Lipase variants, polynucleotides encoding same and the use thereof

ABSTRACT

The present invention relates to lipase variants. The present invention also relates to polynucleotides encoding the variants; nucleic acid constructs, vectors, and host cells comprising the polynucleotides; and methods of using the variants.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. application Ser. No. 16/316,458 filed on Jan. 9, 2019 which is a 35 U.S.C. 371 national application of PCT/EP2017/067857 filed Jul. 14, 2017, which claims priority or the benefit under 35 U.S.C. 119 of EP 16179929.1 filed Jul. 18, 2016, the contents of which are fully incorporated herein by reference.

REFERENCE TO A SEQUENCE LISTING

This application contains a Sequence Listing in computer readable form, which is incorporated herein by reference. The name of the file containing the Sequence Listing is SQ.HTML, which was created on Jul. 6, 2022 and has 2.17 KB.

BACKGROUND OF THE INVENTION Field of the Invention

The present invention relates to lipase variants, polynucleotides encoding the variants, methods of producing the variants, and methods of using the variants.

Description of the Related Art

Lipases are important biocatalysts which have shown to be useful for various applications and a large number of different lipases have been identified and many commercialized. However, new lipases suitable for use in various compositions adapted to conditions currently used are desirable.

Lipases are included in detergent compositions to increase wash performance and specifically to improve lipid stain removal. Current detergent, cleaning and/or fabric care compositions comprise many active ingredients which are interfering with the ability of lipases to remove lipid stains. Builders are included in detergent compositions amongst other for the purpose of lowering the concentration of calcium which due to precipitation may lead to “graying” of the treated surfaces. Low levels of calcium have shown to result in a reduction of lipase activity.

The catalytic site in many lipases is shielded by a lid domain (lid region or lid) and studies have indicated that the lid is important for lipase activity and has a role in activation of lipases. Enhanced catalytic activity in the presence of a water/lipid interface is referred to as “interfacial activation” and describes the situation where the amphiphilic surface loop, i.e., the lid opens on contact with the interface. Shu et al., 2011, Enzyme and Microbial Technology 48: 129-133 generated four Aspergillus niger lipase (ANL) mutants one with no lid and three with the lid in an open conformation for the purpose of identifying interfacial activation independent lipase mutants.

There is thus a need for lipases with improved lipase activity in particular for use in detergent compositions.

SUMMARY OF THE INVENTION

In an aspect, the present invention relates to lipase variants, comprising a modification at one or more positions corresponding to positions 1, 2, 3, 5, 8, 43, 45, 105, 167, 178, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 239 and 244 of SEQ ID NO: 1, wherein the variants have lipase activity.

In a second aspect, the present invention relates to lipase variants, comprising a modification at two or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254, and 256 of SEQ ID NO: 1, wherein the variants have lipase activity.

In a third aspect, the present invention relates to lipase variants, comprising a substitution at two or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254, and 256 of SEQ ID NO: 1 with Arg, wherein the variants have lipase activity.

The present invention also relates to isolated polynucleotides encoding the variants; nucleic acid constructs, vectors, and host cells comprising the polynucleotides; and methods of producing and using the variants.

Definitions

Lipase: The terms “lipase”, “lipase enzyme”, “lipolytic enzyme”, “lipid esterase”, “lipolytic polypeptide”, and “lipolytic protein” refers to an enzyme in class EC 3.1.1 as defined by Enzyme Nomenclature. It may have lipase activity (triacylglycerol lipase, EC 3.1.1.3), cutinase activity (EC 3.1.1.74), sterol esterase activity (EC 3.1.1.13) and/or wax-ester hydrolase activity (EC 3.1.1.50). For purposes of the present invention, lipase activity is determined according to the procedure described in the Example section: Hydrolytic activity may be determined with a PnP assay using substrates with various chain lengths. In one aspect, the variants of the present invention have at least 20%, e.g., at least 25%, at least 30%, at least 35%, at least 40%, at least 45%, at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, or 100% of the lipase activity of the parent lipase. In one aspect the parent lipase is the polypeptide of SEQ ID NO: 1.

Allelic variant: The term “allelic variant” means any of two or more alternative forms of a gene occupying the same chromosomal locus. Allelic variation arises naturally through mutation, and may result in polymorphism within populations. Gene mutations can be silent (no change in the encoded polypeptide) or may encode polypeptides having altered amino acid sequences. An allelic variant of a polypeptide is a polypeptide encoded by an allelic variant of a gene.

cDNA: The term “cDNA” means a DNA molecule that can be prepared by reverse transcription from a mature, spliced, mRNA molecule obtained from a eukaryotic or prokaryotic cell. cDNA lacks intron sequences that may be present in the corresponding genomic DNA. The initial, primary RNA transcript is a precursor to mRNA that is processed through a series of steps, including splicing, before appearing as mature spliced mRNA.

Coding sequence: The term “coding sequence” means a polynucleotide, which directly specifies the amino acid sequence of a variant. The boundaries of the coding sequence are generally determined by an open reading frame, which begins with a start codon such as ATG, GTG or TTG and ends with a stop codon such as TAA, TAG, or TGA. The coding sequence may be a genomic DNA, cDNA, synthetic DNA, or a combination thereof.

Control sequences: The term “control sequences” means nucleic acid sequences necessary for expression of a polynucleotide encoding a variant of the present invention. Each control sequence may be native (i.e., from the same gene) or foreign (i.e., from a different gene) to the polynucleotide encoding the variant or native or foreign to each other. Such control sequences include, but are not limited to, a leader, polyadenylation sequence, propeptide sequence, promoter, signal peptide sequence, and transcription terminator. At a minimum, the control sequences include a promoter, and transcriptional and translational stop signals. The control sequences may be provided with linkers for the purpose of introducing specific restriction sites facilitating ligation of the control sequences with the coding region of the polynucleotide encoding a variant.

Expression: The term “expression” includes any step involved in the production of a variant including, but not limited to, transcription, post-transcriptional modification, translation, post-translational modification, and secretion.

Expression vector: The term “expression vector” means a linear or circular DNA molecule that comprises a polynucleotide encoding a variant and is operably linked to control sequences that provide for its expression.

Fragment: The term “fragment” means a polypeptide having one or more (e.g., several) amino acids absent from the amino and/or carboxyl terminus of a polypeptide; wherein the fragment has lipase activity. In one aspect, a fragment contains at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, or at least 95% but less than 100% of the number of the amino acids present in the parent lipase. In one aspect the parent lipase is the polypeptide of SEQ ID NO: 1.

Host cell: The term “host cell” means any cell type that is susceptible to transformation, transfection, transduction, or the like with a nucleic acid construct or expression vector comprising a polynucleotide of the present invention. The term “host cell” encompasses any progeny of a parent cell that is not identical to the parent cell due to mutations that occur during replication.

Improved property: The term “improved property” means a characteristic associated with a variant that is improved compared to the parent lipase. Such improved properties include, but are not limited to lipase activity and Ca-independency. The lipase activity may be an increased lipase activity; Increased lipase activity at reduced/low levels of Ca; or Increased lipase activity in the presence of EDTA. The Ca-independency may be an increased Ca-independency. The term “reduced or low levels of Ca” means that the concentration of Ca in a solution has been reduced or lowered as compared to a control solution. Such reduced or low levels of Ca may be obtained by adding an agent that depletes a part or all Ca from the solution. Such an agent may be a builder as described in the section “Composition” of the present application.

Isolated: The term “isolated” means a substance in a form or environment that does not occur in nature. Non-limiting examples of isolated substances include (1) any non-naturally occurring substance, (2) any substance including, but not limited to, any enzyme, variant, nucleic acid, protein, peptide or cofactor, that is at least partially removed from one or more or all of the naturally occurring constituents with which it is associated in nature; (3) any substance modified by the hand of man relative to that substance found in nature; or (4) any substance modified by increasing the amount of the substance relative to other components with which it is naturally associated (e.g., recombinant production in a host cell; multiple copies of a gene encoding the substance; and use of a stronger promoter than the promoter naturally associated with the gene encoding the substance).

Mature polypeptide: The term “mature polypeptide” means a polypeptide in its final form following translation and any post-translational modifications, such as N-terminal processing, C-terminal truncation, glycosylation, phosphorylation, etc. In one aspect, the mature polypeptide is SEQ ID NO: 1. It is known in the art that a host cell may produce a mixture of two of more different mature polypeptides (i.e., with a different C-terminal and/or N-terminal amino acid) expressed by the same polynucleotide.

Mutant: The term “mutant” means a polynucleotide encoding a variant.

Nucleic acid construct: The term “nucleic acid construct” means a nucleic acid molecule, either single- or double-stranded, which is isolated from a naturally occurring gene or is modified to contain segments of nucleic acids in a manner that would not otherwise exist in nature or which is synthetic, which comprises one or more control sequences.

Operably linked: The term “operably linked” means a configuration in which a control sequence is placed at an appropriate position relative to the coding sequence of a polynucleotide such that the control sequence directs expression of the coding sequence.

Parent or parent lipase: The term “parent” or “parent lipase” means a lipase to which a modification is made to produce the enzyme variants of the present invention. The parent may be a naturally occurring (wild-type) polypeptide or a variant or fragment thereof. An example of such parent lipases is the amino acid sequence of SEQ ID NO: 1.

Sequence identity: The relatedness between two amino acid sequences or between two nucleotide sequences is described by the parameter “sequence identity”.

For purposes of the present invention, the sequence identity between two amino acid sequences is determined using the Needleman-Wunsch algorithm (Needleman and Wunsch, 1970, J. Mol. Biol. 48: 443-453) as implemented in the Needle program of the EMBOSS package (EMBOSS: The European Molecular Biology Open Software Suite, Rice et al., 2000, Trends Genet. 16: 276-277), preferably version 5.0.0 or later. The parameters used are gap open penalty of 10, gap extension penalty of 0.5, and the EBLOSUM62 (EMBOSS version of BLOSUM62) substitution matrix. The output of Needle labeled “longest identity” (obtained using the −nobrief option) is used as the percent identity and is calculated as follows:

(Identical Residues×100)/(Length of Alignment−Total Number of Gaps in Alignment)

For purposes of the present invention, the sequence identity between two deoxyribonucleotide sequences is determined using the Needleman-Wunsch algorithm (Needleman and Wunsch, 1970, supra) as implemented in the Needle program of the EMBOSS package (EMBOSS: The European Molecular Biology Open Software Suite, Rice et al., 2000, supra), preferably version 5.0.0 or later. The parameters used are gap open penalty of 10, gap extension penalty of 0.5, and the EDNAFULL (EMBOSS version of NCBI NUC4.4) substitution matrix. The output of Needle labeled “longest identity” (obtained using the −nobrief option) is used as the percent identity and is calculated as follows:

(Identical Deoxyribonucleotides×100)/(Length of Alignment−Total Number of Gaps in Alignment)

Variant: The term “variant” means a polypeptide having lipase activity comprising a modification, i.e., a substitution, insertion, and/or deletion, at one or more (e.g., several) positions. A substitution means replacement of the amino acid occupying a position with a different amino acid; a deletion means removal of the amino acid occupying a position; and an insertion means adding an amino acid adjacent to and immediately following the amino acid occupying a position. The variants of the present invention have at least 20%, e.g., at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, or at least 100% of the lipase activity of the polypeptide of the parent lipase. In one aspect the parent lipase comprises or consists of the amino acid sequence of SEQ ID NO: 1.

Wild-type lipase: The term “wild-type” lipase means a lipase expressed by a naturally occurring microorganism, such as a bacterium, yeast, or filamentous fungus found in nature.

Conventions for Designation of Variants

For purposes of the present invention, SEQ ID NO: 1 is used to determine the corresponding amino acid residue in another lipase. The amino acid sequence of another lipase is aligned with SEQ ID NO: 1, and based on the alignment, the amino acid position number corresponding to any amino acid residue in SEQ ID NO: 1 is determined using the Needleman-Wunsch algorithm (Needleman and Wunsch, 1970, J. Mol. Biol. 48: 443-453) as implemented in the Needle program of the EMBOSS package (EMBOSS: The European Molecular Biology Open Software Suite, Rice et al., 2000, Trends Genet. 16: 276-277), preferably version 5.0.0 or later. The parameters used are gap open penalty of 10, gap extension penalty of 0.5, and the EBLOSUM62 (EMBOSS version of BLOSUM62) substitution matrix.

Identification of the corresponding amino acid residue in another lipase can be determined by alignment of multiple polypeptide sequences using several computer programs including, but not limited to, MUSCLE (multiple sequence comparison by log-expectation; version 3.5 or later; Edgar, 2004, Nucleic Acids Research 32: 1792-2797), MAFTT (version 6.857 or later; Katoh and Kuma, 2002, Nucleic Acids Research 30: 3059-3066; Katoh et al., 2005, Nucleic Acids Research 33: 511-518; Katoh and Toh, 2007, Bioinformatics 23: 372-374; Katoh et al., 2009, Methods in Molecular Biology 537: 39-64; Katoh and Toh, 2010, Bioinformatics 26: 1899-1900), and EMBOSS EMMA employing ClustalW (1.83 or later; Thompson et al., 1994, Nucleic Acids Research 22: 4673-4680), using their respective default parameters.

When the other enzyme has diverged from SEQ ID NO: 1 such that traditional sequence-based comparison fails to detect their relationship (Lindahl and Elofsson, 2000, J. Mol. Biol. 295: 613-615), other pairwise sequence comparison algorithms can be used. Greater sensitivity in sequence-based searching can be attained using search programs that utilize probabilistic representations of polypeptide families (profiles) to search databases. For example, the PSI-BLAST program generates profiles through an iterative database search process and is capable of detecting remote homologs (Atschul et al., 1997, Nucleic Acids Res. 25: 3389-3402). Even greater sensitivity can be achieved if the family or superfamily for the polypeptide has one or more representatives in the protein structure databases. Programs such as GenTHREADER (Jones, 1999, J. Mol. Biol. 287: 797-815; McGuffin and Jones, 2003, Bioinformatics 19: 874-881) utilize information from a variety of sources (PSI-BLAST, secondary structure prediction, structural alignment profiles, and solvation potentials) as input to a neural network that predicts the structural fold for a query sequence. Similarly, the method of Gough et al., 2000, J. Mol. Biol. 313: 903-919, can be used to align a sequence of unknown structure with the superfamily models present in the SCOP database. These alignments can in turn be used to generate homology models for the polypeptide, and such models can be assessed for accuracy using a variety of tools developed for that purpose.

For proteins of known structure, several tools and resources are available for retrieving and generating structural alignments. For example the SCOP superfamilies of proteins have been structurally aligned, and those alignments are accessible and downloadable. Two or more protein structures can be aligned using a variety of algorithms such as the distance alignment matrix (Holm and Sander, 1998, Proteins 33: 88-96) or combinatorial extension (Shindyalov and Bourne, 1998, Protein Engineering 11: 739-747), and implementation of these algorithms can additionally be utilized to query structure databases with a structure of interest in order to discover possible structural homologs (e.g., Holm and Park, 2000, Bioinformatics 16: 566-567).

In describing the variants of the present invention, the nomenclature described below is adapted for ease of reference. The accepted IUPAC single letter or three letter amino acid abbreviation is employed.

Substitutions: For an amino acid substitution, the following nomenclature is used: Original amino acid, position, substituted amino acid. Accordingly, the substitution of threonine at position 226 with alanine is designated as “Thr226Ala” or “T226A”. Multiple mutations/modifications are separated by addition marks (“+”), e.g., “Gly205Arg+Ser411Phe” or “G205R+S411F” (or G205 S411F), representing substitutions at positions 205 and 411 of glycine (G) with arginine (R) and serine (S) with phenylalanine (F), respectively.

Deletions: For an amino acid deletion, the following nomenclature is used: Original amino acid, position, *. Accordingly, the deletion of glycine at position 195 is designated as “Gly195*” or “G195*”. Multiple deletions are separated by addition marks (“+”), e.g., “Gly195*+Ser411*” or “G195*+S411*”.

Insertions: For an amino acid insertion, the following nomenclature is used: Original amino acid, position, original amino acid, inserted amino acid. Accordingly the insertion of lysine after glycine at position 195 is designated “Gly195GlyLys” or “G195GK”. An insertion of multiple amino acids is designated [Original amino acid, position, original amino acid, inserted amino acid #1, inserted amino acid #2; etc.]. For example, the insertion of lysine and alanine after glycine at position 195 is indicated as “Gly195GlyLysAla” or “G195GKA”.

In such cases the inserted amino acid residue(s) are numbered by the addition of lower case letters to the position number of the amino acid residue preceding the inserted amino acid residue(s). In the above example, the sequence would thus be:

Parent: Variant: 195 195 195a 195b G G-K-A

Multiple modifications: Variants comprising multiple modifications are separated by addition marks (“+”), e.g., “Arg170Tyr+Gly195Glu” or “R170Y+G195E” representing a substitution of arginine and glycine at positions 170 and 195 with tyrosine and glutamic acid, respectively.

Different modifications: Where different modifications can be introduced at a position, the different modifications are separated by a comma, e.g., “Arg170Tyr,Glu” represents a substitution of arginine at position 170 with tyrosine or glutamic acid. Thus, “Tyr167Gly,Ala+Arg170Gly,Ala” designates the following variants: “Tyr167Gly+Arg170Gly”, “Tyr167Gly+Arg170Ala”, “Tyr167Ala+Arg170Gly”, and “Tyr167Ala+Arg170Ala”.

DETAILED DESCRIPTION OF THE INVENTION

The present invention relates to lipase variants, which have an increased lipase activity and/or increased Ca-independency as compared to the parent enzyme.

Variants

In a first aspect, the present invention relates to isolated lipase variants, comprising a modification at one or more (e.g., several) positions corresponding to positions 1, 2, 3, 5, 8, 43, 45, 105, 167, 178, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 239 and 244 of SEQ ID NO: 1, wherein the variants have lipase activity and wherein:

a. the modification at the position corresponding to position 1 is a deletion, e.g., E1*, or an insertion of Arg, e.g., E1ER;

b. the modification at the position corresponding to position 2 is a deletion, e.g., V2*;

c. the modification at the position corresponding to position 3 is a deletion, e.g., S3*;

d. the modification at the position corresponding to position 5 is a deletion, e.g., D5*;

e. the modification at the position corresponding to position 8 is a substitution with Arg or Lys, e.g., N8R,K, in particular with Arg;

f. the modification at the position corresponding to position 43 is a deletion, e.g., E43*;

g. the modification at the position corresponding to position 45 is a deletion, e.g., E45*;

h. the modification at the position corresponding to position 167 is a deletion, e.g., D167*;

i. the modification at the position corresponding to position 224 is a deletion, e.g., S224* or an insertion of Arg, e.g., S224SR;

j. the modification at the position corresponding to position 225 is a deletion, e.g., G225* or an insertion of Arg, e.g., G225GR;

k. the modification at the position corresponding to position 226 is a deletion, e.g., T226* or an insertion of Arg, e.g., T226TR;

l. the modification at the position corresponding to position 227 is a deletion, e.g., L227* or an insertion of Arg, e.g., L227LR;

m. the modification at the position corresponding to position 228 is a deletion, e.g., V228* or an insertion of Arg, e.g., V228VR;

n. the modification at the position corresponding to position 229 is a deletion, e.g., P229* or an insertion of Arg, e.g., P229PR;

o. the modification at the position corresponding to position 230 is a deletion, e.g., V230*, or a substitution with Arg or Lys, e.g., V230K,R, in particular with Arg;

p. the modification at the position corresponding to position 231 is an insertion of one or more Arg, e.g., T231TR or T231TRR;

q. the modification at the position corresponding to position 232 is an insertion of Arg, e.g., R232RR;

r. the modification at the position corresponding to position 234 is a deletion, e.g., D234*;

s. the modification at the position corresponding to position 236 is a substitution with Arg or Lys, e.g., V236K or V236R, in particular with Arg; and

t. the modification at the position corresponding to position 239 is a deletion, e.g., E239*;

u. the modification at the position corresponding to position 105 is a substitution with Arg, e.g. S105R, and/or an insertion of Arg, e.g., S105SR or S105RR; and

v. the modification at the position corresponding to position 178 is a substitution with Arg, e.g. N178R;

x. the modification at the position corresponding to position 244 is an insertion of Arg, e.g., T244TR.

In a second aspect, the present invention relates to isolated lipase variants, comprising a modification at two or more (e.g., several) positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 31, 30, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256 of SEQ ID NO: 1, wherein the variants have lipase activity and wherein

-   -   a. the modification at the position corresponding to position 1         is a deletion, e.g., E1*, an insertion of Arg, e.g., E1ER, or a         substitution with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg, Gln, Lys, or Pro, most particularly with Gln or Pro,         e.g., E1P or E1Q;     -   b. the modification at the position corresponding to position 2         is a deletion, e.g., V2*, or a substitution with Arg or Lys,         e.g., V2R or V2K;     -   c. the modification at the position corresponding to position 3         is a deletion, e.g., S3*, or a substitution with Arg or Lys,         e.g., S3R or S3K, in particular with Arg;     -   d. the modification at the position corresponding to position 4         is a substitution with Arg or Lys, e.g., Q4R or Q4K, in         particular with Arg;     -   e. the modification at the position corresponding to position 5         is a deletion, e.g., D5*, or a substitution with Ala, Arg, Asn,         Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp,         Tyr, or Val, in particular with Arg or Lys, e.g., D5K or D5R,         most particularly with Arg;     -   f. the modification at the position corresponding to position 6         is a substitution with Arg or Lys, e.g., L6R or L6K, in         particular with Arg;     -   g. the modification at the position corresponding to position 7         is a substitution with Arg or Lys, e.g., F7R or F7K, in         particular with Arg;     -   h. the modification at the position corresponding to position 8         is a substitution with Arg or Lys, e.g., N8R or N8K, in         particular with Arg;     -   i. the modification at the position corresponding to position 9         is a substitution with Arg or Lys, e.g., Q9R or Q9K, in         particular with Arg;     -   j. the modification at the position corresponding to position 11         is a substitution with Arg or Lys, e.g., N11R or N11K, in         particular with Arg;     -   k. the modification at the position corresponding to position 12         is a substitution with Arg or Lys, e.g., L12R or L12K, in         particular with Arg;     -   l. the modification at the position corresponding to position 15         is a substitution with Arg or Lys, e.g., Q15R or Q15K, in         particular with Arg;     -   m. the modification at the position corresponding to position 37         is a substitution with Arg or Lys, e.g., T37R or T37K, in         particular with Arg;     -   n. the modification at the position corresponding to position 38         is a substitution with Arg or Lys, e.g., Q38R or Q38K, in         particular with Arg;     -   o. the modification at the position corresponding to position 39         is a substitution with Arg or Lys, e.g., N39R or N39K, in         particular with Arg;     -   p. the modification at the position corresponding to position 40         is a substitution with Arg or Lys, e.g., A40R or A40K, in         particular with Arg;     -   q. the modification at the position corresponding to position 42         is a substitution with Arg or Lys, e.g., P42R or P42K, in         particular with Arg;     -   r. the modification at the position corresponding to position 43         is a deletion, e.g., E43*, or a substitution at the position         corresponding to position 43 with Ala, Arg, Asn, Cys, Gln, Gly,         His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val,         in particular with Arg or Lys, e.g., E43K, or E43R, most         particularly with Arg;     -   s. the modification at the position corresponding to position 45         is a deletion, e.g., E45*, or a substitution at the position         corresponding to position 45 with Ala, Arg, Asn, Cys, Gln, Gly,         His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val,         in particular with Arg or Lys, e.g., E45K or E45R, most         particularly with Arg;     -   t. the modification at the position corresponding to position 73         is a substitution with Arg or Lys, e.g., N73R or N73K, in         particular with Arg;     -   u. the modification at the position corresponding to position         167 is a deletion, e.g., D167*, or a substitution at the         position corresponding to position 167 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., D167K or D167R,         most particularly with Arg;     -   v. the modification at the position corresponding to position         192 is a substitution with Arg or Lys, e.g., T192R or T192K, in         particular with Arg;     -   w. the modification at the position corresponding to position         193 is a substitution with Arg or Lys, e.g., L193R or L193K, in         particular with Arg;     -   x. the modification at the position corresponding to position         194 is a substitution with Arg or Lys, e.g., Y194R or Y194K, in         particular with Arg;     -   y. the modification at the position corresponding to position         199 is a substitution with Arg or Lys, e.g., T199R or T199K, in         particular with Arg;     -   z. the modification at the position corresponding to position         200 is a substitution with Arg or Lys, e.g., N200R or N200K, in         particular with Arg;     -   aa. the modification at the position corresponding to position         202 is a substitution with Arg or Lys, e.g., I202R or I202K, in         particular with Arg;     -   ab. the modification at the position corresponding to position         217 is a substitution with Arg or Lys, e.g., S217R or S217K, in         particular with Arg;     -   ac. the modification at the position corresponding to position         218 is a substitution with Arg or Lys, e.g., P218R or P218K, in         particular with Arg;     -   ad. the modification at the position corresponding to position         220 is a substitution with Arg or Lys, e.g., Y220R or Y220K, in         particular with Arg;     -   ae. the modification at the position corresponding to position         221 is a substitution with Arg or Lys, e.g., W221R or W221K, in         particular with Arg;     -   af. the modification at the position corresponding to position         224 is a deletion, e.g., S224*, an insertion of Arg, e.g.,         S224SR, or a substitution with Arg or Lys, e.g., S224K or S224R,         in particular with Arg;     -   ag. the modification at the position corresponding to position         225 is a deletion, e.g., G225*, an insertion of Arg, e.g.,         G225GR, or a substitution with Arg or Lys, e.g., G225K or G225R,         in particular with Arg;     -   ah. the modification at the position corresponding to position         226 is a deletion, e.g., T226*, an insertion of Arg, e.g.,         T226TR or a substitution with Arg or Lys, e.g., T226K or T226R,         in particular with Arg;     -   ai. the modification at the position corresponding to position         227 is a deletion, e.g., L227*, an insertion of Arg, e.g.,         L227LR or a substitution with Arg or Lys, e.g., L227K or L227R,         in particular with Arg;     -   aj. the modification at the position corresponding to position         228 is a deletion, e.g., V228*, an insertion of Arg, e.g.,         V228VR or a substitution with Arg or Lys, e.g., V228K or V228R,         in particular with Arg;     -   ak. the modification at the position corresponding to position         229 is a deletion, e.g., P229*, an insertion of Arg, e.g.,         P229PR, or a substitution with Arg or Lys, e.g., P229K or P229R,         in particular with Arg;     -   al. the modification at the position corresponding to position         230 is a deletion, e.g., V230*, an insertion of Arg, e.g.,         V230VR or a substitution with Arg or Lys, e.g., V230K or V230R,         in particular with Arg;     -   am. the modification at the position corresponding to position         231 is insertion of one or two Arg, e.g., T231TR or T231TRR, or         a substitution with Arg or Lys, e.g., T231K or T231R, in         particular with Arg;     -   an. the modification at the position corresponding to position         232 is an insertion of Arg, e.g., R232RR;     -   ao. the modification at the position corresponding to position         233 is a substitution with Arg or Lys, e.g., N233K or D233R, in         particular with Arg;     -   ap. the modification at the position corresponding to position         234 is a deletion, e.g., D234*, or a substitution at the         position corresponding to position 234 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., D234K or D234R,         most particularly with Arg;     -   aq. the modification at the position corresponding to position         236 is a substitution with Arg or Lys, e.g., V236K or V236R, in         particular with Arg;     -   ar. the modification at the position corresponding to position         238 is a substitution with Arg or Lys, e.g., I238K or I238R, in         particular with Arg;     -   as. the modification at the position corresponding to position         239 is a deletion, e.g., E239*, or a substitution at the         position corresponding to position 239 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., E239K or E239R,         most particularly with Arg;     -   at. the modification at the position corresponding to position         243 is an insertion of Arg, e.g., A243AR or a substitution with         Arg or Lys, e.g., A243K or A243R, in particular with Arg;     -   au. the modification at the position corresponding to position         244 is an insertion of Arg, e.g., T244TR or a substitution with         Arg or Lys, e.g., T244K or T244R, in particular with Arg;     -   av. the modification at the position corresponding to position         245 is a substitution with Arg or Lys, e.g., G245K or G245R, in         particular with Arg;     -   aw. the modification at the position corresponding to position         248 is a substitution with Arg or Lys, e.g., N248K or N248R, in         particular with Arg;     -   ax. the modification at the position corresponding to position         249 is a substitution with Arg or Lys, e.g., Q249K or Q249R, in         particular with Arg; and     -   ay. the modification at the position corresponding to position         251 is a substitution with Arg or Lys, e.g., N251K or N251R, in         particular with Arg     -   az. the modification at the position corresponding to position         28 is a substitution with Arg, e.g., A28R     -   ba. the modification at the position corresponding to position         29 is a substitution with Arg, e.g., P29R;     -   bb. the modification at the position corresponding to position         30 is a substitution with Arg, e.g., A30R;     -   bc. the modification at the position corresponding to position         31 is a substitution with Arg, e.g., G31R;     -   bd. the modification at the position corresponding to position         33 is a substitution with Arg, e.g., N33R;     -   be. the modification at the position corresponding to position         99 is a substitution with Arg, e.g., E99R;     -   bf. the modification at the position corresponding to position         101 is a substitution with Arg, e.g., N101R;     -   bg. the modification at the position corresponding to position         102 is a substitution with Arg, e.g., D102R;     -   bh. the modification at the position corresponding to position         105 is a substitution with Arg, e.g., S105R and/or an insertion         of Arg, e.g., S105SR or S105RR;     -   bi. the modification at the position corresponding to position         178 is a substitution with Arg, e.g., N178R     -   bj. the modification at the position corresponding to position         180 is a substitution with Arg, e.g., A180R;     -   bk. the modification at the position corresponding to position         211 is a substitution with Arg, e.g., F211R;     -   bl. the modification at the position corresponding to position         250 is a substitution with Arg, e.g., P250R;     -   bm. the modification at the position corresponding to position         252 is a substitution with Arg, e.g., I252R;     -   bn. the modification at the position corresponding to position         254 is a substitution with Arg, e.g., D254R;     -   bo. the modification at the position corresponding to position         256 is a substitution with Arg, e.g., P256R.

In another embodiment, the lipase variant comprises a modification at three or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256. In another aspect, the lipase variant comprises a modification at four or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256. In another aspect, the lipase variant comprises a modification at five or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256. In another aspect, the lipase variant comprises a modification at six or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256.

In an embodiment, the variant comprises a deletion at the position corresponding to position 1, e.g., E1*, an insertion of Arg at the position corresponding to position 1, e.g., E1ER, or a substitution at the position corresponding to position 1 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg, Gln, Lys or Pro, most particularly with Gln or Pro. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution E1P or E1Q.

In another embodiment, the variant comprises a deletion at the position corresponding to position 2, e.g., V2*, or a substitution at the position corresponding to position 2 with Arg or Lys. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution V2K or V2R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 3, e.g., S3*, or a substitution at the position corresponding to position 3 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution S3K or S3R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 4 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Q4K or Q4R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 5, e.g., D5*, or a substitution at the position corresponding to position 5 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution D5K or D5R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 6 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution L6K or L6R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 7 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution F7K or F7R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 8 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N8K or N8R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 9 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Q9K or Q9R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 11 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N11K or N11R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 12 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution L12K or L12R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 15 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Q15K or Q15R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 28 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution A28K or A28R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 29 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P29K or P29R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 30 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution A30K or A30R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 31 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution G31K or G31R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 33 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N33K or N33R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 37 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T37K or T37R. In another embodiment, the variant comprises a substitution at the position corresponding to position 38 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Q38K or Q38R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 39 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N39K or N39R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 40 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution A40K or A40R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 42 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P42K or P42R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 43, e.g., E43*, or a substitution at the position corresponding to position 43 with Ala, Arg, Asn, Cys, Gin, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution E43K or E43R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 45, e.g., E45*, or a substitution at the position corresponding to position 45 with Ala, Arg, Asn, Cys, Gin, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution E45K or E45R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 73 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N73K or N73R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 99 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution E99K or E99R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 105 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution S105K or S105R. In another embodiment, the variant comprises a deletion at the position corresponding to position 167, e.g., D167*, or a substitution at the position corresponding to position 167 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution D167K or D167R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 178 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N178K or N178R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 180 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution A180K or A180R. In another embodiment, the variant comprises a substitution at the position corresponding to position 192 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T192K or T192R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 193 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution L193K or L193R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 194 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Y194K of Y194R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 199 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T199K or T199R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 200 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N200K or N200R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 202 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution I202K or I202R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 211 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution F211K or F211R. In another embodiment, the variant comprises a substitution at the position corresponding to position 217 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution S217K or S217R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 218 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P218K or P218R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 220 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Y220K or Y220R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 221 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution W221K or W221R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 224, e.g., S224*, or a substitution at the position corresponding to position 224 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution S224K or S224R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 225, e.g., G225*, or a substitution at the position corresponding to position 225 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution G225K or G225R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 226, e.g., T226*, or a substitution at the position corresponding to position 226 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T226K or T226R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 227, e.g., L227*, or a substitution at the position corresponding to position 227 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution L227K or L227R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 228, e.g., V228*, or a substitution at the position corresponding to position 228 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution V228K or V228R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 229, e.g., P229*, or a substitution at the position corresponding to position 229 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P229K or P229R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 230, e.g., V230*, or a substitution at the position corresponding to position 230 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution V230K or V230R.

In an embodiment, the variant comprises one or two insertions of Arg at the position corresponding to position 231, e.g., T231TR pr T231TRR, or a substitution at the position corresponding to position 231 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T231R.

In an embodiment, the variant comprises an insertion of Arg at the position corresponding to position 232, e.g., R232RR.

In another embodiment, the variant comprises a substitution at the position corresponding to position 233 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N233K or N233R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 234, e.g., D234*, or a substitution at the position corresponding to position 234 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution D234K or D234R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 236 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution V236K or V236R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 237 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution I238K or I238R.

In another embodiment, the variant comprises a deletion at the position corresponding to position 239, e.g., E239*, or a substitution at the position corresponding to position 239 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, most particularly with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution E239K or E239R.

In another embodiment, the variant comprises an insertion of Arg at the position corresponding to position 243, e.g., A243AR. In another embodiment, the variant comprises a substitution at the position corresponding to position 243 with Arg or Lys, in particular with Arg.

In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution A243K or A243R.

In another embodiment, the variant comprises one or two insertions of Arg at the position corresponding to position 244, e.g., T244TR pr T244TRR. In an embodiment the variant comprises a substitution at the position corresponding to position 244 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution T244K or T244R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 245 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution G245K or G245R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 248 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N248K or N248R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 249 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution Q249K or Q249R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 250 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P250K or P250R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 251 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution N251K or N251R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 252 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution I252K or I252R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 254 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution D254K or D254R.

In another embodiment, the variant comprises a substitution at the position corresponding to position 256 with Arg or Lys, in particular with Arg. In another aspect, the variant is a variant of SEQ ID NO: 1, comprising the substitution P256K or P256R. In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 1 and 2, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 1 and 3, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 1 and 4, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 2 and 3, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 2 and 4, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 4 and 8, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 5 and 8, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 8 and 11, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 8 and 43, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 30 and 31, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 30 and 33, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 30 and 34, such as those described above. In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 37 and 38, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 37 and 39, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 38 and 39, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 38 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 39 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 102 and 105, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 105 and 106, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 106 and 178, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 199 and 200, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 200 and 225, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 200 and 227, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 200 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 210 and 211, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 225, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 226, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 227, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 228, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 230, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 232, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 233, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 224 and 234, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 226, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 227, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 228, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 230, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 232, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 233, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 225 and 234, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 227, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 228, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 230, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 232, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 233, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 234, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 226 and 249, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 228, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 229, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 230, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 232, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 233, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 234, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 227 and 249, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 229 and 230, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 229 and 231, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 233 and 236, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 233 and 243, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 233 and 249, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 234 and 236, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 236 and 239, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 243 and 245, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 245 and 249, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 249 and 250, such as those described above.

In another embodiment, the variant comprises or consists of a modification at positions corresponding to positions 250 and 252, such as those described above. In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 1, 2, and 3, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 1, 2, and 4, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 37, 38, and 39, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, and 226, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, and 227, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, and 227, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, and 227, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 227, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 231, 233, and 244, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 231, 239, and 249, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, and 227, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, 227, and 228, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, 227, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, 227, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 226, 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, 227, 228, and 229, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 225, 226, 227, 228, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 224, 226, 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises or consists of modifications at positions corresponding to positions 225, 226, 227, 228, 229, and 230, such as those described above.

In another embodiment, the variant comprises the modifications in the positions corresponding to the positions selected from the group consisting of: E1*+V2*; E1*+S3*; E1*+D5*; E1*+N8R; E1*+N8K; E1*+E43*; E1*+E45*; E1*+D167*; E1*+S224*; E1*+S225*; E1*+T226*; E1*+L227*; E1*+V228*; E1*+P229*; E1*+V230*; E1*+V230K; E1*+V230R; E1*+D234*; E1*+V236K; E1*+V236R; E1*+E239*; E1ER+V2*; E1ER+S3*; E1ER+D5*; E1ER+N8R; E1ER+N8K; E1ER+E43*; E1ER+E45*; E1ER+D167*; E1ER+S224*; E1ER+S225*; E1ER+T226*; E1ER+L227*; E1ER+V228*; E1ER+P229*; E1ER+V230*; E1ER+V230K; E1ER+V230R; E1ER+D234*; E1ER+V236K; E1ER+V236R; E1ER+E239*; E1Q+V2K; V2*+S3*; V2*+D5*; V2*+N8R; V2*+N8K; V2*+E43*; V2*+E45*; V2*+D167*; V2*+S224*; V2*+S225*; V2*+T226*; V2*+L227*; V2*+V228*; V2*+P229*; V2*+V230*; V2*+V230K; V2*+V230R; V2*+D234*; V2*+V236K; V2*+V236R; V2*+E239*; S3*+D5*; S3*+N8R; S3*+N8K; S3*+E43*; S3*+E45*; S3*+D167*; S3*+S224*; S3*+S225*; S3*+T226*; S3*+L227*; S3*+V228*; S3*+P229*; S3*+V230*; S3*+V230K; S3*+V230R; S3*+D234*; S3*+V236K; S3*+V236R; S3*+E239*; D5*+N8R; D5*+N8K; D5*+E43*; D5*+E45*; D5*+D167*; D5*+S224*; D5*+S225*; D5*+T226*; D5*+L227*; D5*+V228*; D5*+P229*; D5*+V230*; D5*+V230K; D5*+V230R; D5*+D234*; D5*+V236K; D5*+V236R; D5*+E239*; N8R+E43*; N8R+E45*; N8R+D167*; N8R+S224*; N8R+S225*; N8R+T226*; N8R+L227*; N8R+V228*; N8R+P229*; N8R+V230*; N8R+V230K; N8R+V230R; N8R+D234*; N8R+V236K; N8R+V236R; N8R+E239*; N8K+E43*; N8K+E45*; N8K+D167*; N8K+S224*; N8K+S225*; N8K+T226*; N8K+L227*; N8K+V228*; N8K+P229*; N8K+V230*; N8K+V230K; N8K+V230R; N8K+D234*; N8K+V236K; N8K+V236R; N8K+E239*; E43*+E45*; E43*+D167*; E43*+S224*; E43*+S225*; E43*+T226*; E43*+L227*; E43*+V228*; E43*+P229*; E43*+V230*; E43*+V230K; E43*+V230R; E43*+D234*; E43*+V236K; E43*+V236R; E43*+E239*; E45*+D167*; E45*+S224*; E45*+S225*; E45*+T226*; E45*+L227*; E45*+V228*; E45*+P229*; E45*+V230*; E45*+V230K; E45*+V230R; E45*+D234*; E45*+V236K; E45*+V236R; E45*+E239*; D167*+S224*; D167*+S225*; D167*+T226*; D167*+L227*; D167*+V228*; D167*+P229*; D167*+V230*; D167*+V230K; D167*+V230R; D167*+D234*; D167*+V236K; D167*+V236R; D167*+E239*; S224*+S225*; S224*+T226*; S224*+L227*; S224*+V228*; S224*+P229*; S224*+V230*; S224*+V230K; S224*+V230R; S224*+D234*; S224*+V236K; S224*+V236R; S224*+E239*; S225*+T226*; S225*+L227*; S225*+V228*; S225*+P229*; S225*+V230*; S225*+V230K; S225*+V230R; S225*+D234*; S225*+V236K; S225*+V236R; S225*+E239*; T226*+L227*; T226*+V228*; T226*+P229*; T226*+V230*; T226*+V230K; T226*+V230R; T226*+D234*; T226*+V236K; T226*+V236R; T226*+E239*; L227*+V228*; L227*+P229*; L227*+V230*; L227*+V230K; L227*+V230R; L227*+D234*; L227*+V236K; L227*+V236R; L227*+E239*; V228*+P229*; V228*+V230*; V228*+V230K; V228*+V230R; V228*+D234*; V228*+V236K; V228*+V236R; V228*+E239*; P229*+V230*; P229*+V230K; P229*+V230R; P229*+D234*; P229*+V236K; P229*+V236R; P229*+E239*; V230*+V230R; V230*+D234*; V230*+V236K; V230*+V236R; V230*+E239*; V230K+V230R; V230K+D234*; V230K+V236K; V230K+V236R; V230K+E239*; V230R+D234*; V230R+V236K; V230R+V236R; V230R+E239*; D234*+V236K; D234*+V236R; D234*+E239*; V236K+E239*; and V236R+E239* of SEQ ID NO: 1.

In another embodiment, the variant comprises or consists of (a) E1ER, E1P or E1Q+(b) V2*, V2K or V2R.

In another embodiment, the variant comprises or consists of (a) E1ER, E1P or E1Q+(b) S3* or S3R.

In another embodiment, the variant comprises or consists of (a) E1ER, E1P or E1Q+(b) Q4R.

In another embodiment, the variant comprises or consists of (a) V2*, V2K or V2R+(b) S3* or S3R.

In another embodiment, the variant comprises or consists of (a) V2*, V2K or V2R+(b) Q4R.

In another embodiment, the variant comprises or consists of (a) Q4R+(b) N8R.

In another embodiment, the variant comprises or consists of (a) D5R+(b) N8R.

In another embodiment, the variant comprises or consists of (a) N8R+(b) N11R.

In another embodiment, the variant comprises or consists of (a) N8R+(b) E43R.

In another embodiment, the variant comprises or consists of (a) T37R+(b) G38R.

In another embodiment, the variant comprises or consists of (a) T37R+(b) N39R.

In another embodiment, the variant comprises or consists of (a) G38R+(b) N39R.

In another embodiment, the variant comprises or consists of (a) T199R+(b) N200R.

In another embodiment, the variant comprises or consists of (a) N200R+(b) G225R.

In another embodiment, the variant comprises or consists of (a) N200R+(b) L227R.

In another embodiment, the variant comprises or consists of (a) N200R+(b) T231R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) G225* or G225R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) T226* or T226R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) T231TR or T231R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) R232RR.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) N233R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R+(b) D234* or D234R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) T226* or T226R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) L227*+L227R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) T231TR or T231R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) R232RR.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) N233R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R+(b) D234* or D234R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) T231TR or T231R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) R232RR.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) N233R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) D234* or D234R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R+(b) Q249R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) T231TR or T231R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) R232RR.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) N233R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) D234* or D234R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R+(b) Q249R.

In another embodiment, the variant comprises or consists of (a) T231TR or T231R+(b) V236R.

In another embodiment, the variant comprises or consists of (a) T231TR or T231R+(b) G239* or G239E.

In another embodiment, the variant comprises or consists of (a) T231TR or T231R+(b) Q249R.

In another embodiment, the variant comprises or consists of (a) N233R+(b) V236R.

In another embodiment, the variant comprises or consists of (a) N233R+(b) Q249R.

In another embodiment, the variant comprises or consists of (a) V236R+(b) G239* or G239E.

In another embodiment, the variant comprises the modifications in the positions corresponding to the positions selected from the group consisting of: E1*+V2*; E1*+V2R; E1*+V2*; E1*+V2K; E1*+S3*; E1*+V3R; E1*+V3K; E1*+Q4R; E1*+Q4K; E1*+D5*; E1*+D5R; E1*+D5K; E1*+L6R; E1*+L6K; E1*+F7R; E1*+F7K; E1*+N8R; E1*+N8K; E1*+Q9R; E1*+Q9K; E1*+N11R; E1*+N11K; E1*+L12R; E1*+L12K; E1*+Q15R; E1*+Q15K; E1*+T37R; E1*+T37K; E1*+Q38R; E1*+Q38K; E1*+N39R; E1*+N39K; E1*+A40R; E1*+A40K; E1*+P42R; E1*+P42K; E1*+E43*; E1*+E43R; E1*+E43K; E1*+E45*; E1*+E45R; E1*+E45K; E1*+N73R; E1*+N73K; E1*+D167*; E1*+D167R; 1*+D167K; E1*+T192R; E1*+T192K; E1*+L193R; E1*+L193K; E1*+Y194R; E1*+Y194K; E1*+T199R; E1*+T199K; E1*+N200R; E1*+N200K; E1*+I202R; E1*+I202K; E1*+S217R; E1*+S217K; E1*+P218R; E1*+P218K; E1*+Y220R; E1*+Y220K; E1*+W221R; E1*+W221K; E1*+S224*; E1*+S224R; E1*+S224K; E1*+S225*; E1*+S225R; E1*+S225K; E1*+T226*; E1*+T226R; E1*+T226K; E1*+L227*; E1*+L227R; E1*+L227K; E1*+V228*; E1*+V228R; E1*+V228K; E1*+P229*; E1*+P229R; E1*+P229K; E1*+V230*; E1*+V230K; E1*+V230R; E1*+T231R; E1*+T231K; E1*+R232RR; E1*+N233R; E1*+N233K; E1*+D234*; E1*+D234R; E1*+D234K; E1*+V236K; E1*+V236R; E1*+I238R; E1*+I238K; E1*+E239*; E1*+E239R; E1*+E239K; E1*+A243R; E1*+A243K; E1*+T244R; E1*+T244K; E1*+G245R; E1*+G245K; E1*+N248R; E1*+N248K; E1*+Q249R; E1*+Q249K; E1*+N251R; E1*+N251K; E1ER+V2*; E1ER+V2R; E1ER+V2K; E1ER+S3*; E1ER+V3R; E1ER+V3K; E1ER+Q4R; E1ER+Q4K; E1ER+D5*; E1ER+D5R; E1ER+D5K; E1ER+L6R; E1ER+L6K; E1ER+F7R; E1ER+F7K; E1ER+N8R; E1ER+N8K; E1ER+Q9R; E1ER+Q9K; E1ER+N11R; E1ER+N11K; E1ER+L12R; E1ER+L12K; E1ER+Q15R; E1ER+Q15K; E1ER+T37R; E1ER+T37K; E1ER+Q38R; E1ER+Q38K; E1ER+N39R; E1ER+N39K; E1ER+A40R; E1ER+A40K; E1ER+P42R; E1ER+P42K; E1ER+E43*; E1ER+E43R; E1ER+E43K; E1ER+E45*; E1ER+E45R; E1ER+E45K; E1ER+N73R; E1ER+N73K; E1ER+D167*; E1ER+D167R; E1ER+D167K; E1ER+T192R; E1ER+T192K; E1ER+L193R; E1ER+L193K; E1ER+Y194R; E1ER+Y194K; E1ER+T199R; E1ER+T199K; E1ER+N200R; E1ER+N200K; E1ER+I202R; E1ER+I202K; E1ER+S217R; E1ER+S217K; E1ER+P218R; E1ER+P218K; E1ER+Y220R; E1ER+Y220K; E1ER+W221R; E1ER+W221K; E1ER+S224*; E1ER+S224R; E1ER+S224K; E1ER+S225*; E1ER+S225R; E1ER+S225K; E1ER+T226*; E1ER+T226R; E1ER+T226K; E1ER+L227*; E1ER+L227R; E1ER+L227K; E1ER+V228*; E1ER+V228R; E1ER+V228K; E1ER+P229*; E1ER+P229R; E1ER+P229K; E1ER+V230*; E1ER+V230K; E1ER+V230R; E1ER+T231R; E1ER+T231K; E1ER+R232RR; E1ER+N233R; E1ER+N233K; E1ER+D234*; E1ER+D234R; E1ER+D234K; E1ER+V236K; E1ER+V236R; E1ER+I238R; E1ER+I238K; E1ER+E239*; E1ER+E239R; E1ER+E239K; E1ER+A243R; E1ER+A243K; E1ER+T244R; E1ER+T244K; E1ER+G245R; E1ER+G245K; E1ER+N248R; E1ER+N248K; E1ER+Q249R; E1ER+Q249K; E1ER+N251R; E1ER+N251K; E1R+V2*; E1R+V2R; E1R+V2K; E1R+S3*; E1R+V3R; E1R+V3K; E1R+Q4R; E1R+Q4K; E1R+D5*; E1R+D5R; E1R+D5K; E1R+L6R; E1R+L6K; E1R+F7R; E1R+F7K; E1R+N8R; E1R+N8K; E1R+Q9R; E1R+Q9K; E1R+N11R; E1R+N11K; E1R+L12R; E1R+L12K; E1R+Q15R; E1R+Q15K; E1R+T37R; E1R+T37K; E1R+Q38R; E1R+Q38K; E1R+N39R; E1R+N39K; E1R+A40R; E1R+A40K; E1R+P42R; E1R+P42K; E1R+E43*; E1R+E43R; E1R+E43K; E1R+E45*; E1R+E45R; E1R+E45K; E1R+N73R; E1R+N73K; E1R+D167*; E1R+D167R; E1R+D167K; E1R+T192R; E1R+T192K; E1R+L193R; E1R+L193K; E1R+Y194R; E1R+Y194K; E1R+T199R; E1R+T199K; E1R+N200R; E1R+N200K; E1R+I202R; E1R+I202K; E1R+S217R; E1R+S217K; E1R+P218R; E1R+P218K; E1R+Y220R; E1R+Y220K; E1R+W221R; E1R+W221K; E1R+S224*; E1R+S224R; E1R+S224K; E1R+S225*; E1R+S225R; E1R+S225K; E1R+T226*; E1R+T226R; E1R+T226K; E1R+L227*; E1R+L227R; E1R+L227K; E1R+V228*; E1R+V228R; E1R+V228K; E1R+P229*; E1R+P229R; E1R+P229K; E1R+V230*; E1R+V230K; E1R+V230R; E1R+T231R; E1R+T231K; E1R+R232RR; E1R+N233R; E1R+N233K; E1R+D234*; E1R+D234R; E1R+D234K; E1R+V236K; E1R+V236R; E1R+I238R; E1R+I238K; E1R+E239*; E1R+E239R; E1R+E239K; E1R+A243R; E1R+A243K; E1R+T244R; E1R+T244K; E1R+G245R; E1R+G245K; E1R+N248R; E1R+N248K; E1R+Q249R; E1R+Q249K; E1R+N251R; E1R+N251K; E1L+V2*; E1L+V2R; E1L+V2K; E1L+S3*; E1L+V3R; E1L+V3K; E1L+Q4R; E1L+Q4K; E1L+D5*; E1L+D5R; E1L+D5K; E1L+L6R; E1L+L6K; E1L+F7R; E1L+F7K; E1L+N8R; E1L+N8K; E1L+Q9R; E1L+Q9K; E1L+N11R; E1L+N11K; E1L+L12R; E1L+L12K; E1L+Q15R; E1L+Q15K; E1L+T37R; E1L+T37K; E1L+Q38R; E1L+Q38K; E1L+N39R; E1L+N39K; E1L+A40R; E1L+A40K; E1L+P42R; E1L+P42K; E1L+E43*; E1L+E43R; E1L+E43K; E1L+E45*; E1L+E45R; E1L+E45K; E1L+N73R; E1L+N73K; E1L+D167*; E1L+D167R; E1L+D167K; E1L+T192R; E1L+T192K; E1L+L193R; E1L+L193K; E1L+Y194R; E1L+Y194K; E1L+T199R′; E1L+T199K; E1L+N200R; E1L+N200K; E1L+I202R; E1L+I202K; E1L+S217R; E1L+S217K; E1L+P218R; E1L+P218K; E1L+Y220R; E1L+Y220K; E1L+W221R; E1L+W221K; E1L+S224*; E1L+S224R; E1L+S224K; E1L+S225*; E1L+S225R; E1L+S225K; E1L+T226*; E1L+T226R; E1L+T226K; E1L+L227*; E1L+L227R; E1L+L227K; E1L+V228*; E1L+V228R; E1L+V228K; E1L+P229*; E1L+P229R; E1L+P229K; E1L+V230*; E1L+V230K; E1L+V230R; E1L+T231R; E1L+T231K; E1L+R232RR; E1L+N233R; E1L+N233K; E1L+D234*; E1L+D234R; E1L+D234K; E1L+V236K; E1L+V236R; E1L+I238R; E1L+I238K; E1L+E239*; E1L+E239R; E1L+E239K; E1L+A243R; E1L+A243K; E1L+T244R; E1L+T244K; E1L+G245R; E1L+G245K; E1L+N248R; E1L+N248K; E1L+Q249R; E1L+Q249K; E1L+N251R; E1L+N251K; V2*+S3*; V2*+V3R; V2*+V3K; V2*+Q4R; V2*+Q4K; V2*+D5*; V2*+D5R; V2*+D5K; V2*+L6R; V2*+L6K; V2*+F7R; V2*+F7K; V2*+N8R; V2*+N8K; V2*+Q9R; V2*+Q9K; V2*+N11R; V2*+N11K; V2*+L12R; V2*+L12K; V2*+Q15R; V2*+Q15K; V2*+T37R; V2*+T37K; V2*+Q38R; V2*+Q38K; V2*+N39R; V2*+N39K; V2*+A40R; V2*+A40K; V2*+P42R; V2*+P42K; V2*+E43*; V2*+E43R; V2*+E43K; V2*+E45*; V2*+E45R; V2*+E45K; V2*+N73R; V2*+N73K; V2*+D167*; V2*+D167R; V2*+D167K; V2*+T192R; V2*+T192K; V2*+L193R; V2*+L193K; V2*+Y194R; V2*+Y194K; V2*+T199R; V2*+T199K; V2*+N200R; V2*+N200K; V2*+I202R; V2*+I202K; V2*+S217R; V2*+S217K; V2*+P218R; V2*+P218K; V2*+Y220R; V2*+Y220K; V2*+W221R; V2*+W221K; V2*+S224*; V2*+S224R; V2*+S224K; V2*+S225*; V2*+S225R; V2*+S225K; V2*+T226*; V2*+T226R; V2*+T226K; V2*+L227*; V2*+L227R; V2*+L227K; V2*+V228*; V2*+V228R; V2*+V228K; V2*+P229*; V2*+P229R; V2*+P229K; V2*+V230*; V2*+V230K; V2*+V230R; V2*+T231R; V2*+T231K; V2*+R232RR; V2*+N233R; V2*+N233K; V2*+D234*; V2*+D234R; V2*+D234K; V2*+V236K; V2*+V236R; V2*+I238R; V2*+I238K; V2*+E239*; V2*+E239R; V2*+E239K; V2*+A243R; V2*+A243K; V2*+T244R; V2*+T244K; V2*+G245R; V2*+G245K; V2*+N248R; V2*+N248K; V2*+Q249R; V2*+Q249K; V2*+N251R; V2*+N251K; V2R+S3*; V2R+V3R; V2R+V3K; V2R+Q4R; V2R+Q4K; V2R+D5*; V2R+D5R; V2R+D5K; V2R+L6R; V2R+L6K; V2R+F7R; V2R+F7K; V2R+N8R; V2R+N8K; V2R+Q9R; V2R+Q9K; V2R+N11R; V2R+N11K; V2R+L12R; V2R+L12K; V2R+Q15R; V2R+Q15K; V2R+T37R; V2R+T37K; V2R+Q38R; V2R+Q38K; V2R+N39R; V2R+N39K; V2R+A40R; V2R+A40K; V2R+P42R; V2R+P42K; V2R+E43*; V2R+E43R; V2R+E43K; V2R+E45*; V2R+E45R; V2R+E45K; V2R+N73R; V2R+N73K; V2R+D167*; V2R+D167R; V2R+D167K; V2R+T192R; V2R+T192K; V2R+L193R; V2R+L193K; V2R+Y194R; V2R+Y194K; V2R+T199R; V2R+T199K; V2R+N200R; V2R+N200K; V2R+I202R; V2R+I202K; V2R+S217R; V2R+S217K; V2R+P218R; V2R+P218K; V2R+Y220R; V2R+Y220K; V2R+W221R; V2R+W221K; V2R+S224*; V2R+S224R; V2R+S224K; V2R+S225*; V2R+S225R; V2R+S225K; V2R+T226*; V2R+T226R; V2R+T226K; V2R+L227*; V2R+L227R; V2R+L227K; V2R+V228*; V2R+V228R; V2R+V228K; V2R+P229*; V2R+P229R; V2R+P229K; V2R+V230*; V2R+V230K; V2R+V230R; V2R+T231R; V2R+T231K; V2R+R232RR; V2R+N233R; V2R+N233K; V2R+D234*; V2R+D234R; V2R+D234K; V2R+V236K; V2R+V236R; V2R+I238R; V2R+I238K; V2R+E239*; V2R+E239R; V2R+E239K; V2R+A243R; V2R+A243K; V2R+T244R; V2R+T244K; V2R+G245R; V2R+G245K; V2R+N248R; V2R+N248K; V2R+Q249R; V2R+Q249K; V2R+N251R; V2R+N251K; V2K+S3*; V2K+V3R; V2K+V3K; V2K+Q4R; V2K+Q4K; V2K+D5*; V2K+D5R; V2K+D5K; V2K+L6R; V2K+L6K; V2K+F7R; V2K+F7K; V2K+N8R; V2K+N8K; V2K+Q9R; V2K+Q9K; V2K+N11R; V2K+N11K; V2K+L12R; V2K+L12K; V2K+Q15R; V2K+Q15K; V2K+T37R; V2K+T37K; V2K+Q38R; V2K+Q38K; V2K+N39R; V2K+N39K; V2K+A40R; V2K+A40K; V2K+P42R; V2K+P42K; V2K+E43*; V2K+E43R; V2K+E43K; V2K+E45*; V2K+E45R; V2K+E45K; V2K+N73R; V2K+N73K; V2K+D167*; V2K+D167R; V2K+D167K; V2K+T192R; V2K+T192K; V2K+L193R; V2K+L193K; V2K+Y194R; V2K+Y194K; V2K+T199R; V2K+T199K; V2K+N200R; V2K+N200K; V2K+I202R; V2K+I202K; V2K+S217R; V2K+S217K; V2K+P218R; V2K+P218K; V2K+Y220R; V2K+Y220K; V2K+W221R; V2K+W221K; V2K+S224*; V2K+S224R; V2K+S224K; V2K+S225*; V2K+S225R; V2K+S225K; V2K+T226*; V2K+T226R; V2K+T226K; V2K+L227*; V2K+L227R; V2K+L227K; V2K+V228*; V2K+V228R; V2K+V228K; V2K+P229*; V2K+P229R; V2K+P229K; V2K+V230*; V2K+V230K; V2K+V230R; V2K+T231R; V2K+T231K; V2K+R232RR; V2K+N233R; V2K+N233K; V2K+D234*; V2K+D234R; V2K+D234K; V2K+V236K; V2K+V236R; V2K+I238R; V2K+I238K; V2K+E239*; V2K+E239R; V2K+E239K; V2K+A243R; V2K+A243K; V2K+T244R; V2K+T244K; V2K+G245R; V2K+G245K; V2K+N248R; V2K+N248K; V2K+Q249R; V2K+Q249K; V2K+N251R; V2K+N251K; S3*+Q4R; S3*+Q4K; S3*+D5*; S3*+D5R; S3*+D5K; S3*+L6R; S3*+L6K; S3*+F7R; S3*+F7K; S3*+N8R; S3*+N8K; S3*+Q9R; S3*+Q9K; S3*+N11R; S3*+N11K; S3*+L12R; S3*+L12K; S3*+Q15R; S3*+Q15K; S3*+T37R; S3*+T37K; S3*+Q38R; S3*+Q38K; S3*+N39R; S3*+N39K; S3*+A40R; S3*+A40K; S3*+P42R; S3*+P42K; S3*+E43*; S3*+E43R; S3*+E43K; S3*+E45*; S3*+E45R; S3*+E45K; S3*+N73R; S3*+N73K; S3*+D167*; S3*+D167R; S3*+D167K; S3*+T192R; S3*+T192K; S3*+L193R; S3*+L193K; S3*+Y194R; S3*+Y194K; S3*+T199R; S3*+T199K; S3*+N200R; S3*+N200K; S3*+I202R; S3*+I202K; S3*+S217R; S3*+S217K; S3*+P218R; S3*+P218K; S3*+Y220R; S3*+Y220K; S3*+W221R; S3*+W221K; S3*+S224*; S3*+S224R; S3*+S224K; S3*+S225*; S3*+S225R; S3*+S225K; S3*+T226*; S3*+T226R; S3*+T226K; S3*+L227*; S3*+L227R; S3*+L227K; S3*+V228*; S3*+V228R; S3*+V228K; S3*+P229*; S3*+P229R; S3*+P229K; S3*+V230*; S3*+V230K; S3*+V230R; S3*+T231R; S3*+T231K; S3*+R232RR; S3*+N233R; S3*+N233K; S3*+D234*; S3*+D234R; S3*+D234K; S3*+V236K; S3*+V236R; S3*+I238R; S3*+I238K; S3*+E239*; S3*+E239R; S3*+E239K; S3*+A243R; S3*+A243K; S3*+T244R; S3*+T244K; S3*+G245R; S3*+G245K; S3*+N248R; S3*+N248K; S3*+Q249R; S3*+Q249K; S3*+N251R; S3*+N251K; V3R+Q4R; V3R+Q4K; V3R+D5*; V3R+D5R; V3R+D5K; V3R+L6R; V3R+L6K; V3R+F7R; V3R+F7K; V3R+N8R; V3R+N8K; V3R+Q9R; V3R+Q9K; V3R+N11R; V3R+N11K; V3R+L12R; V3R+L12K; V3R+Q15R; V3R+Q15K; V3R+T37R; V3R+T37K; V3R+Q38R; V3R+Q38K; V3R+N39R; V3R+N39K; V3R+A40R; V3R+A40K; V3R+P42R; V3R+P42K; V3R+E43*; V3R+E43R; V3R+E43K; V3R+E45*; V3R+E45R; V3R+E45K; V3R+N73R; V3R+N73K; V3R+D167*; V3R+D167R; V3R+D167K; V3R+T192R; V3R+T192K; V3R+L193R; V3R+L193K; V3R+Y194R; V3R+Y194K; V3R+T199R; V3R+T199K; V3R+N200R; V3R+N200K; V3R+I202R; V3R+I202K; V3R+S217R; V3R+S217K; V3R+P218R; V3R+P218K; V3R+Y220R; V3R+Y220K; V3R+W221R; V3R+W221K; V3R+S224*; V3R+S224R; V3R+S224K; V3R+S225*; V3R+S225R; V3R+S225K; V3R+T226*; V3R+T226R; V3R+T226K; V3R+L227*; V3R+L227R; V3R+L227K; V3R+V228*; V3R+V228R; V3R+V228K; V3R+P229*; V3R+P229R; V3R+P229K; V3R+V230*; V3R+V230K; V3R+V230R; V3R+T231R; V3R+T231K; V3R+R232RR; V3R+N233R; V3R+N233K; V3R+D234*; V3R+D234R; V3R+D234K; V3R+V236K; V3R+V236R; V3R+I238R; V3R+I238K; V3R+E239*; V3R+E239R; V3R+E239K; V3R+A243R; V3R+A243K; V3R+T244R; V3R+T244K; V3R+G245R; V3R+G245K; V3R+N248R; V3R+N248K; V3R+Q249R; V3R+Q249K; V3R+N251R; V3R+N251K; V3K+Q4R; V3K+Q4K; V3K+D5*; V3K+D5R; V3K+D5K; V3K+L6R; V3K+L6K; V3K+F7R; V3K+F7K; V3K+N8R; V3K+N8K; V3K+Q9R; V3K+Q9K; V3K+N11R; V3K+N11K; V3K+L12R; V3K+L12K; V3K+Q15R; V3K+Q15K; V3K+T37R; V3K+T37K; V3K+Q38R; V3K+Q38K; V3K+N39R; V3K+N39K; V3K+A40R; V3K+A40K; V3K+P42R; V3K+P42K; V3K+E43*; V3K+E43R; V3K+E43K; V3K+E45*; V3K+E45R; V3K+E45K; V3K+N73R; V3K+N73K; V3K+D167*; V3K+D167R; V3K+D167K; V3K+T192R; V3K+T192K; V3K+L193R; V3K+L193K; V3K+Y194R; V3K+Y194K; V3K+T199R; V3K+T199K; V3K+N200R; V3K+N200K; V3K+I202R; V3K+I202K; V3K+S217R; V3K+S217K; V3K+P218R; V3K+P218K; V3K+Y220R; V3K+Y220K; V3K+W221R; V3K+W221K; V3K+S224*; V3K+S224R; V3K+S224K; V3K+S225*; V3K+S225R; V3K+S225K; V3K+T226*; V3K+T226R; V3K+T226K; V3K+L227*; V3K+L227R; V3K+L227K; V3K+V228*; V3K+V228R; V3K+V228K; V3K+P229*; V3K+P229R; V3K+P229K; V3K+V230*; V3K+V230K; V3K+V230R; V3K+T231R; V3K+T231K; V3K+R232RR; V3K+N233R; V3K+N233K; V3K+D234*; V3K+D234R; V3K+D234K; V3K+V236K; V3K+V236R; V3K+I238R; V3K+I238K; V3K+E239*; V3K+E239R; V3K+E239K; V3K+A243R; V3K+A243K; V3K+T244R; V3K+T244K; V3K+G245R; V3K+G245K; V3K+N248R; V3K+N248K; V3K+Q249R; V3K+Q249K; V3K+N251R; V3K+N251K; Q4R+D5*; Q4R+D5R; Q4R+D5K; Q4R+L6R; Q4R+L6K; Q4R+F7R; Q4R+F7K; Q4R+N8R; Q4R+N8K; Q4R+Q9R; Q4R+Q9K; Q4R+N11R; Q4R+N11K; Q4R+L12R; Q4R+L12K; Q4R+Q15R; Q4R+Q15K; Q4R+T37R; Q4R+T37K; Q4R+Q38R; Q4R+Q38K; Q4R+N39R; Q4R+N39K; Q4R+A40R; Q4R+A40K; Q4R+P42R; Q4R+P42K; Q4R+E43*; Q4R+E43R; Q4R+E43K; Q4R+E45*; Q4R+E45R; Q4R+E45K; Q4R+N73R; Q4R+N73K; Q4R+D167*; Q4R+D167R; Q4R+D167K; Q4R+T192R; Q4R+T192K; Q4R+L193R; Q4R+L193K; Q4R+Y194R; Q4R+Y194K; Q4R+T199R; Q4R+T199K; Q4R+N200R; Q4R+N200K; Q4R+I202R; Q4R+I202K; Q4R+S217R; Q4R+S217K; Q4R+P218R; Q4R+P218K; Q4R+Y220R; Q4R+Y220K; Q4R+W221R; Q4R+W221K; Q4R+S224*; Q4R+S224R; Q4R+S224K; Q4R+S225*; Q4R+S225R; Q4R+S225K; Q4R+T226*; Q4R+T226R; Q4R+T226K; Q4R+L227*; Q4R+L227R; Q4R+L227K; Q4R+V228*; Q4R+V228R; Q4R+V228K; Q4R+P229*; Q4R+P229R; Q4R+P229K; Q4R+V230*; Q4R+V230K; Q4R+V230R; Q4R+T231R; Q4R+T231K; Q4R+R232RR; Q4R+N233R; Q4R+N233K; Q4R+D234*; Q4R+D234R; Q4R+D234K; Q4R+V236K; Q4R+V236R; Q4R+I238R; Q4R+I238K; Q4R+E239*; Q4R+E239R; Q4R+E239K; Q4R+A243R; Q4R+A243K; Q4R+T244R; Q4R+T244K; Q4R+G245R; Q4R+G245K; Q4R+N248R; Q4R+N248K; Q4R+Q249R; Q4R+Q249K; Q4R+N251R; Q4R+N251K; Q4K+D5*; Q4K+D5R; Q4K+D5K; Q4K+L6R; Q4K+L6K; Q4K+F7R; Q4K+F7K; Q4K+N8R; Q4K+N8K; Q4K+Q9R; Q4K+Q9K; Q4K+N11R; Q4K+N11K; Q4K+L12R; Q4K+L12K; Q4K+Q15R; Q4K+Q15K; Q4K+T37R; Q4K+T37K; Q4K+Q38R; Q4K+Q38K; Q4K+N39R; Q4K+N39K; Q4K+A40R; Q4K+A40K; Q4K+P42R; Q4K+P42K; Q4K+E43*; Q4K+E43R; Q4K+E43K; Q4K+E45*; Q4K+E45R; Q4K+E45K; Q4K+N73R; Q4K+N73K; Q4K+D167*; Q4K+D167R; Q4K+D167K; Q4K+T192R; Q4K+T192K; Q4K+L193R; Q4K+L193K; Q4K+Y194R; Q4K+Y194K; Q4K+T199R; Q4K+T199K; Q4K+N200R; Q4K+N200K; Q4K+I202R; Q4K+I202K; Q4K+S217R; Q4K+S217K; Q4K+P218R; Q4K+P218K; Q4K+Y220R; Q4K+Y220K; Q4K+W221R; Q4K+W221K; Q4K+S224*; Q4K+S224R; Q4K+S224K; Q4K+S225*; Q4K+S225R; Q4K+S225K; Q4K+T226*; Q4K+T226R; Q4K+T226K; Q4K+L227*; Q4K+L227R; Q4K+L227K; Q4K+V228*; Q4K+V228R; Q4K+V228K; Q4K+P229*; Q4K+P229R; Q4K+P229K; Q4K+V230*; Q4K+V230K; Q4K+V230R; Q4K+T231R; Q4K+T231K; Q4K+R232RR; Q4K+N233R; Q4K+N233K; Q4K+D234*; Q4K+D234R; Q4K+D234K; Q4K+V236K; Q4K+V236R; Q4K+I238R; Q4K+I238K; Q4K+E239*; Q4K+E239R; Q4K+E239K; Q4K+A243R; Q4K+A243K; Q4K+T244R; Q4K+T244K; Q4K+G245R; Q4K+G245K; Q4K+N248R; Q4K+N248K; Q4K+Q249R; Q4K+Q249K; Q4K+N251R; Q4K+N251K; D5*+L6R; D5*+L6K; D5*+F7R; D5*+F7K; D5*+N8R; D5*+N8K; D5*+Q9R; D5*+Q9K; D5*+N11R; D5*+N11K; D5*+L12R; D5*+L12K; D5*+Q15R; D5*+Q15K; D5*+T37R; D5*+T37K; D5*+Q38R; D5*+Q38K; D5*+N39R; D5*+N39K; D5*+A40R; D5*+A40K; D5*+P42R; D5*+P42K; D5*+E43*; D5*+E43R; D5*+E43K; D5*+E45*; D5*+E45R; D5*+E45K; D5*+N73R; D5*+N73K; D5*+D167*; D5*+D167R; D5*+D167K; D5*+T192R; D5*+T192K; D5*+L193R; D5*+L193K; D5*+Y194R; D5*+Y194K; D5*+T199R; D5*+T199K; D5*+N200R; D5*+N200K; D5*+I202R; D5*+I202K; D5*+S217R; D5*+S217K; D5*+P218R; D5*+P218K; D5*+Y220R; D5*+Y220K; D5*+W221R; D5*+W221K; D5*+S224*; D5*+S224R; D5*+S224K; D5*+S225*; D5*+S225R; D5*+S225K; D5*+T226*; D5*+T226R; D5*+T226K; D5*+L227*; D5*+L227R; D5*+L227K; D5*+V228*; D5*+V228R; D5*+V228K; D5*+P229*; D5*+P229R; D5*+P229K; D5*+V230*; D5*+V230K; D5*+V230R; D5*+T231R; D5*+T231K; D5*+R232RR; D5*+N233R; D5*+N233K; D5*+D234*; D5*+D234R; D5*+D234K; D5*+V236K; D5*+V236R; D5*+I238R; D5*+I238K; D5*+E239*; D5*+E239R; D5*+E239K; D5*+A243R; D5*+A243K′; D5*+T244R; D5*+T244K; D5*+G245R; D5*+G245K; D5*+N248R; D5*+N248K; D5*+Q249R; D5*+Q249K; D5*+N251R; D5*+N251K; D5R+L6R; D5R+L6K; D5R+F7R; D5R+F7K; D5R+N8R; D5R+N8K; D5R+Q9R; D5R+Q9K; D5R+N11R; D5R+N11K; D5R+L12R; D5R+L12K; D5R+Q15R; D5R+Q15K; D5R+T37R; D5R+T37K; D5R+Q38R; D5R+Q38K; D5R+N39R; D5R+N39K; D5R+A40R; D5R+A40K; D5R+P42R; D5R+P42K; D5R+E43*; D5R+E43R; D5R+E43K; D5R+E45*; D5R+E45R; D5R+E45K; D5R+N73R; D5R+N73K; D5R+D167*; D5R+D167R; D5R+D167K; D5R+T192R; D5R+T192K; D5R+L193R; D5R+L193K; D5R+Y194R; D5R+Y194K; D5R+T199R; D5R+T199K; D5R+N200R; D5R+N200K; D5R+I202R; D5R+I202K; D5R+S217R; D5R+S217K; D5R+P218R; D5R+P218K; D5R+Y220R; D5R+Y220K; D5R+W221R; D5R+W221K; D5R+S224*; D5R+S224R; D5R+S224K; D5R+S225*; D5R+S225R; D5R+S225K; D5R+T226*; D5R+T226R; D5R+T226K; D5R+L227*; D5R+L227R; D5R+L227K; D5R+V228*; D5R+V228R; D5R+V228K; D5R+P229*; D5R+P229R; D5R+P229K; D5R+V230*; D5R+V230K; D5R+V230R; D5R+T231R; D5R+T231K; D5R+R232RR; D5R+N233R; D5R+N233K; D5R+D234*; D5R+D234R; D5R+D234K; D5R+V236K; D5R+V236R; D5R+I238R; D5R+I238K; D5R+E239*; D5R+E239R; D5R+E239K; D5R+A243R; D5R+A243K; D5R+T244R; D5R+T244K; D5R+G245R; D5R+G245K; D5R+N248R; D5R+N248K; D5R+Q249R; D5R+Q249K; D5R+N251R; D5R+N251K; D5K+L6R; D5K+L6K; D5K+F7R; D5K+F7K; D5K+N8R; D5K+N8K; D5K+Q9R; D5K+Q9K; D5K+N11R; D5K+N11K; D5K+L12R; D5K+L12K; D5K+Q15R; D5K+Q15K; D5K+T37R; D5K+T37K; D5K+Q38R; D5K+Q38K; D5K+N39R; D5K+N39K; D5K+A40R; D5K+A40K; D5K+P42R; D5K+P42K; D5K+E43*; D5K+E43R; D5K+E43K; D5K+E45*; D5K+E45R; D5K+E45K; D5K+N73R; D5K+N73K; D5K+D167*; D5K+D167R; D5K+D167K; D5K+T192R; D5K+T192K; D5K+L193R; D5K+L193K; D5K+Y194R; D5K+Y194K; D5K+T199R; D5K+T199K; D5K+N200R; D5K+N200K; D5K+I202R; D5K+I202K; D5K+S217R; D5K+S217K; D5K+P218R; D5K+P218K; D5K+Y220R; D5K+Y220K; D5K+W221R; D5K+W221K; D5K+S224*; D5K+S224R; D5K+S224K; D5K+S225*; D5K+S225R; D5K+S225K; D5K+T226*; D5K+T226R; D5K+T226K; D5K+L227*; D5K+L227R; D5K+L227K; D5K+V228*; D5K+V228R; D5K+V228K; D5K+P229*; D5K+P229R; D5K+P229K; D5K+V230*; D5K+V230K; D5K+V230R; D5K+T231R; D5K+T231K; D5K+R232RR; D5K+N233R; D5K+N233K; D5K+D234*; D5K+D234R; D5K+D234K; D5K+V236K; D5K+V236R; D5K+I238R; D5K+I238K; D5K+E239*; D5K+E239R; D5K+E239K; D5K+A243R; D5K+A243K; D5K+T244R; D5K+T244K; D5K+G245R; D5K+G245K; D5K+N248R; D5K+N248K; D5K+Q249R; D5K+Q249K; D5K+N251R; D5K+N251K; L6R+F7R; L6R+F7K; L6R+N8R; L6R+N8K; L6R+Q9R; L6R+Q9K; L6R+N11R; L6R+N11K; L6R+L12R; L6R+L12K; L6R+Q15R; L6R+Q15K; L6R+T37R; L6R+T37K; L6R+Q38R; L6R+Q38K; L6R+N39R; L6R+N39K; L6R+A40R; L6R+A40K; L6R+P42R; L6R+P42K; L6R+E43*; L6R+E43R; L6R+E43K; L6R+E45*; L6R+E45R; L6R+E45K; L6R+N73R; L6R+N73K; L6R+D167*; L6R+D167R; L6R+D167K; L6R+T192R; L6R+T192K; L6R+L193R; L6R+L193K; L6R+Y194R; L6R+Y194K; L6R+T199R; L6R+T199K; L6R+N200R; L6R+N200K; L6R+I202R; L6R+I202K; L6R+S217R; L6R+S217K; L6R+P218R; L6R+P218K; L6R+Y220R; L6R+Y220K; L6R+W221R; L6R+W221K; L6R+S224*; L6R+S224R; L6R+S224K; L6R+S225*; L6R+S225R; L6R+S225K; L6R+T226*; L6R+T226R; L6R+T226K; L6R+L227*; L6R+L227R; L6R+L227K; L6R+V228*; L6R+V228R; L6R+V228K; L6R+P229*; L6R+P229R; L6R+P229K; L6R+V230*; L6R+V230K; L6R+V230R; L6R+T231R; L6R+T231K; L6R+R232RR; L6R+N233R; L6R+N233K; L6R+D234*; L6R+D234R; L6R+D234K; L6R+V236K; L6R+V236R; L6R+I238R; L6R+I238K; L6R+E239*; L6R+E239R; L6R+E239K; L6R+A243R; L6R+A243K; L6R+T244R; L6R+T244K; L6R+G245R; L6R+G245K; L6R+N248R; L6R+N248K; L6R+Q249R; L6R+Q249K′; L6R+N251R; L6R+N251K; L6K+F7R; L6K+F7K; L6K+N8R; L6K+N8K; L6K+Q9R; L6K+Q9K; L6K+N11R; L6K+N11K; L6K+L12R; L6K+L12K; L6K+Q15R; L6K+Q15K; L6K+T37R; L6K+T37K; L6K+Q38R; L6K+Q38K; L6K+N39R; L6K+N39K; L6K+A40R; L6K+A40K; L6K+P42R; L6K+P42K; L6K+E43*; L6K+E43R; L6K+E43K; L6K+E45*; L6K+E45R; L6K+E45K; L6K+N73R; L6K+N73K; L6K+D167*; L6K+D167R; L6K+D167K; L6K+T192R; L6K+T192K; L6K+L193R; L6K+L193K; L6K+Y194R; L6K+Y194K; L6K+T199R; L6K+T199K; L6K+N200R; L6K+N200K; L6K+I202R; L6K+I202K; L6K+S217R; L6K+S217K; L6K+P218R; L6K+P218K; L6K+Y220R; L6K+Y220K; L6K+W221R; L6K+W221K; L6K+S224*; L6K+S224R; L6K+S224K; L6K+S225*; L6K+S225R; L6K+S225K; L6K+T226*; L6K+T226R; L6K+T226K; L6K+L227*; L6K+L227R; L6K+L227K; L6K+V228*; L6K+V228R; L6K+V228K; L6K+P229*; L6K+P229R; L6K+P229K; L6K+V230*; L6K+V230K; L6K+V230R; L6K+T231R; L6K+T231K; L6K+R232RR; L6K+N233R; L6K+N233K; L6K+D234*; L6K+D234R; L6K+D234K; L6K+V236K; L6K+V236R; L6K+I238R; L6K+I238K; L6K+E239*; L6K+E239R; L6K+E239K; L6K+A243R; L6K+A243K; L6K+T244R; L6K+T244K; L6K+G245R; L6K+G245K; L6K+N248R; 6K+N248K; L6K+Q249R; L6K+Q249K; L6K+N251R; L6K+N251K; F7R+N8R; F7R+N8K; F7R+Q9R; F7R+Q9K; F7R+N11R; F7R+N11K; F7R+L12R; F7R+L12K; F7R+Q15R; F7R+Q15K; F7R+T37R; F7R+T37K; F7R+Q38R; F7R+Q38K; F7R+N39R; F7R+N39K; F7R+A40R; F7R+A40K; F7R+P42R; F7R+P42K; F7R+E43*; F7R+E43R; F7R+E43K; F7R+E45*; F7R+E45R; F7R+E45K; F7R+N73R; F7R+N73K; F7R+D167*; F7R+D167R; F7R+D167K; F7R+T192R; F7R+T192K; F7R+L193R; F7R+L193K; F7R+Y194R; F7R+Y194K; F7R+T199R; F7R+T199K; F7R+N200R; F7R+N200K; F7R+I202R; F7R+I202K; F7R+S217R; F7R+S217K; F7R+P218R; F7R+P218K; F7R+Y220R; F7R+Y220K; F7R+W221R; F7R+W221K; F7R+S224*; F7R+S224R; F7R+S224K; F7R+S225*; F7R+S225R; F7R+S225K; F7R+T226*; F7R+T226R; F7R+T226K; F7R+L227*; F7R+L227R; F7R+L227K; F7R+V228*; F7R+V228R; F7R+V228K; F7R+P229*; F7R+P229R; F7R+P229K; F7R+V230*; F7R+V230K; F7R+V230R; F7R+T231R; F7R+T231K; F7R+R232RR; F7R+N233R; F7R+N233K; F7R+D234*; F7R+D234R; F7R+D234K; F7R+V236K; F7R+V236R; F7R+I238R; F7R+I238K; F7R+E239*; F7R+E239R; F7R+E239K; F7R+A243R; F7R+A243K; F7R+T244R; F7R+T244K; F7R+G245R; F7R+G245K; F7R+N248R; F7R+N248K; F7R+Q249R; F7R+Q249K; F7R+N251R; F7R+N251K; F7K+N8R; F7K+N8K; F7K+Q9R; F7K+Q9K; F7K+N11R; F7K+N11K; F7K+L12R; F7K+L12K; F7K+Q15R; F7K+Q15K; F7K+T37R; F7K+T37K; F7K+Q38R; F7K+Q38K; F7K+N39R; F7K+N39K; F7K+A40R; F7K+A40K; F7K+P42R; F7K+P42K; F7K+E43*; F7K+E43R; F7K+E43K; F7K+E45*; F7K+E45R; F7K+E45K; F7K+N73R; F7K+N73K; F7K+D167*; F7K+D167R; F7K+D167K; F7K+T192R; F7K+T192K; F7K+L193R; F7K+L193K; F7K+Y194R; F7K+Y194K; F7K+T199R; F7K+T199K; F7K+N200R; F7K+N200K; F7K+I202R; F7K+I202K; F7K+S217R; F7K+S217K; F7K+P218R; F7K+P218K; F7K+Y220R; F7K+Y220K; F7K+W221R; F7K+W221K; F7K+S224*; F7K+S224R; F7K+S224K; F7K+S225*; F7K+S225R; F7K+S225K; F7K+T226*; F7K+T226R; F7K+T226K; F7K+L227*; F7K+L227R; F7K+L227K; F7K+V228*; F7K+V228R; F7K+V228K; F7K+P229*; F7K+P229R; F7K+P229K; F7K+V230*; F7K+V230K; F7K+V230R; F7K+T231R; F7K+T231K; F7K+R232RR; F7K+N233R; F7K+N233K; F7K+D234*; F7K+D234R; F7K+D234K; F7K+V236K; F7K+V236R; F7K+I238R; F7K+I238K; F7K+E239*; F7K+E239R; F7K+E239K; F7K+A243R; F7K+A243K; F7K+T244R; F7K+T244K; F7K+G245R; F7K+G245K; F7K+N248R; F7K+N248K; F7K+Q249R; F7K+Q249K; F7K+N251R; F7K+N251K; N8R+Q9R; N8R+Q9K; N8R+N11R; N8R+N11K; N8R+L12R; N8R+L12K; N8R+Q15R; N8R+Q15K; N8R+T37R; N8R+T37K; N8R+Q38R; N8R+Q38K; N8R+N39R; N8R+N39K; N8R+A40R; N8R+A40K; N8R+P42R; N8R+P42K; N8R+E43*; N8R+E43R; N8R+E43K; N8R+E45*; N8R+E45R; N8R+E45K; N8R+N73R; N8R+N73K; N8R+D167*; N8R+D167R; N8R+D167K; N8R+T192R; N8R+T192K; N8R+L193R; N8R+L193K; N8R+Y194R; N8R+Y194K; N8R+T199R; N8R+T199K; N8R+N200R; N8R+N200K; N8R+I202R; N8R+I202K; N8R+S217R; N8R+S217K; N8R+P218R; N8R+P218K; N8R+Y220R; N8R+Y220K; N8R+W221R; N8R+W221K; N8R+S224*; N8R+S224R; N8R+S224K; N8R+S225*; N8R+S225R; N8R+S225K; N8R+T226*; N8R+T226R; N8R+T226K; N8R+L227*; N8R+L227R; N8R+L227K; N8R+V228*; N8R+V228R; N8R+V228K; N8R+P229*; N8R+P229R; N8R+P229K; N8R+V230*; N8R+V230K; N8R+V230R; N8R+T231R; N8R+T231K; N8R+R232RR; N8R+N233R; N8R+N233K; N8R+D234*; N8R+D234R; N8R+D234K; N8R+V236K; N8R+V236R; N8R+I238R; N8R+I238K; N8R+E239*; N8R+E239R; N8R+E239K; N8R+A243R; N8R+A243K; N8R+T244R; N8R+T244K; N8R+G245R; N8R+G245K; N8R+N248R; N8R+N248K; N8R+Q249R; N8R+Q249K; N8R+N251R; N8R+N251K; N8K+Q9R; N8K+Q9K; N8K+N11R; N8K+N11K; N8K+L12R; N8K+L12K; N8K+Q15R; N8K+Q15K; N8K+T37R; N8K+T37K; N8K+Q38R; N8K+Q38K; N8K+N39R; N8K+N39K; N8K+A40R; N8K+A40K; N8K+P42R; N8K+P42K; N8K+E43*; N8K+E43R; N8K+E43K; N8K+E45*; N8K+E45R; N8K+E45K; N8K+N73R; N8K+N73K; N8K+D167*; N8K+D167R; N8K+D167K; N8K+T192R; N8K+T192K; N8K+L193R; N8K+L193K; N8K+Y194R; N8K+Y194K; N8K+T199R; N8K+T199K; N8K+N200R; N8K+N200K; N8K+I202R; N8K+I202K; N8K+S217R; N8K+S217K; N8K+P218R; N8K+P218K; N8K+Y220R; N8K+Y220K; N8K+W221R; N8K+W221K; N8K+S224*; N8K+S224R; N8K+S224K; N8K+S225*; N8K+S225R; N8K+S225K; N8K+T226*; N8K+T226R; N8K+T226K; N8K+L227*; N8K+L227R; N8K+L227K; N8K+V228*; N8K+V228R; N8K+V228K; N8K+P229*; N8K+P229R; N8K+P229K; N8K+V230*; N8K+V230K; N8K+V230R; N8K+T231R; N8K+T231K; N8K+R232RR; N8K+N233R; N8K+N233K; N8K+D234*; N8K+D234R; N8K+D234K; N8K+V236K; N8K+V236R; N8K+I238R; N8K+I238K; N8K+E239*; N8K+E239R; N8K+E239K; N8K+A243R; N8K+A243K; N8K+T244R; N8K+T244K; N8K+G245R; N8K+G245K; N8K+N248R; N8K+N248K; N8K+Q249R; N8K+Q249K; N8K+N251R; N8K+N251K; Q9R+N11R; Q9R+N11K; Q9R+L12R Q9R+L12K; Q9R+Q15R; Q9R+Q15K; Q9R+T37R; Q9R+T37K; Q9R+Q38R; Q9R+Q38K; Q9R+N39R; Q9R+N39K; Q9R+A40R; Q9R+A40K; Q9R+P42R; Q9R+P42K; Q9R+E43*; Q9R+E43R; Q9R+E43K; Q9R+E45*; Q9R+E45R; Q9R+E45K; Q9R+N73R; Q9R+N73K; Q9R+D167*; Q9R+D167R; Q9R+D167K; Q9R+T192R; Q9R+T192K; Q9R+L193R; Q9R+L193K; Q9R+Y194R; Q9R+Y194K; Q9R+T199R; Q9R+T199K; Q9R+N200R; Q9R+N200K; Q9R+I202R; Q9R+I202K; Q9R+S217R; Q9R+S217K; Q9R+P218R; Q9R+P218K; Q9R+Y220R; Q9R+Y220K; Q9R+W221R; Q9R+W221K; Q9R+S224*; Q9R+S224R; Q9R+S224K; Q9R+S225*; Q9R+S225R; Q9R+S225K; Q9R+T226*; Q9R+T226R; Q9R+T226K; Q9R+L227*; Q9R+L227R; Q9R+L227K; Q9R+V228*; Q9R+V228R; Q9R+V228K; Q9R+P229*; Q9R+P229R; Q9R+P229K; Q9R+V230*; Q9R+V230K; Q9R+V230R; Q9R+T231R; Q9R+T231K; Q9R+R232RR; Q9R+N233R; Q9R+N233K; Q9R+D234*; Q9R+D234R; Q9R+D234K; Q9R+V236K; Q9R+V236R; Q9R+I238R; Q9R+I238K; Q9R+E239*; Q9R+E239R; Q9R+E239K; Q9R+A243R; Q9R+A243K; Q9R+T244R; Q9R+T244K; Q9R+G245R; Q9R+G245K; Q9R+N248R; Q9R+N248K; Q9R+Q249R; Q9R+Q249K; Q9R+N251R; Q9R+N251K; Q9K+N11R; Q9K+N11K; Q9K+L12R; Q9K+L12K; Q9K+Q15R; Q9K+Q15K; Q9K+T37R; Q9K+T37K; Q9K+Q38R; Q9K+Q38K; Q9K+N39R; Q9K+N39K; Q9K+A40R; Q9K+A40K; Q9K+P42R; Q9K+P42K; Q9K+E43*; Q9K+E43R; Q9K+E43K; Q9K+E45*; Q9K+E45R; Q9K+E45K; Q9K+N73R; Q9K+N73K; Q9K+D167*; Q9K+D167R; Q9K+D167K; Q9K+T192R; Q9K+T192K; Q9K+L193R; Q9K+L193K; Q9K+Y194R; Q9K+Y194K; Q9K+T199R; Q9K+T199K; Q9K+N200R; Q9K+N200K; Q9K+I202R; Q9K+I202K; Q9K+S217R; Q9K+S217K; Q9K+P218R; Q9K+P218K; Q9K+Y220R; Q9K+Y220K; Q9K+W221R; Q9K+W221K; Q9K+S224*; Q9K+S224R; Q9K+S224K; Q9K+S225*; Q9K+S225R; Q9K+S225K; Q9K+T226*; Q9K+T226R; Q9K+T226K; Q9K+L227*; Q9K+L227R; Q9K+L227K; Q9K+V228*; Q9K+V228R; Q9K+V228K; Q9K+P229*; Q9K+P229R; Q9K+P229K; Q9K+V230*; Q9K+V230K; Q9K+V230R; Q9K+T231R; Q9K+T231K; Q9K+R232RR; Q9K+N233R; Q9K+N233K; Q9K+D234*; Q9K+D234R; Q9K+D234K; Q9K+V236K; Q9K+V236R; Q9K+I238R; Q9K+I238K; Q9K+E239*; Q9K+E239R; Q9K+E239K; Q9K+A243R; Q9K+A243K; Q9K+T244R; Q9K+T244K; Q9K+G245R; Q9K+G245K; Q9K+N248R; Q9K+N248K; Q9K+Q249R; Q9K+Q249K; Q9K+N251R; Q9K+N251K; N11R+L12R; N11R+L12K; N11R+Q15R; N11R+Q15K; N11R+T37R; N11R+T37K; N11R+Q38R; N11R+Q38K; N11R+N39R; N11R+N39K; N11R+A40R; N11R+A40K; N11R+P42R; N11R+P42K; N11R+E43*; N11R+E43R; N11R+E43K; N11R+E45*; N11R+E45R; N11R+E45K; N11R+N73R; N11R+N73K; N11R+D167*; N11R+D167R; N11R+D167K; N11R+T192R; N11R+T192K; N11R+L193R; N11R+L193K; N11R+Y194R; N11R+Y194K; N11R+T199R; N11R+T199K; N11R+N200R; N11R+N200K; N11R+I202R; N11R+I202K; N11R+S217R; N11R+S217K; N11R+P218R; N11R+P218K; N11R+Y220R; N11R+Y220K; N11R+W221R; N11R+W221K; N11R+S224*; N11R+S224R; N11R+S224K; N11R+S225*; N11R+S225R; N11R+S225K; N11R+T226*; N11R+T226R; N11R+T226K; N11R+L227*; N11R+L227R; N11R+L227K; N11R+V228*; N11R+V228R; N11R+V228K; N11R+P229*; N11R+P229R; N11R+P229K; N11R+V230*; N11R+V230K; N11R+V230R; N11R+T231R; N11R+T231K; N11R+R232RR; N11R+N233R; N11R+N233K; N11R+D234*; N11R+D234R; N11R+D234K; N11R+V236K; N11R+V236R; N11R+I238R; N11R+I238K; N11R+E239*; N11R+E239R; N11R+E239K; N11R+A243R; N11R+A243K; N11R+T244R; N11R+T244K; N11R+G245R; N11R+G245K; N11R+N248R; N11R+N248K; N11R+Q249R; N11R+Q249K; N11R+N251R; N11R+N251K; N11K+L12R; N11K+L12K; N11K+Q15R; N11K+Q15K; N11K+T37R; N11K+T37K; N11K+Q38R; N11K+Q38K; N11K+N39R; N11K+N39K; N11K+A40R; N11K+A40K; N11K+P42R; N11K+P42K; N11K+E43*; N11K+E43R; N11K+E43K; N11K+E45*; N11K+E45R; N11K+E45K; N11K+N73R; N11K+N73K; N11K+D167*; N11K+D167R; N11K+D167K; N11K+T192R; N11K+T192K; N11K+L193R; N11K+L193K; N11K+Y194R; N11K+Y194K; N11K+T199R; N11K+T199K; N11K+N200R; N11K+N200K; N11K+I202R; N11K+I202K; N11K+S217R; N11K+S217K; N11K+P218R; N11K+P218K; N11K+Y220R; N11K+Y220K; N11K+W221R; N11K+W221K; N11K+S224*; N11K+S224R; N11K+S224K; N11K+S225*; N11K+S225R; N11K+S225K; N11K+T226*; N11K+T226R; 11K+T226K; N11K+L227*; N11K+L227R; N11K+L227K; N11K+V228*; N11K+V228R; N11K+V228K; N11K+P229*; N11K+P229R; N11K+P229K; N11K+V230*; N11K+V230K; N11K+V230R; N11K+T231R; N11K+T231K; N11K+R232RR; N11K+N233R; N11K+N233K; N11K+D234*; N11K+D234R; N11K+D234K; N11K+V236K; N11K+V236R; N11K+I238R; N11K+I238K; N11K+E239*; N11K+E239R; N11K+E239K; N11K+A243R; N11K+A243K; N11K+T244R; N11K+T244K; N11K+G245R; N11K+G245K; N11K+N248R; N11K+N248K; N11K+Q249R; N11K+Q249K; N11K+N251R; N11K+N251K; L12R+Q15R; L12R+Q15K; L12R+T37R; L12R+T37K; L12R+Q38R; L12R+Q38K; L12R+N39R; L12R+N39K; L12R+A40R; L12R+A40K; L12R+P42R; L12R+P42K; L12R+E43*; L12R+E43R; L12R+E43K; L12R+E45*; L12R+E45R; L12R+E45K; L12R+N73R; L12R+N73K; L12R+D167*; L12R+D167R; L12R+D167K; L12R+T192R; L12R+T192K; L12R+L193R; L12R+L193K; L12R+Y194R; L12R+Y194K; L12R+T199R; L12R+T199K; L12R+N200R; L12R+N200K; L12R+I202R; L12R+I202K; L12R+S217R; L12R+S217K; L12R+P218R; L12R+P218K; L12R+Y220R; L12R+Y220K; L12R+W221R; L12R+W221K; L12R+S224*; L12R+S224R; L12R+S224K; L12R+S225*; L12R+S225R; L12R+S225K; L12R+T226*; L12R+T226R; L12R+T226K; L12R+L227*; L12R+L227R; L12R+L227K; L12R+V228*; L12R+V228R; L12R+V228K; L12R+P229*; L12R+P229R; L12R+P229K; L12R+V230*; L12R+V230K; L12R+V230R; L12R+T231R; L12R+T231K; L12R+R232RR; L12R+N233R; L12R+N233K; L12R+D234*; L12R+D234R; L12R+D234K; L12R+V236K; L12R+V236R; L12R+I238R; L12R+I238K; L12R+E239*; L12R+E239R; L12R+E239K; L12R+A243R; L12R+A243K; L12R+T244R; L12R+T244K; L12R+G245R; L12R+G245K; L12R+N248R; L12R+N248K; L12R+Q249R; L12R+Q249K; 12R+N251R; L12R+N251K; L12K+Q15R; L12K+Q15K; L12K+T37R; L12K+T37K; L12K+Q38R; L12K+Q38K; L12K+N39R; L12K+N39K; L12K+A40R; L12K+A40K; L12K+P42R; L12K+P42K; L12K+E43*; L12K+E43R; L12K+E43K; L12K+E45*; L12K+E45R; L12K+E45K; L12K+N73R; L12K+N73K; L12K+D167*; L12K+D167R; L12K+D167K; L12K+T192R; L12K+T192K; L12K+L193R; L12K+L193K; L12K+Y194R; L12K+Y194K; L12K+T199R; L12K+T199K; L12K+N200R; L12K+N200K; L12K+I202R; L12K+I202K; L12K+S217R; L12K+S217K; L12K+P218R; L12K+P218K; L12K+Y220R; L12K+Y220K; L12K+W221R; L12K+W221K; L12K+S224*; L12K+S224R; L12K+S224K; L12K+S225*; L12K+S225R; L12K+S225K; L12K+T226*; L12K+T226R; L12K+T226K; L12K+L227*; L12K+L227R; L12K+L227K; L12K+V228*; L12K+V228R; L12K+V228K; L12K+P229*; L12K+P229R; L12K+P229K; L12K+V230*; L12K+V230K; L12K+V230R; L12K+T231R; L12K+T231K; L12K+R232RR; L12K+N233R; L12K+N233K; L12K+D234*; L12K+D234R; L12K+D234K; L12K+V236K; L12K+V236R; L12K+I238R; L12K+I238K; L12K+E239*; L12K+E239R; L12K+E239K; L12K+A243R; L12K+A243K; L12K+T244R; L12K+T244K; L12K+G245R; L12K+G245K; L12K+N248R; L12K+N248K; L12K+Q249R; L12K+Q249K; L12K+N251R; L12K+N251K; Q15R+T37R; Q15R+T37K; Q15R+Q38R; Q15R+Q38K; Q15R+N39R; Q15R+N39K; Q15R+A40R; Q15R+A40K; Q15R+P42R; Q15R+P42K; Q15R+E43*; Q15R+E43R; Q15R+E43K; Q15R+E45*; Q15R+E45R; Q15R+E45K; Q15R+N73R; Q15R+N73K; Q15R+D167*; Q15R+D167R; Q15R+D167K; Q15R+T192R; Q15R+T192K; Q15R+L193R; Q15R+L193K; Q15R+Y194R; Q15R+Y194K; Q15R+T199R; Q15R+T199K; Q15R+N200R; Q15R+N200K; Q15R+I202R; Q15R+I202K; Q15R+S217R; Q15R+S217K; Q15R+P218R; Q15R+P218K; Q15R+Y220R; Q15R+Y220K; Q15R+W221R; Q15R+W221K; Q15R+S224*; Q15R+S224R; Q15R+S224K; Q15R+S225*; Q15R+S225R; Q15R+S225K; Q15R+T226*; Q15R+T226R; Q15R+T226K; Q15R+L227*; Q15R+L227R; Q15R+L227K; Q15R+V228*; Q15R+V228R; Q15R+V228K; Q15R+P229*; Q15R+P229R; Q15R+P229K; Q15R+V230*; Q15R+V230K; Q15R+V230R; Q15R+T231R; Q15R+T231K; Q15R+R232RR; Q15R+N233R; Q15R+N233K; Q15R+D234*; Q15R+D234R; Q15R+D234K; Q15R+V236K; Q15R+V236R; Q15R+I238R; Q15R+I238K; Q15R+E239*; Q15R+E239R; Q15R+E239K; Q15R+A243R; Q15R+A243K; Q15R+T244R; Q15R+T244K; Q15R+G245R; Q15R+G245K; Q15R+N248R; Q15R+N248K; Q15R+Q249R; Q15R+Q249K; Q15R+N251R; Q15R+N251K; Q15K+T37R; Q15K+T37K; Q15K+Q38R; Q15K+Q38K; Q15K+N39R Q15K+N39K; Q15K+A40R; Q15K+A40K; Q15K+P42R; Q15K+P42K; Q15K+E43*; Q15K+E43R; Q15K+E43K; Q15K+E45*; Q15K+E45R; Q15K+E45K; Q15K+N73R; Q15K+N73K; Q15K+D167*; Q15K+D167R; Q15K+D167K; Q15K+T192R; Q15K+T192K; Q15K+L193R; Q15K+L193K; Q15K+Y194R; Q15K+Y194K; Q15K+T199R; Q15K+T199K; Q15K+N200R; Q15K+N200K; Q15K+I202R; Q15K+I202K; Q15K+S217R; Q15K+S217K; Q15K+P218R; Q15K+P218K; Q15K+Y220R; Q15K+Y220K; Q15K+W221R; Q15K+W221K; Q15K+S224*; Q15K+S224R; Q15K+S224K; Q15K+S225*; Q15K+S225R; Q15K+S225K; Q15K+T226*; Q15K+T226R; Q15K+T226K; Q15K+L227*; Q15K+L227R; Q15K+L227K; Q15K+V228*; Q15K+V228R; Q15K+V228K; Q15K+P229*; Q15K+P229R; Q15K+P229K; Q15K+V230*; Q15K+V230K; Q15K+V230R; Q15K+T231R; Q15K+T231K; Q15K+R232RR; Q15K+N233R; Q15K+N233K; Q15K+D234*; Q15K+D234R; Q15K+D234K; Q15K+V236K; Q15K+V236R; Q15K+I238R; Q15K+I238K; Q15K+E239*; Q15K+E239R; Q15K+E239K; Q15K+A243R; Q15K+A243K; Q15K+T244R; Q15K+T244K; Q15K+G245R; Q15K+G245K; Q15K+N248R; Q15K+N248K; Q15K+Q249R; Q15K+Q249K; Q15K+N251R; Q15K+N251K; T37R+Q38R; T37R+Q38K; T37R+N39R; T37R+N39K; T37R+A40R; T37R+A40K; T37R+P42R; T37R+P42K; T37R+E43*; T37R+E43R; T37R+E43K; T37R+E45*; T37R+E45R; T37R+E45K; T37R+N73R; T37R+N73K; T37R+D167*; T37R+D167R; T37R+D167K; T37R+T192R; T37R+T192K; T37R+L193R; T37R+L193K; T37R+Y194R; T37R+Y194K; T37R+T199R; T37R+T199K; T37R+N200R; T37R+N200K; T37R+I202R; T37R+I202K; T37R+S217R; T37R+S217K; T37R+P218R; T37R+P218K; T37R+Y220R; T37R+Y220K; T37R+W221R; T37R+W221K; T37R+S224*; T37R+S224R; T37R+S224K; T37R+S225*; T37R+S225R; T37R+S225K; T37R+T226*; T37R+T226R; T37R+T226K; T37R+L227*; T37R+L227R; T37R+L227K; T37R+V228*; T37R+V228R; T37R+V228K; T37R+P229*; T37R+P229R; T37R+P229K; T37R+V230*; T37R+V230K; T37R+V230R; T37R+T231R; T37R+T231K; T37R+R232RR; T37R+N233R; T37R+N233K; T37R+D234*; T37R+D234R; T37R+D234K; T37R+V236K; T37R+V236R; T37R+I238R; T37R+I238K; T37R+E239*; T37R+E239R; T37R+E239K; T37R+A243R; T37R+A243K; T37R+T244R; T37R+T244K; T37R+G245R; T37R+G245K; T37R+N248R; T37R+N248K; T37R+Q249R; T37R+Q249K; T37R+N251R; T37R+N251K; T37K+Q38R; T37K+Q38K; T37K+N39R; T37K+N39K; T37K+A40R; T37K+A40K; T37K+P42R; T37K+P42K; T37K+E43*; T37K+E43R; T37K+E43K; T37K+E45*; T37K+E45R; T37K+E45K; T37K+N73R; T37K+N73K; T37K+D167*; T37K+D167R; 37K+D167K; T37K+T192R; T37K+T192K; T37K+L193R; T37K+L193K; T37K+Y194R; T37K+Y194K; T37K+T199R; T37K+T199K; T37K+N200R; T37K+N200K; T37K+I202R; T37K+I202K; T37K+S217R; T37K+S217K; T37K+P218R; T37K+P218K; T37K+Y220R; T37K+Y220K; T37K+W221R; T37K+W221K; T37K+S224*; T37K+S224R; T37K+S224K; T37K+S225*; T37K+S225R; T37K+S225K; T37K+T226*; T37K+T226R; T37K+T226K; T37K+L227*; T37K+L227R; T37K+L227K; T37K+V228*; T37K+V228R; T37K+V228K; T37K+P229*; T37K+P229R; T37K+P229K; T37K+V230*; T37K+V230K; T37K+V230R; T37K+T231R; T37K+T231K; T37K+R232RR; T37K+N233R; T37K+N233K; T37K+D234*; T37K+D234R; T37K+D234K; T37K+V236K; T37K+V236R; T37K+I238R; T37K+I238K; T37K+E239*; T37K+E239R; T37K+E239K; T37K+A243R; T37K+A243K; T37K+T244R; T37K+T244K; T37K+G245R; T37K+G245K; T37K+N248R; T37K+N248K; T37K+Q249R; T37K+Q249K; T37K+N251R; T37K+N251K; Q38R+N39R; Q38R+N39K; Q38R+A40R; Q38R+A40K; Q38R+P42R; Q38R+P42K; Q38R+E43*; Q38R+E43R; Q38R+E43K; Q38R+E45*; Q38R+E45R; Q38R+E45K; Q38R+N73R; Q38R+N73K; Q38R+D167*; Q38R+D167R; Q38R+D167K; Q38R+T192R; Q38R+T192K; Q38R+L193R; Q38R+L193K; Q38R+Y194R; Q38R+Y194K; Q38R+T199R; Q38R+T199K; Q38R+N200R; Q38R+N200K; Q38R+I202R; Q38R+I202K; Q38R+S217R; Q38R+S217K; Q38R+P218R; Q38R+P218K; Q38R+Y220R; Q38R+Y220K; Q38R+W221R; Q38R+W221K; Q38R+S224*; Q38R+S224R; Q38R+S224K; Q38R+S225*; Q38R+S225R; Q38R+S225K; Q38R+T226*; Q38R+T226R; Q38R+T226K; Q38R+L227*; Q38R+L227R; Q38R+L227K; Q38R+V228*; Q38R+V228R; Q38R+V228K; Q38R+P229*; Q38R+P229R; Q38R+P229K; Q38R+V230*; Q38R+V230K; Q38R+V230R; Q38R+T231R; Q38R+T231K; Q38R+R232RR; Q38R+N233R; Q38R+N233K; Q38R+D234*; Q38R+D234R; Q38R+D234K; Q38R+V236K; Q38R+V236R; Q38R+I238R; Q38R+I238K; Q38R+E239*; Q38R+E239R; Q38R+E239K; Q38R+A243R; Q38R+A243K; Q38R+T244R; Q38R+T244K; Q38R+G245R; Q38R+G245K; Q38R+N248R; Q38R+N248K; Q38R+Q249R; Q38R+Q249K; Q38R+N251R; Q38R+N251K; Q38K+N39R; Q38K+N39K; Q38K+A40R; Q38K+A40K; Q38K+P42R; Q38K+P42K; Q38K+E43*; Q38K+E43R; Q38K+E43K; Q38K+E45*; Q38K+E45R; Q38K+E45K; Q38K+N73R; Q38K+N73K; Q38K+D167*; Q38K+D167R; Q38K+D167K; Q38K+T192R; Q38K+T192K; Q38K+L193R; Q38K+L193K; Q38K+Y194R; Q38K+Y194K; Q38K+T199R; Q38K+T199K; Q38K+N200R; Q38K+N200K; Q38K+I202R; Q38K+I202K; Q38K+S217R; Q38K+S217K; Q38K+P218R; Q38K+P218K; Q38K+Y220R; Q38K+Y220K; Q38K+W221R; Q38K+W221K; Q38K+S224*; Q38K+S224R; Q38K+S224K; Q38K+S225*; Q38K+S225R; Q38K+S225K; Q38K+T226*; Q38K+T226R; Q38K+T226K; Q38K+L227*; Q38K+L227R; Q38K+L227K; Q38K+V228*; Q38K+V228R; Q38K+V228K; Q38K+P229*; Q38K+P229R; Q38K+P229K; Q38K+V230*; Q38K+V230K; Q38K+V230R; Q38K+T231R; Q38K+T231K; Q38K+R232RR; Q38K+N233R; Q38K+N233K; Q38K+D234*; Q38K+D234R; Q38K+D234K; Q38K+V236K; Q38K+V236R; Q38K+I238R; Q38K+I238K; Q38K+E239*; Q38K+E239R; Q38K+E239K; Q38K+A243R; Q38K+A243K; Q38K+T244R; Q38K+T244K; Q38K+G245R; Q38K+G245K; Q38K+N248R; Q38K+N248K; Q38K+Q249R; Q38K+Q249K; Q38K+N251R; Q38K+N251K; N39R+A40R; N39R+A40K; N39R+P42R; N39R+P42K; N39R+E43*; N39R+E43R; N39R+E43K; N39R+E45*; N39R+E45R; N39R+E45K; N39R+N73R; N39R+N73K; N39R+D167*; N39R+D167R; N39R+D167K; N39R+T192R; N39R+T192K; N39R+L193R; N39R+L193K; N39R+Y194R; N39R+Y194K; N39R+T199R; N39R+T199K; N39R+N200R; N39R+N200K; N39R+I202R; N39R+I202K; N39R+S217R; N39R+S217K; N39R+P218R; N39R+P218K; N39R+Y220R; N39R+Y220K; N39R+W221R; N39R+W221K; N39R+S224*; N39R+S224R; N39R+S224K; N39R+S225*; N39R+S225R; N39R+S225K; N39R+T226*; N39R+T226R; N39R+T226K; N39R+L227*; N39R+L227R; N39R+L227K; N39R+V228*; N39R+V228R; N39R+V228K; N39R+P229*; N39R+P229R; N39R+P229K; N39R+V230*; N39R+V230K; N39R+V230R; N39R+T231R; N39R+T231K; N39R+R232RR; N39R+N233R; N39R+N233K; N39R+D234*; N39R+D234R; N39R+D234K; N39R+V236K; N39R+V236R; N39R+I238R; N39R+I238K; N39R+E239*; N39R+E239R; N39R+E239K; N39R+A243R; N39R+A243K; N39R+T244R; N39R+T244K; N39R+G245R; N39R+G245K; N39R+N248R; N39R+N248K; N39R+Q249R; N39R+Q249K; N39R+N251R; N39R+N251K; N39K+A40R; N39K+A40K; N39K+P42R; N39K+P42K; N39K+E43*; N39K+E43R; N39K+E43K; N39K+E45*; N39K+E45R; N39K+E45K; N39K+N73R; N39K+N73K; N39K+D167*; N39K+D167R; N39K+D167K; N39K+T192R; N39K+T192K; N39K+L193R; N39K+L193K; N39K+Y194R; N39K+Y194K; N39K+T199R; N39K+T199K; N39K+N200R; N39K+N200K; N39K+I202R; N39K+I202K; N39K+S217R; N39K+S217K; N39K+P218R; N39K+P218K; N39K+Y220R; N39K+Y220K; N39K+W221R; N39K+W221K; N39K+S224*; N39K+S224R; N39K+S224K; N39K+S225*; N39K+S225R; N39K+S225K; N39K+T226*; N39K+T226R; 39K+T226K; N39K+L227*; N39K+L227R; N39K+L227K; N39K+V228*; N39K+V228R; N39K+V228K; N39K+P229*; N39K+P229R; N39K+P229K; N39K+V230*; N39K+V230K; N39K+V230R; N39K+T231R; N39K+T231K; N39K+R232RR; N39K+N233R; N39K+N233K; N39K+D234*; N39K+D234R; N39K+D234K; N39K+V236K; N39K+V236R; N39K+I238R; N39K+I238K; N39K+E239*; N39K+E239R; N39K+E239K; N39K+A243R; N39K+A243K; N39K+T244R; N39K+T244K; N39K+G245R; N39K+G245K; N39K+N248R; N39K+N248K; N39K+Q249R; N39K+Q249K; N39K+N251R; N39K+N251K; A40R+P42R; A40R+P42K; A40R+E43*; A40R+E43R; A40R+E43K; A40R+E45*; A40R+E45R; A40R+E45K; A40R+N73R; A40R+N73K; A40R+D167*; A40R+D167R; A40R+D167K; A40R+T192R; A40R+T192K; A40R+L193R; A40R+L193K; A40R+Y194R; A40R+Y194K; A40R+T199R; A40R+T199K; A40R+N200R; A40R+N200K; A40R+I202R; A40R+I202K; A40R+S217R; A40R+S217K; A40R+P218R; A40R+P218K; A40R+Y220R; A40R+Y220K; A40R+W221R; A40R+W221K; A40R+S224*; A40R+S224R; A40R+S224K; A40R+S225*; A40R+S225R; A40R+S225K; A40R+T226*; A40R+T226R; A40R+T226K; A40R+L227*; A40R+L227R; A40R+L227K; A40R+V228*; A40R+V228R; A40R+V228K; A40R+P229*; A40R+P229R; A40R+P229K; A40R+V230*; A40R+V230K; A40R+V230R; A40R+T231R; A40R+T231K; A40R+R232RR; A40R+N233R; A40R+N233K; A40R+D234*; A40R+D234R; A40R+D234K; A40R+V236K; A40R+V236R; A40R+I238R; A40R+I238K; A40R+E239*; A40R+E239R; A40R+E239K; A40R+A243R; A40R+A243K; A40R+T244R; A40R+T244K; A40R+G245R; A40R+G245K; A40R+N248R; A40R+N248K; A40R+Q249R; A40R+Q249K; A40R+N251R; A40R+N251K; A40K+P42R; A40K+P42K; A40K+E43*; A40K+E43R; A40K+E43K; A40K+E45*; A40K+E45R; A40K+E45K; A40K+N73R; A40K+N73K; A40K+D167*; A40K+D167R; A40K+D167K; A40K+T192R; A40K+T192K; A40K+L193R; A40K+L193K; A40K+Y194R; A40K+Y194K; A40K+T199R; A40K+T199K; A40K+N200R; A40K+N200K; A40K+I202R; A40K+I202K; A40K+S217R; A40K+S217K; A40K+P218R; A40K+P218K; A40K+Y220R; A40K+Y220K; A40K+W221R; A40K+W221K; A40K+S224*; A40K+S224R; A40K+S224K; A40K+S225*; A40K+S225R; A40K+S225K; A40K+T226*; A40K+T226R; A40K+T226K; A40K+L227*; A40K+L227R; A40K+L227K; A40K+V228*; A40K+V228R; A40K+V228K; A40K+P229*; A40K+P229R; A40K+P229K; A40K+V230*; A40K+V230K; A40K+V230R; A40K+T231R; A40K+T231K; A40K+R232RR; A40K+N233R; A40K+N233K; A40K+D234*; A40K+D234R; A40K+D234K; A40K+V236K; A40K+V236R; A40K+I238R; A40K+I238K; A40K+E239*; A40K+E239R; A40K+E239K; A40K+A243R; A40K+A243K; A40K+T244R; A40K+T244K; A40K+G245R; A40K+G245K; A40K+N248R; A40K+N248K; A40K+Q249R; A40K+Q249K; A40K+N251R; A40K+N251K; P42R+E43*; P42R+E43R; P42R+E43K; P42R+E45*; P42R+E45R; P42R+E45K; P42R+N73R; P42R+N73K; P42R+D167*; P42R+D167R; P42R+D167K; P42R+T192R; P42R+T192K; P42R+L193R; P42R+L193K; P42R+Y194R; P42R+Y194K; P42R+T199R; P42R+T199K; P42R+N200R; P42R+N200K; P42R+I202R; P42R+I202K; P42R+S217R; P42R+S217K; P42R+P218R; P42R+P218K; P42R+Y220R; P42R+Y220K; P42R+W221R; P42R+W221K; P42R+S224*; P42R+S224R; P42R+S224K; P42R+S225*; P42R+S225R; P42R+S225K; P42R+T226*; P42 R+T226R; P42 R+T226K; P42R+L227*; P42R+L227R; P42R+L227K; P42 R+V228*; P42 R+V228R; P42R+V228K; P42 R+P229*; P42 R+P229R; P42R+P229K; P42R+V230*; P42R+V230K; P42R+V230R; P42R+T231R; P42R+T231K; P42R+R232RR; P42R+N233R; P42R+N233K; P42R+D234*; P42R+D234R; P42R+D234K; P42R+V236K; P42 R+V236R; P42R+I238R; P42 R+I238K; P42R+E239*; P42 R+E239R; P42R+E239K; P42R+A243R; P42R+A243K; P42R+T244R; P42R+T244K; P42R+G245R; P42R+G245K; P42R+N248R; P42R+N248K; P42R+Q249R; P42R+Q249K; P42R+N251R; P42R+N251K; P42K+E43*; P42K+E43R; P42K+E43K; P42K+E45*; P42K+E45R; P42K+E45K; P42K+N73R; P42K+N73K; P42K+D167*; P42K+D167R; P42K+D167K; P42K+T192R; P42K+T192K; P42K+L193R; P42K+L193K; P42K+Y194R; P42K+Y194K; P42K+T199R; P42K+T199K; P42K+N200R; P42K+N200K; P42K+1202R; P42K+I202K; P42K+S217R; P42K+S217K; P42K+P218R; P42K+P218K; P42K+Y220R; P42K+Y220K; P42K+W221R; P42K+W221K; P42K+S224*; P42K+S224R; P42K+S224K; P42K+S225*; P42K+S225R; P42K+S225K; P42K+T226*; P42K+T226R; P42K+T226K; P42K+L227*; P42K+L227R; P42K+L227K; P42K+V228*; P42K+V228R; P42K+V228K; P42K+P229*; P42K+P229R; P42K+P229K; P42K+V230*; P42K+V230K; P42K+V230R; P42K+T231R; P42K+T231K; P42K+R232RR; P42K+N233R; P42K+N233K; P42K+D234*; P42K+D234R; P42K+D234K; P42K+V236K; P42K+V236R; P42K+I238R; P42K+I238K; P42K+E239*; P42K+E239R; P42K+E239K; P42K+A243R; P42K+A243K; P42K+T244R; P42K+T244K; P42K+G245R; P42K+G245K; P42K+N248R; P42K+N248K; P42K+Q249R; P42K+Q249K; P42K+N251R; P42K+N251K; E43*+E45*; E43*+E45R; E43*+E45K; E43*+N73R; E43*+N73K; E43*+D167*; E43*+D167R; E43*+D167K; E43*+T192R; E43*+T192K; E43*+L193R; E43*+L193K; E43*+Y194R; E43*+Y194K; E43*+T199R; E43*+T199K; E43*+N200R; E43*+N200K; E43*+I202R; E43*+I202K; E43*+S217R; E43*+S217K; E43*+P218R; E43*+P218K; E43*+Y220R; E43*+Y220K; E43*+W221R; E43*+W221K; E43*+S224*; E43*+S224R; E43*+S224K; E43*+S225*; E43*+S225R; E43*+S225K; E43*+T226*; E43*+T226R; E43*+T226K; E43*+L227*; E43*+L227R; E43*+L227K; E43*+V228*; E43*+V228R; E43*+V228K; E43*+P229*; E43*+P229R; E43*+P229K; E43*+V230*; E43*+V230K; E43*+V230R; E43*+T231R; E43*+T231K; E43*+R232RR; E43*+N233R; E43*+N233K; E43*+D234*; E43*+D234R; E43*+D234K; E43*+V236K; E43*+V236R; E43*+I238R; E43*+I238K; E43*+E239*; E43*+E239R; E43*+E239K; E43*+A243R; E43*+A243K; E43*+T244R; E43*+T244K; E43*+G245R; E43*+G245K; E43*+N248R; E43*+N248K; E43*+Q249R; E43*+Q249K; E43*+N251R; E43*+N251K; E43R+E45*; E43R+E45R; E43R+E45K; E43R+N73R; E43R+N73K; E43R+D167*; E43R+D167R; E43R+D167K; E43R+T192R; E43R+T192K; E43R+L193R; E43R+L193K; E43R+Y194R; E43R+Y194K; E43R+T199R; E43R+T199K; E43R+N200R; E43R+N200K; E43R+I202R; E43R+I202K; E43R+S217R; E43R+S217K; E43R+P218R; E43R+P218K; E43R+Y220R; E43R+Y220K; E43R+W221R; E43R+W221K; E43R+S224*; E43R+S224R; E43R+S224K; E43R+S225*; E43R+S225R; E43R+S225K; E43R+T226*; E43R+T226R; E43R+T226K; E43R+L227*; E43R+L227R; E43R+L227K; E43R+V228*; E43R+V228R; E43R+V228K; E43R+P229*; E43R+P229R; E43R+P229K; E43R+V230*; E43R+V230K; E43R+V230R; E43R+T231R; E43R+T231K; E43R+R232RR; E43R+N233R; E43R+N233K; E43R+D234*; E43R+D234R; E43R+D234K; E43R+V236K; E43R+V236R; E43R+I238R; E43R+I238K; E43R+E239*; E43R+E239R; E43R+E239K; E43R+A243R; E43R+A243K; E43R+T244R; E43R+T244K; E43R+G245R; E43R+G245K; E43R+N248R; E43R+N248K; E43R+Q249R; E43R+Q249K; E43R+N251R; E43R+N251K; E43K+E45*; E43K+E45R; E43K+E45K; E43K+N73R; E43K+N73K; E43K+D167*; E43K+D167R; E43K+D167K; E43K+T192R; E43K+T192K; E43K+L193R; E43K+L193K; E43K+Y194R; E43K+Y194K; E43K+T199R; E43K+T199K; E43K+N200R; E43K+N200K; E43K+I202R; E43K+I202K; E43K+S217R; E43K+S217K; E43K+P218R; E43K+P218K; E43K+Y220R; E43K+Y220K; E43K+W221R; E43K+W221K; E43K+S224*; E43K+S224R; E43K+S224K; E43K+S225*; E43K+S225R; E43K+S225K; E43K+T226*; E43K+T226R; E43K+T226K; E43K+L227*; E43K+L227R; E43K+L227K; E43K+V228*; E43K+V228R; E43K+V228K; E43K+P229*; E43K+P229R; E43K+P229K; E43K+V230*; E43K+V230K; E43K+V230R; E43K+T231R; E43K+T231K; E43K+R232RR; E43K+N233R; E43K+N233K; E43K+D234*; E43K+D234R; E43K+D234K; E43K+V236K; E43K+V236R; E43K+I238R; E43K+I238K; E43K+E239*; E43K+E239R; E43K+E239K; E43K+A243R; E43K+A243K; E43K+T244R; E43K+T244K; E43K+G245R; E43K+G245K; E43K+N248R; E43K+N248K; E43K+Q249R; E43K+Q249K; E43K+N251R; E43K+N251K; E45*+N73R; E45*+N73K; E45*+D167*; E45*+D167R; E45*+D167K; E45*+T192R; E45*+T192K; E45*+L193R; E45*+L193K; E45*+Y194R; E45*+Y194K; E45*+T199R; E45*+T199K; E45*+N200R; E45*+N200K; E45*+I202R; E45*+I202K; E45*+S217R; E45*+S217K; E45*+P218R; E45*+P218K; E45*+Y220R; E45*+Y220K; E45*+W221R; E45*+W221K; E45*+S224*; E45*+S224R; E45*+S224K; E45*+S225*; E45*+S225R; E45*+S225K; E45*+T226*; E45*+T226R; E45*+T226K; E45*+L227*; E45*+L227R; E45*+L227K; E45*+V228*; E45*+V228R; E45*+V228K; E45*+P229*; E45*+P229R; E45*+P229K; E45*+V230*; E45*+V230K; E45*+V230R; E45*+T231R; E45*+T231K; E45*+R232RR; E45*+N233R; E45*+N233K; E45*+D234*; E45*+D234R; E45*+D234K; E45*+V236K; E45*+V236R; E45*+I238R; E45*+I238K; E45*+E239*; E45*+E239R; E45*+E239K; E45*+A243R; E45*+A243K; E45*+T244R; E45*+T244K; E45*+G245R; E45*+G245K; E45*+N248R; E45*+N248K; E45*+Q249R; E45*+Q249K; E45*+N251R; E45*+N251K; E45R+N73R; E45R+N73K; E45R+D167*; E45R+D167R; E45R+D167K; E45R+T192R; E45R+T192K; E45R+L193R; E45R+L193K; E45R+Y194R; E45R+Y194K; E45R+T199R; E45R+T199K; E45R+N200R; E45R+N200K; E45R+I202R; E45R+I202K; E45R+S217R; E45R+S217K; E45R+P218R; E45R+P218K; E45R+Y220R; E45R+Y220K; E45R+W221R; E45R+W221K; E45R+S224*; E45R+S224R; E45R+S224K; E45R+S225*; E45R+S225R; E45R+S225K; E45R+T226*; E45R+T226R; E45R+T226K; E45R+L227*; E45R+L227R; E45R+L227K; E45R+V228*; E45R+V228R; E45R+V228K; E45R+P229*; E45R+P229R; E45R+P229K; E45R+V230*; E45R+V230K; E45R+V230R; E45R+T231R; E45R+T231K; E45R+R232RR; E45R+N233R; E45R+N233K; E45R+D234*; E45R+D234R; E45R+D234K; E45R+V236K; E45R+V236R; E45R+I238R; E45R+I238K; E45R+E239*; E45R+E239R; E45R+E239K; E45R+A243R; E45R+A243K; E45R+T244R; E45R+T244K; E45R+G245R; E45R+G245K; E45R+N248R; E45R+N248K; E45R+Q249R; E45R+Q249K; E45R+N251R; E45R+N251K; E45K+N73R; E45K+N73K; E45K+D167*; E45K+D167R; E45K+D167K; E45K+T192R; E45K+T192K; E45K+L193R; E45K+L193K; E45K+Y194R; E45K+Y194K; E45K+T199R; E45K+T199K; E45K+N200R; E45K+N200K; E45K+I202R; E45K+I202K; E45K+S217R; E45K+S217K; E45K+P218R; E45K+P218K; E45K+Y220R; E45K+Y220K; E45K+W221R; E45K+W221K; E45K+S224*; E45K+S224R; E45K+S224K; E45K+S225*; E45K+S225R; E45K+S225K; E45K+T226*; E45K+T226R; E45K+T226K; E45K+L227*; E45K+L227R; E45K+L227K; E45K+V228*; E45K+V228R; E45K+V228K; E45K+P229*; E45K+P229R; E45K+P229K; E45K+V230*; E45K+V230K; E45K+V230R; E45K+T231R; E45K+T231K; E45K+R232RR; E45K+N233R; E45K+N233K; E45K+D234*; E45K+D234R; E45K+D234K; E45K+V236K; E45K+V236R; E45K+I238R; E45K+I238K; E45K+E239*; E45K+E239R; E45K+E239K; E45K+A243R; E45K+A243K; E45K+T244R; E45K+T244K; E45K+G245R; E45K+G245K; E45K+N248R; E45K+N248K; E45K+Q249R; E45K+Q249K; E45K+N251R; E45K+N251K; N73R+D167*; N73R+D167R; N73R+D167K; N73R+T192R; N73R+T192K; N73R+L193R; N73R+L193K; N73R+Y194R; N73R+Y194K; N73R+T199R; N73R+T199K; N73R+N200R; N73R+N200K; N73R+I202R; N73R+I202K; N73R+S217R; N73R+S217K; N73R+P218R; N73R+P218K; N73R+Y220R; N73R+Y220K; N73R+W221R; N73R+W221K; N73R+S224*; N73R+S224R; N73R+S224K; N73R+S225*; N73R+S225R; N73R+S225K; N73R+T226*; N73R+T226R; N73R+T226K; N73R+L227*; N73R+L227R; N73R+L227K; N73R+V228*; N73R+V228R; N73R+V228K; N73R+P229*; N73R+P229R; N73R+P229K; N73R+V230*; N73R+V230K; N73R+V230R; N73R+T231R; N73R+T231K; N73R+R232RR; N73R+N233R; N73R+N233K; N73R+D234*; N73R+D234R; N73R+D234K; N73R+V236K; N73R+V236R; N73R+I238R; N73R+I238K; N73R+E239*; N73R+E239R; N73R+E239K; N73R+A243R; N73R+A243K; N73R+T244R; N73R+T244K; N73R+G245R; N73R+G245K; N73R+N248R; N73R+N248K; N73R+Q249R; N73R+Q249K; N73R+N251R; N73R+N251K; N73K+D167*; N73K+D167R; N73K+D167K; N73K+T192R; N73K+T192K; N73K+L193R; N73K+L193K; N73K+Y194R; N73K+Y194K; N73K+T199R; N73K+T199K; N73K+N200R; N73K+N200K; N73K+I202R; N73K+I202K; N73K+S217R; N73K+S217K; N73K+P218R; N73K+P218K; N73K+Y220R; N73K+Y220K; N73K+W221R; N73K+W221K; N73K+S224*; N73K+S224R; N73K+S224K; N73K+S225*; N73K+S225R; N73K+S225K; N73K+T226*; N73K+T226R; N73K+T226K; N73K+L227*; N73K+L227R; N73K+L227K; N73K+V228*; N73K+V228R; N73K+V228K; N73K+P229*; N73K+P229R; N73K+P229K; N73K+V230*; N73K+V230K; N73K+V230R; N73K+T231R; N73K+T231K; N73K+R232RR; N73K+N233R; N73K+N233K; N73K+D234*; N73K+D234R; N73K+D234K; N73K+V236K; N73K+V236R; N73K+I238R; N73K+I238K; N73K+E239*; N73K+E239R; N73K+E239K; N73K+A243R; N73K+A243K; N73K+T244R; N73K+T244K; N73K+G245R; N73K+G245K; N73K+N248R; N73K+N248K; N73K+Q249R; N73K+Q249K; N73K+N251R; N73K+N251K; D167*+T192R; D167*+T192K; D167*+L193R; D167*+L193K; D167*+Y194R; D167*+Y194K; D167*+T199R; D167*+T199K; D167*+N200R; D167*+N200K; D167*+I202R; D167*+I202K; D167*+S217R; D167*+S217K; D167*+P218R; D167*+P218K; D167*+Y220R; D167*+Y220K; D167*+W221R; D167*+W221K; D167*+S224*; D167*+S224R; D167*+S224K; D167*+S225*; D167*+S225R; D167*+S225K; D167*+T226*; D167*+T226R; D167*+T226K; D167*+L227*; D167*+L227R; D167*+L227K; D167*+V228*; D167*+V228R; D167*+V228K; D167*+P229*; D167*+P229R; D167*+P229K; D167*+V230*; D167*+V230K; D167*+V230R; D167*+T231R; D167*+T231K; D167*+R232RR; D167*+N233R; D167*+N233K; D167*+D234*; D167*+D234R; D167*+D234K; D167*+V236K; D167*+V236R; D167*+I238R; D167*+I238K; D167*+E239*; D167*+E239R; D167*+E239K; D167*+A243R; D167*+A243K; D167*+T244R; D167*+T244K; D167*+G245R; D167*+G245K; D167*+N248R; D167*+N248K; D167*+Q249R; D167*+Q249K; D167*+N251R; D167*+N251K; D167R+T192R; D167R+T192K; D167R+L193R; D167R+L193K; D167R+Y194R; D167R+Y194K; D167R+T199R; 167R+T199K; D167R+N200R; D167R+N200K; D167R+I202R; D167R+I202K; D167R+S217R; D167R+S217K; D167R+P218R; D167R+P218K; D167R+Y220R; D167R+Y220K; D167R+W221R D167R+W221K; D167R+S224*; D167R+S224R; D167R+S224K; D167R+S225*; D167R+S225R; D167R+S225K; D167R+T226*; D167R+T226R; D167R+T226K; D167R+L227*; D167R+L227R; D167R+L227K; D167R+V228*; D167R+V228R; D167R+V228K; D167R+P229*; D167R+P229R; D167R+P229K; D167R+V230*; D167R+V230K; D167R+V230R; D167R+T231R; D167R+T231K; D167R+R232RR; D167R+N233R; D167R+N233K; D167R+D234*; D167R+D234R; D167R+D234K; D167R+V236K; D167R+V236R; D167R+I238R; D167R+I238K; D167R+E239*; D167R+E239R; D167R+E239K; D167R+A243R; D167R+A243K; D167R+T244R; D167R+T244K; D167R+G245R; D167R+G245K; D167R+N248R; D167R+N248K; D167R+Q249R; D167R+Q249K; D167R+N251R; D167R+N251K; D167K+T192R; D167K+T192K; D167K+L193R; D167K+L193K; D167K+Y194R; D167K+Y194K; D167K+T199R; D167K+T199K; D167K+N200R; D167K+N200K; D167K+I202R; D167K+I202K; D167K+S217R; D167K+S217K; D167K+P218R; D167K+P218K; D167K+Y220R; D167K+Y220K; D167K+W221R; D167K+W221K; D167K+S224*; D167K+S224R; D167K+S224K; D167K+S225*; D167K+S225R; D167K+S225K; D167K+T226*; D167K+T226R; D167K+T226K; D167K+L227*; D167K+L227R; D167K+L227K; D167K+V228*; D167K+V228R; D167K+V228K; D167K+P229*; D167K+P229R; D167K+P229K; D167K+V230*; D167K+V230K; D167K+V230R; D167K+T231R; D167K+T231K; D167K+R232RR; D167K+N233R; D167K+N233K; D167K+D234*; D167K+D234R; D167K+D234K; D167K+V236K; D167K+V236R; D167K+I238R; D167K+I238K; D167K+E239*; D167K+E239R; D167K+E239K; D167K+A243R; D167K+A243K; D167K+T244R; D167K+T244K; D167K+G245R; D167K+G245K; D167K+N248R; D167K+N248K; D167K+Q249R; D167K+Q249K; D167K+N251R; D167K+N251K; T192R+L193R; T192R+L193K; T192R+Y194R; T192R+Y194K; T192R+T199R; T192R+T199K; T192R+N200R; T192R+N200K; T192R+I202R; T192R+I202K; T192R+S217R; T192R+S217K; T192R+P218R; T192R+P218K; T192R+Y220R; T192R+Y220K; T192R+W221R; T192R+W221K; T192R+S224*; T192R+S224R; T192R+S224K; T192R+S225*; T192R+S225R; T192R+S225K; T192R+T226*; T192R+T226R; T192R+T226K; T192R+L227*; T192R+L227R; T192R+L227K; T192R+V228*; T192R+V228R; T192R+V228K; T192R+P229*; T192R+P229R; T192R+P229K; T192R+V230*; T192R+V230K; T192R+V230R; T192R+T231R; T192R+T231K; T192R+R232RR; T192R+N233R; T192R+N233K; T192R+D234*; T192R+D234R; T192R+D234K; T192R+V236K; T192R+V236R; T192R+I238R; T192R+I238K; T192R+E239*; T192R+E239R; T192R+E239K; T192R+A243R; T192R+A243K; T192R+T244R; T192R+T244K; T192R+G245R; T192R+G245K; T192R+N248R; T192R+N248K; T192R+Q249R; T192R+Q249K; T192R+N251R; T192R+N251K; T192K+L193R; T192K+L193K; T192K+Y194R; T192K+Y194K; T192K+T199R; T192K+T199K; T192K+N200R; T192K+N200K; T192K+I202R; T192K+I202K; T192K+S217R; T192K+S217K; T192K+P218R; T192K+P218K; T192K+Y220R; T192K+Y220K; T192K+W221R; T192K+W221K; T192K+S224*; T192K+S224R; T192K+S224K; T192K+S225*; T192K+S225R; T192K+S225K; T192K+T226*; T192K+T226R; T192K+T226K; T192K+L227*; T192K+L227R; T192K+L227K; T192K+V228*; T192K+V228R; T192K+V228K; T192K+P229*; T192K+P229R; T192K+P229K; T192K+V230*; T192K+V230K; T192K+V230R; T192K+T231R; T192K+T231K; T192K+R232RR; T192K+N233R; T192K+N233K; T192K+D234*; T192K+D234R; T192K+D234K; T192K+V236K; T192K+V236R; T192K+I238R; T192K+I238K; T192K+E239*; T192K+E239R; T192K+E239K; T192K+A243R; T192K+A243K; T192K+T244R; T192K+T244K; T192K+G245R; T192K+G245K; T192K+N248R; T192K+N248K; T192K+Q249R; T192K+Q249K; T192K+N251R; T192K+N251K; L193R+Y194R; L193R+Y194K; L193R+T199R; L193R+T199K; L193R+N200R; L193R+N200K; L193R+I202R; L193R+I202K; L193R+S217R; L193R+S217K; L193R+P218R; L193R+P218K; L193R+Y220R; L193R+Y220K; L193R+W221R; L193R+W221K; L193R+S224*; L193R+S224R; L193R+S224K; L193R+S225*; L193R+S225R; L193R+S225K; L193R+T226*; L193R+T226R; L193R+T226K; L193R+L227*; L193R+L227R; L193R+L227K; L193R+V228*; L193R+V228R; L193R+V228K; L193R+P229*; L193R+P229R; L193R+P229K; L193R+V230*; L193R+V230K; L193R+V230R; L193R+T231R; L193R+T231K; L193R+R232RR; L193R+N233R; L193R+N233K; L193R+D234*; L193R+D234R; L193R+D234K; L193R+V236K; L193R+V236R; L193R+I238R; L193R+I238K; L193R+E239*; L193R+E239R; L193R+E239K; L193R+A243R; L193R+A243K; L193R+T244R; L193R+T244K; L193R+G245R; L193R+G245K; L193R+N248R; L193R+N248K; L193R+Q249R; L193R+Q249K; L193R+N251R; L193R+N251K; L193K+Y194R; L193K+Y194K; L193K+T199R; L193K+T199K; L193K+N200R; L193K+N200K; L193K+I202R; L193K+I202K; L193K+S217R; L193K+S217K; L193K+P218R; L193K+P218K; L193K+Y220R; L193K+Y220K; L193K+W221R; L193K+W221K; L193K+S224*; L193K+S224R; L193K+S224K; L193K+S225*; L193K+S225R; L193K+S225K; L193K+T226*; L193K+T226R; L193K+T226K; L193K+L227*; L193K+L227R; L193K+L227K; L193K+V228*; L193K+V228R; L193K+V228K; L193K+P229*; L193K+P229R; L193K+P229K; L193K+V230*; L193K+V230K; L193K+V230R; L193K+T231R; L193K+T231K; L193K+R232RR; L193K+N233R; L193K+N233K; L193K+D234*; L193K+D234R; L193K+D234K; L193K+V236K; L193K+V236R; L193K+I238R; L193K+I238K; L193K+E239*; L193K+E239R; L193K+E239K; L193K+A243R; L193K+A243K; L193K+T244R; L193K+T244K; L193K+G245R; L193K+G245K; L193K+N248R; L193K+N248K; L193K+Q249R; L193K+Q249K; L193K+N251R; L193K+N251K; Y194R+T199R; Y194R+T199K; Y194R+N200R; Y194R+N200K; Y194R+I202R; Y194R+I202K; Y194R+S217R; Y194R+S217K; Y194R+P218R; Y194R+P218K; Y194R+Y220R; Y194R+Y220K; Y194R+W221R; Y194R+W221K; Y194R+S224*; Y194R+S224R; Y194R+S224K; Y194R+S225*; Y194R+S225R; Y194R+S225K; Y194R+T226*; Y194R+T226R; Y194R+T226K; Y194R+L227*; Y194R+L227R; Y194R+L227K; Y194R+V228*; Y194R+V228R; Y194R+V228K; Y194R+P229*; Y194R+P229R; Y194R+P229K; Y194R+V230*; Y194R+V230K; Y194R+V230R; Y194R+T231R; Y194R+T231K; Y194R+R232RR; Y194R+N233R; Y194R+N233K; Y194R+D234*; Y194R+D234R; Y194R+D234K; Y194R+V236K; Y194R+V236R; Y194R+I238R; Y194R+I238K; Y194R+E239*; Y194R+E239R; Y194R+E239K; Y194R+A243R; Y194R+A243K; Y194R+T244R; Y194R+T244K; Y194R+G245R; Y194R+G245K; Y194R+N248R; Y194R+N248K; Y194R+Q249R; Y194R+Q249K; Y194R+N251R; Y194R+N251K; Y194K+T199R; Y194K+T199K; Y194K+N200R; Y194K+N200K; Y194K+I202R; Y194K+I202K; Y194K+S217R; Y194K+S217K; Y194K+P218R; Y194K+P218K; Y194K+Y220R; Y194K+Y220K; Y194K+W221R; Y194K+W221K; Y194K+S224*; Y194K+S224R; Y194K+S224K; Y194K+S225*; Y194K+S225R; Y194K+S225K; Y194K+T226*; Y194K+T226R; Y194K+T226K; Y194K+L227*; Y194K+L227R; Y194K+L227K; Y194K+V228*; Y194K+V228R; Y194K+V228K; Y194K+P229*; Y194K+P229R; Y194K+P229K; Y194K+V230*; Y194K+V230K; Y194K+V230R; Y194K+T231R; Y194K+T231K; Y194K+R232RR; Y194K+N233R; Y194K+N233K; Y194K+D234*; Y194K+D234R; Y194K+D234K; Y194K+V236K; Y194K+V236R; Y194K+I238R; Y194K+I238K; Y194K+E239*; Y194K+E239R; Y194K+E239K; Y194K+A243R; Y194K+A243K; Y194K+T244R; Y194K+T244K; Y194K+G245R; Y194K+G245K; Y194K+N248R; Y194K+N248K; Y194K+Q249R; Y194K+Q249K; Y194K+N251R; Y194K+N251K; T199R+N200R; T199R+N200K; T199R+I202R; T199R+I202K; T199R+S217R; T199R+S217K; T199R+P218R; T199R+P218K; T199R+Y220R; T199R+Y220K; T199R+W221R; T199R+W221K; T199R+S224*; T199R+S224R; T199R+S224K; T199R+S225*; T199R+S225R; T199R+S225K; T199R+T226*; T199R+T226R; T199R+T226K; T199R+L227*; T199R+L227R; T199R+L227K; T199R+V228*; T199R+V228R; T199R+V228K; T199R+P229*; T199R+P229R; T199R+P229K; T199R+V230*; T199R+V230K; T199R+V230R; T199R+T231R; T199R+T231K; T199R+R232RR; T199R+N233R; T199R+N233K; T199R+D234*; T199R+D234R; T199R+D234K; T199R+V236K; T199R+V236R; T199R+I238R; T199R+I238K; T199R+E239*; T199R+E239R; T199R+E239K; T199R+A243R; T199R+A243K; T199R+T244R; T199R+T244K; T199R+G245R; T199R+G245K; T199R+N248R; T199R+N248K; T199R+Q249R; T199R+Q249K; T199R+N251R; T199R+N251K; T199K+N200R; T199K+N200K; T199K+I202R; T199K+I202K; T199K+S217R; T199K+S217K; T199K+P218R; T199K+P218K; T199K+Y220R; T199K+Y220K; T199K+W221R; T199K+W221K; T199K+S224*; T199K+S224R; T199K+S224K; T199K+S225*; T199K+S225R; T199K+S225K; T199K+T226*; T199K+T226R; T199K+T226K; T199K+L227*; T199K+L227R; T199K+L227K; T199K+V228*; T199K+V228R; T199K+V228K; T199K+P229*; T199K+P229R; T199K+P229K; T199K+V230*; T199K+V230K; T199K+V230R; T199K+T231R; T199K+T231K; T199K+R232RR; T199K+N233R; T199K+N233K; T199K+D234*; T199K+D234R; T199K+D234K; T199K+V236K; T199K+V236R; T199K+I238R; T199K+I238K; T199K+E239*; T199K+E239R; T199K+E239K; T199K+A243R; T199K+A243K; T199K+T244R; T199K+T244K; T199K+G245R; T199K+G245K; T199K+N248R; T199K+N248K; T199K+Q249R; T199K+Q249K; T199K+N251R; T199K+N251K; N200R+I202R; N200R+I202K; N200R+S217R; N200R+S217K; N200R+P218R; N200R+P218K; N200R+Y220R; N200R+Y220K; N200R+W221R; N200R+W221K; N200R+S224*; N200R+S224R; N200R+S224K; N200R+S225*; N200R+S225R; N200R+S225K; N200R+T226*; N200R+T226R; N200R+T226K; N200R+L227*; N200R+L227R; N200R+L227K; N200R+V228*; N200R+V228R; N200R+V228K; N200R+P229*; N200R+P229R; N200R+P229K; N200R+V230*; N200R+V230K; N200R+V230R; N200R+T231R; N200R+T231K; N200R+R232RR; N200R+N233R; N200R+N233K; N200R+D234*; N200R+D234R; N200R+D234K; N200R+V236K; N200R+V236R; N200R+I238R; N200R+I238K; N200R+E239*; N200R+E239R; N200R+E239K; N200R+A243R; N200R+A243K; N200R+T244R; N200R+T244K; N200R+G245R; N200R+G245K; N200R+N248R; N200R+N248K; N200R+Q249R; N200R+Q249K; N200R+N251R; N200R+N251K; N200K+I202R; N200K+I202K; N200K+S217R; N200K+S217K; N200K+P218R; N200K+P218K; N200K+Y220R; N200K+Y220K; N200K+W221R; N200K+W221K; N200K+S224*; N200K+S224R; N200K+S224K; N200K+S225*; N200K+S225R; N200K+S225K; N200K+T226*; N200K+T226R; N200K+T226K; N200K+L227*; N200K+L227R; N200K+L227K; N200K+V228*; N200K+V228R; N200K+V228K; N200K+P229*; N200K+P229R; N200K+P229K; N200K+V230*; N200K+V230K; N200K+V230R; N200K+T231R; N200K+T231K; N200K+R232RR; N200K+N233R; N200K+N233K; N200K+D234*; N200K+D234R; N200K+D234K; N200K+V236K; N200K+V236R; N200K+I238R; N200K+I238K; N200K+E239*; N200K+E239R; N200K+E239K; N200K+A243R; N200K+A243K; N200K+T244R; N200K+T244K; N200K+G245R; N200K+G245K; N200K+N248R; N200K+N248K; N200K+Q249R; N200K+Q249K; N200K+N251R; N200K+N251K; I202R+S217R; I202R+S217K; I202R+P218R; I202R+P218K; I202R+Y220R; I202R+Y220K; I202R+W221R; I202R+W221K; I202R+S224*; 1202R+S224R; I202R+S224K; I202R+S225*; 1202R+S225R; I202R+S225K; I202R+T226*; 1202R+T226R; I202R+T226K; I202R+L227*; 1202R+L227R; I202R+L227K; I202R+V228*; 1202R+V228R; I202R+V228K; I202R+P229*; 1202R+P229R; I202R+P229K; I202R+V230*; I202R+V230K; I202R+V230R; I202R+T231R; I202R+T231K; I202R+R232RR; I202R+N233R; I202R+N233K; I202R+D234*; 1202R+D234R; I202R+D234K; I202R+V236K; I202R+V236R; I202R+I238R; I202R+I238K; I202R+E239*; 1202R+E239R; I202R+E239K; I202R+A243R; I202R+A243K; I202R+T244R; I202R+T244K; I202R+G245R; I202R+G245K; I202R+N248R; I202R+N248K; I202R+Q249R; I202R+Q249K; I202R+N251R; I202R+N251K; I202K+S217R; I202K+S217K; I202K+P218R; I202K+P218K; I202K+Y220R; I202K+Y220K; I202K+W221R; I202K+W221K; I202K+S224*; 1202K+S224R; I202K+S224K; I202K+S225*; 1202K+S225R; I202K+S225K; I202K+T226*; 1202K+T226R; I202K+T226K; I202K+L227*; 1202K+L227R; I202K+L227K; I202K+V228*; 1202K+V228R; I202K+V228K; I202K+P229*; 1202K+P229R; I202K+P229K; I202K+V230*; 1202K+V230K; I202K+V230R; I202K+T231R; I202K+T231K; I202K+R232RR; I202K+N233R; I202K+N233K; I202K+D234*; 1202K+D234R; I202K+D234K; I202K+V236K; I202K+V236R; I202K+I238R; I202K+I238K; I202K+E239*; 1202K+E239R; I202K+E239K; I202K+A243R; I202K+A243K; I202K+T244R; I202K+T244K; I202K+G245R; I202K+G245K; I202K+N248R; I202K+N248K; I202K+Q249R; I202K+Q249K; I202K+N251R; I202K+N251K; S217R+P218R; S217R+P218K; S217R+Y220R; S217R+Y220K; S217R+W221R; S217R+W221K; S217R+S224*; S217R+S224R; S217R+S224K; S217R+S225*; S217R+S225R; S217R+S225K; S217R+T226*; S217R+T226R; S217R+T226K; S217R+L227*; S217R+L227R; S217R+L227K; S217R+V228*; S217R+V228R; S217R+V228K; S217R+P229*; S217R+P229R; S217R+P229K; S217R+V230*; S217R+V230K; S217R+V230R; S217R+T231R; S217R+T231K; S217R+R232RR; S217R+N233R; S217R+N233K; S217R+D234*; S217R+D234R; S217R+D234K; S217R+V236K; S217R+V236R; S217R+I238R; S217R+I238K; S217R+E239*; S217R+E239R; S217R+E239K; S217R+A243R; S217R+A243K; S217R+T244R; S217R+T244K; S217R+G245R; S217R+G245K; S217R+N248R; S217R+N248K; S217R+Q249R; S217R+Q249K; S217R+N251R; S217R+N251K; S217K+P218R; S217K+P218K; S217K+Y220R; S217K+Y220K; S217K+W221R; S217K+W221K; S217K+S224*; S217K+S224R; S217K+S224K; S217K+S225*; S217K+S225R; S217K+S225K; S217K+T226*; S217K+T226R; S217K+T226K; 217K+L227*; S217K+L227R; S217K+L227K; S217K+V228*; S217K+V228R; S217K+V228K; S217K+P229*; S217K+P229R; S217K+P229K; S217K+V230*; S217K+V230K; S217K+V230R; S217K+T231R; S217K+T231K; S217K+R232RR; S217K+N233R; S217K+N233K; S217K+D234*; S217K+D234R; S217K+D234K; S217K+V236K; S217K+V236R; S217K+I238R; S217K+I238K; S217K+E239*; S217K+E239R; S217K+E239K; S217K+A243R; S217K+A243K; S217K+T244R; S217K+T244K; S217K+G245R; S217K+G245K; S217K+N248R; S217K+N248K; S217K+Q249R; S217K+Q249K; S217K+N251R; S217K+N251K; P218R+Y220R; P218R+Y220K; P218R+W221R; P218R+W221K; P218R+S224*; P218R+S224R; P218R+S224K; P218R+S225*; P218R+S225R; P218R+S225K; P218R+T226*; P218R+T226R; P218R+T226K; P218R+L227*; P218R+L227R; P218R+L227K; P218R+V228*; P218R+V228R; P218R+V228K; P218R+P229*; P218R+P229R; P218R+P229K; P218R+V230*; P218R+V230K; P218R+V230R; P218R+T231R; P218R+T231K; P218R+R232RR; P218R+N233R; P218R+N233K; P218R+D234*; P218R+D234R; P218R+D234K; P218R+V236K; P218R+V236R; P218R+I238R; P218R+I238K; P218R+E239*; P218R+E239R; P218R+E239K; P218R+A243R; P218R+A243K; P218R+T244R; P218R+T244K; P218R+G245R; P218R+G245K; P218R+N248R; P218R+N248K; P218R+Q249R; P218R+Q249K; P218R+N251R; P218R+N251K; P218K+Y220R; P218K+Y220K; P218K+W221R; P218K+W221K; P218K+S224*; P218K+S224R; P218K+S224K; P218K+S225*; P218K+S225R; P218K+S225K; P218K+T226*; P218K+T226R; P218K+T226K; P218K+L227*; P218K+L227R; P218K+L227K; P218K+V228*; P218K+V228R; P218K+V228K; P218K+P229*; P218K+P229R; P218K+P229K; P218K+V230*; P218K+V230K; P218K+V230R; P218K+T231R; P218K+T231K; P218K+R232RR; P218K+N233R; P218K+N233K; P218K+D234*; P218K+D234R; P218K+D234K; P218K+V236K; P218K+V236R; P218K+I238R; P218K+I238K; P218K+E239*; P218K+E239R; P218K+E239K; P218K+A243R; P218K+A243K; P218K+T244R; P218K+T244K; P218K+G245R; P218K+G245K; P218K+N248R; P218K+N248K; P218K+Q249R; P218K+Q249K; P218K+N251R; P218K+N251K; Y220R+W221R; Y220R+W221K; Y220R+S224*; Y220R+S224R; Y220R+S224K; Y220R+S225*; Y220R+S225R; Y220R+S225K; Y220R+T226*; Y220R+T226R; Y220R+T226K; Y220R+L227*; Y220R+L227R; Y220R+L227K; Y220R+V228*; Y220R+V228R; Y220R+V228K; Y220R+P229*; Y220R+P229R; Y220R+P229K; Y220R+V230*; Y220R+V230K; Y220R+V230R; Y220R+T231R; Y220R+T231K; Y220R+R232RR; Y220R+N233R; Y220R+N233K; Y220R+D234*; Y220R+D234R; Y220R+D234K; Y220R+V236K; Y220R+V236R; Y220R+I238R; Y220R+I238K; Y220R+E239*; Y220R+E239R; Y220R+E239K; Y220R+A243R; Y220R+A243K; Y220R+T244R; Y220R+T244K; Y220R+G245R; Y220R+G245K; Y220R+N248R; Y220R+N248K; Y220R+Q249R; Y220R+Q249K; Y220R+N251R; Y220R+N251K; Y220K+W221R; Y220K+W221K; Y220K+S224*; Y220K+S224R; Y220K+S224K; Y220K+S225*; Y220K+S225R; Y220K+S225K; Y220K+T226*; Y220K+T226R; Y220K+T226K; Y220K+L227*; Y220K+L227R; Y220K+L227K; Y220K+V228*; Y220K+V228R; Y220K+V228K; Y220K+P229*; Y220K+P229R; Y220K+P229K; Y220K+V230*; Y220K+V230K; Y220K+V230R; Y220K+T231R; Y220K+T231K; Y220K+R232RR; Y220K+N233R; Y220K+N233K; Y220K+D234*; Y220K+D234R; Y220K+D234K; Y220K+V236K; Y220K+V236R; Y220K+I238R; Y220K+I238K; Y220K+E239*; Y220K+E239R; Y220K+E239K; Y220K+A243R; Y220K+A243K; Y220K+T244R; Y220K+T244K; Y220K+G245R; Y220K+G245K; Y220K+N248R; Y220K+N248K; Y220K+Q249R; Y220K+Q249K; Y220K+N251R; Y220K+N251K; W221R+S224*; W221R+S224R; W221R+S224K; W221R+S225*; W221R+S225R; W221R+S225K; W221R+T226*; W221R+T226R; W221R+T226K; W221R+L227*; W221R+L227R; W221R+L227K; W221R+V228*; W221R+V228R; W221R+V228K; W221R+P229*; W221R+P229R; W221R+P229K; W221R+V230*; W221R+V230K; W221R+V230R; W221R+T231R; W221R+T231K; W221R+R232RR; W221R+N233R; W221R+N233K; W221R+D234*; W221R+D234R; W221R+D234K; W221R+V236K; W221R+V236R; W221R+I238R; W221R+I238K; W221R+E239*; W221R+E239R; W221R+E239K; W221R+A243R; W221R+A243K; W221R+T244R; W221R+T244K; W221R+G245R; W221R+G245K; W221R+N248R; W221R+N248K; W221R+Q249R; W221R+Q249K; W221R+N251R; W221R+N251K; W221K+S224*; W221K+S224R; W221K+S224K; W221K+S225*; W221K+S225R; W221K+S225K; W221K+T226*; W221K+T226R; W221K+T226K; W221K+L227*; W221K+L227R; W221K+L227K; W221K+V228*; W221K+V228R; W221K+V228K; W221K+P229*; W221K+P229R; W221K+P229K; W221K+V230*; W221K+V230K; W221K+V230R; W221K+T231R; W221K+T231K; W221K+R232RR; W221K+N233R; W221K+N233K; W221K+D234*; W221K+D234R; W221K+D234K; W221K+V236K; W221K+V236R; W221K+I238R; W221K+I238K; W221K+E239*; W221K+E239R; W221K+E239K; W221K+A243R; W221K+A243K; W221K+T244R; W221K+T244K; W221K+G245R; W221K+G245K; W221K+N248R; W221K+N248K; W221K+Q249R; W221K+Q249K; W221K+N251R; W221K+N251K; S224*+S225*; S224*+S225R; S224*+S225K; S224*+T226*; S224*+T226R; S224*+T226K; S224*+L227*; S224*+L227R; S224*+L227K; S224*+V228*; S224*+V228R; S224*+V228K; S224*+P229*; S224*+P229R; S224*+P229K; S224*+V230*; S224*+V230K; S224*+V230R; S224*+T231R; S224*+T231K; S224*+R232RR; S224*+N233R; S224*+N233K; S224*+D234*; S224*+D234R; S224*+D234K; S224*+V236K; S224*+V236R; S224*+I238R; S224*+I238K; S224*+E239*; S224*+E239R; S224*+E239K; S224*+A243R; S224*+A243K; S224*+T244R; S224*+T244K; S224*+G245R; S224*+G245K; S224*+N248R; S224*+N248K; S224*+Q249R; S224*+Q249K; S224*+N251R; S224*+N251K; S224R+S225*; S224R+S225R; S224R+S225K; S224R+T226*; S224R+T226R; S224R+T226K; S224R+L227*; S224R+L227R; S224R+L227K; S224R+V228*; S224R+V228R; S224R+V228K; S224R+P229*; S224R+P229R; S224R+P229K; S224R+V230*; S224R+V230K; S224R+V230R; S224R+T231R; S224R+T231K; S224R+R232RR; S224R+N233R; S224R+N233K; S224R+D234*; S224R+D234R; S224R+D234K; S224R+V236K; S224R+V236R; S224R+I238R; S224R+I238K; S224R+E239*; S224R+E239R; S224R+E239K; S224R+A243R; S224R+A243K; S224R+T244R; S224R+T244K; S224R+G245R; S224R+G245K; S224R+N248R; S224R+N248K; S224R+Q249R; S224R+Q249K; S224R+N251R; S224R+N251K; S224K+S225*; S224K+S225R; S224K+S225K; S224K+T226*; S224K+T226R; S224K+T226K; S224K+L227*; S224K+L227R; S224K+L227K′; S224K+V228*; S224K+V228R; S224K+V228K; S224K+P229*; S224K+P229R; S224K+P229K; S224K+V230*; S224K+V230K; S224K+V230R; S224K+T231R; S224K+T231K; S224K+R232RR; S224K+N233R; S224K+N233K; S224K+D234*; S224K+D234R; S224K+D234K; S224K+V236K; S224K+V236R; S224K+I238R; S224K+I238K; S224K+E239*; S224K+E239R; S224K+E239K; S224K+A243R; S224K+A243K; S224K+T244R; S224K+T244K; S224K+G245R; S224K+G245K; S224K+N248R; S224K+N248K; S224K+Q249R; S224K+Q249K; S224K+N251R; S224K+N251K; S225*+T226*; S225*+T226R; S225*+T226K; S225*+L227*; S225*+L227R; S225*+L227K; S225*+V228*; S225*+V228R; S225*+V228K; S225*+P229*; S225*+P229R; S225*+P229K; S225*+V230*; S225*+V230K; S225*+V230R; S225*+T231R; S225*+T231K; S225*+R232RR; S225*+N233R; S225*+N233K; S225*+D234*; S225*+D234R; S225*+D234K; S225*+V236K; S225*+V236R; S225*+I238R; S225*+I238K; S225*+E239*; S225*+E239R; S225*+E239K; S225*+A243R; S225*+A243K; S225*+T244R; S225*+T244K; S225*+G245R; S225*+G245K; S225*+N248R; S225*+N248K; S225*+Q249R; S225*+Q249K; S225*+N251R; S225*+N251K; S225R+T226*; S225R+T226R; S225R+T226K; S225R+L227*; S225R+L227R; S225R+L227K; S225R+V228*; S225R+V228R; S225R+V228K; S225R+P229*; S225R+P229R; S225R+P229K; S225R+V230*; S225R+V230K; S225R+V230R; S225R+T231R; S225R+T231K; S225R+R232RR; S225R+N233R; S225R+N233K; S225R+D234*; S225R+D234R; S225R+D234K; S225R+V236K; S225R+V236R; S225R+I238R; S225R+I238K; S225R+E239*; S225R+E239R; S225R+E239K; S225R+A243R; S225R+A243K; S225R+T244R; S225R+T244K; S225R+G245R; S225R+G245K; S225R+N248R; S225R+N248K; S225R+Q249R; S225R+Q249K; S225R+N251R; S225R+N251K; S225K+T226*; S225K+T226R; S225K+T226K; S225K+L227*; S225K+L227R; S225K+L227K; S225K+V228*; S225K+V228R; S225K+V228K; S225K+P229*; S225K+P229R; S225K+P229K; S225K+V230*; S225K+V230K; S225K+V230R; S225K+T231R; S225K+T231K; S225K+R232RR; S225K+N233R; S225K+N233K; S225K+D234*; S225K+D234R; S225K+D234K; S225K+V236K; S225K+V236R; S225K+I238R; S225K+I238K; S225K+E239*; S225K+E239R; S225K+E239K; S225K+A243R; S225K+A243K; S225K+T244R; S225K+T244K; S225K+G245R; S225K+G245K; S225K+N248R; S225K+N248K; S225K+Q249R; S225K+Q249K; S225K+N251R; S225K+N251K; T226*+L227*; T226*+L227R; T226*+L227K; T226*+V228*; T226*+V228R; T226*+V228K; T226*+P229*; T226*+P229R; T226*+P229K; T226*+V230*; T226*+V230K; T226*+V230R; T226*+T231R; T226*+T231K; T226*+R232RR; T226*+N233R; T226*+N233K; T226*+D234*; T226*+D234R; T226*+D234K; T226*+V236K; T226*+V236R; T226*+I238R; T226*+I238K; T226*+E239*; T226*+E239R; T226*+E239K; T226*+A243R; T226*+A243K; T226*+T244R; T226*+T244K; T226*+G245R; T226*+G245K; T226*+N248R; T226*+N248K; T226*+Q249R; T226*+Q249K; T226*+N251R; T226*+N251K; T226R+L227*; T226R+L227R; T226R+L227K; T226R+V228*; T226R+V228R; T226R+V228K; T226R+P229*; T226R+P229R; T226R+P229K; T226R+V230*; T226R+V230K; T226R+V230R; T226R+T231R; T226R+T231K; T226R+R232RR; T226R+N233R; T226R+N233K; T226R+D234*; T226R+D234R; T226R+D234K; T226R+V236K; T226R+V236R; T226R+I238R; T226R+I238K; T226R+E239*; T226R+E239R; T226R+E239K; T226R+A243R; T226R+A243K; T226R+T244R; T226R+T244K; T226R+G245R; T226R+G245K; T226R+N248R; T226R+N248K; T226R+Q249R; T226R+Q249K; T226R+N251R; T226R+N251K; T226K+L227*; T226K+L227R; T226K+L227K; T226K+V228*; T226K+V228R; T226K+V228K; T226K+P229*; T226K+P229R; T226K+P229K; T226K+V230*; T226K+V230K; T226K+V230R; T226K+T231R; T226K+T231K; T226K+R232RR; T226K+N233R; T226K+N233K; T226K+D234*; T226K+D234R; T226K+D234K; T226K+V236K; T226K+V236R; T226K+I238R; T226K+I238K; T226K+E239*; T226K+E239R; T226K+E239K; T226K+A243R; T226K+A243K; T226K+T244R; T226K+T244K; T226K+G245R; T226K+G245K; T226K+N248R; T226K+N248K; T226K+Q249R; T226K+Q249K; T226K+N251R; T226K+N251K L227*+V228*; L227*+V228R; L227*+V228K; L227*+P229*; L227*+P229R; L227*+P229K; L227*+V230*; L227*+V230K; L227*+V230R; L227*+T231R; L227*+T231K; L227*+R232RR; L227*+N233R; L227*+N233K; L227*+D234*; L227*+D234R; L227*+D234K; L227*+V236K; L227*+V236R; L227*+I238R; L227*+I238K; L227*+E239*; L227*+E239R; L227*+E239K; L227*+A243R; L227*+A243K; L227*+T244R; L227*+T244K; L227*+G245R; L227*+G245K; L227*+N248R; L227*+N248K; L227*+Q249R; L227*+Q249K; L227*+N251R; L227*+N251K; L227R+V228*; L227R+V228R; L227R+V228K; L227R+P229*; L227R+P229R; L227R+P229K; L227R+V230*; L227R+V230K; L227R+V230R; L227R+T231R; L227R+T231K; L227R+R232RR; L227R+N233R; L227R+N233K; L227R+D234*; L227R+D234R; L227R+D234K; L227R+V236K; L227R+V236R; L227R+I238R; L227R+I238K; L227R+E239*; L227R+E239R; L227R+E239K; L227R+A243R; L227R+A243K; L227R+T244R; L227R+T244K; L227R+G245R; L227R+G245K; L227R+N248R; L227R+N248K; L227R+Q249R; L227R+Q249K; L227R+N251R; L227R+N251K; L227K+V228*; L227K+V228R; L227K+V228K; L227K+P229*; L227K+P229R; L227K+P229K; L227K+V230*; L227K+V230K; L227K+V230R; L227K+T231R; L227K+T231K; L227K+R232RR; L227K+N233R; L227K+N233K; L227K+D234*; L227K+D234R; L227K+D234K; L227K+V236K; L227K+V236R; L227K+I238R; L227K+I238K; L227K+E239*; L227K+E239R; L227K+E239K; L227K+A243R; L227K+A243K; L227K+T244R; L227K+T244K; L227K+G245R; L227K+G245K; L227K+N248R; L227K+N248K; L227K+Q249R; L227K+Q249K; L227K+N251R; L227K+N251K; V228*+P229*; V228*+P229R; V228*+P229K; V228*+V230*; V228*+V230K; V228*+V230R; V228*+T231R; V228*+T231K; V228*+R232RR; V228*+N233R; V228*+N233K; V228*+D234*; V228*+D234R; V228*+D234K; V228*+V236K; V228*+V236R; V228*+I238R; V228*+I238K; V228*+E239*; V228*+E239R; V228*+E239K; V228*+A243R; V228*+A243K; V228*+T244R; V228*+T244K; V228*+G245R; V228*+G245K; V228*+N248R; V228*+N248K; V228*+Q249R; V228*+Q249K; V228*+N251R; V228*+N251K; V228R+P229*; V228R+P229R; V228R+P229K; V228R+V230*; V228R+V230K; V228R+V230R; V228R+T231R; V228R+T231K; V228R+R232RR; V228R+N233R; V228R+N233K; V228R+D234*; V228R+D234R; V228R+D234K; V228R+V236K; V228R+V236R; V228R+I238R; V228R+I238K; V228R+E239*; V228R+E239R; V228R+E239K; V228R+A243R; V228R+A243K; V228R+T244R; V228R+T244K; V228R+G245R; V228R+G245K; V228R+N248R; V228R+N248K; V228R+Q249R; V228R+Q249K; V228R+N251R; V228R+N251K; V228K+P229*; V228K+P229R; V228K+P229K; V228K+V230*; V228K+V230K; V228K+V230R; V228K+T231R; V228K+T231K; V228K+R232RR; V228K+N233R; V228K+N233K; V228K+D234*; V228K+D234R; V228K+D234K; V228K+V236K; V228K+V236R; V228K+I238R; V228K+I238K; V228K+E239*; V228K+E239R; V228K+E239K; V228K+A243R; V228K+A243K; V228K+T244R; V228K+T244K; V228K+G245R; V228K+G245K; V228K+N248R; V228K+N248K; V228K+Q249R; V228K+Q249K; V228K+N251R; V228K+N251K; P229*+V230*; P229*+V230K; P229*+V230R; P229*+T231R; P229*+T231K; P229*+R232RR; P229*+N233R; P229*+N233K; P229*+D234*; P229*+D234R; P229*+D234K; P229*+V236K; P229*+V236R; P229*+I238R; P229*+I238K; P229*+E239*; P229*+E239R; P229*+E239K; P229*+A243R; P229*+A243K; P229*+T244R; P229*+T244K; P229*+G245R; P229*+G245K; P229*+N248R; P229*+N248K; P229*+Q249R; P229*+Q249K; P229*+N251R; P229*+N251K; P229R+V230*; P229R+V230K; P229R+V230R; P229R+T231R; P229R+T231K; P229R+R232RR; P229R+N233R; P229R+N233K; P229R+D234*; P229R+D234R; P229R+D234K; P229R+V236K; P229R+V236R; P229R+I238R; P229R+I238K; P229R+E239*; P229R+E239R; P229R+E239K; P229R+A243R; P229R+A243K; P229R+T244R; P229R+T244K; P229R+G245R; P229R+G245K; P229R+N248R; P229R+N248K; P229R+Q249R; P229R+Q249K; P229R+N251R; P229R+N251K; P229K+V230*; P229K+V230K; P229K+V230R; P229K+T231R; P229K+T231K; P229K+R232RR; P229K+N233R; P229K+N233K; P229K+D234*; P229K+D234R; P229K+D234K; P229K+V236K; P229K+V236R; P229K+I238R; P229K+I238K; P229K+E239*; P229K+E239R; P229K+E239K; P229K+A243R; P229K+A243K; P229K+T244R; P229K+T244K; P229K+G245R; P229K+G245K; P229K+N248R; P229K+N248K; P229K+Q249R; P229K+Q249K; P229K+N251R; P229K+N251K; V230*+T231R; V230*+T231K; V230*+R232RR; V230*+N233R; V230*+N233K; V230*+D234*; V230*+D234R; V230*+D234K; V230*+V236K; V230*+V236R; V230*+I238R; V230*+I238K; V230*+E239*; V230*+E239R; V230*+E239K; V230*+A243R; V230*+A243K; V230*+T244R; V230*+T244K; V230*+G245R; V230*+G245K; V230*+N248R; V230*+N248K; V230*+Q249R; V230*+Q249K; V230*+N251R; V230*+N251K; V230K+T231R; V230K+T231K; V230K+R232RR; V230K+N233R; V230K+N233K; V230K+D234*; V230K+D234R; V230K+D234K; V230K+V236K; V230K+V236R; V230K+I238R; V230K+I238K; V230K+E239*; V230K+E239R; V230K+E239K; V230K+A243R; V230K+A243K; V230K+T244R; V230K+T244K; V230K+G245R; V230K+G245K; V230K+N248R; V230K+N248K; V230K+Q249R; V230K+Q249K; V230K+N251R; V230K+N251K; V230R+T231R; V230R+T231K; V230R+R232RR; V230R+N233R; V230R+N233K; V230R+D234*; V230R+D234R; V230R+D234K; V230R+V236K; V230R+V236R; V230R+I238R; V230R+I238K; V230R+E239*; V230R+E239R; V230R+E239K; V230R+A243R; V230R+A243K; V230R+T244R; V230R+T244K; V230R+G245R; V230R+G245K; V230R+N248R; V230R+N248K; V230R+Q249R; V230R+Q249K; V230R+N251R; V230R+N251K; T231R+R232RR; T231R+N233R; T231R+N233K; T231R+D234*; T231R+D234R; T231R+D234K; T231R+V236K; T231R+V236R; T231R+I238R; T231R+I238K; T231R+E239*; T231R+E239R; T231R+E239K; T231R+A243R; T231R+A243K; T231R+T244R; T231R+T244K; T231R+G245R; T231R+G245K; T231R+N248R; T231R+N248K; T231R+Q249R; T231R+Q249K; T231R+N251R; T231R+N251K; T231K+R232RR; T231K+N233R; T231K+N233K; T231K+D234*; T231K+D234R; T231K+D234K; T231K+V236K; T231K+V236R; T231K+I238R; T231K+I238K; T231K+E239*; T231K+E239R; T231K+E239K; T231K+A243R; T231K+A243K; T231K+T244R; T231K+T244K; T231K+G245R; T231K+G245K; T231K+N248R; T231K+N248K; T231K+Q249R; T231K+Q249K; T231K+N251R; T231K+N251K; R232RR+N233R; R232RR+N233K; R232RR+D234*; R232RR+D234R; R232RR+D234K; R232RR+V236K; R232RR+V236R; R232RR+I238R; R232RR+I238K; R232RR+E239*; R232RR+E239R; R232RR+E239K; R232RR+A243R; R232RR+A243K; R232RR+T244R; R232RR+T244K; R232RR+G245R; R232RR+G245K; R232RR+N248R; R232RR+N248K; R232RR+Q249R; R232RR+Q249K; R232RR+N251R; R232RR+N251K; N233R+D234*; N233R+D234R; N233R+D234K; N233R+V236K; N233R+V236R; 33R+I238R; N233R+I238K; N233R+E239*; N233R+E239R; N233R+E239K; N233R+A243R; N233R+A243K; N233R+T244R; N233R+T244K; N233R+G245R; N233R+G245K; N233R+N248R; N233R+N248K; N233R+Q249R; N233R+Q249K; N233R+N251R; N233R+N251K; N233K+D234*; N233K+D234R; N233K+D234K; N233K+V236K; 233K+V236R; N233K+I238R; N233K+I238K; N233K+E239*; N233K+E239R; N233K+E239K; N233K+A243R; N233K+A243K; N233K+T244R; N233K+T244K; N233K+G245R; N233K+G245K; N233K+N248R; N233K+N248K; N233K+Q249R; N233K+Q249K; N233K+N251R; N233K+N251K; D234*+V236K; D234*+V236R; D234*+I238R; D234*+I238K; D234*+E239*; D234*+E239R; D234*+E239K; D234*+A243R; D234*+A243K; D234*+T244R; D234*+T244K; D234*+G245R; D234*+G245K; D234*+N248R; D234*+N248K; D234*+Q249R; D234*+Q249K; D234*+N251R; D234*+N251K; D234R+D234K; D234R+V236K; D234R+V236R; D234R+I238R; D234R+I238K; D234R+E239*; D234R+E239R; D234R+E239K; D234R+A243R; D234R+A243K; D234R+T244R; D234R+T244K; D234R+G245R; D234R+G245K; D234R+N248R; D234R+N248K; D234R+Q249R; D234R+Q249K; D234R+N251R; D234R+N251K; D234K+V236K; D234K+V236R; D234K+I238R; D234K+I238KD234K+E239*; D234K+E239R; D234K+E239K; D234K+A243R; D234K+A243K; D234K+T244R; D234K+T244K; D234K+G245R; D234K+G245K; D234K+N248R; D234K+N248K; D234K+Q249R; D234K+Q249K; D234K+N251R; D234K+N251K; V236K+I238R; V236K+I238K; V236K+E239*; V236K+E239R; V236K+E239K; V236K+A243R; V236K+A243K; V236K+T244R; V236K+T244K; V236K+G245R; V236K+G245K; V236K+N248R; V236K+N248K; V236K+Q249R; V236K+Q249K; V236K+N251R; V236K+N251K; V236R+I238R; V236R+I238K; V236R+E239*; V236R+E239R; V236R+E239K; V236R+A243R; V236R+A243K; V236R+T244R; V236R+T244K; V236R+G245R; V236R+G245K; V236R+N248R; V236R+N248K; V236R+Q249R; V236R+Q249K; V236R+N251R; V236R+N251K; I238R+E239*; I238R+E239R; I238R+E239K; I238R+A243R; I238R+A243K; I238R+T244R; I238R+T244K; I238R+G245R; I238R+G245K; I238R+N248R; I238R+N248K; I238R+Q249R; I238R+Q249K; I238R+N251R; I238R+N251K; I238K+E239*; I238K+E239R; I238K+E239K; I238K+A243R; I238K+A243K; I238K+T244R; I238K+T244K; I238K+G245R; I238K+G245K; I238K+N248R; I238K+N248K; I238K+Q249R; I238K+Q249K; I238K+N251R; I238K+N251K; E239*+A243R; E239*+A243K; E239*+T244R; E239*+T244K; E239*+G245R; E239*+G245K; E239*+N248R; E239*+N248K; E239*+Q249R; E239*+Q249K; E239*+N251R; E239*+N251K; E239R+A243R; E239R+A243K; E239R+T244R; E239R+T244K; E239R+G245R; E239R+G245K; E239R+N248R; E239R+N248K; E239R+Q249R; E239R+Q249K; E239R+N251R; E239R+N251K; E239K+A243R; E239K+A243K; E239K+T244R; E239K+T244K; E239K+G245R; E239K+G245K; E239K+N248R; E239K+N248K; E239K+Q249R; E239K+Q249K; E239K+N251R; E239K+N251K; A243R+T244R; A243R+T244K; A243R+G245R; A243R+G245K; A243R+N248R; A243R+N248K; A243R+Q249R; A243R+Q249K; A243R+N251R; A243R+N251K; A243K+T244R; A243K+T244K; A243K+G245R; A243K+G245K; A243K+N248R; A243K+N248K; A243K+Q249R; A243K+Q249K; A243K+N251R; A243K+N251K; T244R+G245R; T244R+G245K; T244R+N248R; T244R+N248K; T244R+Q249R; T244R+Q249K; T244R+N251R; T244R+N251K; T244K+G245R; T244K+G245K; T244K+N248R; T244K+N248K; T244K+Q249R; T244K+Q249K; T244K+N251R; T244K+N251K; G245R+N248R; G245R+N248K; G245R+Q249R; G245R+Q249K; G245R+N251R; G245R+N251K; G245K+N248R; G245K+N248K; G245K+Q249R; G245K+Q249K; G245K+N251R; G245K+N251K; N248R+Q249R; N248R+Q249K; N248R+N251R; N248R+N251K; N248K+Q249R; N248K+Q249K; N248K+N251R; N248K+N251K; Q249R+N251R; Q249R+N251K; Q249K+N251R; and Q249K+N251K.

In another embodiment, the variant comprises or consists of (a) E1ER, E1P or E1Q, (b) V2*, V2K or V2R, +(c) S3* or S3R.

In another embodiment, the variant comprises or consists of (a) E1ER, E1P or E1Q, (b) V2*, V2K or V2R, +(c) Q4R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, +(c) T226* or T226R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, +(c) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, +(c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, +(c) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R+(c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, +(c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) V228* or V228R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) V228* or V228R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) P229* or P229R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, +(b) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, +(c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227*+L227R, +(c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227*+L227R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227*+L227R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) V228* or V228R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) V228* or V228R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) P229* or P229R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, and (c) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) V228* or V228R, +(c) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) V228* or V228R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) P229* or P229R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R, (b) V228* or V228R, at positions corresponding to positions 227, 228, and 229.

In another embodiment, the variant comprises or consists of (a) L227* or L227R, (b) V228* or V228R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R, (b) P229* or P229R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) V228* or V228R, (b) P229* or P229R, +(c) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T231TR or T231R, (b) G239* or G239E, +(c) Q249R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, +(d) L227* or L227R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, +(d) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) L227* or L227R, +(d) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) L227* or L227R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) L227* or L227R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, +(d) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (B) V228* or V228R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, +(d) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227* or L227R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227* or L227R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) V228* or V228R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, (c) V228* or V228R, +(d) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, (c) V228* or V228R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) V228* or V228R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) L227* or L227R, (b) V228* or V228R, (c) P229* or P229R, +(d) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, (d) L227* or L227R, +(e) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, (d) L227* or L227R, +(e) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, (d) L227* or L227R, +(e) V228* or V228R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, +(e) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) L227* or L227R, (c) V228* or V228R, (d) P229* or P229R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, +(e) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) V228* or V228R, (d) P229* or P229R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) L227* or L227R, (c) V228* or V228R, (d) P229* or P229R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) T226* or T226R, (b) L227* or L227R, (c) V228* or V228R, (d) P229* or P229R, +(e) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, (d) L227* or L227R, (e) V228* or V228R, +(f) P229* or P229R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) G225* or G225R, (c) T226* or T226R, (d) L227* or L227R, (e) V228* or V228R, +(f) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) S224* or S224R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, (e) P229* or P229R, +(f) V230* or V230R.

In another embodiment, the variant comprises or consists of (a) G225* or G225R, (b) T226* or T226R, (c) L227* or L227R, (d) V228* or V228R, (e) P229* or P229R, +(f) V230* or V230R.

In a third aspect, the present invention relates to lipase variants, comprising a substitution at two or more positions corresponding to positions 2, 3, 4, 5, 8, 11, 37, 38, 39, 43, 101, 105, 106, 178, 199, 200, 224, 225, 227, 228, 229, 231, 236, 239, 244, and 249 of SEQ ID NO: 1 with Arg, wherein the lipase variant has lipase activity.

Thus, in one embodiment, the variant comprises two substitutions corresponding to the substitutions selected from the group consisting of: E1R+V2R; E1R+V3R; E1R+Q4R; E1R+D5R; E1R+L6R; E1R+F7R; E1R+N8R; E1R+Q9R; E1R+N11R; E1R+L12R; E1R+Q15R; E1R+T37R; E1R+Q38R; E1R+N39R; E1R+A40R; E1R+P42R; E1R+E43R; E1R+E45R; E1R+N73R; E1R+D167R; E1R+T192R; E1R+L193R; E1R+Y194R; E1R+T199R; E1R+N200R; E1R+I202R; E1R+S217R; E1R+P218R; E1R+Y220R; E1R+W221R; E1R+S224R; E1R+S225R; E1R+T226R; E1R+L227R; E1R+V228R; E1R+P229R; E1R+V230R; E1R+T231R; E1R+N233R; E1R+D234R; E1R+V236R; E1R+I238R; E1R+E239R; E1R+A243R; E1R+T244R; E1R+G245R; E1R+N248R; E1R+Q249R; E1R+N251R; V2R+V3R; V2R+Q4R; V2R+D5R; V2R+L6R; V2R+F7R; V2R+N8R; V2R+Q9R; V2R+N11R; V2R+L12R; V2R+Q15R; V2R+T37R; V2R+Q38R; V2R+N39R; V2R+A40R; V2R+P42R; V2R+E43R; V2R+E45R; V2R+N73R; V2R+D167R; V2R+T192R; V2R+L193R; V2R+Y194R; V2R+T199R; V2R+N200R; V2R+I202R; V2R+S217R; V2R+P218R; V2R+Y220R; V2R+W221R; V2R+S224R; V2R+S225R; V2R+T226R; V2R+L227R; V2R+V228R; V2R+P229R; V2R+V230R; V2R+T231R; V2R+N233R; V2R+D234R; V2R+V236R; V2R+I238R; V2R+E239R; V2R+A243R; V2R+T244R; V2R+G245R; V2R+N248R; V2R+Q249R; V2R+N251R; V3R+Q4R; V3R+D5R; V3R+L6R; V3R+F7R; V3R+N8R; V3R+Q9R; V3R+N11R; V3R+L12R; V3R+Q15R; V3R+T37R; V3R+Q38R; V3R+N39R; V3R+A40R; V3R+P42R; V3R+E43R; V3R+E45R; V3R+N73R; V3R+D167R; V3R+T192R; V3R+L193R; V3R+Y194R; V3R+T199R; V3R+N200R; V3R+I202R; V3R+S217R; V3R+P218R; V3R+Y220R; V3R+W221R; V3R+S224R; V3R+S225R; V3R+T226R; V3R+L227R; V3R+V228R; V3R+P229R; V3R+V230R; V3R+T231R; V3R+N233R; V3R+D234R; V3R+V236R; V3R+I238R; V3R+E239R; V3R+A243R; V3R+T244R; V3R+G245R; V3R+N248R; V3R+Q249R; V3R+N251R; Q4R+D5R; Q4R+L6R; Q4R+F7R; Q4R+N8R; Q4R+Q9R; Q4R+N11R; Q4R+L12R; Q4R+Q15R; Q4R+T37R; Q4R+Q38R; Q4R+N39R; Q4R+A40R; Q4R+P42R; Q4R+E43R; Q4R+E45R; Q4R+N73R; Q4R+D167R; Q4R+T192R; Q4R+L193R; Q4R+Y194R; Q4R+T199R; Q4R+N200R; Q4R+I202R; Q4R+S217R; Q4R+P218R; Q4R+Y220R; Q4R+W221R; Q4R+S224R; Q4R+S225R; Q4R+T226R; Q4R+L227R; Q4R+V228R; Q4R+P229R; Q4R+V230R; Q4R+T231R; Q4R+N233R; Q4R+D234R; Q4R+V236R; Q4R+I238R; Q4R+E239R; Q4R+A243R; Q4R+T244R; Q4R+G245R; Q4R+N248R; Q4R+Q249R; Q4R+N251R; D5R+L6R; D5R+F7R; D5R+N8R; D5R+Q9R; D5R+N11R; D5R+L12R; D5R+Q15R; D5R+T37R; D5R+Q38R; D5R+N39R; D5R+A40R; D5R+P42R; D5R+E43R; D5R+E45R; D5R+N73R; D5R+D167R; D5R+T192R; D5R+L193R; D5R+Y194R; D5R+T199R; D5R+N200R; D5R+I202R; D5R+S217R; D5R+P218R; D5R+Y220R; D5R+W221R; D5R+S224R; D5R+S225R; D5R+T226R; D5R+L227R; D5R+V228R; D5R+P229R; D5R+V230R; D5R+T231R; D5R+N233R; D5R+D234R; D5R+V236R; D5R+I238R; D5R+E239R; D5R+A243R; D5R+T244R; D5R+G245R; D5R+N248R; D5R+Q249R; D5R+N251R; L6R+F7R; L6R+N8R; L6R+Q9R; L6R+N11R; L6R+L12R; L6R+Q15R; L6R+T37R; L6R+Q38R; L6R+N39R; L6R+A40R; L6R+P42R; L6R+E43R; L6R+E45R; L6R+N73R; L6R+D167R; L6R+T192R; L6R+L193R; L6R+Y194R; L6R+T199R; L6R+N200R; L6R+I202R; L6R+S217R; L6R+P218R; L6R+Y220R; L6R+W221R; L6R+S224R; L6R+S225R; L6R+T226R; L6R+L227R; L6R+V228R; L6R+P229R; L6R+V230R; L6R+T231R; L6R+N233R; L6R+D234R; L6R+V236R; L6R+I238R; L6R+E239R; L6R+A243R L6R+T244R; L6R+G245R; L6R+N248R; L6R+Q249R; L6R+N251R; F7R+N8R; F7R+Q9R; F7R+N11R; F7R+L12R; F7R+Q15R; F7R+T37R; F7R+Q38R; F7R+N39R; F7R+A40R; F7R+P42R; F7R+E43R; F7R+E45R; F7R+N73R; F7R+D167R; F7R+T192R; F7R+L193R; F7R+Y194R; F7R+T199R; F7R+N200R; F7R+I202R; F7R+S217R; F7R+P218R; F7R+Y220R; F7R+W221R; F7R+S224R; F7R+S225R; F7R+T226R; F7R+L227R; F7R+V228R; F7R+P229R; F7R+V230R; F7R+T231R; F7R+N233R; F7R+D234R; F7R+V236R; F7R+I238R; F7R+E239R; F7R+A243R; F7R+T244R; F7R+G245R; F7R+N248R; F7R+Q249R; F7R+N251R; N8R+Q9R; N8R+N11R; N8R+L12R; N8R+Q15R; N8R+T37R; N8R+Q38R; N8R+N39R; N8R+A40R; N8R+P42R; N8R+E43R; N8R+E45R; N8R+N73R; N8R+D167R; N8R+T192R; N8R+L193R; N8R+Y194R; N8R+T199R; N8R+N200R; N8R+I202R; N8R+S217R; N8R+P218R; N8R+Y220R; N8R+W221R; N8R+S224R; N8R+S225R; N8R+T226R; N8R+L227R; N8R+V228R; N8R+P229R; N8R+V230R; N8R+T231R; N8R+N233R; N8R+D234R; N8R+V236R; N8R+I238R; N8R+E239R; N8R+A243R; N8R+T244R; N8R+G245R; N8R+N248R; N8R+Q249R; N8R+N251R; Q9R+N11R; Q9R+L12R; Q9R+Q15R; Q9R+T37R; Q9R+Q38R; Q9R+N39R; Q9R+A40R; Q9R+P42R; Q9R+E43R; Q9R+E45R; Q9R+N73R; Q9R+D167R; Q9R+T192R; Q9R+L193R; Q9R+Y194R; Q9R+T199R; Q9R+N200R; Q9R+I202R; Q9R+S217R; Q9R+P218R; Q9R+Y220R; Q9R+W221R; Q9R+S224R; Q9R+S225R; Q9R+T226R; Q9R+L227R; Q9R+V228R; Q9R+P229R; Q9R+V230R; Q9R+T231R; Q9R+N233R; Q9R+D234R; Q9R+V236R; Q9R+I238R; Q9R+E239R; Q9R+A243R; Q9R+T244R; Q9R+G245R; Q9R+N248R; Q9R+Q249R; Q9R+N251R; N11R+L12R; N11R+Q15R; N11R+T37R; N11R+Q38R; N11R+N39R; N11R+A40R; N11R+P42R; N11R+E43R; N11R+E45R; N11R+N73R; N11R+D167R; N11R+T192R; N11R+L193R; N11R+Y194R; N11R+T199R; N11R+N200R; N11R+I202R; N11R+S217R; N11R+P218R; N11R+Y220R; N11R+W221R; N11R+S224R; N11R+S225R; N11R+T226R; N11R+L227R; N11R+V228R; N11R+P229R; N11R+V230R; N11R+T231R; N11R+N233R; N11R+D234R; N11R+V236R; N11R+I238R; N11R+E239R; N11R+A243R; N11R+T244R; N11R+G245R; N11R+N248R; N11R+Q249R; N11R+N251R; L12R+Q15R; L12R+T37R; L12R+Q38R; L12R+N39R; L12R+A40R; L12R+P42R; L12R+E43R; L12R+E45R; L12R+N73R; L12R+D167R; L12R+T192R; L12R+L193R; L12R+Y194R; L12R+T199R; L12R+N200R; L12R+I202R; L12R+S217R; L12R+P218R; L12R+Y220R; L12R+W221R; L12R+S224R; L12R+S225R; L12R+T226R; L12R+L227R; L12R+V228R; L12R+P229R; L12R+V230R; L12R+T231R; L12R+N233R; L12R+D234R; L12R+V236R; L12R+I238R; L12R+E239R; L12R+A243R; L12R+T244R; L12R+G245R; L12R+N248R; L12R+Q249R; L12R+N251R; Q15R+T37R; Q15R+Q38R; Q15R+N39R; Q15R+A40R; Q15R+P42R; Q15R+E43R; Q15R+E45R; Q15R+N73R; Q15R+D167R; Q15R+T192R; Q15R+L193R; Q15R+Y194R; Q15R+T199R; Q15R+N200R; Q15R+I202R; Q15R+S217R; Q15R+P218R; Q15R+Y220R; Q15R+W221R; Q15R+S224R; Q15R+S225R; Q15R+T226R; Q15R+L227R; Q15R+V228R; Q15R+P229R; Q15R+V230R; Q15R+T231R; Q15R+N233R; Q15R+D234R; Q15R+V236R; Q15R+I238R; Q15R+E239R; Q15R+A243R; Q15R+T244R; Q15R+G245R; Q15R+N248R; Q15R+Q249R; Q15R+N251R; T37R+Q38R; T37R+N39R; T37R+A40R; T37R+P42R; T37R+E43R; T37R+E45R; T37R+N73R; T37R+D167R; T37R+T192R; T37R+L193R; T37R+Y194R; T37R+T199R; T37R+N200R; T37R+I202R; T37R+S217R; T37R+P218R; T37R+Y220R; T37R+W221R; T37R+S224R; T37R+S225R; T37R+T226R; T37R+L227R; T37R+V228R; T37R+P229R; T37R+V230R; T37R+T231R; T37R+N233R; T37R+D234R; T37R+V236R; T37R+I238R; T37R+E239R; T37R+A243R; T37R+T244R; T37R+G245R; T37R+N248R; T37R+Q249R; T37R+N251R; Q38R+N39R; Q38R+A40R; Q38R+P42R; Q38R+E43R; Q38R+E45R; Q38R+N73R; Q38R+D167R; Q38R+T192R; Q38R+L193R; Q38R+Y194R; Q38R+T199R; Q38R+N200R; Q38R+I202R; Q38R+S217R; Q38R+P218R; Q38R+Y220R; Q38R+W221R; Q38R+S224R; Q38R+S225R; Q38R+T226R; Q38R+L227R; Q38R+V228R; Q38R+P229R; Q38R+V230R; Q38R+T231R; Q38R+N233R; Q38R+D234R; Q38R+V236R; Q38R+I238R; Q38R+E239R; Q38R+A243R; Q38R+T244R; Q38R+G245R; Q38R+N248R; Q38R+Q249R; Q38R+N251R; N39R+A40R; N39R+P42R; N39R+E43R; N39R+E45R; N39R+N73R; N39R+D167R; N39R+T192R; N39R+L193R; N39R+Y194R; N39R+T199R; N39R+N200R; N39R+I202R; N39R+S217R; N39R+P218R; N39R+Y220R; N39R+W221R; N39R+S224R; N39R+S225R; N39R+T226R; N39R+L227R; N39R+V228R; N39R+P229R; N39R+V230R; N39R+T231R; N39R+N233R; N39R+D234R; N39R+V236R; N39R+I238R; N39R+E239R; N39R+A243R; N39R+T244R; N39R+G245R; N39R+N248R; N39R+Q249R; N39R+N251R; A40R+P42R; A40R+E43R; A40R+E45R; A40R+N73R; A40R+D167R; A40R+T192R; A40R+L193R; A40R+Y194R; A40R+T199R; A40R+N200R; A40R+I202R; A40R+S217R; A40R+P218R; A40R+Y220R; A40R+W221R; A40R+S224R; A40R+S225R; A40R+T226R; A40R+L227R; A40R+V228R; A40R+P229R; A40R+V230R; A40R+T231R; A40R+N233R; A40R+D234R; A40R+V236R; A40R+I238R; A40R+E239R; A40R+A243R; A40R+T244R; A40R+G245R; A40R+N248R; A40R+Q249R; A40R+N251R; P42R+E43R; P42R+E45R; P42R+N73R; P42R+D167R; P42R+T192R; P42R+L193R; P42R+Y194R; P42R+T199R; P42R+N200R; P42R+I202R; P42R+S217R; P42R+P218R; P42R+Y220R; P42R+W221R; P42R+S224R; P42R+S225R; P42R+T226R; P42R+L227R; P42R+V228R; P42R+P229R; P42R+V230R; P42R+T231R; P42R+N233R; P42R+D234R; P42R+V236R; P42R+I238R; P42R+E239R; P42R+A243R; P42R+T244R; P42R+G245R; P42R+N248R; P42R+Q249R; P42R+N251R; E43R+E45R; E43R+N73R; E43R+D167R; E43R+T192R; E43R+L193R; E43R+Y194R; E43R+T199R; E43R+N200R; E43R+I202R; E43R+S217R; E43R+P218R; E43R+Y220R; E43R+W221R; E43R+S224R; E43R+S225R; E43R+T226R; E43R+L227R; E43R+V228R; E43R+P229R; E43R+V230R; E43R+T231R; E43R+N233R; E43R+D234R; E43R+V236R; E43R+I238R; E43R+E239R; E43R+A243R; E43R+T244R; E43R+G245R; E43R+N248R; E43R+Q249R; E43R+N251R; E45R+N73R; E45R+D167R; E45R+T192R; E45R+L193R; E45R+Y194R; E45R+T199R; E45R+N200R; E45R+I202R; E45R+S217R; E45R+P218R; E45R+Y220R; E45R+W221R; E45R+S224R; E45R+S225R; E45R+T226R; E45R+L227R; E45R+V228R; E45R+P229R; E45R+V230R; E45R+T231R; E45R+N233R; E45R+D234R; E45R+V236R; E45R+I238R; E45R+E239R; E45R+A243R; E45R+T244R; E45R+G245R; E45R+N248R; E45R+Q249R; E45R+N251R; N73R+D167R; N73R+T192R; N73R+L193R; N73R+Y194R; N73R+T199R; N73R+N200R; N73R+I202R; N73R+S217R; N73R+P218R; N73R+Y220R; N73R+W221R; N73R+S224R; N73R+S225R; N73R+T226R; N73R+L227R; N73R+V228R; N73R+P229R; N73R+V230R; N73R+T231R; N73R+N233R; N73R+D234R; N73R+V236R; N73R+I238R; N73R+E239R; N73R+A243R; N73R+T244R; N73R+G245R; N73R+N248R; N73R+Q249R; N73R+N251R; D167R+T192R; D167R+L193R; D167R+Y194R; D167R+T199R; D167R+N200R; D167R+I202R; D167R+S217R; D167R+P218R; D167R+Y220R; D167R+W221R; D167R+S224R; D167R+S225R; D167R+T226R; D167R+L227R; D167R+V228R; D167R+P229R; D167R+V230R; D167R+T231R; D167R+N233R; D167R+D234R; D167R+V236R; D167R+I238R; D167R+E239R; D167R+A243R; D167R+T244R; D167R+G245R; D167R+N248R; D167R+Q249R; D167R+N251R; T192R+L193R; T192R+Y194R; T192R+T199R; T192R+N200R; T192R+I202R; T192R+S217R; T192R+P218R; T192R+Y220R; T192R+W221R; T192R+S224R; T192R+S225R; T192R+T226R; T192R+L227R; T192R+V228R; T192R+P229R; T192R+V230R; T192R+T231R; T192R+N233R; T192R+D234R; T192R+V236R; T192R+I238R; T192R+E239R; T192R+A243R; T192R+T244R; T192R+G245R; T192R+N248R; T192R+Q249R; T192R+N251R; L193R+Y194R; L193R+T199R; L193R+N200R; L193R+I202R; L193R+S217R; L193R+P218R; L193R+Y220R; L193R+W221R; L193R+S224R; L193R+S225R; L193R+T226R; L193R+L227R; L193R+V228R; L193R+P229R; L193R+V230R; L193R+T231R; L193R+N233R; L193R+D234R; L193R+V236R; L193R+I238R; L193R+E239R; L193R+A243R; L193R+T244R; L193R+G245R; L193R+N248R; L193R+Q249R; L193R+N251R; Y194R+T199R; Y194R+N200R; Y194R+I202R; Y194R+S217R; Y194R+P218R; Y194R+Y220R; Y194R+W221R; Y194R+S224R; Y194R+S225R; Y194R+T226R; Y194R+L227R; Y194R+V228R; Y194R+P229R; Y194R+V230R; Y194R+T231R; Y194R+N233R; Y194R+D234R; Y194R+V236R; Y194R+I238R; Y194R+E239R; Y194R+A243R; Y194R+T244R; Y194R+G245R; Y194R+N248R; Y194R+Q249R; Y194R+N251R; T199R+N200R; T199R+I202R; T199R+S217R; T199R+P218R; T199R+Y220R; T199R+W221R; T199R+S224R; T199R+S225R; T199R+T226R; T199R+L227R; T199R+V228R; T199R+P229R; T199R+V230R; T199R+T231R; T199R+N233R; T199R+D234R; T199R+V236R; T199R+I238R; T199R+E239R; T199R+A243R; T199R+T244R; T199R+G245R; T199R+N248R; T199R+Q249R; T199R+N251R; N200R+I202R; N200R+S217R; N200R+P218R; N200R+Y220R; N200R+W221R; N200R+S224R; N200R+S225R; N200R+T226R; N200R+L227R; N200R+V228R; N200R+P229R; N200R+V230R; N200R+T231R; N200R+N233R; N200R+D234R; N200R+V236R; N200R+I238R; N200R+E239R; N200R+A243R; N200R+T244R; N200R+G245R; N200R+N248R; N200R+Q249R; N200R+N251R; I202R+S217R; I202R+P218R; I202R+Y220R; I202R+W221R; I202R+S224R; I202R+S225R; I202R+T226R; I202R+L227R; I202R+V228R; I202R+P229R; I202R+V230R; I202R+T231R; I202R+N233R; I202R+D234R; I202R+V236R; I202R+I238R; I202R+E239R; I202R+A243R; I202R+T244R; I202R+G245R; I202R+N248R; I202R+Q249R; I202R+N251R; S217R+P218R; S217R+Y220R; S217R+W221R; S217R+S224R; S217R+S225R; S217R+T226R; S217R+L227R; S217R+V228R; S217R+P229R; S217R+V230R; S217R+T231R; S217R+N233R; S217R+D234R; S217R+V236R; S217R+I238R; S217R+E239R; S217R+A243R; S217R+T244R; S217R+G245R; S217R+N248R; S217R+Q249R; S217R+N251R; P218R+Y220R; P218R+W221R; P218R+S224R; P218R+S225R; P218R+T226R; P218R+L227R; P218R+V228R; P218R+P229R; P218R+V230R; P218R+T231R; P218R+N233R; P218R+D234R; P218R+V236R; P218R+I238R; P218R+E239R; P218R+A243R; P218R+T244R; P218R+G245R; P218R+N248R; P218R+Q249R; P218R+N251R; Y220R+W221R; Y220R+S224R; Y220R+S225R; Y220R+T226R; Y220R+L227R; Y220R+V228R; Y220R+P229R; Y220R+V230R; Y220R+T231R; Y220R+N233R; Y220R+D234R; Y220R+V236R; Y220R+I238R; Y220R+E239R; Y220R+A243R; Y220R+T244R; Y220R+G245R; Y220R+N248R; Y220R+Q249R; Y220R+N251R; W221R+S224R; W221R+S225R; W221R+T226R; W221R+L227R; W221R+V228R; W221R+P229R; W221R+V230R; W221R+T231R; W221R+N233R; W221R+D234R; W221R+V236R; W221R+I238R; W221R+E239R; W221R+A243R; W221R+T244R; W221R+G245R; W221R+N248R; W221R+Q249R; W221R+N251R; S224R+S225R; S224R+T226R; S224R+L227R; S224R+V228R; S224R+P229R; S224R+V230R; S224R+T231R; S224R+N233R; S224R+D234R; S224R+V236R; S224R+I238R; S224R+E239R; S224R+A243R; S224R+T244R; S224R+G245R; S224R+N248R; S224R+Q249R; S224R+N251R; S225R+T226R; S225R+L227R; S225R+V228R; S225R+P229R; S225R+V230R; S225R+T231R; S225R+N233R; S225R+D234R; S225R+V236R; S225R+I238R; S225R+E239R; S225R+A243R; S225R+T244R; S225R+G245R; S225R+N248R; S225R+Q249R; S225R+N251R; T226R+L227R; T226R+V228R; T226R+P229R; T226R+V230R; T226R+T231R; T226R+N233R; T226R+D234R; T226R+V236R; T226R+I238R; T226R+E239R; T226R+A243R; T226R+T244R; T226R+G245R; T226R+N248R; T226R+Q249R; T226R+N251R; L227R+V228R; L227R+P229R; L227R+V230R; L227R+T231R; L227R+N233R; L227R+D234R; L227R+V236R; L227R+I238R; L227R+E239R; L227R+A243R; L227R+T244R; L227R+G245R; L227R+N248R; L227R+Q249R; L227R+N251R; V228R+P229R; V228R+V230R; V228R+T231R; V228R+N233R; V228R+D234R; V228R+V236R; V228R+I238R; V228R+E239R; V228R+A243R; V228R+T244R; V228R+G245R; V228R+N248R; V228R+Q249R; V228R+N251R; P229R+V230R; P229R+T231R; P229R+N233R; P229R+D234R; P229R+V236R; P229R+I238R; P229R+E239R; P229R+A243R; P229R+T244R; P229R+G245R; P229R+N248R; P229R+Q249R; P229R+N251R; V230R+T231R; V230R+N233R; V230R+D234R; V230R+V236R; V230R+I238R; V230R+E239R; V230R+A243R; V230R+T244R; V230R+G245R; V230R+N248R; V230R+Q249R; V230R+N251R; T231R+N233R; T231R+D234R; T231R+V236R; T231R+I238R; T231R+E239R; T231R+A243R; T231R+T244R; T231R+G245R; T231R+N248R; T231R+Q249R; T231R+N251R; N233R+D234R; N233R+V236R; N233R+I238R; N233R+E239R; N233R+A243R; N233R+T244R; N233R+G245R; N233R+N248R; N233R+Q249R; N233R+N251R; D234R+V236R; D234R+I238R; D234R+E239R; D234R+A243R; D234R+T244R; D234R+G245R; D234R+N248R; D234R+Q249R; D234R+N251R; V236R+I238R; V236R+E239R; V236R+A243R; V236R+T244R; V236R+G245R; V236R+N248R; V236R+Q249R; V236R+N251R; I238R+E239R; I238R+A243R; I238R+T244R; I238R+G245R; I238R+N248R; I238R+Q249R; I238R+N251R; E239R+A243R; E239R+T244R; E239R+G245R; E239R+N248R; E239R+Q249R; E239R+N251R; A243R+T244R; A243R+G245R; A243R+N248R; A243R+Q249R; A243R+N251R; T244R+G245R; T244R+N248R; T244R+Q249R; T244R+N251R; G245R+N248R; G245R+Q249R; G245R+N251R; N248R+Q249R; N248R+N251R; and Q249R+N251R.

In an embodiment of all three aspects, the variant has sequence identity of at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 91%, at least 92%, at least 93%, at least 94%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99%, but less than 100%, to the amino acid sequence of the parent lipase. In another embodiment, the variant has at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 91%, at least 92%, at least 93%, at least 94%, at least 95%, such as at least 96%, at least 97%, at least 98%, or at least 99%, but less than 100%, sequence identity to SEQ ID NO: 1. In one aspect, the number of modifications is 1-20, e.g., 1-10 and 1-5, such as 1, 2, 3, 4, 5, 6, 7, 8, 9 or 10 modifications.

The variants may further comprise one or more additional modifications at one or more other positions.

The amino acid changes may be of a minor nature, that is conservative amino acid substitutions or insertions that do not significantly affect the folding and/or activity of the protein; small deletions, typically of 1-30 amino acids; small amino- or carboxyl-terminal extensions, such as an amino-terminal methionine residue; a small linker peptide of up to 20-25 residues; or a small extension that facilitates purification by changing net charge or another function, such as a poly-histidine tract, an antigenic epitope or a binding domain.

Examples of conservative substitutions are within the groups of basic amino acids (arginine, lysine and histidine), acidic amino acids (glutamic acid and aspartic acid), polar amino acids (glutamine and asparagine), hydrophobic amino acids (leucine, isoleucine and valine), aromatic amino acids (phenylalanine, tryptophan and tyrosine), and small amino acids (glycine, alanine, serine, threonine and methionine). Amino acid substitutions that do not generally alter specific activity are known in the art and are described, for example, by H. Neurath and R. L. Hill, 1979, In, The Proteins, Academic Press, New York. Common substitutions are Ala/Ser, Val/Ile, Asp/Glu, Thr/Ser, Ala/Gly, Ala/Thr, Ser/Asn, Ala/Val, Ser/Gly, Tyr/Phe, Ala/Pro, Lys/Arg, Asp/Asn, Leu/Ile, Leu/Val, Ala/Glu, and Asp/Gly.

Alternatively, the amino acid changes are of such a nature that the physico-chemical properties of the polypeptides are altered. For example, amino acid changes may improve the thermal stability of the polypeptide, alter the substrate specificity, change the pH optimum, and the like.

For example, the lipase variant may further comprise one or more substitutions in the lid region corresponding to positions 81-99 of SEQ ID NO: 1, preferably R81Q; S83T; R84H; S85T; I86L, I86P, I86V, I86W; E87A, E87I, E87K, E87T, E87V; N88Q; I90L, I90M; G91A, G91L, G91N, G91Q, G91T; N92D, N92K; L93F; N94D, N94K, N94R; F95A, F95L, F95Y; D96E, D961, D96L, D96T: L97F, L97M, L97P; K98D, K98E, K98I, K98Q; and E99K.

The lipase variant also may further comprise one or more substitutions corresponding to any of positions selected from: 27, 33, 38, 51, 56, 57, 58, 60, 69, 101, 106, 111, 150, 163, 198, 210, 211, 216, 220, 254, 255, 256, 263, 264, 265, 266, 267, and 269 of SEQ ID NO: 1. In one aspect the lipase variant further comprises one or more substitutions selected from the group consisting of: 27N, 27R; 33K, 33Q; 38A; 51I, 51L, 51V; 56K, 56Q, 56R, 56S; 57G, 57N; 58A; 60S; 69R; 101R; 106K, 101R; 111A; 131T; 149G; 150G; 163K, 163S; 198S; 210K, 210Q; 211L; 216P; 220F; 254S; 255A, 255I, 255T; 256K, 256T, 256V; 263Q; 264A, 264F, 264W; 265T; 266D; 267A; and 269N.

In a specific preferred embodiment, the variant of the invention has one of the following set of modifications:

R232RR V236R + E239R S224* + G225* + T226* + L227R + V228R + V230* G225R + T231R T231R + E239R + Q249R G225R + L227R T199R + N200R Q4R + N8R E1Q + V2K G91T + N101R + G106R G225R + V228R E1ER T231TR E1* + V2R + S3R E1* + V2* + S3R E1* + V2* + S3* E1* + V2R E1* N233R + V236R T231R + V236R N200R + T231R N233R + Q249R G225R + N233R L227R + V236R N200R + L227R T226R + Q249R N200R + G225R G225R + T226R V236R + E239R S224R + G225R N8R + N11R G38R + N39R S224R + P229R T37R + G38R + N39R E1Q + V2K + Q4R T37R + N39R T37R + G38R S224R + L227R L227R + P229R E1P + V2* D5R + N8R N8R + E43R

In another specific preferred embodiment, the variant of the invention has one of the following set of modifications:

D234R V236R G225R P229R N33R T37R N39R A131T G245R Q249R G225* T226* L227R V228R E1* V2* E1* V2K V2* E1Q V2* E1ER V2R S224* G225* T226R L227R V228* S224* G225* T226* L227R P229R S224R G225R L227R V228* T231RR S224K G225K A30R N33R S224K P229K S224K G225K L227K V236K E239K T231R N233R T231R N233R D254S N39K P229R G38R P229R A30R G31R S105R G106R G106R N178R E210Q F211R P250R I252R Q249R P250R A243R G245R N233R A243AR T244TRR S105RR S105RR G106R T199KN200K P229R T231TR P229R V230VR P229PR T231TR T226R V228R E1P V2* Q4R N8R E1P D5R N8R D5R N11R Q4R N11R A28R P29R N178R A180R T37K G38K N39K G225GR G91T N101R S105R G91T D102R S105R S224R V228VR S224SRV228VR S224SR T226TR V228VR P229PR G91T E99R N101R S105R G91TG106R N178R T244TR E99R N101R G91T N101R D102R N101R D102R D102R S105R G91TG106R A180R D254R P256R L227LR

The variants of the invention have improved wash performance. In a preferred embodiment the variants has a BRF (Benefit Risk Factor) higher than 1 when compared to the lipase shown as SEQ ID NO: 1, such as higher than 2, such as higher than 3, such as higher than 4, such as higher than 5, such as higher than 6, such as higher than 7, such as higher than 8, such as higher than 9, such as higher than 10, such as higher than 11, such as higher than 12, such as higher than 13, such as higher than 14, such as higher than 15.

In an embodiment, BRF is determined in a detergent composition comprising an anionic surfactant, in particular a linear alkylbenzene sulfonate (LAS) and/or alcohol ethoxysulfate (AEOS).

In an embodiment, BRF is determined in a detergent composition comprising a nonionic surfactant, such as alcohol ethoxylate (AEO).

In an embodiment, BRF is determined in a detergent composition comprising one or more anionic and/or one or more nonionic surfactants.

In an embodiment, BRF is determined in a detergent composition comprising linear alkylbenzene sulfonate (LAS) and alcohol ethoxylate (AEO).

In an embodiment, BRF is determined using AMSA in Model Detergent J (6° dH, 0.8 g/L) and/or Model Detergent B (6° dH, 3.3 g/L) (See Example 3).

In an embodiment, a variant of the invention has one of the following set of modifications:

N200R + G225R G225R + N233R N200R + T231R T231R + E239R + Q249R G225R + T231R T37R + N39R T37R + G38R + N39R G38R + N39R G91T + N101R + G106R

In an embodiment, the variants have improved wash performance, in particular a Relative Wash Performance (RP) higher than 1, when compared to the lipase shown as SEQ ID NO: 1.

In an embodiment, the Relative Wash Performance (RP) is determined in a detergent composition comprising an anionic surfactant, in particular linear alkylbenzene sulfonate (LAS) and/or alcohol ethoxysulfate (AEOS).

In an embodiment, the Relative Wash Performance (RP) is determined in a detergent composition comprising nonionic surfactant, such as alcohol ethoxylate (AEO).

In an embodiment, the Relative Wash Performance (RP) is determined in a detergent composition comprising a nonionic surfactant, such as alcohol ethoxylate (AEO).

In an embodiment, the Relative Wash Performance (RP) is determined in a detergent composition comprising one or more anionic and/or one or more nonionic surfactants.

In an embodiment, the Relative Wash Performance (RP) is determined in a detergent composition comprising linear alkylbenzene sulfonate (LAS) and alcohol ethoxylate (AEO).

In an embodiment, the Relative Wash Performance is determined using AMSA in a detergent composition selected from the group of Model Detergent B, Detergent Diao, Model Detergent V, Model Detergent T, Model Detergent Y, and Model Detergent X (See Example 4).

Essential amino acids in a polypeptide can be identified according to procedures known in the art, such as site-directed mutagenesis or alanine-scanning mutagenesis (Cunningham and Wells, 1989, Science 244: 1081-1085). In the latter technique, single alanine mutations are introduced at every residue in the molecule, and the resultant mutant molecules are tested for lipase activity to identify amino acid residues that are critical to the activity of the molecule. See also, Hilton et al., 1996, J. Biol. Chem. 271: 4699-4708. The active site of the enzyme or other biological interaction can also be determined by physical analysis of structure, as determined by such techniques as nuclear magnetic resonance, crystallography, electron diffraction, or photoaffinity labeling, in conjunction with mutation of putative contact site amino acids. See, for example, de Vos et al., 1992, Science 255: 306-312; Smith et al., 1992, J. Mol. Biol. 224: 899-904; Wlodaver et al., 1992, FEBS Lett. 309: 59-64. The identity of essential amino acids can also be inferred from an alignment with a related polypeptide. The amino acids which form the catalytic triad of the lipase of SEQ ID NO: 1 are S146, D201, and H258, and should not be altered.

In an embodiment, the variant has improved wash performance compared to the parent enzyme.

In an embodiment, the variant has improved catalytic efficiency compared to the parent enzyme.

In an embodiment, the variant has improved catalytic rate compared to the parent enzyme.

In an embodiment, the variant has improved pH activity compared to the parent enzyme.

In an embodiment, the variant has improved pH stability compared to the parent enzyme.

In an embodiment, the variant has improved specific activity compared to the parent enzyme.

In an embodiment, the variant has improved stability under storage conditions compared to the parent enzyme.

In an embodiment, the variant has improved substrate binding compared to the parent enzyme.

In an embodiment, the variant has improved substrate cleavage compared to the parent enzyme.

In an embodiment, the variant has improved surface properties compared to the parent enzyme.

In an embodiment, the variant has improved thermostability compared to the parent enzyme.

Parent Lipases

The parent lipase is a polypeptide having at least 60% sequence identity to SEQ ID NO: 1, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 91%, at least 92%, at least 93%, at least 94%, at least 95%, at least 96%, at least 97%, at least 98%, at least 99%, or 100%, which have lipase activity. In one aspect, the amino acid sequence of the parent differs by up to 40 amino acids, e.g., 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, or 40 from SEQ ID NO: 1.

In one aspect, the parent comprises or consists of the amino acid sequence of SEQ ID NO: 1.

In one aspect, the parent is a fragment of SEQ ID NO: 1, containing at least 50%, at least 55%, at least 60%, at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, or at least 95% of the number of amino acids of SEQ ID NO: 1.

In one aspect, the parent is an allelic variant of the polypeptide of SEQ ID NO: 1.

The polypeptide may be a hybrid polypeptide in which a region of one polypeptide is fused at the N-terminus or the C-terminus of a region of another polypeptide.

The parent may be a fusion polypeptide or cleavable fusion polypeptide in which another polypeptide is fused at the N-terminus or the C-terminus of the polypeptide of the present invention. A fusion polypeptide is produced by fusing a polynucleotide encoding another polypeptide to a polynucleotide of the present invention. Techniques for producing fusion polypeptides are known in the art, and include ligating the coding sequences encoding the polypeptides so that they are in frame and that expression of the fusion polypeptide is under control of the same promoter(s) and terminator. Fusion polypeptides may also be constructed using intein technology in which fusion polypeptides are created post-translationally (Cooper et al., 1993, EMBO J. 12: 2575-2583; Dawson et al., 1994, Science 266: 776-779).

A fusion polypeptide can further comprise a cleavage site between the two polypeptides. Upon secretion of the fusion protein, the site is cleaved releasing the two polypeptides. Examples of cleavage sites include, but are not limited to, the sites disclosed in Martin et al., 2003, J. Ind. Microbiol. Biotechnol. 3: 568-576; Svetina et al., 2000, J. Biotechnol. 76: 245-251; Rasmussen-Wilson et al., 1997, Appl. Environ. Microbiol. 63: 3488-3493; Ward et al., 1995, Biotechnology 13: 498-503; and Contreras et al., 1991, Biotechnology 9: 378-381; Eaton et al., 1986, Biochemistry 25: 505-512; Collins-Racie et al., 1995, Biotechnology 13: 982-987; Carter et al., 1989, Proteins: Structure, Function, and Genetics 6: 240-248; and Stevens, 2003, Drug Discovery World 4: 35-48.

The parent may be obtained from microorganisms of any genus. For purposes of the present invention, the term “obtained from” as used herein in connection with a given source shall mean that the parent encoded by a polynucleotide is produced by the source or by a strain in which the polynucleotide from the source has been inserted. In one aspect, the parent is secreted extracellularly.

The parent may be a bacterial lipase. For example, the parent may be a Gram-positive bacterial polypeptide such as a Bacillus, Clostridium, Enterococcus, Geobacillus, Lactobacillus, Lactococcus, Oceanobacillus, Staphylococcus, Streptococcus, or Streptomyces lipase, or a Gram-negative bacterial polypeptide such as a Campylobacter, E. coli, Flavobacterium, Fusobacterium, Helicobacter, Ilyobacter, Neisseria, Pseudomonas, Salmonella, or Ureaplasma lipase.

In one aspect, the parent is a Bacillus alkalophilus, Bacillus amyloliquefaciens, Bacillus brevis, Bacillus circulans, Bacillus clausii, Bacillus coagulans, Bacillus firmus, Bacillus lautus, Bacillus lentus, Bacillus licheniformis, Bacillus megaterium, Bacillus pumilus, Bacillus stearothermophilus, Bacillus subtilis, or Bacillus thuringiensis lipase.

In another aspect, the parent is a Streptococcus equisimilis, Streptococcus pyogenes, Streptococcus uberis, or Streptococcus equi subsp. Zooepidemicus lipase.

In another aspect, the parent is a Streptomyces achromogenes, Streptomyces avermitilis, Streptomyces coelicolor, Streptomyces griseus, or Streptomyces lividans lipase.

The parent may be a fungal lipase. For example, the parent may be a yeast lipase such as a Candida, Kluyveromyces, Pichia, Saccharomyces, Schizosaccharomyces, or Yarrowia lipase; or a filamentous fungal lipase such as an Acremonium, Agaricus, Alternaria, Aspergillus, Aureobasidium, Botryosphaeria, Ceriporiopsis, Chaetomidium, Chrysosporium, Claviceps, Cochliobolus, Coprinopsis, Coptotermes, Corynascus, Cryphonectria, Cryptococcus, Diplodia, Exidia, Filibasidium, Fusarium, Gibberella, Holomastigotoides, Humicola, Irpex, Lentinula, Leptospaeria, Magnaporthe, Melanocarpus, Meripilus, Mucor, Myceliophthora, Neocallimastix, Neurospora, Paecilomyces, Penicillium, Phanerochaete, Piromyces, Poitrasia, Pseudoplectania, Pseudotrichonympha, Rhizomucor, Schizophyllum, Scytalidium, Talaromyces, Thermoascus, Thermomyces, Thielavia, Tolypocladium, Trichoderma, Trichophaea, Verticillium, Volvariella, or Xylaria lipase.

In another aspect, the parent is a Saccharomyces carlsbergensis, Saccharomyces cerevisiae, Saccharomyces diastaticus, Saccharomyces douglasii, Saccharomyces kluyveri, Saccharomyces norbensis, or Saccharomyces oviformis lipase.

In another aspect, the parent is an Acremonium cellulolyticus, Aspergillus aculeatus, Aspergillus awamori, Aspergillus foetidus, Aspergillus fumigatus, Aspergillus japonicus, Aspergillus nidulans, Aspergillus niger, Aspergillus oryzae, Chrysosporium inops, Chrysosporium keratinophilum, Chrysosporium lucknowense, Chrysosporium merdarium, Chrysosporium pannicola, Chrysosporium queenslandicum, Chrysosporium tropicum, Chrysosporium zonatum, Fusarium bactridioides, Fusarium cerealis, Fusarium crookwellense, Fusarium culmorum, Fusarium graminearum, Fusarium graminum, Fusarium heterosporum, Fusarium negundi, Fusarium oxysporum, Fusarium reticulatum, Fusarium roseum, Fusarium sambucinum, Fusarium sarcochroum, Fusarium sporotrichioides, Fusarium sulphureum, Fusarium torulosum, Fusarium trichothecioides, Fusarium venenatum, Humicola grisea, Humicola insolens, Humicola lanuginosa, Irpex lacteus, Mucor miehei, Myceliophthora thermophila, Neurospora crassa, Penicillium funiculosum, Penicillium purpurogenum, Phanerochaete chrysosporium, Thielavia achromatica, Thielavia albomyces, Thielavia albopilosa, Thielavia australeinsis, Thielavia fimeti, Thielavia microspora, Thielavia ovispora, Thielavia peruviana, Thielavia setosa, Thielavia spededonium, Thielavia subthermophila, Thielavia terrestris, Trichoderma harzianum, Trichoderma koningii, Trichoderma longibrachiatum, Trichoderma reesei, or Trichoderma viride lipase.

In one aspect, the parent is a Thermomyces lanuginosus (previously known as Humicola lanuginosa) lipase, e.g., the lipase of SEQ ID NO: 1.

It will be understood that for the aforementioned species, the invention encompasses both the perfect and imperfect states, and other taxonomic equivalents, e.g., anamorphs, regardless of the species name by which they are known. Those skilled in the art will readily recognize the identity of appropriate equivalents.

Strains of these species are readily accessible to the public in a number of culture collections, such as the American Type Culture Collection (ATCC), Deutsche Sammlung von Mikroorganismen and Zellkulturen GmbH (DSMZ), Centraalbureau Voor Schimmelcultures (CBS), and Agricultural Research Service Patent Culture Collection, Northern Regional Research Center (NRRL).

The parent may be identified and obtained from other sources including microorganisms isolated from nature (e.g., soil, composts, water, etc.) or DNA samples obtained directly from natural materials (e.g., soil, composts, water, etc.) using the above-mentioned probes. Techniques for isolating microorganisms and DNA directly from natural habitats are well known in the art. A polynucleotide encoding a parent may then be obtained by similarly screening a genomic DNA or cDNA library of another microorganism or mixed DNA sample. Once a polynucleotide encoding a parent has been detected with the probe(s), the polynucleotide can be isolated or cloned by utilizing techniques that are known to those of ordinary skill in the art (see, e.g., Sambrook et al., 1989, supra).

Preparation of Variants

The present invention also relates to methods for obtaining a variant having lipase activity, comprising: (a) introducing into a parent lipase a modification at one or more (e.g., several) positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256 of SEQ ID NO: 1, wherein the variant has lipase activity; and (b) recovering the variant.

The variants can be prepared using any mutagenesis procedure known in the art, such as site-directed mutagenesis, synthetic gene construction, semi-synthetic gene construction, random mutagenesis, shuffling, etc.

Site-directed mutagenesis is a technique in which one or more (e.g., several) mutations/modifications are introduced at one or more defined sites in a polynucleotide encoding the parent.

Site-directed mutagenesis can be accomplished in vitro by PCR involving the use of oligonucleotide primers containing the desired mutation. Site-directed mutagenesis can also be performed in vitro by cassette mutagenesis involving the cleavage by a restriction enzyme at a site in the plasmid comprising a polynucleotide encoding the parent and subsequent ligation of an oligonucleotide containing the mutation in the polynucleotide. Usually the restriction enzyme that digests the plasmid and the oligonucleotide is the same, permitting sticky ends of the plasmid and the insert to ligate to one another. See, e.g., Scherer and Davis, 1979, Proc. Natl. Acad. Sci. USA 76: 4949-4955; and Barton et al., 1990, Nucleic Acids Res. 18: 7349-4966.

Site-directed mutagenesis can also be accomplished in vivo by methods known in the art. See, e.g., U.S. Patent Application Publication No. 2004/0171154; Storici et al., 2001, Nature Biotechnol. 19: 773-776; Kren et al., 1998, Nat. Med. 4: 285-290; and Calissano and Macino, 1996, Fungal Genet. Newslett. 43: 15-16.

Any site-directed mutagenesis procedure can be used in the present invention. There are many commercial kits available that can be used to prepare variants.

Synthetic gene construction entails in vitro synthesis of a designed polynucleotide molecule to encode a polypeptide of interest. Gene synthesis can be performed utilizing a number of techniques, such as the multiplex microchip-based technology described by Tian et al. (2004, Nature 432: 1050-1054) and similar technologies wherein oligonucleotides are synthesized and assembled upon photo-programmable microfluidic chips.

Single or multiple amino acid substitutions, deletions, and/or insertions can be made and tested using known methods of mutagenesis, recombination, and/or shuffling, followed by a relevant screening procedure, such as those disclosed by Reidhaar-Olson and Sauer, 1988, Science 241: 53-57; Bowie and Sauer, 1989, Proc. Natl. Acad. Sci. USA 86: 2152-2156; WO 95/17413; or WO 95/22625. Other methods that can be used include error-prone PCR, phage display (e.g., Lowman et al., 1991, Biochemistry 30: 10832-10837; U.S. Pat. No. 5,223,409; WO 92/06204) and region-directed mutagenesis (Derbyshire et al., 1986, Gene 46: 145; Ner et al., 1988, DNA 7: 127).

Mutagenesis/shuffling methods can be combined with high-throughput, automated screening methods to detect activity of cloned, mutagenized polypeptides expressed by host cells (Ness et al., 1999, Nature Biotechnology 17: 893-896). Mutagenized DNA molecules that encode active polypeptides can be recovered from the host cells and rapidly sequenced using standard methods in the art. These methods allow the rapid determination of the importance of individual amino acid residues in a polypeptide.

Semi-synthetic gene construction is accomplished by combining aspects of synthetic gene construction, and/or site-directed mutagenesis, and/or random mutagenesis, and/or shuffling. Semi-synthetic construction is typified by a process utilizing polynucleotide fragments that are synthesized, in combination with PCR techniques. Defined regions of genes may thus be synthesized de novo, while other regions may be amplified using site-specific mutagenic primers, while yet other regions may be subjected to error-prone PCR or non-error prone PCR amplification. Polynucleotide subsequences may then be shuffled.

Polynucleotides

The present invention also relates to isolated polynucleotides encoding a variant of the present invention.

Nucleic Acid Constructs

The present invention also relates to nucleic acid constructs comprising a polynucleotide encoding a variant of the present invention operably linked to one or more control sequences that direct the expression of the coding sequence in a suitable host cell under conditions compatible with the control sequences.

The polynucleotide may be manipulated in a variety of ways to provide for expression of a variant. Manipulation of the polynucleotide prior to its insertion into a vector may be desirable or necessary depending on the expression vector. The techniques for modifying polynucleotides utilizing recombinant DNA methods are well known in the art.

The control sequence may be a promoter, a polynucleotide recognized by a host cell for expression of a polynucleotide encoding a variant of the present invention. The promoter contains transcriptional control sequences that mediate the expression of the variant. The promoter may be any polynucleotide that shows transcriptional activity in the host cell including mutant, truncated, and hybrid promoters, and may be obtained from genes encoding extracellular or intracellular polypeptides either homologous or heterologous to the host cell.

Examples of suitable promoters for directing transcription of the nucleic acid constructs of the present invention in a bacterial host cell are the promoters obtained from the Bacillus amyloliquefaciens alpha-amylase gene (amyQ), Bacillus licheniformis alpha-amylase gene (amyL), Bacillus licheniformis penicillinase gene (penP), Bacillus stearothermophilus maltogenic amylase gene (amyM), Bacillus subtilis levansucrase gene (sacB), Bacillus subtilis xylA and xylB genes, Bacillus thuringiensis crylllA gene (Agaisse and Lereclus, 1994, Molecular Microbiology 13: 97-107), E. coli lac operon, E. coli trc promoter (Egon et al., 1988, Gene 69: 301-315), Streptomyces coelicolor agarase gene (dagA), and prokaryotic beta-lactamase gene (Villa-Kamaroff et al., 1978, Proc. Natl. Acad. Sci. USA 75: 3727-3731), as well as the tac promoter (DeBoer et al., 1983, Proc. Natl. Acad. Sci. USA 80: 21-25). Further promoters are described in “Useful proteins from recombinant bacteria” in Gilbert et al., 1980, Scientific American 242: 74-94; and in Sambrook et al., 1989, supra. Examples of tandem promoters are disclosed in WO 99/43835.

Examples of suitable promoters for directing transcription of the nucleic acid constructs of the present invention in a filamentous fungal host cell are promoters obtained from the genes for Aspergillus nidulans acetamidase, Aspergillus niger neutral alpha-amylase, Aspergillus niger acid stable alpha-amylase, Aspergillus niger or Aspergillus awamori glucoamylase (glaA), Aspergillus oryzae TAKA amylase, Aspergillus oryzae alkaline protease, Aspergillus oryzae triose phosphate isomerase, Fusarium oxysporum trypsin-like protease (WO 96/00787), Fusarium venenatum amyloglucosidase (WO 00/56900), Fusarium venenatum Dania (WO 00/56900), Fusarium venenatum Quinn (WO 00/56900), Rhizomucor miehei lipase, Rhizomucor miehei aspartic proteinase, Trichoderma reesei beta-glucosidase, Trichoderma reesei cellobiohydrolase I, Trichoderma reesei cellobiohydrolase II, Trichoderma reesei endoglucanase I, Trichoderma reesei endoglucanase II, Trichoderma reesei endoglucanase III, Trichoderma reesei endoglucanase V, Trichoderma reesei xylanase I, Trichoderma reesei xylanase II, Trichoderma reesei xylanase III, Trichoderma reesei beta-xylosidase, and Trichoderma reesei translation elongation factor, as well as the NA2-tpi promoter (a modified promoter from an Aspergillus neutral alpha-amylase gene in which the untranslated leader has been replaced by an untranslated leader from an Aspergillus triose phosphate isomerase gene; non-limiting examples include modified promoters from an Aspergillus niger neutral alpha-amylase gene in which the untranslated leader has been replaced by an untranslated leader from an Aspergillus nidulans or Aspergillus oryzae triose phosphate isomerase gene); and mutant, truncated, and hybrid promoters thereof. Other promoters are described in U.S. Pat. No. 6,011,147.

In a yeast host, useful promoters are obtained from the genes for Saccharomyces cerevisiae enolase (ENO-1), Saccharomyces cerevisiae galactokinase (GAL1), Saccharomyces cerevisiae alcohol dehydrogenase/glyceraldehyde-3-phosphate dehydrogenase (ADH1, ADH2/GAP), Saccharomyces cerevisiae triose phosphate isomerase (TPI), Saccharomyces cerevisiae metallothionein (CUP1), and Saccharomyces cerevisiae 3-phosphoglycerate kinase. Other useful promoters for yeast host cells are described by Romanos et al., 1992, Yeast 8: 423-488.

The control sequence may also be a transcription terminator, which is recognized by a host cell to terminate transcription. The terminator is operably linked to the 3′-terminus of the polynucleotide encoding the variant. Any terminator that is functional in the host cell may be used in the present invention.

Preferred terminators for bacterial host cells are obtained from the genes for Bacillus clausii alkaline protease (aprH), Bacillus licheniformis alpha-amylase (amyL), and Escherichia coli ribosomal RNA (rrnB).

Preferred terminators for filamentous fungal host cells are obtained from the genes for Aspergillus nidulans acetamidase, Aspergillus nidulans anthranilate synthase, Aspergillus niger glucoamylase, Aspergillus niger alpha-glucosidase, Aspergillus oryzae TAKA amylase, Fusarium oxysporum trypsin-like protease, Trichoderma reesei beta-glucosidase, Trichoderma reesei cellobiohydrolase I, Trichoderma reesei cellobiohydrolase II, Trichoderma reesei endoglucanase I, Trichoderma reesei endoglucanase II, Trichoderma reesei endoglucanase III, Trichoderma reesei endoglucanase V, Trichoderma reesei xylanase I, Trichoderma reesei xylanase II, Trichoderma reesei xylanase III, Trichoderma reesei beta-xylosidase, and Trichoderma reesei translation elongation factor.

Preferred terminators for yeast host cells are obtained from the genes for Saccharomyces cerevisiae enolase, Saccharomyces cerevisiae cytochrome C (CYC1), and Saccharomyces cerevisiae glyceraldehyde-3-phosphate dehydrogenase. Other useful terminators for yeast host cells are described by Romanos et al., 1992, supra.

The control sequence may also be an mRNA stabilizer region downstream of a promoter and upstream of the coding sequence of a gene which increases expression of the gene.

Examples of suitable mRNA stabilizer regions are obtained from a Bacillus thuringiensis crylllA gene (WO 94/25612) and a Bacillus subtilis SP82 gene (Hue et al., 1995, Journal of Bacteriology 177: 3465-3471).

The control sequence may also be a leader, a nontranslated region of an mRNA that is important for translation by the host cell. The leader is operably linked to the 5′-terminus of the polynucleotide encoding the variant. Any leader that is functional in the host cell may be used.

Preferred leaders for filamentous fungal host cells are obtained from the genes for Aspergillus oryzae TAKA amylase and Aspergillus nidulans triose phosphate isomerase.

Suitable leaders for yeast host cells are obtained from the genes for Saccharomyces cerevisiae enolase (ENO-1), Saccharomyces cerevisiae 3-phosphoglycerate kinase, Saccharomyces cerevisiae alpha-factor, and Saccharomyces cerevisiae alcohol dehydrogenase/glyceraldehyde-3-phosphate dehydrogenase (ADH2/GAP).

The control sequence may also be a polyadenylation sequence, a sequence operably linked to the 3′-terminus of the polynucleotide and, when transcribed, is recognized by the host cell as a signal to add polyadenosine residues to transcribed mRNA. Any polyadenylation sequence that is functional in the host cell may be used.

Preferred polyadenylation sequences for filamentous fungal host cells are obtained from the genes for Aspergillus nidulans anthranilate synthase, Aspergillus niger glucoamylase, Aspergillus niger alpha-glucosidase Aspergillus oryzae TAKA amylase, and Fusarium oxysporum trypsin-like protease.

Useful polyadenylation sequences for yeast host cells are described by Guo and Sherman, 1995, Mol. Cellular Biol. 15: 5983-5990.

The control sequence may also be a signal peptide coding region that encodes a signal peptide linked to the N-terminus of a variant and directs the variant into the cell's secretory pathway. The 5′-end of the coding sequence of the polynucleotide may inherently contain a signal peptide coding sequence naturally linked in translation reading frame with the segment of the coding sequence that encodes the variant. Alternatively, the 5′-end of the coding sequence may contain a signal peptide coding sequence that is foreign to the coding sequence. A foreign signal peptide coding sequence may be required where the coding sequence does not naturally contain a signal peptide coding sequence. Alternatively, a foreign signal peptide coding sequence may simply replace the natural signal peptide coding sequence in order to enhance secretion of the variant. However, any signal peptide coding sequence that directs the expressed variant into the secretory pathway of a host cell may be used.

Effective signal peptide coding sequences for bacterial host cells are the signal peptide coding sequences obtained from the genes for Bacillus NCIB 11837 maltogenic amylase, Bacillus licheniformis subtilisin, Bacillus licheniformis beta-lactamase, Bacillus stearothermophilus alpha-amylase, Bacillus stearothermophilus neutral proteases (nprT, nprS, nprM), and Bacillus subtilis prsA. Further signal peptides are described by Simonen and Palva, 1993, Microbiological Reviews 57: 109-137.

Effective signal peptide coding sequences for filamentous fungal host cells are the signal peptide coding sequences obtained from the genes for Aspergillus niger neutral amylase, Aspergillus niger glucoamylase, Aspergillus oryzae TAKA amylase, Humicola insolens cellulase, Humicola insolens endoglucanase V, Humicola lanuginosa lipase, and Rhizomucor miehei aspartic proteinase.

Useful signal peptides for yeast host cells are obtained from the genes for Saccharomyces cerevisiae alpha-factor and Saccharomyces cerevisiae invertase. Other useful signal peptide coding sequences are described by Romanos et al., 1992, supra.

The control sequence may also be a propeptide coding sequence that encodes a propeptide positioned at the N-terminus of a variant. The resultant polypeptide is known as a proenzyme or propolypeptide (or a zymogen in some cases). A propolypeptide is generally inactive and can be converted to an active variant by catalytic or autocatalytic cleavage of the propeptide from the propolypeptide. The propeptide coding sequence may be obtained from the genes for Bacillus subtilis alkaline protease (aprE), Bacillus subtilis neutral protease (nprT), Myceliophthora thermophila laccase (WO 95/33836), Rhizomucor miehei aspartic proteinase, and Saccharomyces cerevisiae alpha-factor.

Where both signal peptide and propeptide sequences are present, the propeptide sequence is positioned next to the N-terminus of a variant and the signal peptide sequence is positioned next to the N-terminus of the propeptide sequence.

It may also be desirable to add regulatory sequences that regulate expression of the variant relative to the growth of the host cell. Examples of regulatory sequences are those that cause expression of the gene to be turned on or off in response to a chemical or physical stimulus, including the presence of a regulatory compound. Regulatory sequences in prokaryotic systems include the lac, tac, and trp operator systems. In yeast, the ADH2 system or GAL1 system may be used. In filamentous fungi, the Aspergillus niger glucoamylase promoter, Aspergillus oryzae TAKA alpha-amylase promoter, and Aspergillus oryzae glucoamylase promoter, Trichoderma reesei cellobiohydrolase I promoter, and Trichoderma reesei cellobiohydrolase II promoter may be used. Other examples of regulatory sequences are those that allow for gene amplification. In eukaryotic systems, these regulatory sequences include the dihydrofolate reductase gene that is amplified in the presence of methotrexate, and the metallothionein genes that are amplified with heavy metals. In these cases, the polynucleotide encoding the variant would be operably linked to the regulatory sequence.

Expression Vectors

The present invention also relates to recombinant expression vectors comprising a polynucleotide encoding a variant of the present invention, a promoter, and transcriptional and translational stop signals. The various nucleotide and control sequences may be joined together to produce a recombinant expression vector that may include one or more convenient restriction sites to allow for insertion or substitution of the polynucleotide encoding the variant at such sites. Alternatively, the polynucleotide may be expressed by inserting the polynucleotide or a nucleic acid construct comprising the polynucleotide into an appropriate vector for expression. In creating the expression vector, the coding sequence is located in the vector so that the coding sequence is operably linked with the appropriate control sequences for expression.

The recombinant expression vector may be any vector (e.g., a plasmid or virus) that can be conveniently subjected to recombinant DNA procedures and can bring about expression of the polynucleotide. The choice of the vector will typically depend on the compatibility of the vector with the host cell into which the vector is to be introduced. The vector may be a linear or closed circular plasmid.

The vector may be an autonomously replicating vector, i.e., a vector that exists as an extrachromosomal entity, the replication of which is independent of chromosomal replication, e.g., a plasmid, an extrachromosomal element, a minichromosome, or an artificial chromosome. The vector may contain any means for assuring self-replication. Alternatively, the vector may be one that, when introduced into the host cell, is integrated into the genome and replicated together with the chromosome(s) into which it has been integrated. Furthermore, a single vector or plasmid or two or more vectors or plasmids that together contain the total DNA to be introduced into the genome of the host cell, or a transposon, may be used.

The vector preferably contains one or more selectable markers that permit easy selection of transformed, transfected, transduced, or the like cells. A selectable marker is a gene the product of which provides for biocide or viral resistance, resistance to heavy metals, prototrophy to auxotrophs, and the like.

Examples of bacterial selectable markers are Bacillus licheniformis or Bacillus subtilis dal genes, or markers that confer antibiotic resistance such as ampicillin, chloramphenicol, kanamycin, neomycin, spectinomycin, or tetracycline resistance. Suitable markers for yeast host cells include, but are not limited to, ADE2, HIS3, LEU2, LYS2, MET3, TRP1, and URA3. Selectable markers for use in a filamentous fungal host cell include, but are not limited to, adeA (phosphoribosylaminoimidazole-succinocarboxamide synthase), adeB (phosphoribosyl-am inoimidazole synthase), amdS (acetamidase), argB (ornithine carbamoyltransferase), bar (phosphinothricin acetyltransferase), hph (hygromycin phosphotransferase), niaD (nitrate reductase), pyrG (orotidine-5′-phosphate decarboxylase), sC (sulfate adenyltransferase), and trpC (anthranilate synthase), as well as equivalents thereof. Preferred for use in an Aspergillus cell are Aspergillus nidulans or Aspergillus oryzae amdS and pyrG genes and a Streptomyces hygroscopicus bar gene. Preferred for use in a Trichoderma cell are adeA, adeB, amdS, hph, and pyrG genes.

The selectable marker may be a dual selectable marker system as described in WO 2010/039889. In one aspect, the dual selectable marker is a hph-tk dual selectable marker system.

The vector preferably contains an element(s) that permits integration of the vector into the host cell's genome or autonomous replication of the vector in the cell independent of the genome.

For integration into the host cell genome, the vector may rely on the polynucleotide's sequence encoding the variant or any other element of the vector for integration into the genome by homologous or non-homologous recombination. Alternatively, the vector may contain additional polynucleotides for directing integration by homologous recombination into the genome of the host cell at a precise location(s) in the chromosome(s). To increase the likelihood of integration at a precise location, the integrational elements should contain a sufficient number of nucleic acids, such as 100 to 10,000 base pairs, 400 to 10,000 base pairs, and 800 to 10,000 base pairs, which have a high degree of sequence identity to the corresponding target sequence to enhance the probability of homologous recombination. The integrational elements may be any sequence that is homologous with the target sequence in the genome of the host cell. Furthermore, the integrational elements may be non-encoding or encoding polynucleotides. On the other hand, the vector may be integrated into the genome of the host cell by non-homologous recombination.

For autonomous replication, the vector may further comprise an origin of replication enabling the vector to replicate autonomously in the host cell in question. The origin of replication may be any plasmid replicator mediating autonomous replication that functions in a cell. The term “origin of replication” or “plasmid replicator” means a polynucleotide that enables a plasmid or vector to replicate in vivo.

Examples of bacterial origins of replication are the origins of replication of plasmids pBR322, pUC19, pACYC177, and pACYC184 permitting replication in E. coli, and pUB110, pE194, pTA1060, and pAMß1 permitting replication in Bacillus.

Examples of origins of replication for use in a yeast host cell are the 2 micron origin of replication, ARS1, ARS4, the combination of ARS1 and CEN3, and the combination of ARS4 and CEN6.

Examples of origins of replication useful in a filamentous fungal cell are AMA1 and ANSI (Gems et al., 1991, Gene 98: 61-67; Cullen et al., 1987, Nucleic Acids Res. 15: 9163-9175; WO 00/24883). Isolation of the AMA1 gene and construction of plasmids or vectors comprising the gene can be accomplished according to the methods disclosed in WO 00/24883.

More than one copy of a polynucleotide of the present invention may be inserted into a host cell to increase production of a variant. An increase in the copy number of the polynucleotide can be obtained by integrating at least one additional copy of the sequence into the host cell genome or by including an amplifiable selectable marker gene with the polynucleotide where cells containing amplified copies of the selectable marker gene, and thereby additional copies of the polynucleotide, can be selected for by cultivating the cells in the presence of the appropriate selectable agent.

The procedures used to ligate the elements described above to construct the recombinant expression vectors of the present invention are well known to one skilled in the art (see, e.g., Sambrook et al., 1989, supra).

Host Cells

The present invention also relates to recombinant host cells, comprising a polynucleotide encoding a variant of the present invention operably linked to one or more control sequences that direct the production of a variant of the present invention. A construct or vector comprising a polynucleotide is introduced into a host cell so that the construct or vector is maintained as a chromosomal integrant or as a self-replicating extra-chromosomal vector as described earlier. The term “host cell” encompasses any progeny of a parent cell that is not identical to the parent cell due to mutations that occur during replication. The choice of a host cell will to a large extent depend upon the gene encoding the variant and its source.

The host cell may be any cell useful in the recombinant production of a variant, e.g., a prokaryote or a eukaryote.

The prokaryotic host cell may be any Gram-positive or Gram-negative bacterium. Gram-positive bacteria include, but are not limited to, Bacillus, Clostridium, Enterococcus, Geobacillus, Lactobacillus, Lactococcus, Oceanobacillus, Staphylococcus, Streptococcus, and Streptomyces. Gram-negative bacteria include, but are not limited to, Campylobacter, E. coli, Flavobacterium, Fusobacterium, Helicobacter, Ilyobacter, Neisseria, Pseudomonas, Salmonella, and Ureaplasma.

The bacterial host cell may be any Bacillus cell including, but not limited to, Bacillus alkalophilus, Bacillus amyloliquefaciens, Bacillus brevis, Bacillus circulans, Bacillus clausii, Bacillus coagulans, Bacillus firmus, Bacillus lautus, Bacillus lentus, Bacillus licheniformis, Bacillus megaterium, Bacillus pumilus, Bacillus stearothermophilus, Bacillus subtilis, and Bacillus thuringiensis cells.

The bacterial host cell may also be any Streptococcus cell including, but not limited to, Streptococcus equisimilis, Streptococcus pyogenes, Streptococcus uberis, and Streptococcus equi subsp. Zooepidemicus cells.

The bacterial host cell may also be any Streptomyces cell, including, but not limited to, Streptomyces achromogenes, Streptomyces avermitilis, Streptomyces coelicolor, Streptomyces griseus, and Streptomyces lividans cells.

The introduction of DNA into a Bacillus cell may be effected by protoplast transformation (see, e.g., Chang and Cohen, 1979, Mol. Gen. Genet. 168: 111-115), competent cell transformation (see, e.g., Young and Spizizen, 1961, J. Bacteriol. 81: 823-829, or Dubnau and Davidoff-Abelson, 1971, J. Mol. Biol. 56: 209-221), electroporation (see, e.g., Shigekawa and Dower, 1988, Biotechniques 6: 742-751), or conjugation (see, e.g., Koehler and Thorne, 1987, J. Bacteriol. 169: 5271-5278). The introduction of DNA into an E. coli cell may be effected by protoplast transformation (see, e.g., Hanahan, 1983, J. Mol. Biol. 166: 557-580) or electroporation (see, e.g., Dower et al., 1988, Nucleic Acids Res. 16: 6127-6145). The introduction of DNA into a Streptomyces cell may be effected by protoplast transformation, electroporation (see, e.g., Gong et al., 2004, Folia Microbiol. (Praha) 49: 399-405), conjugation (see, e.g., Mazodier et al., 1989, J. Bacteriol. 171: 3583-3585), or transduction (see, e.g., Burke et al., 2001, Proc. Natl. Acad. Sci. USA 98: 6289-6294). The introduction of DNA into a Pseudomonas cell may be effected by electroporation (see, e.g., Choi et al., 2006, J. Microbiol. Methods 64: 391-397), or conjugation (see, e.g., Pinedo and Smets, 2005, Appl. Environ. Microbiol. 71: 51-57). The introduction of DNA into a Streptococcus cell may be effected by natural competence (see, e.g., Perry and Kuramitsu, 1981, Infect. Immun. 32: 1295-1297), protoplast transformation (see, e.g., Catt and Jollick, 1991, Microbios 68: 189-207), electroporation (see, e.g., Buckley et al., 1999, Appl. Environ. Microbiol. 65: 3800-3804), or conjugation (see, e.g., Clewell, 1981, Microbiol. Rev. 45: 409-436). However, any method known in the art for introducing DNA into a host cell can be used.

The host cell may also be a eukaryote, such as a mammalian, insect, plant, or fungal cell.

The host cell may be a fungal cell. “Fungi” as used herein includes the phyla Ascomycota, Basidiomycota, Chytridiomycota, and Zygomycota as well as the Oomycota and all mitosporic fungi (as defined by Hawksworth et al., In, Ainsworth and Bisby's Dictionary of The Fungi, 8th edition, 1995, CAB International, University Press, Cambridge, UK).

The fungal host cell may be a yeast cell. “Yeast” as used herein includes ascosporogenous yeast (Endomycetales), basidiosporogenous yeast, and yeast belonging to the Fungi Imperfecti (Blastomycetes). Since the classification of yeast may change in the future, for the purposes of this invention, yeast shall be defined as described in Biology and Activities of Yeast (Skinner, Passmore, and Davenport, editors, Soc. App. Bacteriol. Symposium Series No. 9, 1980).

The yeast host cell may be a Candida, Hansenula, Kluyveromyces, Pichia, Saccharomyces, Schizosaccharomyces, or Yarrowia cell such as a Kluyveromyces lactis, Saccharomyces carlsbergensis, Saccharomyces cerevisiae, Saccharomyces diastaticus, Saccharomyces douglasii, Saccharomyces kluyveri, Saccharomyces norbensis, Saccharomyces oviformis, or Yarrowia lipolytica cell.

The fungal host cell may be a filamentous fungal cell. “Filamentous fungi” include all filamentous forms of the subdivision Eumycota and Oomycota (as defined by Hawksworth et al., 1995, supra). The filamentous fungi are generally characterized by a mycelial wall composed of chitin, cellulose, glucan, chitosan, mannan, and other complex polysaccharides. Vegetative growth is by hyphal elongation and carbon catabolism is obligately aerobic. In contrast, vegetative growth by yeasts such as Saccharomyces cerevisiae is by budding of a unicellular thallus and carbon catabolism may be fermentative.

The filamentous fungal host cell may be an Acremonium, Aspergillus, Aureobasidium, Bjerkandera, Ceriporiopsis, Chrysosporium, Coprinus, Coriolus, Cryptococcus, Filibasidium, Fusarium, Humicola, Magnaporthe, Mucor, Myceliophthora, Neocallimastix, Neurospora, Paecilomyces, Penicillium, Phanerochaete, Phlebia, Piromyces, Pleurotus, Schizophyllum, Talaromyces, Thermoascus, Thielavia, Tolypocladium, Trametes, or Trichoderma cell.

For example, the filamentous fungal host cell may be an Aspergillus awamori, Aspergillus foetidus, Aspergillus fumigatus, Aspergillus japonicus, Aspergillus nidulans, Aspergillus niger, Aspergillus oryzae, Bjerkandera adusta, Ceriporiopsis aneirina, Ceriporiopsis caregiea, Ceriporiopsis gilvescens, Ceriporiopsis pannocinta, Ceriporiopsis rivulosa, Ceriporiopsis subrufa, Ceriporiopsis subvermispora, Chrysosporium inops, Chrysosporium keratinophilum, Chrysosporium lucknowense, Chrysosporium merdarium, Chrysosporium pannicola, Chrysosporium queenslandicum, Chrysosporium tropicum, Chrysosporium zonatum, Coprinus cinereus, Coriolus hirsutus, Fusarium bactridioides, Fusarium cerealis, Fusarium crookwellense, Fusarium culmorum, Fusarium graminearum, Fusarium graminum, Fusarium heterosporum, Fusarium negundi, Fusarium oxysporum, Fusarium reticulatum, Fusarium roseum, Fusarium sambucinum, Fusarium sarcochroum, Fusarium sporotrichioides, Fusarium sulphureum, Fusarium torulosum, Fusarium trichothecioides, Fusarium venenatum, Humicola insolens, Humicola lanuginosa, Mucor miehei, Myceliophthora thermophila, Neurospora crassa, Penicillium purpurogenum, Phanerochaete chrysosporium, Phlebia radiata, Pleurotus eryngii, Thielavia terrestris, Trametes villosa, Trametes versicolor, Trichoderma harzianum, Trichoderma koningii, Trichoderma longibrachiatum, Trichoderma reesei, or Trichoderma viride cell. Fungal cells may be transformed by a process involving protoplast formation, transformation of the protoplasts, and regeneration of the cell wall in a manner known per se. Suitable procedures for transformation of Aspergillus and Trichoderma host cells are described in EP 238023, Yelton et al., 1984, Proc. Natl. Acad. Sci. USA 81: 1470-1474, and Christensen et al., 1988, Bio/Technology 6: 1419-1422. Suitable methods for transforming Fusarium species are described by Malardier et al., 1989, Gene 78: 147-156, and WO 96/00787. Yeast may be transformed using the procedures described by Becker and Guarente, In Abelson, J. N. and Simon, M.I., editors, Guide to Yeast Genetics and Molecular Biology, Methods in Enzymology, Volume 194, pp 182-187, Academic Press, Inc., New York; Ito et al., 1983, J. Bacteriol. 153: 163; and Hinnen et al., 1978, Proc. Natl. Acad. Sci. USA 75: 1920.

Methods of Production

The present invention also relates to methods of producing a variant, comprising (a) cultivating a recombinant host cell of the present invention under conditions conducive for production of the variant; and optionally (b) recovering the variant.

The host cells are cultivated in a nutrient medium suitable for production of the variant using methods known in the art. For example, the cells may be cultivated by shake flask cultivation, or small-scale or large-scale fermentation (including continuous, batch, fed-batch, or solid state fermentations) in laboratory or industrial fermentors in a suitable medium and under conditions allowing the variant to be expressed and/or isolated. The cultivation takes place in a suitable nutrient medium comprising carbon and nitrogen sources and inorganic salts, using procedures known in the art. Suitable media are available from commercial suppliers or may be prepared according to published compositions (e.g., in catalogues of the American Type Culture Collection). If the variant is secreted into the nutrient medium, the variant can be recovered directly from the medium. If the variant is not secreted, it can be recovered from cell lysates.

The variants may be detected using methods known in the art that are specific for the variants. These detection methods include, but are not limited to, use of specific antibodies, formation of an enzyme product, or disappearance of an enzyme substrate. For example, an enzyme assay may be used to determine the activity of the variant.

The variant may be recovered using methods known in the art. For example, the variant may be recovered from the nutrient medium by conventional procedures including, but not limited to, collection, centrifugation, filtration, extraction, spray-drying, evaporation, or precipitation. In one aspect, the whole fermentation broth is recovered.

The variant may be purified by a variety of procedures known in the art including, but not limited to, chromatography (e.g., ion exchange, affinity, hydrophobic, chromatofocusing, and size exclusion), electrophoretic procedures (e.g., preparative isoelectric focusing), differential solubility (e.g., ammonium sulfate precipitation), SDS-PAGE, or extraction (see, e.g., Protein Purification, Janson and Ryden, editors, VCH Publishers, New York, 1989) to obtain substantially pure variants.

In an alternative aspect, the variant is not recovered, but rather a host cell of the present invention expressing the variant is used as a source of the variant.

Fermentation Broth Formulations or Cell Compositions

The present invention also relates to a fermentation broth formulation or a cell composition comprising a variant of the present invention. The fermentation broth product further comprises additional ingredients used in the fermentation process, such as, for example, cells (including, the host cells containing the gene encoding the variant of the present invention which are used to produce the variant of interest), cell debris, biomass, fermentation media and/or fermentation products. In some embodiments, the composition is a cell-killed whole broth containing organic acid(s), killed cells and/or cell debris, and culture medium.

The term “fermentation broth” as used herein refers to a preparation produced by cellular fermentation that undergoes no or minimal recovery and/or purification. For example, fermentation broths are produced when microbial cultures are grown to saturation, incubated under carbon-limiting conditions to allow protein synthesis (e.g., expression of enzymes by host cells) and secretion into cell culture medium. The fermentation broth can contain unfractionated or fractionated contents of the fermentation materials derived at the end of the fermentation. Typically, the fermentation broth is unfractionated and comprises the spent culture medium and cell debris present after the microbial cells (e.g., filamentous fungal cells) are removed, e.g., by centrifugation. In some embodiments, the fermentation broth contains spent cell culture medium, extracellular enzymes, and viable and/or nonviable microbial cells.

In an embodiment, the fermentation broth formulation and cell compositions comprise a first organic acid component comprising at least one 1-5 carbon organic acid and/or a salt thereof and a second organic acid component comprising at least one 6 or more carbon organic acid and/or a salt thereof. In a specific embodiment, the first organic acid component is acetic acid, formic acid, propionic acid, a salt thereof, or a mixture of two or more of the foregoing and the second organic acid component is benzoic acid, cyclohexanecarboxylic acid, 4-methylvaleric acid, phenylacetic acid, a salt thereof, or a mixture of two or more of the foregoing.

In one aspect, the composition contains an organic acid(s), and optionally further contains killed cells and/or cell debris. In one embodiment, the killed cells and/or cell debris are removed from a cell-killed whole broth to provide a composition that is free of these components.

The fermentation broth formulations or cell compositions may further comprise a preservative and/or anti-microbial (e.g., bacteriostatic) agent, including, but not limited to, sorbitol, sodium chloride, potassium sorbate, and others known in the art.

The cell-killed whole broth or composition may contain the unfractionated contents of the fermentation materials derived at the end of the fermentation. Typically, the cell-killed whole broth or composition contains the spent culture medium and cell debris present after the microbial cells (e.g., filamentous fungal cells) are grown to saturation, incubated under carbon-limiting conditions to allow protein synthesis. In some embodiments, the cell-killed whole broth or composition contains the spent cell culture medium, extracellular enzymes, and killed filamentous fungal cells. In some embodiments, the microbial cells present in the cell-killed whole broth or composition can be permeabilized and/or lysed using methods known in the art.

A whole broth or cell composition as described herein is typically a liquid, but may contain insoluble components, such as killed cells, cell debris, culture media components, and/or insoluble enzyme(s). In some embodiments, insoluble components may be removed to provide a clarified liquid composition.

The whole broth formulations and cell compositions of the present invention may be produced by a method described in WO 90/15861 or WO 2010/096673.

Compositions

The present invention also relates to compositions comprising a lipase variant of the present invention.

The non-limiting list of composition components illustrated hereinafter are suitable for use in the compositions and methods herein may be desirably incorporated in certain embodiments of the invention, e.g., to assist or enhance cleaning performance, for treatment of the substrate to be cleaned, or to modify the aesthetics of the composition as is the case with perfumes, colorants, dyes or the like. The levels of any such components incorporated in any compositions are in addition to any materials previously recited for incorporation. The precise nature of these additional components, and levels of incorporation thereof, will depend on the physical form of the composition and the nature of the cleaning operation for which it is to be used. Although components mentioned below are categorized by general header according to a particular functionality, this is not to be construed as a limitation, as a component may comprise additional functionalities as will be appreciated by the skilled artisan.

Unless otherwise indicated the amounts in percentage is by weight of the composition (wt. %). Suitable component materials include, but are not limited to, surfactants, builders, chelating agents, dye transfer inhibiting agents, dispersants, enzymes, and enzyme stabilizers, catalytic materials, bleach activators, hydrogen peroxide, sources of hydrogen peroxide, preformed peracids, polymeric dispersing agents, clay soil removal/anti-redeposition agents, brighteners, suds suppressors, dyes, hueing dyes, perfumes, perfume delivery systems, structure elasticizing agents, fabric softeners, carriers, hydrotropes, processing aids, solvents and/or pigments. In addition to the disclosure below, suitable examples of such other components and levels of use are found in U.S. Pat. Nos. 5,576,282, 6,306,812, and 6,326,348 hereby incorporated by reference.

Thus, in certain embodiments the invention do not contain or comprise one or more of the following adjuncts materials: surfactants, soaps, builders, chelating agents, dye transfer inhibiting agents, dispersants, additional enzymes, enzyme stabilizers, catalytic materials, bleach activators, hydrogen peroxide, sources of hydrogen peroxide, preformed peracids, polymeric dispersing agents, clay soil removal/anti-redeposition agents, brighteners, suds suppressors, dyes, perfumes, perfume delivery systems, structure elasticizing agents, fabric softeners, carriers, hydrotropes, processing aids, solvents and/or pigments. However, when one or more components are present, such one or more components may be present as detailed below:

Surfactants—The compositions according to the present invention may comprise a surfactant or surfactant system wherein the surfactant can be selected from nonionic surfactants, anionic surfactants, cationic surfactants, ampholytic surfactants, zwitterionic surfactants, semipolar nonionic surfactants and mixtures thereof. When present, surfactant is typically present at a level of from 0.1 to 60 wt. %, from 0.2 to 40 wt. %, from 0.5 to 30 wt. %, from 1 to 50 wt. %, from 1 to 40 wt. %, from 1 to 30 wt. %, from 1 to 20 wt. %, from 3 to 10 wt. %, from 3 to 5 wt. %, from 5 to 40 wt. %, from 5 to 30 wt. %, from 5 to 15 wt. %, from 3 to 20 wt. %, from 3 to 10 wt. %, from 8 to 12 wt. %, from 10 to 12 wt. %, from 20 to 25 wt. % or from 25-60 wt. %.

Suitable anionic detersive surfactants include sulphate and sulphonate detersive surfactants.

Suitable sulphonate detersive surfactants include alkyl benzene sulphonate, in one aspect, C₁₀₋₁₃ alkyl benzene sulphonate. Suitable alkyl benzene sulphonate (LAS) may be obtained, by sulphonating commercially available linear alkyl benzene (LAB); suitable LAB includes low 2-phenyl LAB, such as Isochem® or Petrelab®, other suitable LAB include high 2-phenyl LAB, such as Hyblene®. A suitable anionic detersive surfactant is alkyl benzene sulphonate that is obtained by DETAL catalyzed process, although other synthesis routes, such as HF, may also be suitable. In one aspect, a magnesium salt of LAS is used.

Suitable sulphate detersive surfactants include alkyl sulphate, in one aspect, C₈₋₁₈ alkyl sulphate, or predominantly C₁₂ alkyl sulphate.

Another suitable sulphate detersive surfactant is alkyl alkoxylated sulphate, in one aspect, alkyl ethoxylated sulphate, in one aspect, a C₈₋₁₈ alkyl alkoxylated sulphate, in one aspect, a C₈₋₁₈ alkyl ethoxylated sulphate, typically the alkyl alkoxylated sulphate has an average degree of alkoxylation of from 0.5 to 20, or from 0.5 to 10, typically the alkyl alkoxylated sulphate is a C₈₋₁₈ alkyl ethoxylated sulphate having an average degree of ethoxylation of from 0.5 to 10, from 0.5 to 7, from 0.5 to 5 or from 0.5 to 3.

The alkyl sulphate, alkyl alkoxylated sulphate and alkyl benzene sulphonates may be linear or branched, substituted or un-substituted.

The detersive surfactant may be a mid-chain branched detersive surfactant, in one aspect, a mid-chain branched anionic detersive surfactant, in one aspect, a mid-chain branched alkyl sulphate and/or a mid-chain branched alkyl benzene sulphonate, e.g., a mid-chain branched alkyl sulphate. In one aspect, the mid-chain branches are C₁₋₄ alkyl groups, typically methyl and/or ethyl groups.

Non-limiting examples of anionic surfactants include sulfates and sulfonates, in particular, linear alkylbenzenesulfonates (LAS), isomers of LAS, branched alkylbenzenesulfonates (BABS), phenylalkanesulfonates, alpha-olefinsulfonates (AOS), olefin sulfonates, alkene sulfonates, alkane-2,3-diylbis(sulfates), hydroxyalkanesulfonates and disulfonates, alkyl sulfates (AS) such as sodium dodecyl sulfate (SDS), fatty alcohol sulfates (FAS), primary alcohol sulfates (PAS), alcohol ethersulfates (AES or AEOS or FES, also known as alcohol ethoxysulfates or fatty alcohol ether sulfates), secondary alkanesulfonates (SAS), paraffin sulfonates (PS), ester sulfonates, sulfonated fatty acid glycerol esters, alpha-sulfo fatty acid methyl esters (alpha-SFMe or SES) including methyl ester sulfonate (MES), alkyl- or alkenylsuccinic acid, dodecenyl/tetradecenyl succinic acid (DTSA), fatty acid derivatives of amino acids, diesters and monoesters of sulfo-succinic acid or soap, and combinations thereof.

Suitable non-ionic detersive surfactants are selected from the group consisting of: C₈-C₁₈ alkyl ethoxylates, such as, NEODOL®; C₆-C₁₂ alkyl phenol alkoxylates wherein the alkoxylate units may be ethyleneoxy units, propyleneoxy units or a mixture thereof; C₁₂-C₁₈ alcohol and C₈-C₁₂ alkyl phenol condensates with ethylene oxide/propylene oxide block polymers such as Pluronic®; C₁₄-C₂₂ mid-chain branched alcohols; C₁₄-C₂₂ mid-chain branched alkyl alkoxylates, typically having an average degree of alkoxylation of from 1 to 30; alkylpolysaccharides, in one aspect, alkylpolyglycosides; polyhydroxy fatty acid amides; ether capped poly(oxyalkylated) alcohol surfactants; and mixtures thereof.

Suitable non-ionic detersive surfactants include alkyl polyglucoside and/or an alkyl alkoxylated alcohol.

In one aspect, non-ionic detersive surfactants include alkyl alkoxylated alcohols, in one aspect C₈₋₁₈ alkyl alkoxylated alcohol, e.g., a C₈₋₁₈ alkyl ethoxylated alcohol, the alkyl alkoxylated alcohol may have an average degree of alkoxylation of from 1 to 50, from 1 to 30, from 1 to 20, or from 1 to 10. In one aspect, the alkyl alkoxylated alcohol may be a C₈₋₁₈ alkyl ethoxylated alcohol having an average degree of ethoxylation of from 1 to 10, from 1 to 7, more from 1 to 5 or from 3 to 7. The alkyl alkoxylated alcohol can be linear or branched, and substituted or unsubstituted. Suitable nonionic surfactants include Lutensol®.

Non-limiting examples of nonionic surfactants include alcohol ethoxylates (AE or AEO), alcohol propoxylates, propoxylated fatty alcohols (PFA), alkoxylated fatty acid alkyl esters, such as ethoxylated and/or propoxylated fatty acid alkyl esters, alkylphenol ethoxylates (APE), nonylphenol ethoxylates (NPE), alkylpolyglycosides (APG), alkoxylated amines, fatty acid monoethanolamides (FAM), fatty acid diethanolamides (FADA), ethoxylated fatty acid monoethanolamides (EFAM), propoxylated fatty acid monoethanolamides (PFAM), polyhydroxyalkyl fatty acid amides, or N-acyl N-alkyl derivatives of glucosamine (glucamides, GA, or fatty acid glucamides, FAGA), as well as products available under the trade names SPAN and TWEEN, and combinations thereof.

Suitable cationic detersive surfactants include alkyl pyridinium compounds, alkyl quaternary ammonium compounds, alkyl quaternary phosphonium compounds, alkyl ternary sulphonium compounds, and mixtures thereof.

Suitable cationic detersive surfactants are quaternary ammonium compounds having the formula: (R)(R₁)(R₂)(R₃)N⁺ X⁻, wherein, R is a linear or branched, substituted or unsubstituted C₆₋₁₈ alkyl or alkenyl moiety, R₁ and R₂ are independently selected from methyl or ethyl moieties, R₃ is a hydroxyl, hydroxymethyl or a hydroxyethyl moiety, X is an anion which provides charge neutrality, suitable anions include: halides, e.g., chloride; sulphate; and sulphonate. Suitable cationic detersive surfactants are mono-C₆₋₁₈ alkyl mono-hydroxyethyl di-methyl quaternary ammonium chlorides. Highly suitable cationic detersive surfactants are mono-C₈₋₁₀ alkyl mono-hydroxyethyl di-methyl quaternary ammonium chloride, mono-C₁₀₋₁₂ alkyl mono-hydroxyethyl di-methyl quaternary ammonium chloride and mono-C₁₀ alkyl mono-hydroxyethyl di-methyl quaternary ammonium chloride.

Non-limiting examples of cationic surfactants include alkyldimethylethanolamine quat (ADMEAQ), cetyltrimethylammonium bromide (CTAB), dimethyldistearylammonium chloride (DSDMAC), and alkylbenzyldimethylammonium, alkyl quaternary ammonium compounds, alkoxylated quaternary ammonium (AQA) compounds, ester quats, and combinations thereof.

Suitable amphoteric/zwitterionic surfactants include amine oxides and betaines such as alkyldimethylbetaines, sulfobetaines, or combinations thereof.

Amine-neutralized anionic surfactants—Anionic surfactants of the present invention and adjunct anionic cosurfactants, may exist in an acid form, and said acid form may be neutralized to form a surfactant salt which is desirable for use in the present detergent compositions. Typical agents for neutralization include the metal counterion base such as hydroxides, e.g., NaOH or KOH. Further preferred agents for neutralizing anionic surfactants of the present invention and adjunct anionic surfactants or cosurfactants in their acid forms include ammonia, amines, or alkanolamines. Alkanolamines are preferred. Suitable non-limiting examples including monoethanolamine, diethanolamine, triethanolamine, and other linear or branched alkanolamines known in the art; e.g., highly preferred alkanolamines include 2-amino-1-propanol, 1-aminopropanol, monoisopropanolamine, or 1-amino-3-propanol. Amine neutralization may be done to a full or partial extent, e.g., part of the anionic surfactant mix may be neutralized with sodium or potassium and part of the anionic surfactant mix may be neutralized with amines or alkanolamines.

Non-limiting examples of semipolar surfactants include amine oxides (AO) such as alkyldimethylamineoxide

Surfactant systems comprising mixtures of one or more anionic and in addition one or more nonionic surfactants optionally with an additional surfactant such as a cationic surfactant, may be preferred. Preferred weight ratios of anionic to nonionic surfactant are at least 2:1, or at least 1:1 to 1:10.

In one aspect a surfactant system may comprise a mixture of isoprenoid surfactants represented by formula A and formula B:

where Y is CH₂ or null, and Z may be chosen such that the resulting surfactant is selected from the following surfactants: an alkyl carboxylate surfactant, an alkyl polyalkoxy surfactant, an alkyl anionic polyalkoxy sulfate surfactant, an alkyl glycerol ester sulfonate surfactant, an alkyl dimethyl amine oxide surfactant, an alkyl polyhydroxy based surfactant, an alkyl phosphate ester surfactant, an alkyl glycerol sulfonate surfactant, an alkyl polygluconate surfactant, an alkyl polyphosphate ester surfactant, an alkyl phosphonate surfactant, an alkyl polyglycoside surfactant, an alkyl monoglycoside surfactant, an alkyl diglycoside surfactant, an alkyl sulfosuccinate surfactant, an alkyl disulfate surfactant, an alkyl disulfonate surfactant, an alkyl sulfosuccinamate surfactant, an alkyl glucamide surfactant, an alkyl taurinate surfactant, an alkyl sarcosinate surfactant, an alkyl glycinate surfactant, an alkyl isethionate surfactant, an alkyl dialkanolamide surfactant, an alkyl monoalkanolamide surfactant, an alkyl monoalkanolamide sulfate surfactant, an alkyl diglycolamide surfactant, an alkyl diglycolamide sulfate surfactant, an alkyl glycerol ester surfactant, an alkyl glycerol ester sulfate surfactant, an alkyl glycerol ether surfactant, an alkyl glycerol ether sulfate surfactant, alkyl methyl ester sulfonate surfactant, an alkyl polyglycerol ether surfactant, an alkyl polyglycerol ether sulfate surfactant, an alkyl sorbitan ester surfactant, an alkyl ammonioalkanesulfonate surfactant, an alkyl amidopropyl betaine surfactant, an alkyl allylated quat based surfactant, an alkyl monohydroxyalkyl-di-alkylated quat based surfactant, an alkyl di-hydroxyalkyl monoalkyl quat based surfactant, an alkylated quat surfactant, an alkyl trimethylammonium quat surfactant, an alkyl polyhydroxalkyl oxypropyl quat based surfactant, an alkyl glycerol ester quat surfactant, an alkyl glycol amine quat surfactant, an alkyl monomethyl dihydroxyethyl quaternary ammonium surfactant, an alkyl dimethyl monohydroxyethyl quaternary ammonium surfactant, an alkyl trimethylammonium surfactant, an alkyl imidazoline-based surfactant, an alken-2-yl-succinate surfactant, an alkyl a-sulfonated carboxylic acid surfactant, an alkyl a-sulfonated carboxylic acid alkyl ester surfactant, an alpha olefin sulfonate surfactant, an alkyl phenol ethoxylate surfactant, an alkyl benzenesulfonate surfactant, an alkyl sulfobetaine surfactant, an alkyl hydroxysulfobetaine surfactant, an alkyl ammoniocarboxylate betaine surfactant, an alkyl sucrose ester surfactant, an alkyl alkanolamide surfactant, an alkyl di(polyoxyethylene) monoalkyl ammonium surfactant, an alkyl mono(polyoxyethylene) dialkyl ammonium surfactant, an alkyl benzyl dimethylammonium surfactant, an alkyl aminopropionate surfactant, an alkyl amidopropyl dimethylamine surfactant, or a mixture thereof; and if Z is a charged moiety, Z is charge-balanced by a suitable metal or organic counter ion. Suitable counter ions include a metal counter ion, an amine, or an alkanolamine, e.g., C1-C6 alkanolammonium. More specifically, suitable counter ions include Na+, Ca+, Li+, K+, Mg+, e.g., monoethanolamine (MEA), diethanolamine (DEA), triethanolamine (TEA), 2-amino-1-propanol, 1-aminopropanol, methyldiethanolamine, dimethylethanolamine, monoisopropanolamine, triisopropanolamine, 1-amino-3-propanol, or mixtures thereof. In one aspect, the compositions contain from 5% to 97% of one or more non-isoprenoid surfactants; and one or more adjunct cleaning additives; wherein the weight ratio of surfactant of formula A to surfactant of formula B is from 50:50 to 95:5.

Soap—The compositions herein may contain soap. Without being limited by theory, it may be desirable to include soap as it acts in part as a surfactant and in part as a builder and may be useful for suppression of foam and may furthermore interact favorably with the various cationic compounds of the composition to enhance softness on textile fabrics treaded with the inventive compositions. Any soap known in the art for use in laundry detergents may be utilized. In one aspect, the compositions contain from 0 wt. % to 20 wt. %, from 0.5 wt. % to 20 wt. %, from 4 wt. % to 10 wt. %, or from 4 wt. % to 7 wt. % of soap.

Examples of soap useful herein include oleic acid soaps, palmitic acid soaps, palm kernel fatty acid soaps, and mixtures thereof. Typical soaps are in the form of mixtures of fatty acid soaps having different chain lengths and degrees of substitution. One such mixture is topped palm kernel fatty acid.

In one aspect, the soap is selected from free fatty acid. Suitable fatty acids are saturated and/or unsaturated and can be obtained from natural sources such a plant or animal esters (e.g., palm kernel oil, palm oil, coconut oil, babassu oil, safflower oil, tall oil, castor oil, tallow and fish oils, grease, and mixtures thereof), or synthetically prepared (e.g., via the oxidation of petroleum or by hydrogenation of carbon monoxide via the Fisher Tropsch process).

Examples of suitable saturated fatty acids for use in the compositions of this invention include captic, lauric, myristic, palmitic, stearic, arachidic and behenic acid. Suitable unsaturated fatty acid species include: palmitoleic, oleic, linoleic, linolenic and ricinoleic acid. Examples of preferred fatty acids are saturated Cn fatty acid, saturated Ci₂-Ci₄ fatty acids, and saturated or unsaturated Cn to Ci₈ fatty acids, and mixtures thereof.

When present, the weight ratio of fabric softening cationic cosurfactant to fatty acid is preferably from about 1:3 to about 3:1, more preferably from about 1:1.5 to about 1.5:1, most preferably about 1:1.

Levels of soap and of nonsoap anionic surfactants herein are percentages by weight of the detergent composition, specified on an acid form basis. However, as is commonly understood in the art, anionic surfactants and soaps are in practice neutralized using sodium, potassium or alkanolammonium bases, such as sodium hydroxide or monoethanolamine.

Hydrotropes—The compositions of the present invention may comprise one or more hydrotropes. A hydrotrope is a compound that solubilises hydrophobic compounds in aqueous solutions (or oppositely, polar substances in a non-polar environment). Typically, hydrotropes have both hydrophilic and a hydrophobic character (so-called amphiphilic properties as known from surfactants); however the molecular structure of hydrotropes generally do not favor spontaneous self-aggregation, see, e.g., review by Hodgdon and Kaler, 2007, Current Opinion in Colloid & Interface Science 12: 121-128. Hydrotropes do not display a critical concentration above which self-aggregation occurs as found for surfactants and lipids forming miceller, lamellar or other well defined meso-phases. Instead, many hydrotropes show a continuous-type aggregation process where the sizes of aggregates grow as concentration increases. However, many hydrotropes alter the phase behavior, stability, and colloidal properties of systems containing substances of polar and non-polar character, including mixtures of water, oil, surfactants, and polymers. Hydrotropes are classically used across industries from pharma, personal care, food, to technical applications. Use of hydrotropes in detergent compositions allow for example more concentrated formulations of surfactants (as in the process of compacting liquid detergents by removing water) without inducing undesired phenomena such as phase separation or high viscosity.

The detergent may contain from 0 to 10 wt. %, such as from 0 to 5 wt. %, 0.5 to 5 wt. %, or from 3 to 5 wt. %, of a hydrotrope. Any hydrotrope known in the art for use in detergents may be utilized. Non-limiting examples of hydrotropes include sodium benzenesulfonate, sodium p-toluene sulfonate (STS), sodium xylene sulfonate (SXS), sodium cumene sulfonate (SCS), sodium cymene sulfonate, amine oxides, alcohols and polyglycolethers, sodium hydroxynaphthoate, sodium hydroxynaphthalene sulfonate, sodium ethylhexyl sulfate, and combinations thereof.

Builders—The compositions of the present invention may comprise one or more builders, co-builders, builder systems or a mixture thereof. When a builder is used, the cleaning composition will typically comprise from 0 to 65 wt. %, at least 1 wt. %, from 2 to 60 wt. % or from 5 to 10 wt. % builder. In a dish wash cleaning composition, the level of builder is typically 40 to 65 wt. % or 50 to 65 wt. %. The composition may be substantially free of builder; substantially free means “no deliberately added” zeolite and/or phosphate. Typical zeolite builders include zeolite A, zeolite P and zeolite MAP. A typical phosphate builder is sodium tri-polyphosphate.

The builder and/or co-builder may particularly be a chelating agent that forms water-soluble complexes with Ca and Mg. Any builder and/or co-builder known in the art for use in detergents may be utilized. Non-limiting examples of builders include zeolites, diphosphates (pyrophosphates), triphosphates such as sodium triphosphate (STP or STPP), carbonates such as sodium carbonate, soluble silicates such as sodium metasilicate, layered silicates (e.g., SKS-6 from Hoechst), ethanolamines such as 2-aminoethan-1-ol (MEA), iminodiethanol (DEA) and 2,2′,2″-nitrilotriethanol (TEA), and carboxymethylinulin (CMI), and combinations thereof.

The cleaning composition may include a co-builder alone, or in combination with a builder, e.g., a zeolite builder. Non-limiting examples of co-builders include homopolymers of polyacrylates or copolymers thereof, such as poly(acrylic acid) (PAA) or copoly(acrylic acid/maleic acid) (PAA/PMA). Further non-limiting examples include citrate, chelators such as aminocarboxylates, aminopolycarboxylates and phosphonates, and alkyl- or alkenylsuccinic acid. Additional specific examples include 2,2′,2″-nitrilotriacetic acid (NTA), etheylenediaminetetraacetic acid (EDTA), diethylenetriaminepentaacetic acid (DTPA), iminodisuccinic acid (IDS), ethylenediamine-N,N′-disuccinic acid (EDDS), methylglycinediacetic acid (MGDA), glutamic acid-N,N-diacetic acid (GLDA), 1-hydroxyethane-1,1-diylbis(phosphonic acid) (HEDP), ethylenediaminetetrakis(methylene)tetrakis(phosphonic acid) (EDTMPA), diethylenetriaminepentakis(methylene)pentakis(phosphonic acid) (DTPMPA), N-(2-hydroxyethyl)iminodiacetic acid (EDG), aspartic acid-N-monoacetic acid (ASMA), aspartic acid-N,N-diacetic acid (ASDA), aspartic acid-N-monopropionic acid (ASMP), iminodisuccinic acid (IDA), N-(2-sulfomethyl) aspartic acid (SMAS), N-(2-sulfoethyl) aspartic acid (SEAS), N-(2-sulfomethyl) glutamic acid (SMGL), N-(2-sulfoethyl) glutamic acid (SEGL), N-methyliminodiacetic acid (MIDA), α-alanine-N,N-diacetic acid (α-ALDA), serine-N,N-diacetic acid (SEDA), isoserine-N,N-diacetic acid (ISDA), phenylalanine-N,N-diacetic acid (PHDA), anthranilic acid-N,N-diacetic acid (ANDA), sulfanilic acid-N, N-diacetic acid (SLDA), taurine-N, N-diacetic acid (TUDA) and sulfomethyl-N,N-diacetic acid (SMDA), N-(hydroxyethyl)-ethylidenediaminetriacetate (HEDTA), diethanolglycine (DEG), Diethylenetriamine Penta (Methylene Phosphonic acid) (DTPMP), aminotris(methylenephosphonic acid) (ATMP), and combinations and salts thereof. Further exemplary builders and/or co-builders are described in, e.g., WO 2009/102854, U.S. Pat. No. 5,977,053.

Chelating Agents and Crystal Growth Inhibitors—The compositions herein may contain a chelating agent and/or a crystal growth inhibitor. Suitable molecules include copper, iron and/or manganese chelating agents and mixtures thereof. Suitable molecules include DTPA (Diethylene triamine pentaacetic acid), HEDP (Hydroxyethane diphosphonic acid), DTPMP (Diethylene triamine penta(methylene phosphonic acid)), 1,2-Dihydroxybenzene-3,5-disulfonic acid disodium salt hydrate, ethylenediamine, diethylene triamine, ethylenediaminedisuccinic acid (EDDS), N-hydroxyethylethylenediaminetri-acetic acid (HEDTA), triethylenetetraaminehexaacetic acid (TTHA), N-hydroxyethyliminodiacetic acid (HEIDA), dihydroxyethylglycine (DHEG), ethylenediaminetetrapropionic acid (EDTP), carboxymethyl inulin and 2-Phosphonobutane 1,2,4-tricarboxylic acid (Bayhibit® AM) and derivatives thereof. Typically the composition may comprise from 0.005 to 15 wt. % or from 3.0 to 10 wt. % chelating agent or crystal growth inhibitor.

Bleach Component—The bleach component suitable for incorporation in the methods and compositions of the invention comprise one or a mixture of more than one bleach component. Suitable bleach components include bleaching catalysts, photobleaches, bleach activators, hydrogen peroxide, sources of hydrogen peroxide, pre-formed peracids and mixtures thereof. In general, when a bleach component is used, the compositions of the present invention may comprise from 0 to 30 wt. %, from 0.00001 to 90 wt. %, 0.0001 to 50 wt. %, from 0.001 to 25 wt. % or from 1 to 20 wt. %. Examples of suitable bleach components include:

(1) Pre-formed peracids: Suitable preformed peracids include, but are not limited to, compounds selected from the group consisting of pre-formed peroxyacids or salts thereof, typically either a peroxycarboxylic acid or salt thereof, or a peroxysulphonic acid or salt thereof.

The pre-formed peroxyacid or salt thereof is preferably a peroxycarboxylic acid or salt thereof, typically having a chemical structure corresponding to the following chemical formula:

wherein: R¹⁴ is selected from alkyl, aralkyl, cycloalkyl, aryl or heterocyclic groups; the R¹⁴ group can be linear or branched, substituted or unsubstituted; and Y is any suitable counter-ion that achieves electric charge neutrality, preferably Y is selected from hydrogen, sodium or potassium. Preferably, R¹⁴ is a linear or branched, substituted or unsubstituted C₆₋₉ alkyl. Preferably, the peroxyacid or salt thereof is selected from peroxyhexanoic acid, peroxyheptanoic acid, peroxyoctanoic acid, peroxynonanoic acid, peroxydecanoic acid, any salt thereof, or any combination thereof. Particularly preferred peroxyacids are phthalimido-peroxy-alkanoic acids, in particular ε-phthahlimido peroxy hexanoic acid (PAP). Preferably, the peroxyacid or salt thereof has a melting point in the range of from 30° C. to 60° C.

The pre-formed peroxyacid or salt thereof can also be a peroxysulphonic acid or salt thereof, typically having a chemical structure corresponding to the following chemical formula:

wherein: R¹⁵ is selected from alkyl, aralkyl, cycloalkyl, aryl or heterocyclic groups; the R¹⁵ group can be linear or branched, substituted or unsubstituted; and Z is any suitable counter-ion that achieves electric charge neutrality, preferably Z is selected from hydrogen, sodium or potassium. Preferably R¹⁵ is a linear or branched, substituted or unsubstituted C₆₋₉ alkyl. Preferably such bleach components may be present in the compositions of the invention in an amount from 0.01 to 50 wt. % or from 0.1 to 20 wt. %.

(2) Sources of hydrogen peroxide include e.g., inorganic perhydrate salts, including alkali metal salts such as sodium salts of perborate (usually mono- or tetra-hydrate), percarbonate, persulphate, perphosphate, persilicate salts and mixtures thereof. In one aspect of the invention the inorganic perhydrate salts such as those selected from the group consisting of sodium salts of perborate, percarbonate and mixtures thereof. When employed, inorganic perhydrate salts are typically present in amounts of 0.05 to 40 wt. % or 1 to 30 wt. % of the overall composition and are typically incorporated into such compositions as a crystalline solid that may be coated. Suitable coatings include: inorganic salts such as alkali metal silicate, carbonate or borate salts or mixtures thereof, or organic materials such as water-soluble or dispersible polymers, waxes, oils or fatty soaps. Preferably such bleach components may be present in the compositions of the invention in an amount of 0.01 to 50 wt. % or 0.1 to 20 wt. %.

(3) The term bleach activator is meant herein as a compound which reacts with hydrogen peroxide to form a peracid via perhydrolysis. The peracid thus formed constitutes the activated bleach. Suitable bleach activators to be used herein include those belonging to the class of esters, amides, imides or anhydrides. Suitable bleach activators are those having R—(C═O)-L wherein R is an alkyl group, optionally branched, having, when the bleach activator is hydrophobic, from 6 to 14 carbon atoms, or from 8 to 12 carbon atoms and, when the bleach activator is hydrophilic, less than 6 carbon atoms or less than 4 carbon atoms; and L is leaving group. Examples of suitable leaving groups are benzoic acid and derivatives thereof—especially benzene sulphonate. Suitable bleach activators include dodecanoyl oxybenzene sulphonate, decanoyl oxybenzene sulphonate, decanoyl oxybenzoic acid or salts thereof, 3,5,5-trimethyl hexanoyloxybenzene sulphonate, tetraacetyl ethylene diamine (TAED), sodium 4-[(3,5,5-trimethylhexanoy)oxy]benzene-1-sulfonate (ISONOBS), 4-(dodecanoyloxy)benzene-1-sulfonate (LOBS), 4-(decanoyloxy)benzene-1-sulfonate, 4-(decanoyloxy)benzoate (DOBS or DOBA), 4-(nonanoyloxy)benzene-1-sulfonate (NOBS), and/or those disclosed in WO 98/17767. A family of bleach activators is disclosed in EP 624154 and particularly preferred in that family is acetyl triethyl citrate (ATC). ATC or a short chain triglyceride like triacetin has the advantage that it is environmentally friendly. Furthermore acetyl triethyl citrate and triacetin have good hydrolytical stability in the product upon storage and are efficient bleach activators. Finally ATC is multifunctional, as the citrate released in the perhydrolysis reaction may function as a builder. Alternatively, the bleaching system may comprise peroxyacids of, for example, the amide, imide, or sulfone type. The bleaching system may also comprise peracids such as 6-(phthalimido)peroxyhexanoic acid (PAP). Suitable bleach activators are also disclosed in WO 98/17767. While any suitable bleach activator may be employed, in one aspect of the invention the subject cleaning composition may comprise NOBS, TAED or mixtures thereof. When present, the peracid and/or bleach activator is generally present in the composition in an amount of 0.1 to 60 wt. %, 0.5 to 40 wt. % or 0.6 to 10 wt. % based on the fabric and home care composition. One or more hydrophobic peracids or precursors thereof may be used in combination with one or more hydrophilic peracid or precursor thereof. Preferably such bleach components may be present in the compositions of the invention in an amount of 0.01 to 50 wt. %, or 0.1 to 20 wt. %.

The amounts of hydrogen peroxide source and peracid or bleach activator may be selected such that the molar ratio of available oxygen (from the peroxide source) to peracid is from 1:1 to 35:1, or even 2:1 to 10:1.

(4) Diacyl peroxides—preferred diacyl peroxide bleaching species include those selected from diacyl peroxides of the formula: R¹—C(O)—OO—(O)C—R², in which R¹ represents a C₆-C₁₈ alkyl, preferably C₆-C₁₂ alkyl group containing a linear chain of at least 5 carbon atoms and optionally containing one or more substituents (e.g., —N⁺(CH₃)₃, —COOH or —CN) and/or one or more interrupting moieties (e.g., —CONH— or —CH═CH—) interpolated between adjacent carbon atoms of the alkyl radical, and R² represents an aliphatic group compatible with a peroxide moiety, such that R¹ and R² together contain a total of 8 to 30 carbon atoms. In one preferred aspect R¹ and R² are linear unsubstituted C₆-C₁₂ alkyl chains. Most preferably R¹ and R² are identical. Diacyl peroxides, in which both R¹ and R² are C₆-C₁₂ alkyl groups, are particularly preferred. Preferably, at least one of, most preferably only one of, the R groups (R¹ or R²), does not contain branching or pendant rings in the alpha position, or preferably neither in the alpha nor beta positions or most preferably in none of the alpha or beta or gamma positions. In one further preferred embodiment the DAP may be asymmetric, such that preferably the hydrolysis of R¹ acyl group is rapid to generate peracid, but the hydrolysis of R2 acyl group is slow.

The tetraacyl peroxide bleaching species is preferably selected from tetraacyl peroxides of the formula: R³—C(O)—OO—C(O)—(CH₂)_(n)—C(O)—OO—C(O)—R³, in which R³ represents a C₁-C₉ alkyl, or C₃-C₇, group and n represents an integer from 2 to 12, or 4 to 10 inclusive.

Preferably, the diacyl and/or tetraacyl peroxide bleaching species is present in an amount sufficient to provide at least 0.5 ppm, at least 10 ppm, or at least 50 ppm by weight of the wash liquor. In a preferred embodiment, the bleaching species is present in an amount sufficient to provide from 0.5 to 300 ppm, from 30 to 150 ppm by weight of the wash liquor.

Preferably the bleach component comprises a bleach catalyst (5 and 6).

(5) Preferred are organic (non-metal) bleach catalysts including bleach catalyst capable of accepting an oxygen atom from a peroxyacid and/or salt thereof, and transferring the oxygen atom to an oxidizeable substrate. Suitable bleach catalysts include, but are not limited to: iminium cations and polyions; iminium zwitterions; modified amines; modified amine oxides; N-sulphonyl imines; N-phosphonyl imines; N-acyl imines; thiadiazole dioxides; perfluoroimines; cyclic sugar ketones and mixtures thereof.

Suitable iminium cations and polyions include, but are not limited to, N-methyl-3,4-dihydroisoquinolinium tetrafluoroborate, prepared as described in Tetrahedron 49(2): 423-438 (1992) (e.g., compound 4, p. 433); N-methyl-3,4-dihydroisoquinolinium p-toluene sulphonate, prepared as described in U.S. Pat. No. 5,360,569 (e.g., Column 11, Example 1); and N-octyl-3,4-dihydroisoquinolinium p-toluene sulphonate, prepared as described in U.S. Pat. No. 5,360,568 (e.g., Column 10, Ex. 3).

Suitable iminium zwitterions include, but are not limited to, N-(3-sulfopropyl)-3,4-dihydroisoquinolinium, inner salt, prepared as described in U.S. Pat. No. 5,576,282 (e.g., Column 31, Ex. II); N-[2-(sulphooxy)dodecyl]-3,4-dihydroisoquinolinium, inner salt, prepared as described in U.S. Pat. No. 5,817,614 (e.g., Column 32, Ex. V); 2-[3-[(2-ethylhexyl)oxy]-2-(sulphooxy)propyl]-3,4-dihydroisoquinolinium, inner salt, prepared as described in WO 2005/047264 (e.g., p. 18, Ex. 8), and 2-[3-[(2-butyloctyl)oxy]-2-(sulphooxy)propyl]-3,4-dihydroisoquinolinium, inner salt.

Suitable modified amine oxygen transfer catalysts include, but are not limited to, 1,2,3,4-tetrahydro-2-methyl-1-isoquinolinol, which can be made according to the procedures described in Tetrahedron Letters 28(48): 6061-6064 (1987). Suitable modified amine oxide oxygen transfer catalysts include, but are not limited to, sodium 1-hydroxy-N-oxy-N-[2-(sulphooxy)decyl]-1,2,3,4-tetrahydroisoquinoline.

Suitable N-sulphonyl imine oxygen transfer catalysts include, but are not limited to, 3-methyl-1,2-benzisothiazole 1,1-dioxide, prepared according to the procedure described in Journal of Organic Chemistry 55(4): 1254-61 (1990).

Suitable N-phosphonyl imine oxygen transfer catalysts include, but are not limited to, [R-(E)]-N-[(2-chloro-5-nitrophenyl)methylene]-P-phenyl-P-(2,4,6-trimethylphenyl)-phosphinic amide, which can be made according to the procedures described in Journal of the Chemical Society, Chemical Communications 22: 2569-70 (1994).

Suitable N-acyl imine oxygen transfer catalysts include, but are not limited to, [N(E)]-N-(phenylmethylene)acetamide, which can be made according to the procedures described in Polish Journal of Chemistry 77(5): 577-590 (2003).

Suitable thiadiazole dioxide oxygen transfer catalysts include but are not limited to, 3-methyl-4-phenyl-1,2,5-thiadiazole 1,1-dioxide, which can be made according to the procedures described in U.S. Pat. No. 5,753,599 (Column 9, Ex. 2).

Suitable perfluoroimine oxygen transfer catalysts include, but are not limited to, (Z)-2,2,3,3,4,4,4-heptafluoro-N-(nonafluorobutyl)butanimidoyl fluoride, which can be made according to the procedures described in Tetrahedron Letters 35(34): 6329-30 (1994).

Suitable cyclic sugar ketone oxygen transfer catalysts include, but are not limited to, 1,2:4,5-di-O-isopropylidene-D-erythro-2,3-hexodiuro-2,6-pyranose as prepared in U.S. Pat. No. 6,649,085 (Column 12, Ex. 1).

Preferably, the bleach catalyst comprises an iminium and/or carbonyl functional group and is typically capable of forming an oxaziridinium and/or dioxirane functional group upon acceptance of an oxygen atom, especially upon acceptance of an oxygen atom from a peroxyacid and/or salt thereof. Preferably, the bleach catalyst comprises an oxaziridinium functional group and/or is capable of forming an oxaziridinium functional group upon acceptance of an oxygen atom, especially upon acceptance of an oxygen atom from a peroxyacid and/or salt thereof. Preferably, the bleach catalyst comprises a cyclic iminium functional group, preferably wherein the cyclic moiety has a ring size of from five to eight atoms (including the nitrogen atom), preferably six atoms. Preferably, the bleach catalyst comprises an aryliminium functional group, preferably a bi-cyclic aryliminium functional group, preferably a 3,4-dihydroisoquinolinium functional group. Typically, the imine functional group is a quaternary imine functional group and is typically capable of forming a quaternary oxaziridinium functional group upon acceptance of an oxygen atom, especially upon acceptance of an oxygen atom from a peroxyacid and/or salt thereof. In one aspect, the detergent composition comprises a bleach component having a log P_(o/w) no greater than 0, no greater than −0.5, no greater than −1.0, no greater than −1.5, no greater than −2.0, no greater than −2.5, no greater than −3.0, or no greater than −3.5. The method for determining log P_(o/w) is described in more detail below.

Typically, the bleach ingredient is capable of generating a bleaching species having a X_(SO) of from 0.01 to 0.30, from 0.05 to 0.25, or from 0.10 to 0.20. The method for determining X_(SO) is described in more detail below. For example, bleaching ingredients having an isoquinolinium structure are capable of generating a bleaching species that has an oxaziridinium structure. In this example, the X_(SO) is that of the oxaziridinium bleaching species.

Preferably, the bleach catalyst has a chemical structure corresponding to the following chemical formula:

wherein: n and m are independently from 0 to 4, preferably n and m are both 0; each R¹ is independently selected from a substituted or unsubstituted radical selected from the group consisting of hydrogen, alkyl, cycloalkyl, aryl, fused aryl, heterocyclic ring, fused heterocyclic ring, nitro, halo, cyano, sulphonato, alkoxy, keto, carboxylic, and carboalkoxy radicals; and any two vicinal R¹ substituents may combine to form a fused aryl, fused carbocyclic or fused heterocyclic ring; each R² is independently selected from a substituted or unsubstituted radical independently selected from the group consisting of hydrogen, hydroxy, alkyl, cycloalkyl, alkaryl, aryl, aralkyl, alkylenes, heterocyclic ring, alkoxys, arylcarbonyl groups, carboxyalkyl groups and amide groups; any R² may be joined together with any other of R² to form part of a common ring; any geminal R² may combine to form a carbonyl; and any two R² may combine to form a substituted or unsubstituted fused unsaturated moiety; R³ is a C₁ to C₂₀ substituted or unsubstituted alkyl; R⁴ is hydrogen or the moiety Q_(t)-A, wherein: Q is a branched or unbranched alkylene, t=0 or 1 and A is an anionic group selected from the group consisting of OSO₃ ⁻, SO₃ ⁻, CO₂ ⁻, OCO₂ ⁻, OPO₃ ²⁻, OPO₃H⁻ and OPO₂ ⁻; R⁵ is hydrogen or the moiety —CR¹¹R¹²—Y-G_(b)-Y_(c)—[(CR⁹R¹⁰)_(y)—O]_(k)—R⁸, wherein: each Y is independently selected from the group consisting of O, S, N—H, or N—R⁸; and each R⁸ is independently selected from the group consisting of alkyl, aryl and heteroaryl, said moieties being substituted or unsubstituted, and whether substituted or unsubstituted said moieties having less than 21 carbons; each G is independently selected from the group consisting of CO, SO₂, SO, PO and PO₂; R⁹ and R¹⁰ are independently selected from the group consisting of H and C₁-C₄ alkyl; R¹¹ and R¹² are independently selected from the group consisting of H and alkyl, or when taken together may join to form a carbonyl; b=0 or 1; c can=0 or 1, but c must=0 if b=0; y is an integer from 1 to 6; k is an integer from 0 to 20; R⁶ is H, or an alkyl, aryl or heteroaryl moiety; said moieties being substituted or unsubstituted; and X, if present, is a suitable charge balancing counterion, preferably X is present when R⁴ is hydrogen, suitable X, include but are not limited to: chloride, bromide, sulphate, methosulphate, sulphonate, p-toluenesulphonate, borontetraflouride and phosphate. In one aspect of the present invention, the bleach catalyst has a structure corresponding to formula below:

wherein R¹³ is a branched alkyl group containing from three to 24 carbon atoms (including the branching carbon atoms) or a linear alkyl group containing from one to 24 carbon atoms; preferably R¹³ is a branched alkyl group containing from eight to 18 carbon atoms or linear alkyl group containing from eight to eighteen carbon atoms; preferably R¹³ is selected from the group consisting of 2-propylheptyl, 2-butyloctyl, 2-pentylnonyl, 2-hexyldecyl, n-dodecyl, n-tetradecyl, n-hexadecyl, n-octadecyl, iso-nonyl, iso-decyl, iso-tridecyl and iso-pentadecyl; preferably R¹³ is selected from the group consisting of 2-butyloctyl, 2-pentylnonyl, 2-hexyldecyl, iso-tridecyl and iso-pentadecyl.

Preferably the bleach component comprises a source of peracid in addition to bleach catalyst, particularly organic bleach catalyst. The source of peracid may be selected from (a) pre-formed peracid; (b) percarbonate, perborate or persulfate salt (hydrogen peroxide source) preferably in combination with a bleach activator; and (c) perhydrolase enzyme and an ester for forming peracid in situ in the presence of water in a textile or hard surface treatment step.

When present, the peracid and/or bleach activator is generally present in the composition in an amount of from 0.1 to 60 wt. %, from 0.5 to 40 wt. % or from 0.6 to 10 wt. % based on the composition. One or more hydrophobic peracids or precursors thereof may be used in combination with one or more hydrophilic peracid or precursor thereof.

The amounts of hydrogen peroxide source and peracid or bleach activator may be selected such that the molar ratio of available oxygen (from the peroxide source) to peracid is from 1:1 to 35:1, or 2:1 to 10:1.

(6) Metal-containing Bleach Catalysts—The bleach component may be provided by a catalytic metal complex. One type of metal-containing bleach catalyst is a catalyst system comprising a transition metal cation of defined bleach catalytic activity, such as copper, iron, titanium, ruthenium, tungsten, molybdenum, or manganese cations, an auxiliary metal cation having little or no bleach catalytic activity, such as zinc or aluminum cations, and a sequestrate having defined stability constants for the catalytic and auxiliary metal cations, particularly ethylenediaminetetraacetic acid, ethylenediaminetetra(methylenephosphonic acid) and water-soluble salts thereof. Such catalysts are disclosed in U.S. Pat. No. 4,430,243. Preferred catalysts are described in WO 2009/839406, U.S. Pat. No. 6,218,351 and WO 00/12667. Particularly preferred are transition metal catalyst or ligands therefore that are cross-bridged polydentate N-donor ligands.

If desired, the compositions herein can be catalyzed by means of a manganese compound. Such compounds and levels of use are well known in the art and include, e.g., the manganese-based catalysts disclosed in U.S. Pat. No. 5,576,282.

Cobalt bleach catalysts useful herein are known, and are described in, e.g., U.S. Pat. Nos. 5,597,936; 5,595,967. Such cobalt catalysts are readily prepared by known procedures, such as taught in, e.g., U.S. Pat. Nos. 5,597,936 and 5,595,967.

Compositions herein may also suitably include a transition metal complex of ligands such as bispidones (U.S. Pat. No. 7,501,389) and/or macropolycyclic rigid ligands—abbreviated as “MRLs”. As a practical matter, and not by way of limitation, the compositions and processes herein can be adjusted to provide on the order of at least one part per hundred million of the active MRL species in the aqueous washing medium, and will typically provide from 0.005 to 25 ppm, from 0.05 to 10 ppm, or from 0.1 to 5 ppm, of the MRL in the wash liquor.

Suitable transition-metals in the instant transition-metal bleach catalyst include, e.g., manganese, iron and chromium. Suitable MRLs include 5,12-diethyl-1,5,8,12-tetraazabicyclo[6.6.2]hexadecane. Suitable transition metal MRLs are readily prepared by known procedures, such as taught in, e.g., U.S. Pat. No. 6,225,464 and WO 00/32601.

(7) Photobleaches—suitable photobleaches include, e.g., sulfonated zinc phthalocyanine sulfonated aluminium phthalocyanines, xanthene dyes and mixtures thereof. Preferred bleach components for use in the present compositions of the invention comprise a hydrogen peroxide source, bleach activator and/or organic peroxyacid, optionally generated in situ by the reaction of a hydrogen peroxide source and bleach activator, in combination with a bleach catalyst. Preferred bleach components comprise bleach catalysts, preferably organic bleach catalysts, as described above.

Particularly preferred bleach components are the bleach catalysts in particular the organic bleach catalysts.

Exemplary bleaching systems are also described, e.g., in WO 2007/087258, WO 2007/087244, WO 2007/087259 and WO 2007/087242.

Fabric Hueing Agents—The composition may comprise a fabric hueing agent. Suitable fabric hueing agents include dyes, dye-clay conjugates, and pigments. Suitable dyes include small molecule dyes and polymeric dyes. Suitable small molecule dyes include small molecule dyes selected from the group consisting of dyes falling into the Color Index (C.I.) classifications of Direct Blue, Direct Red, Direct Violet, Acid Blue, Acid Red, Acid Violet, Basic Blue, Basic Violet and Basic Red, or mixtures thereof.

In one aspect, suitable small molecule dyes include small molecule dyes selected from the group consisting of Color Index (Society of Dyers and Colorists, Bradford, UK) numbers Direct Violet 9, Direct Violet 35, Direct Violet 48, Direct Violet 51, Direct Violet 66, Direct Violet 99, Direct Blue 1, Direct Blue 71, Direct Blue 80, Direct Blue 279, Acid Red 17, Acid Red 73, Acid Red 88, Acid Red 150, Acid Violet 15, Acid Violet 17, Acid Violet 24, Acid Violet 43, Acid Red 52, Acid Violet 49, Acid Violet 50, Acid Blue 15, Acid Blue 17, Acid Blue 25, Acid Blue 29, Acid Blue 40, Acid Blue 45, Acid Blue 75, Acid Blue 80, Acid Blue 83, Acid Blue 90 and Acid Blue 113, Acid Black 1, Basic Violet 1, Basic Violet 3, Basic Violet 4, Basic Violet 10, Basic Violet 35, Basic Blue 3, Basic Blue 16, Basic Blue 22, Basic Blue 47, Basic Blue 66, Basic Blue 75, Basic Blue 159 and mixtures thereof. In one aspect, suitable small molecule dyes include small molecule dyes selected from the group consisting of Color Index (Society of Dyers and Colorists, Bradford, UK) numbers Acid Violet 17, Acid Violet 43, Acid Red 52, Acid Red 73, Acid Red 88, Acid Red 150, Acid Blue 25, Acid Blue 29, Acid Blue 45, Acid Blue 113, Acid Black 1, Direct Blue 1, Direct Blue 71, Direct Violet 51 and mixtures thereof. In one aspect, suitable small molecule dyes include small molecule dyes selected from the group consisting of Color Index (Society of Dyers and Colorists, Bradford, UK) numbers Acid Violet 17, Direct Blue 71, Direct Violet 51, Direct Blue 1, Acid Red 88, Acid Red 150, Acid Blue 29, Acid Blue 113 or mixtures thereof.

Suitable polymeric dyes include polymeric dyes selected from the group consisting of polymers containing conjugated chromogens (dye-polymer conjugates) and polymers with chromogens co-polymerized into the backbone of the polymer and mixtures thereof.

In one aspect, suitable polymeric dyes include polymeric dyes selected from the group consisting of fabric-substantive colorants sold under the name of Liquitint® (Milliken), dye-polymer conjugates formed from at least one reactive dye and a polymer selected from the group consisting of polymers comprising a moiety selected from the group consisting of a hydroxyl moiety, a primary amine moiety, a secondary amine moiety, a thiol moiety and mixtures thereof. In still one aspect, suitable polymeric dyes include polymeric dyes selected from the group consisting of Liquitint® Violet CT, carboxymethyl cellulose (CMC) conjugated with a reactive blue, reactive violet or reactive red dye such as CMC conjugated with C.I. Reactive Blue 19, sold by Megazyme, Wicklow, Ireland under the product name AZO-CM-CELLULOSE, product code S-ACMC, alkoxylated triphenyl-methane polymeric colorants, alkoxylated thiophene polymeric colorants, and mixtures thereof.

Preferred hueing dyes include the whitening agents found in WO 2008/087497. These whitening agents may be characterized by the following structure (I):

wherein R₁ and R₂ can independently be selected from:

a) [(CH₂CR′HO)_(x)(CH₂CR″HO)_(y)H]

wherein R′ is selected from the group consisting of H, CH₃, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein R″ is selected from the group consisting of H, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein x+y≤5; wherein y≥1; and wherein z=0 to 5;

b) R₁=alkyl, aryl or aryl alkyl and R₂═[(CH₂CR′HO)_(x)(CH₂CR″HO)_(y)H]

wherein R′ is selected from the group consisting of H, CH₃, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein R″ is selected from the group consisting of H, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein x+y≤10; wherein y≥1; and wherein z=0 to 5;

c) R₁═[CH₂CH₂(OR₃)CH₂OR₄] and R₂═[CH₂CH₂(O R₃)CH₂O R₄]

wherein R3 is selected from the group consisting of H, (CH₂CH₂O)_(z)H, and mixtures thereof; and wherein z=0 to 10; wherein R4 is selected from the group consisting of (C₁-C₁₆)alkyl, aryl groups, and mixtures thereof; and

d) wherein R1 and R2 can independently be selected from the amino addition product of styrene oxide, glycidyl methyl ether, isobutyl glycidyl ether, isopropylglycidyl ether, t-butyl glycidyl ether, 2-ethylhexylgycidyl ether, and glycidylhexadecyl ether, followed by the addition of from 1 to 10 alkylene oxide units.

A preferred whitening agent of the present invention may be characterized by the following structure (II):

wherein R′ is selected from the group consisting of H, CH₃, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein R″ is selected from the group consisting of H, CH₂O(CH₂CH₂O)_(z)H, and mixtures thereof; wherein x+y≤5; wherein y≥1; and wherein z=0 to 5.

A further preferred whitening agent of the present invention may be characterized by the following structure (III):

typically comprising a mixture having a total of 5 EO groups. Suitable preferred molecules are those in Structure I having the following pendant groups in “part a” above.

TABLE 1 R1 R2 R′ R″ X y R′ R″ x y A H H 3 1 H H 0 1 B H H 2 1 H H 1 1 c = b H H 1 1 H H 2 1 d = a H H 0 1 H H 3 1

Further whitening agents of use include those described in US 2008/0034511 (Unilever). A preferred agent is “Violet 13”.

Suitable dye clay conjugates include dye clay conjugates selected from the group comprising at least one cationic/basic dye and a smectite clay, and mixtures thereof. In one aspect, suitable dye clay conjugates include dye clay conjugates selected from the group consisting of one cationic/basic dye selected from the group consisting of C.I. Basic Yellow 1 through 108, C.I. Basic Orange 1 through 69, C.I. Basic Red 1 through 118, C.I. Basic Violet 1 through 51, C.I. Basic Blue 1 through 164, C.I. Basic Green 1 through 14, C.I. Basic Brown 1 through 23, CI Basic Black 1 through 11, and a clay selected from the group consisting of Montmorillonite clay, Hectorite clay, Saponite clay and mixtures thereof. In still one aspect, suitable dye clay conjugates include dye clay conjugates selected from the group consisting of: Montmorillonite Basic Blue B7 C.I. 42595 conjugate, Montmorillonite Basic Blue B9 C.I. 52015 conjugate, Montmorillonite Basic Violet V3 C.I. 42555 conjugate, Montmorillonite Basic Green G1 C.I. 42040 conjugate, Montmorillonite Basic Red R1 C.I. 45160 conjugate, Montmorillonite C.I. Basic Black 2 conjugate, Hectorite Basic Blue B7 C.I. 42595 conjugate, Hectorite Basic Blue B9 C.I. 52015 conjugate, Hectorite Basic Violet V3 C.I. 42555 conjugate, Hectorite Basic Green G1 C.I. 42040 conjugate, Hectorite Basic Red R1 C.I. 45160 conjugate, Hectorite C.I. Basic Black 2 conjugate, Saponite Basic Blue B7 C.I. 42595 conjugate, Saponite Basic Blue B9 C.I. 52015 conjugate, Saponite Basic Violet V3 C.I. 42555 conjugate, Saponite Basic Green G1 C.I. 42040 conjugate, Saponite Basic Red R1 C.I. 45160 conjugate, Saponite C.I. Basic Black 2 conjugate and mixtures thereof.

Suitable pigments include pigments selected from the group consisting of flavanthrone, indanthrone, chlorinated indanthrone containing from 1 to 4 chlorine atoms, pyranthrone, dichloropyranthrone, monobromodichloropyranthrone, dibromodichloropyranthrone, tetrabromopyranthrone, perylene-3,4,9,10-tetracarboxylic acid diimide, wherein the imide groups may be unsubstituted or substituted by C1-C3-alkyl or a phenyl or heterocyclic radical, and wherein the phenyl and heterocyclic radicals may additionally carry substituents which do not confer solubility in water, anthrapyrimidinecarboxylic acid amides, violanthrone, isoviolanthrone, dioxazine pigments, copper phthalocyanine which may contain up to 2 chlorine atoms per molecule, polychloro-copper phthalocyanine or polybromochloro-copper phthalocyanine containing up to 14 bromine atoms per molecule and mixtures thereof.

In one aspect, suitable pigments include pigments selected from the group consisting of Ultramarine Blue (CA. Pigment Blue 29), Ultramarine Violet (CA. Pigment Violet 15) and mixtures thereof.

The aforementioned fabric hueing agents can be used in combination (any mixture of fabric hueing agents can be used). Suitable hueing agents are described in more detail in U.S. Pat. No. 7,208,459. Preferred levels of dye in compositions of the invention are 0.00001 to 0.5 wt. %, or 0.0001 to 0.25 wt. %. The concentration of dyes preferred in water for the treatment and/or cleaning step is from 1 ppb to 5 ppm, 10 ppb to 5 ppm or 20 ppb to 5 ppm. In preferred compositions, the concentration of surfactant will be from 0.2 to 3 g/I.

Encapsulates—The composition may comprise an encapsulate. In one aspect, an encapsulate comprising a core, a shell having an inner and outer surface, said shell encapsulating said core.

In one aspect of said encapsulate, said core may comprise a material selected from the group consisting of perfumes; brighteners; dyes; insect repellants; silicones; waxes; flavors; vitamins; fabric softening agents; skin care agents in one aspect, paraffins; enzymes; anti-bacterial agents; bleaches; sensates; and mixtures thereof; and said shell may comprise a material selected from the group consisting of polyethylenes; polyamides; polyvinylalcohols, optionally containing other co-monomers; polystyrenes; polyisoprenes; polycarbonates; polyesters; polyacrylates; aminoplasts, in one aspect said aminoplast may comprise a polyureas, polyurethane, and/or polyureaurethane, in one aspect said polyurea may comprise polyoxymethyleneurea and/or melamine formaldehyde; polyolefins; polysaccharides, in one aspect said polysaccharide may comprise alginate and/or chitosan; gelatin; shellac; epoxy resins; vinyl polymers; water insoluble inorganics; silicone; and mixtures thereof.

In one aspect of said encapsulate, said core may comprise perfume.

In one aspect of said encapsulate, said shell may comprise melamine formaldehyde and/or cross linked melamine formaldehyde.

In a one aspect, suitable encapsulates may comprise a core material and a shell, said shell at least partially surrounding said core material, is disclosed. At least 75%, 85% or 90% of said encapsulates may have a fracture strength of from 0.2 to 10 MPa, from 0.4 to 5M Pa, from 0.6 to 3.5 MPa, or from 0.7 to 3 MPa; and a benefit agent leakage of from 0 to 30%, from 0 to 20%, or from 0 to 5%.

In one aspect, at least 75%, 85% or 90% of said encapsulates may have a particle size from 1 to 80 microns, from 5 to 60 microns, from 10 to 50 microns, or from 15 to 40 microns.

In one aspect, at least 75%, 85% or 90% of said encapsulates may have a particle wall thickness from 30 to 250 nm, from 80 to 180 nm, or from 100 to 160 nm.

In one aspect, said encapsulates' core material may comprise a material selected from the group consisting of a perfume raw material and/or optionally a material selected from the group consisting of vegetable oil, including neat and/or blended vegetable oils including castor oil, coconut oil, cottonseed oil, grape oil, rapeseed, soybean oil, corn oil, palm oil, linseed oil, safflower oil, olive oil, peanut oil, coconut oil, palm kernel oil, castor oil, lemon oil and mixtures thereof; esters of vegetable oils, esters, including dibutyl adipate, dibutyl phthalate, butyl benzyl adipate, benzyl octyl adipate, tricresyl phosphate, trioctyl phosphate and mixtures thereof; straight or branched chain hydrocarbons, including those straight or branched chain hydrocarbons having a boiling point of greater than about 80° C.; partially hydrogenated terphenyls, dialkyl phthalates, alkyl biphenyls, including monoisopropylbiphenyl, alkylated naphthalene, including dipropylnaphthalene, petroleum spirits, including kerosene, mineral oil and mixtures thereof; aromatic solvents, including benzene, toluene and mixtures thereof; silicone oils; and mixtures thereof.

In one aspect, said encapsulates' wall material may comprise a suitable resin including the reaction product of an aldehyde and an amine, suitable aldehydes include, formaldehyde. Suitable amines include melamine, urea, benzoguanamine, glycoluril, and mixtures thereof. Suitable melamines include methylol melamine, methylated methylol melamine, imino melamine and mixtures thereof. Suitable ureas include dimethylol urea, methylated dimethylol urea, urea-resorcinol, and mixtures thereof.

In one aspect, suitable formaldehyde scavengers may be employed with the encapsulates, e.g., in a capsule slurry and/or added to a composition before, during or after the encapsulates are added to such composition. Suitable capsules may be made by the following teaching of US 2008/0305982; and/or US 2009/0247449.

In a preferred aspect, the composition can also comprise a deposition aid, preferably consisting of the group comprising cationic or nonionic polymers. Suitable polymers include cationic starches, cationic hydroxyethylcellulose, polyvinylformaldehyde, locust bean gum, mannans, xyloglucans, tamarind gum, polyethyleneterephthalate and polymers containing dimethylaminoethyl methacrylate, optionally with one or monomers selected from the group comprising acrylic acid and acrylamide.

Perfumes—In one aspect, the composition comprises a perfume that comprises one or more perfume raw materials selected from the group consisting of 1,1′-oxybis-2-propanol; 1,4-cyclohexanedicarboxylic acid, diethyl ester; (ethoxymethoxy)cyclododecane; 1,3-nonanediol, monoacetate; (3-methylbutoxy)acetic acid, 2-propenyl ester; beta-methyl cyclododecaneethanol; 2-methyl-3-[(1,7,7-trimethylbicyclo[2.2.1]hept-2-yl)oxy]-1-propanol; oxacyclohexadecan-2-one; alpha-methyl-benzenemethanol acetate; trans-3-ethoxy-1,1,5-trimethylcyclohexane; 4-(1,1-dimethylethyl)cyclohexanol acetate; dodecahydro-3a,6,6,9a-tetramethylnaphtho[2,1-b]furan; beta-methyl benzenepropanal; beta-methyl-3-(1-methylethyl)benzenepropanal; 4-phenyl-2-butanone; 2-methylbutanoic acid, ethyl ester; benzaldehyde; 2-methylbutanoic acid, 1-methylethyl ester; dihydro-5-pentyl-2(3H)furanone; (2E)-1-(2,6,6-trimethyl-2-cyclohexen-1-yl)-2-buten-1-one; dodecanal; undecanal; 2-ethyl-alpha, alpha-dimethylbenzenepropanal; decanal; alpha, alpha-dimethylbenzeneethanol acetate; 2-(phenylmethylene)octanal; 2-[[3-[4-(1,1-dimethylethyl)phenyl]-2-methylpropylidene]amino]benzoic acid, methyl ester; 1-(2,6,6-trimethyl-3-cyclohexen-1-yl)-2-buten-1-one; 2-pentylcyclopentanone; 3-oxo-2-pentyl cyclopentaneacetic acid, methyl ester; 4-hydroxy-3-methoxybenzaldehyde; 3-ethoxy-4-hydroxybenzaldehyde; 2-heptylcyclopentanone; 1-(4-methylphenyl)ethanone; (3E)-4-(2,6,6-trimethyl-1-cyclohexen-1-yl)-3-buten-2-one; (3E)-4-(2,6,6-trimethyl-2-cyclohexen-1-yl)-3-buten-2-one; benzeneethanol; 2H-1-benzopyran-2-one; 4-methoxybenzaldehyde; 10-undecenal; propanoic acid, phenylmethyl ester; beta-methylbenzenepentanol; 1,1-diethoxy-3,7-dimethyl-2,6-octadiene; alpha, alpha-dimethylbenzeneethanol; (2E)-1-(2,6,6-trimethyl-1-cyclohexen-1-yl)-2-buten-1-one; acetic acid, phenylmethyl ester; cyclohexanepropanoic acid, 2-propenyl ester; hexanoic acid, 2-propenyl ester; 1,2-dimethoxy-4-(2-propenyl)benzene; 1,5-dimethyl-bicyclo[3.2.1]octan-8-one oxime; 4-(4-hydroxy-4-methylpentyl)-3-cyclohexene-1-carboxaldehyde; 3-buten-2-ol; 2-[[[2,4(or 3,5)-dimethyl-3-cyclohexen-1-yl]methylene]amino]benzoic acid, methyl ester; 8-cyclohexadecen-1-one; methyl ionone; 2,6-dimethyl-7-octen-2-ol; 2-methoxy-4-(2-propenyl)phenol; (2E)-3,7-dimethyl-2,6-Octadien-1-ol; 2-hydroxy-Benzoic acid, (3Z)-3-hexenyl ester; 2-tridecenenitrile; 4-(2,2-dimethyl-6-methylenecyclohexyl)-3-methyl-3-buten-2-one; tetrahydro-4-methyl-2-(2-methyl-1-propenyl)-2H-pyran; Acetic acid, (2-methylbutoxy)-, 2-propenyl ester; Benzoic acid, 2-hydroxy-, 3-methylbutyl ester; 2-Buten-1-one, 1-(2,6,6-trimethyl-1-cyclohexen-1-yl)-, (Z)-; Cyclopentanecarboxylic acid, 2-hexyl-3-oxo-, methyl ester; Benzenepropanal, 4-ethyl-. alpha.,.alpha.-dimethyl-; 3-Cyclohexene-1-carboxaldehyde, 3-(4-hydroxy-4-methylpentyl)-; Ethanone, 1-(2,3,4,7,8,8a-hexahydro-3,6,8,8-tetramethyl-1H-3a,7-methanoazulen-5-yl)-, [3R-(3.alpha.,3a.beta.,7.beta.,8a.alpha.)]-; Undecanal, 2-methyl-2H-Pyran-2-one, 6-butyltetrahydro-; Benzenepropanal, 4-(1,1-dimethylethyl)-.alpha.-methyl-; 2(3H)-Furanone, 5-heptyldihydro-; Benzoic acid, 2-[(7-hydroxy-3,7-dimethyloctylidene)amino]-, methyl; Benzoic acid, 2-hydroxy-, phenylmethyl ester; Naphthalene, 2-methoxy-; 2-Cyclopenten-1-one, 2-hexyl-; 2(3H)-Furanone, 5-hexyldihydro-; Oxiranecarboxylic acid, 3-methyl-3-phenyl-, ethyl ester; 2-Oxabicyclo[2.2.2]octane, 1,3,3-trimethyl-; Benzenepentanol, γ-methyl-; 3-Octanol, 3,7-dimethyl-; 3,7-dimethyl-2,6-octadienenitrile; 3,7-dimethyl-6-octen-1-ol; Terpineol acetate; 2-methyl-6-methylene-7-Octen-2-ol, dihydro derivative; 3a,4,5,6,7,7a-hexahydro-4,7-Methano-1H-inden-6-ol propanoate; 3-methyl-2-buten-1-ol acetate; (Z)-3-Hexen-1-ol acetate; 2-ethyl-4-(2,2,3-trimethyl-3-cyclopenten-1-yl)-2-buten-1-ol; 4-(octahydro-4,7-methano-5H-inden-5-ylidene)-butanal; 3-2,4-dimethyl-cyclohexene-1-carboxaldehyde; 1-(1,2,3,4,5,6,7,8-octahydro-2,3,8,8-tetramethyl-2-naphthalenyl)-ethanone; 2-hydroxy-benzoic acid, methyl ester; 2-hydroxy-benzoic acid, hexyl ester; 2-phenoxy-ethanol; 2-hydroxy-benzoic acid, pentyl ester; 2,3-heptanedione; 2-hexen-1-ol; 6-Octen-2-ol, 2,6-dimethyl-; damascone (alpha, beta, gamma or delta or mixtures thereof), 4,7-Methano-1H-inden-6-ol, 3a,4,5,6,7,7a-hexahydro-, acetate; 9-Undecenal; 8-Undecenal; Isocyclocitral; Ethanone, 1-(1,2,3,5,6,7,8,8a-octahydro-2,3,8,8-tetramethyl-2-naphthalenyl)-; 3-Cyclohexene-1-carboxaldehyde, 3,5-dimethyl-; 3-Cyclohexene-1-carboxaldehyde, 2,4-dimethyl-; 1,6-Octadien-3-ol, 3,7-dimethyl-; 1,6-Octadien-3-ol, 3,7-dimethyl-, acetate; Lilial (p-t-Bucinal), and Cyclopentanone, 2-[2-(4-methyl-3-cyclohexen-1-yl)propyl]- and 1-methyl-4-(1-methylethenyl)cyclohexene and mixtures thereof.

In one aspect, the composition may comprise an encapsulated perfume particle comprising either a water-soluble hydroxylic compound or melamine-formaldehyde or modified polyvinyl alcohol. In one aspect the encapsulate comprises (a) an at least partially water-soluble solid matrix comprising one or more water-soluble hydroxylic compounds, preferably starch; and (b) a perfume oil encapsulated by the solid matrix.

In a further aspect, the perfume may be pre-complexed with a polyamine, preferably a polyethylenimine so as to form a Schiff base.

Polymers—The composition may comprise one or more polymers. Examples are carboxymethylcellulose, poly(vinyl-pyrrolidone), poly (ethylene glycol), poly(vinyl alcohol), poly(vinylpyridine-N-oxide), poly(vinylimidazole), polycarboxylates such as polyacrylates, maleic/acrylic acid copolymers and lauryl methacrylate/acrylic acid co-polymers.

The composition may comprise one or more amphiphilic cleaning polymers such as the compound having the following structure: bis((C₂H₅O)(C₂H₄O)n)(CH₃)—N⁺—C_(x)H_(2x)—N⁺—(CH₃)-bis((C₂H₅O)(C₂H₄O)n), wherein n=from 20 to 30, and x=from 3 to 8, or sulphated or sulphonated variants thereof.

The composition may comprise amphiphilic alkoxylated grease cleaning polymers which have balanced hydrophilic and hydrophobic properties such that they remove grease particles from fabrics and surfaces. Specific embodiments of the amphiphilic alkoxylated grease cleaning polymers of the present invention comprise a core structure and a plurality of alkoxylate groups attached to that core structure. These may comprise alkoxylated polyalkylenimines, preferably having an inner polyethylene oxide block and an outer polypropylene oxide block.

Alkoxylated polycarboxylates such as those prepared from polyacrylates are useful herein to provide additional grease removal performance. Such materials are described in WO 91/08281 and WO 90/01815. Chemically, these materials comprise polyacrylates having one ethoxy side-chain per every 7-8 acrylate units. The side-chains are of the formula —(CH₂CH₂O), (CH₂)_(n)CH₃ wherein m is 2-3 and n is 6-12. The side-chains are ester-linked to the polyacrylate “backbone” to provide a “comb” polymer type structure. The molecular weight can vary, but is typically in the range of 2000 to 50,000. Such alkoxylated polycarboxylates can comprise from 0.05 wt. % to 10 wt. % of the compositions herein.

The isoprenoid-derived surfactants of the present invention, and their mixtures with other cosurfactants and other adjunct ingredients, are particularly suited to be used with an amphilic graft co-polymer, preferably the amphilic graft co-polymer comprises (i) polyethyelene glycol backbone; and (ii) and at least one pendant moiety selected from polyvinyl acetate, polyvinyl alcohol and mixtures thereof. A preferred amphilic graft co-polymer is Sokalan HP22, supplied from BASF. Suitable polymers include random graft copolymers, preferably a polyvinyl acetate grafted polyethylene oxide copolymer having a polyethylene oxide backbone and multiple polyvinyl acetate side chains. The molecular weight of the polyethylene oxide backbone is preferably 6000 and the weight ratio of the polyethylene oxide to polyvinyl acetate is 40 to 60 and no more than 1 grafting point per 50 ethylene oxide units.

Carboxylate polymer—The composition of the present invention may also include one or more carboxylate polymers such as a maleate/acrylate random copolymer or polyacrylate homopolymer. In one aspect, the carboxylate polymer is a polyacrylate homopolymer having a molecular weight of from 4,000 to 9,000 Da, or from 6,000 to 9,000 Da.

Soil release polymer—The composition of the present invention may also include one or more soil release polymers having a structure as defined by one of the following structures (I), (II) or (III):

—[(OCHR¹—CHR²)_(a)—O—OC—Ar—CO-]_(d)  (I)

—[(OCHR³—CHR⁴)_(b)—O—OC-sAr-CO-]_(e)  (II)

—[(OCHR⁵—CHR⁶)_(c)—OR⁷]_(f)  (III)

wherein: a, b and c are from 1 to 200; d, e and f are from 1 to 50; Ar is a 1,4-substituted phenylene; sAr is 1,3-substituted phenylene substituted in position 5 with SO₃Me; Me is Li, K, Mg/2, Ca/2, Al/3, ammonium, mono-, di-, tri-, or tetraalkylammonium wherein the alkyl groups are C₁-C₁₈ alkyl or C₂-C₁₀ hydroxyalkyl, or mixtures thereof; R¹, R², R³, R⁴, R⁵ and R⁶ are independently selected from H or C₁-C₁₈ n- or iso-alkyl; and R⁷ is a linear or branched C₁-C₁₈ alkyl, or a linear or branched C₂-C₃₀ alkenyl, or a cycloalkyl group with 5 to 9 carbon atoms, or a C₈-C₃₀ aryl group, or a C₆-C₃₀ arylalkyl group.

Suitable soil release polymers are polyester soil release polymers such as Repel-o-tex polymers, including Repel-o-tex, SF-2 and SRP6 supplied by Rhodia. Other suitable soil release polymers include Texcare polymers, including Texcare SRA100, SRA300, SRN100, SRN170, SRN240, SRN300 and SRN325 supplied by Clariant. Other suitable soil release polymers are Marloquest polymers, such as Marloquest SL supplied by Sasol.

Cellulosic polymer—The composition of the present invention may also include one or more cellulosic polymers including those selected from alkyl cellulose, alkyl alkoxyalkyl cellulose, carboxyalkyl cellulose, alkyl carboxyalkyl cellulose. In one aspect, the cellulosic polymers are selected from the group comprising carboxymethyl cellulose, methyl cellulose, methyl hydroxyethyl cellulose, methyl carboxymethyl cellulose, and mixtures thereof. In one aspect, the carboxymethyl cellulose has a degree of carboxymethyl substitution from 0.5 to 0.9 and a molecular weight from 100,000 to 300,000 Da.

Enzymes—The composition may comprise one or more enzymes which provide cleaning performance and/or fabric care benefits. Examples of suitable enzymes include, but are not limited to, hemicellulases, peroxidases, proteases, cellulases, xylanases, lipases, phospholipases, esterases, cutinases, pectinases, mannanases, pectate lyases, keratinases, reductases, oxidases, phenoloxidases, lipoxygenases, ligninases, pullulanases, tannases, pentosanases, malanases, ß-glucanases, arabinosidases, hyaluronidase, chondroitinase, laccase, chlorophyllases, amylases, or mixtures thereof. A typical combination is an enzyme cocktail that may comprise, e.g., a protease and lipase in conjunction with amylase. When present in a composition, the aforementioned additional enzymes may be present at levels from 0.00001 to 2 wt. %, from 0.0001 to 1 wt. % or from 0.001 to 0.5 wt. % enzyme protein by weight of the composition.

In general, the properties of the selected enzyme(s) should be compatible with the selected detergent, (i.e., pH-optimum, compatibility with other enzymatic and non-enzymatic ingredients, etc.), and the enzyme(s) should be present in effective amounts.

In one aspect preferred enzymes would include a cellulase. Suitable cellulases include those of bacterial or fungal origin. Chemically modified or protein engineered mutants are included. Suitable cellulases include cellulases from the genera Bacillus, Pseudomonas, Humicola, Fusarium, Thielavia, Acremonium, e.g., the fungal cellulases produced from Humicola insolens, Myceliophthora thermophila and Fusarium oxysporum disclosed in U.S. Pat. Nos. 4,435,307, 5,648,263, 5,691,178, 5,776,757 and WO 89/09259.

Especially suitable cellulases are the alkaline or neutral cellulases having colour care benefits. Examples of such cellulases are cellulases described in EP 0495257, EP 0531372, WO 96/11262, WO 96/29397, WO 98/08940. Other examples are cellulase variants such as those described in WO 94/07998, EP 0531315, U.S. Pat. Nos. 5,457,046, 5,686,593, 5,763,254, WO 95/24471, WO 98/12307 and PCT/DK98/00299.

Commercially available cellulases include Celluzyme™, and Carezyme™ (Novozymes A/S), Clazinase™, and Puradax HA™ (Genencor International Inc.), and KAC-500(B)™ (Kao Corporation).

In one aspect preferred enzymes would include a protease. Suitable proteases include those of bacterial, fungal, plant, viral or animal origin, e.g., vegetable or microbial origin. Microbial origin is preferred. Chemically modified or protein engineered mutants are included. It may be an alkaline protease, such as a serine protease or a metalloprotease. A serine protease may for example be of the 51 family, such as trypsin, or the S8 family such as subtilisin. A metalloproteases protease may for example be a thermolysin from, e.g., family M4 or other metalloprotease such as those from M5, M7 or M8 families.

The term “subtilases” refers to a sub-group of serine protease according to Siezen et al., 1991, Protein Engng. 4: 719-737 and Siezen et al., 1997, Protein Science 6: 501-523. Serine proteases are a subgroup of proteases characterized by having a serine in the active site, which forms a covalent adduct with the substrate. The subtilases may be divided into 6 sub-divisions, i.e., the Subtilisin family, the Thermitase family, the Proteinase K family, the Lantibiotic peptidase family, the Kexin family and the Pyrolysin family.

Examples of subtilases are those derived from Bacillus such as Bacillus lentus, B. alkalophilus, B. subtilis, B. amyloliquefaciens, Bacillus pumilus and Bacillus gibsonii described in; U.S. Pat. No. 7,262,042 and WO 2009/021867, and subtilisin lentus, subtilisin Novo, subtilisin Carlsberg, Bacillus licheniformis, subtilisin BPN′, subtilisin 309, subtilisin 147 and subtilisin 168 described in WO 89/06279 and protease PD138 described in (WO 93/18140). Other useful proteases may be those described in WO 92/175177, WO 01/16285, WO 02/26024 and WO 02/016547. Examples of trypsin-like proteases are trypsin (e.g., of porcine or bovine origin) and the Fusarium protease described in WO 89/06270, WO 94/25583 and WO 2005/040372, and the chymotrypsin proteases derived from Cellumonas described in WO 2005/052161 and WO 2005/052146.

A further preferred protease is the alkaline protease from Bacillus lentus DSM 5483, as described for example in WO 95/23221, and variants thereof which are described in WO 92/21760, WO 95/23221, EP 1921147 and EP 1921148.

Examples of metalloproteases are the neutral metalloprotease as described in WO 2007/044993 (Genencor Int.) such as those derived from Bacillus amyloliquefaciens.

Examples of useful proteases are the variants described in: WO 92/19729, WO 96/034946, WO 98/20115, WO 98/20116, WO 99/011768, WO 01/44452, WO 03/006602, WO 2004/003186, WO 2004/041979, WO 2007/006305, WO 2011/036263, WO 2011/036264, especially the variants with substitutions in one or more of the following positions: 3, 4, 9, 15, 27, 36, 57, 68, 76, 87, 95, 96, 97, 98, 99, 100, 101, 102, 103, 104, 106, 118, 120, 123, 128, 129, 130, 160, 167, 170, 194, 195, 199, 205, 206, 217, 218, 222, 224, 232, 235, 236, 245, 248, 252 and 274 using the BPN′ numbering. More preferred the subtilase variants may comprise the mutations/modifications: S3T, V41, S9R, A15T, K27R, *36D, V68A, N76D, N87S,R, *97E, A98S, S99G,D,A, S99AD, S101G,M,R S103A, V1041,Y,N, S106A, G118V,R, H120D,N, N123S, S128L, P129Q, 5130A, G160D, Y167A, R1705, A194P, G195E, V199M, V2051, L217D, N218D, M222S, A232V, K235L, Q236H, Q245R, N252K, T274A (using BPN′ numbering).

Suitable commercially available protease enzymes include those sold under the trade names Alcalase®, Blaze®; Duralase™, Durazym™, Relase®, Relase® Ultra, Savinase®, Savinase® Ultra, Primase®, Polarzyme®, Kannase®, Liquanase®, Liquanase® Ultra, Ovozyme®, Coronase®, Coronase® Ultra, Neutrase®, Everlase® and Esperase® all could be sold as Ultra® or Evity® (Novozymes A/S), those sold under the tradename Maxatase®, Maxacal®, Maxapem®, Purafect®, Purafect Prime®, Preferenz™, Purafect MA®, Purafect Ox®, Purafect OxP®, Puramax®, Properase®, Effectenz™, FN2®, FN3®, FN4®, Excellase®, Opticlean® and Optimase® (Danisco/DuPont), Axapem™ (Gist-Brocases N.V.), BLAP (sequence shown in FIG. 29 of U.S. Pat. No. 5,352,604) and variants hereof (Henkel AG) and KAP (Bacillus alkalophilus subtilisin) from Kao.

In one aspect preferred enzymes would include an amylase. Suitable amylases may be an alpha-amylase or a glucoamylase and may be of bacterial or fungal origin. Chemically modified or protein engineered mutants are included. Amylases include, for example, alpha-amylases obtained from Bacillus, e.g., a special strain of Bacillus licheniformis, described in more detail in GB 1296839.

Suitable amylases include amylases having SEQ ID NO: 3 in WO 95/10603 or variants having 90% sequence identity thereto. Preferred variants are described in WO 94/02597, WO 94/18314, WO 97/43424 and SEQ ID NO: 4 of WO 99/19467, such as variants with substitutions in one or more of the following positions: 15, 23, 105, 106, 124, 128, 133, 154, 156, 178, 179, 181, 188, 190, 197, 201, 202, 207, 208, 209, 211, 243, 264, 304, 305, 391, 408, and 444.

Different suitable amylases include amylases having SEQ ID NO: 6 in WO 02/10355 or variants thereof having 90% sequence identity thereto. Preferred variants of SEQ ID NO: 6 have a deletion in positions 181 and 182 and a substitution in position 193.

Other amylases which are suitable are hybrid alpha-amylase comprising residues 1-33 of the alpha-amylase derived from B. amyloliquefaciens shown in SEQ ID NO: 6 of WO 2006/066594 and residues 36-483 of the B. licheniformis alpha-amylase shown in SEQ ID NO: 4 of WO 2006/066594 or variants having 90% sequence identity thereof. Preferred variants of this hybrid alpha-amylase have a substitution, a deletion or an insertion in one of more of the following positions: G48, T49, G107, H156, A181, N190, M197, I201, A209 and Q264. Most preferred variants of the hybrid alpha-amylase comprising residues 1-33 of the alpha-amylase derived from B. amyloliquefaciens shown in SEQ ID NO: 6 of WO 2006/066594 and residues 36-483 of SEQ ID NO: 4 have the substitutions:

M197T;

H156Y+A181T+N190F+A209V+Q264S; or

G48A+T49I+G107A+H156Y+A181T+N190F+I201F+A209V+Q264S.

Further amylases which are suitable are amylases having SEQ ID NO: 6 in WO 99/19467 or variants thereof having 90% sequence identity thereto. Preferred variants of SEQ ID NO: 6 are those having a substitution, a deletion or an insertion in one or more of the following positions: R181, G182, H183, G184, N195, 1206, E212, E216 and K269. Particularly preferred amylases have a deletion in positions R181 and G182, or positions H183 and G184.

Additional amylases have the amino acid sequence of SEQ ID NO: 1, SEQ ID NO: 2, SEQ ID NO: 3, or SEQ ID NO: 7 of WO 96/23873 or variants thereof having 90% sequence identity to SEQ ID NO: 1, SEQ ID NO: 2, SEQ ID NO: 3 or SEQ ID NO: 7. Preferred variants of SEQ ID NO: 1, SEQ ID NO: 2, SEQ ID NO: 3 or SEQ ID NO: 7 have a substitution, a deletion or an insertion in one or more of the following positions: 140, 181, 182, 183, 184, 195, 206, 212, 243, 260, 269, 304 and 476. More preferred variants have a deletion in positions 181 and 182 or positions 183 and 184. Most preferred amylase variants of SEQ ID NO: 1, SEQ ID NO: 2 or SEQ ID NO: 7 have a deletion in positions 183 and 184 and a substitution in one or more of positions 140, 195, 206, 243, 260, 304 and 476.

Other amylases which can be used are amylases having SEQ ID NO: 2 of WO 2008/153815, SEQ ID NO: 10 in WO 01/66712 or variants thereof having 90% sequence identity to SEQ ID NO: 2 of WO 2008/153815 or 90% sequence identity to SEQ ID NO: 10 in WO 01/66712. Preferred variants of SEQ ID NO: 10 in WO 01/66712 have a substitution, a deletion or an insertion in one of more of the following positions: 176, 177, 178, 179, 190, 201, 207, 211 and 264.

Further suitable amylases are amylases having SEQ ID NO: 2 of WO 2009/061380 or variants having 90% sequence identity thereto. Preferred variants have a truncation of the C-terminus and/or a substitution, a deletion or an insertion in one of more of the following positions: Q87, Q98, S125, N128, T131, T165, K178, R180, S181, T182, G183, M201, F202, N225, S243, N272, N282, Y305, R309, D319, Q320, Q359, K444 and G475. More preferred variants have a substitution in one of more of the following positions: Q87E,R, Q98R, S125A, N128C, T131I, T165I, K178L, T182G, M201L, F202Y, N225E,R, N272E,R, S243Q,A,E,D, Y305R, R309A, Q320R, Q359E, K444E and G475K and/or deletion in position R180 and/or S181 or of T182 and/or G183. Most preferred amylase variants have the substitutions:

N128C+K178L+T182G+Y305R+G475K;

N1280+K178L+T182G+F202Y+Y305R+D319T+G475K;

S125A+N128C+K178L+T182G+Y305R+G475K; or

S125A+N128C+T131I+T165I+K178L+T182G+Y305R+G475K wherein the variants are C-terminally truncated and optionally further comprise a substitution at position 243 and/or a deletion at position 180 and/or position 181.

Other suitable amylases are the alpha-amylase having SEQ ID NO: 12 in WO 01/66712 or a variant having at least 90% sequence identity thereto. Preferred amylase variants have a substitution, a deletion or an insertion in one of more of the following positions: R28, R118, N174; R181, G182, D183, G184, G186, W189, N195, M202, Y298, N299, K302, S303, N306, R310, N314; R320, H324, E345, Y396, R400, W439, R444, N445, K446, Q449, R458, N471, N484. Particular preferred amylases include variants having a deletion of D183 and G184 and having the substitutions R118K, N195F, R320K and R458K, and a variant additionally having substitutions in one or more position selected from the group: M9, G149, G182, G186, M202, T257, Y295, N299, M323, E345 and A339, most preferred a variant that additionally has substitutions in all these positions.

Other examples are amylase variants such as those described in WO 2011/098531, WO 2013/001078 and WO 2013/001087.

Commercially available amylases are Duramyl™, Termamyl™, Termamyl Ultra™, Fungamyl™, Ban™, Stainzyme™, Stainzyme Plus™, Amplify®, Supramyl™, Natalase™ Everest™, Liquozyme X and BAN™ (from Novozymes A/S), KEMZYM® AT 9000 Biozym Biotech Trading GmbH Wehlistrasse 27b A-1200 Wien Austria, and Rapidase™, Purastar™/Effectenz™, Powerase, Preferenz S100, Preferenx S110, ENZYSIZE®, OPTISIZE HT PLUS®, and PURASTAR OXAM® (Danisco/DuPont) and KAM® (Kao).

Suitable lipases and cutinases include those of bacterial or fungal origin. Chemically modified or protein engineered mutant enzymes are included. Examples include lipase from Thermomyces, e.g., from T. lanuginosus (previously named Humicola lanuginosa) as described in EP258068 and EP305216, cutinase from Humicola, e.g., H. insolens (WO 96/13580), lipase from strains of Pseudomonas (some of these now renamed to Burkholderia), e.g., P. alcaligenes or P. pseudoalcaligenes (EP 218272), P. cepacia (EP 331376), P. sp. strain SD705 (WO 95/06720 & WO 96/27002), P. wisconsinensis (WO 96/12012), GDSL-type Streptomyces lipases (WO 2010/065455), cutinase from Magnaporthe grisea (WO 2010/107560), cutinase from Pseudomonas mendocina (U.S. Pat. No. 5,389,536), lipase from Thermobifida fusca (WO 2011/084412, WO 2013/033318), Geobacillus stearothermophilus lipase (WO 2011/084417), lipase from Bacillus subtilis (WO 2011/084599), and lipase from Streptomyces griseus (WO 2011/150157) and S. pristinaespiralis (WO 2012/137147).

Other examples are lipase variants such as those described in EP 407225, WO 92/05249, WO 94/01541, WO 94/25578, WO 95/14783, WO 95/30744, WO 95/35381, WO 95/22615, WO 96/00292, WO 97/04079, WO 97/07202, WO 00/34450, WO 00/60063, WO 01/92502, WO 2007/087508 and WO 2009/109500.

Preferred commercial lipase products include Lipolase™, Lipex™; Lipex Evity™; Lipolex™ and Lipoclean™ (Novozymes A/S), Lumafast (originally from Genencor) and Lipomax (originally from Gist-Brocades).

Still other examples are lipases sometimes referred to as acyltransferases or perhydrolases, e.g., acyltransferases with homology to Candida antarctica lipase A (WO 2010/111143), acyltransferase from Mycobacterium smegmatis (WO 2005/056782), perhydrolases from the CE 7 family (WO 2009/67279), and variants of the M. smegmatis perhydrolase in particular the S54V variant used in the commercial product Gentle Power Bleach from Huntsman Textile Effects Pte Ltd (WO 2010/100028).

In one aspect, other preferred enzymes include microbial-derived endoglucanases exhibiting endo-beta-1,4-glucanase activity (EC 3.2.1.4), including a bacterial polypeptide endogenous to a member of the genus Bacillus which has a sequence of at least 90%, 94%, 97% or 99% identity to the amino acid sequence of SEQ ID NO: 2 in U.S. Pat. No. 7,141,403 and mixtures thereof. Suitable endoglucanases are sold under the tradenames Celluclean® and Whitezyme® (Novozymes).

Other preferred enzymes include pectate lyases sold under the tradenames Pectawash®, Pectaway®, Xpect® and mannanases sold under the tradenames Mannaway® (Novozymes), and Purabrite® (Danisco/DuPont).

The detergent enzyme(s) may be included in a detergent composition by adding separate additives containing one or more enzymes, or by adding a combined additive comprising all of these enzymes. A detergent additive of the invention, i.e., a separate additive or a combined additive, can be formulated, for example, as granulate, liquid, slurry, etc. Preferred detergent additive formulations are granulates, in particular non-dusting granulates, liquids, in particular stabilized liquids, or slurries.

Non-dusting granulates may be produced, e.g., as disclosed in U.S. Pat. Nos. 4,106,991 and 4,661,452 and may optionally be coated by methods known in the art. Examples of waxy coating materials are poly(ethylene oxide) products (polyethyleneglycol, PEG) with mean molar weights of 1000 to 20000; ethoxylated nonylphenols having from 16 to 50 ethylene oxide units; ethoxylated fatty alcohols in which the alcohol contains from 12 to 20 carbon atoms and in which there are 15 to 80 ethylene oxide units; fatty alcohols; fatty acids; and mono- and di- and triglycerides of fatty acids. Examples of film-forming coating materials suitable for application by fluid bed techniques are given in GB 1483591. Liquid enzyme preparations may, for instance, be stabilized by adding a polyol such as propylene glycol, a sugar or sugar alcohol, lactic acid or boric acid according to established methods. Protected enzymes may be prepared according to the method disclosed in EP 238216.

Dye Transfer Inhibiting Agents—The compositions of the present invention may also include one or more dye transfer inhibiting agents. Suitable polymeric dye transfer inhibiting agents include, but are not limited to, polyvinylpyrrolidone polymers, polyamine N-oxide polymers, copolymers of N-vinylpyrrolidone and N-vinylimidazole, polyvinyloxazolidones and polyvinylimidazoles or mixtures thereof. When present in a composition, the dye transfer inhibiting agents may be present at levels from 0.0001 to 10 wt. %, from 0.01 to 5 wt. % or from 0.1 to 3 wt. %.

Brighteners—The compositions of the present invention can also contain or comprise additional components that may tint articles being cleaned, such as fluorescent brighteners.

The composition may comprise C.I. fluorescent brightener 260 in alpha-crystalline form having the following structure:

In one aspect, the brightener is a cold water soluble brightener, such as the C.I. fluorescent brightener 260 in alpha-crystalline form. In one aspect the brightener is predominantly in alpha-crystalline form, which means that typically at least 50 wt. %, at least 75 wt. %, at least 90 wt. %, at least 99 wt. %, or even substantially all, of the C.I. fluorescent brightener 260 is in alpha-crystalline form.

The brightener is typically in micronized particulate form, having a weight average primary particle size of from 3 to 30 μm, from 3 to 20 μm, or from 3 to 10 μm.

The composition may comprise C.I. fluorescent brightener 260 in beta-crystalline form, and the weight ratio of: (i) C.I. fluorescent brightener 260 in alpha-crystalline form, to (ii) C.I. fluorescent brightener 260 in beta-crystalline form may be at least 0.1, or at least 0.6. BE680847 relates to a process for making 0.1 fluorescent brightener 260 in alpha-crystalline form.

Commercial optical brighteners which may be useful in the present invention can be classified into subgroups, which include, but are not necessarily limited to, derivatives of stilbene, pyrazoline, coumarin, carboxylic acid, methinecyanines, dibenzothiophene-5,5-dioxide, azoles, 5- and 6-membered-ring heterocycles, and other miscellaneous agents. Examples of such brighteners are disclosed in “The Production and Application of Fluorescent Brightening Agents”, M. Zahradnik, Published by John Wiley & Sons, New York (1982). Specific nonlimiting examples of optical brighteners which are useful in the present compositions are those identified in U.S. Pat. Nos. 4,790,856 and 3,646,015.

A further suitable brightener has the structure below:

Suitable fluorescent brightener levels include lower levels of from 0.01 wt. %, from 0.05 wt. %, from 0.1 wt. % or from 0.2 wt. % to upper levels of 0.5 wt. % or 0.75 wt. %.

In one aspect the brightener may be loaded onto a clay to form a particle.

Silicate salts—The compositions of the present invention can also contain or comprise silicate salts, such as sodium or potassium silicate. The composition may comprise of from 0 wt. % to less than 10 wt. % silicate salt, to 9 wt. %, or to 8 wt. %, or to 7 wt. %, or to 6 wt. %, or to 5 wt. %, or to 4 wt. %, or to 3 wt. %, or even to 2 wt. %, and from above 0 wt. %, or from 0.5 wt. %, or from 1 wt. % silicate salt. A suitable silicate salt is sodium silicate.

Dispersants—The compositions of the present invention can also contain or comprise dispersants. Suitable water-soluble organic materials include the homo- or co-polymeric acids or their salts, in which the polycarboxylic acid comprises at least two carboxyl radicals separated from each other by not more than two carbon atoms.

Enzyme Stabilizers—Enzymes for use in compositions can be stabilized by various techniques. The enzymes employed herein can be stabilized by the presence of water-soluble sources of calcium and/or magnesium ions. Examples of conventional stabilizing agents are, e.g., a polyol such as propylene glycol or glycerol, a sugar or sugar alcohol, a peptide aldehyde, lactic acid, boric acid, or a boric acid derivative, e.g., an aromatic borate ester, or a phenyl boronic acid derivative such as 4-formylphenyl boronic acid, and the composition may be formulated as described in, for example, WO 92/19709 and WO 92/19708 In case of aqueous compositions comprising protease, a reversible protease inhibitor, such as a boron compound including borate, 4-formyl phenylboronic acid, phenylboronic acid and derivatives thereof, or compounds such as calcium formate, sodium formate and 1,2-propane diol can be added to further improve stability. The peptide aldehyde may be of the formula B₂—B₁—B₀—R wherein: R is hydrogen, CH₃, CX₃, CHX₂, or CH₂X, wherein X is a halogen atom; B₀ is a phenylalanine residue with an OH substituent at the p-position and/or at the m-position; B₁ is a single amino acid residue; and B₂ consists of one or more amino acid residues, optionally comprising an N-terminal protection group. Preferred peptide aldehydes include but are not limited to: Z-RAY-H, Ac-GAY-H, Z-GAY-H, Z-GAL-H, Z-GAF-H, Z-GAV-H, Z-RVY-H, Z-LVY-H, Ac-LGAY-H, Ac-FGAY-H, Ac-YGAY-H, Ac-FGVY-H or Ac-WLVY-H, where Z is benzyloxycarbonyl and Ac is acetyl.

Solvents—Suitable solvents include water and other solvents such as lipophilic fluids. Examples of suitable lipophilic fluids include siloxanes, other silicones, hydrocarbons, glycol ethers, glycerine derivatives such as glycerine ethers, perfluorinated amines, perfluorinated and hydrofluoroether solvents, low-volatility nonfluorinated organic solvents, diol solvents, other environmentally-friendly solvents and mixtures thereof.

Structurant/Thickeners—Structured liquids can either be internally structured, whereby the structure is formed by primary ingredients (e.g., surfactant material) and/or externally structured by providing a three dimensional matrix structure using secondary ingredients (e.g., polymers, clay and/or silicate material). The composition may comprise a structurant, from 0.01 to 5 wt. %, or from 0.1 to 2.0 wt. %. The structurant is typically selected from the group consisting of diglycerides and triglycerides, ethylene glycol distearate, microcrystalline cellulose, cellulose-based materials, microfiber cellulose, hydrophobically modified alkali-swellable emulsions such as Polygel W30 (3VSigma), biopolymers, xanthan gum, gellan gum, and mixtures thereof. A suitable structurant includes hydrogenated castor oil, and non-ethoxylated derivatives thereof. A suitable structurant is disclosed in U.S. Pat. No. 6,855,680. Such structurants have a thread-like structuring system having a range of aspect ratios. Other suitable structurants and the processes for making them are described in WO 2010/034736.

Conditioning Agents—The composition of the present invention may include a high melting point fatty compound. The high melting point fatty compound useful herein has a melting point of 25° C. or higher, and is selected from the group consisting of fatty alcohols, fatty acids, fatty alcohol derivatives, fatty acid derivatives, and mixtures thereof. Such compounds of low melting point are not intended to be included in this section. Non-limiting examples of the high melting point compounds are found in International Cosmetic Ingredient Dictionary, Fifth Edition, 1993, and CTFA Cosmetic Ingredient Handbook, Second Edition, 1992.

The high melting point fatty compound is included in the composition at a level of from 0.1 to 40 wt. %, from 1 to 30 wt. %, from 1.5 to 16 wt. %, from 1.5 to 8 wt. % in view of providing improved conditioning benefits such as slippery feel during the application to wet hair, softness and moisturized feel on dry hair.

The compositions of the present invention may contain or comprise a cationic polymer. Concentrations of the cationic polymer in the composition typically range from 0.05 to 3 wt. %, from 0.075 to 2.0 wt. %, or from 0.1 to 1.0 wt. %. Suitable cationic polymers will have cationic charge densities of at least 0.5 meq/gm, at least 0.9 meq/gm, at least 1.2 meq/gm, at least 1.5 meq/gm, or less than 7 meq/gm, and less than 5 meq/gm, at the pH of intended use of the composition, which pH will generally range from pH 3 to pH 9, or between pH 4 and pH 8. Herein, “cationic charge density” of a polymer refers to the ratio of the number of positive charges on the polymer to the molecular weight of the polymer. The average molecular weight of such suitable cationic polymers will generally be between 10,000 and 10 million, between 50,000 and 5 million, or between 100,000 and 3 million.

Suitable cationic polymers for use in the compositions of the present invention contain or comprise cationic nitrogen-containing moieties such as quaternary ammonium or cationic protonated amino moieties. Any anionic counterions can be used in association with the cationic polymers so long as the polymers remain soluble in water, in the composition, or in a coacervate phase of the composition, and so long as the counterions are physically and chemically compatible with the essential components of the composition or do not otherwise unduly impair composition performance, stability or aesthetics. Nonlimiting examples of such counterions include halides (e.g., chloride, fluoride, bromide, iodide), sulfate and methylsulfate.

Nonlimiting examples of such polymers are described in the CTFA Cosmetic Ingredient Dictionary, 3rd edition, edited by Estrin, Crosley, and Haynes (The Cosmetic, Toiletry, and Fragrance Association, Inc., Washington, D.C. (1982)).

Other suitable cationic polymers for use in the composition include polysaccharide polymers, cationic guar gum derivatives, quaternary nitrogen-containing cellulose ethers, synthetic polymers, copolymers of etherified cellulose, guar and starch. When used, the cationic polymers herein are either soluble in the composition or are soluble in a complex coacervate phase in the composition formed by the cationic polymer and the anionic, amphoteric and/or zwitterionic surfactant component described hereinbefore. Complex coacervates of the cationic polymer can also be formed with other charged materials in the composition. Suitable cationic polymers are described in U.S. Pat. Nos. 3,962,418; 3,958,581; and US 2007/0207109.

The composition of the present invention may include a nonionic polymer as a conditioning agent. Polyalkylene glycols having a molecular weight of more than 1000 are useful herein. Useful are those having the following formula:

wherein R⁹⁵ is selected from the group consisting of H, methyl, and mixtures thereof. Conditioning agents, and in particular silicones, may be included in the composition. The conditioning agents useful in the compositions of the present invention typically comprise a water insoluble, water dispersible, non-volatile, liquid that forms emulsified, liquid particles. Suitable conditioning agents for use in the composition are those conditioning agents characterized generally as silicones (e.g., silicone oils, cationic silicones, silicone gums, high refractive silicones, and silicone resins), organic conditioning oils (e.g., hydrocarbon oils, polyolefins, and fatty esters) or combinations thereof, or those conditioning agents which otherwise form liquid, dispersed particles in the aqueous surfactant matrix herein. Such conditioning agents should be physically and chemically compatible with the essential components of the composition, and should not otherwise unduly impair composition stability, aesthetics or performance.

The concentration of the conditioning agent in the composition should be sufficient to provide the desired conditioning benefits. Such concentration can vary with the conditioning agent, the conditioning performance desired, the average size of the conditioning agent particles, the type and concentration of other components, and other like factors.

The concentration of the silicone conditioning agent typically ranges from 0.01 to 10 wt. %. Non-limiting examples of suitable silicone conditioning agents, and optional suspending agents for the silicone, are described in U.S. Reissue Pat. No. 34,584; U.S. Pat. Nos. 5,104,646; 5,106,609; 4,152,416; 2,826,551; 3,964,500; 4,364,837; 6,607,717; 6,482,969; 5,807,956; 5,981,681; 6,207,782; 7,465,439; 7,041,767; 7,217,777; US 2007/0286837; US 2005/0048549; US 2007/0041929; GB 849433; DE 10036533, which are all incorporated herein by reference; Chemistry and Technology of Silicones, New York: Academic Press (1968); General Electric Silicone Rubber Product Data Sheets SE 30, SE 33, SE 54 and SE 76; Silicon Compounds, Petrarch Systems, Inc. (1984); and in Encyclopedia of Polymer Science and Engineering, vol. 15, 2d ed., pp 204-308, John Wiley & Sons, Inc. (1989).

The compositions of the present invention may also comprise from 0.05 to 3 wt. % of at least one organic conditioning oil as the conditioning agent, either alone or in combination with other conditioning agents, such as the silicones (described herein). Suitable conditioning oils include hydrocarbon oils, polyolefins, and fatty esters. Also suitable for use in the compositions herein are the conditioning agents described in U.S. Pat. Nos. 5,674,478 and 5,750,122 or in U.S. Pat. Nos. 4,529,586; 4,507,280; 4,663,158; 4,197,865; 4,217,914; 4,381,919; and 4,422,853.

Hygiene and malodour—The compositions of the present invention may also comprise one or more of zinc ricinoleate, thymol, quaternary ammonium salts such as Bardac®, polyethylenimines (such as Lupasol® from BASF) and zinc complexes thereof, silver and silver compounds, especially those designed to slowly release Ag⁺ or nano-silver dispersions.

Probiotics—The compositions may comprise probiotics such as those described in WO 2009/043709.

Suds Boosters—If high sudsing is desired, suds boosters such as the C₁₀-C₁₆ alkanolamides or C₁₀-C₁₄ alkyl sulphates can be incorporated into the compositions, typically at 1 to 10 wt. % levels. The C₁₀-C₁₄ monoethanol and diethanol amides illustrate a typical class of such suds boosters. Use of such suds boosters with high sudsing adjunct surfactants such as the amine oxides, betaines and sultaines noted above is also advantageous. If desired, water-soluble magnesium and/or calcium salts such as MgCl₂, MgSO₄, CaCl₂, CaSO₄ and the like, can be added at levels of, typically, 0.1 to 2 wt. %, to provide additional suds and to enhance grease removal performance.

Suds Suppressors—Compounds for reducing or suppressing the formation of suds can be incorporated into the compositions of the present invention. Suds suppression can be of particular importance in the so-called “high concentration cleaning process” as described in U.S. Pat. Nos. 4,489,455 and 4,489,574, and in front-loading-style washing machines. A wide variety of materials may be used as suds suppressors, and suds suppressors are well known to those skilled in the art. See, e.g., Kirk Othmer Encyclopedia of Chemical Technology, Third Edition, Volume 7, p. 430-447 (John Wiley & Sons, Inc., 1979). Examples of suds suppressors include monocarboxylic fatty acid and soluble salts therein, high molecular weight hydrocarbons such as paraffin, fatty acid esters (e.g., fatty acid triglycerides), fatty acid esters of monovalent alcohols, aliphatic C₁₈-C₄₀ ketones (e.g., stearone), N-alkylated amino triazines, waxy hydrocarbons preferably having a melting point below about 100° C., silicone suds suppressors, and secondary alcohols. Suds suppressors are described in U.S. Pat. Nos. 2,954,347; 4,265,779; 4,265,779; 3,455,839; 3,933,672; 4,652,392; 4,978,471; 4,983,316; 5,288,431; 4,639,489; 4,749,740; 4,798,679; 4,075,118; EP 89307851.9; EP 150872; and DOS 2,124,526.

For any detergent compositions to be used in automatic laundry washing machines, suds should not form to the extent that they overflow the washing machine. Suds suppressors, when utilized, are preferably present in a “suds suppressing amount. By “suds suppressing amount” is meant that the formulator of the composition can select an amount of this suds controlling agent that will sufficiently control the suds to result in a low-sudsing laundry detergent for use in automatic laundry washing machines.

The compositions herein will generally comprise from 0 to 10 wt. % of suds suppressor. When utilized as suds suppressors, monocarboxylic fatty acids, and salts therein, will be present typically in amounts up to 5 wt. %. Preferably, from 0.5 to 3 wt. % of fatty monocarboxylate suds suppressor is utilized. Silicone suds suppressors are typically utilized in amounts up to 2.0 wt. %, although higher amounts may be used. Monostearyl phosphate suds suppressors are generally utilized in amounts ranging from 0.1 to 2 wt. %. Hydrocarbon suds suppressors are typically utilized in amounts ranging from 0.01 to 5.0 wt. %, although higher levels can be used. The alcohol suds suppressors are typically used at 0.2 to 3 wt. %.

The compositions herein may have a cleaning activity over a broad range of pH. In certain embodiments, the compositions have cleaning activity from pH4 to pH11.5. In other embodiments, the compositions are active from pH6 to pH11, from pH7 to pH11, from pH8 to pH11, from pH9 to pH11, or from pH10 to pH11.5.

The compositions herein may have cleaning activity over a wide range of temperatures, e.g., from 10° C. or lower to 90° C. Preferably the temperature will be below 50° C. or 40° C. or even 30° C. In certain embodiments, the optimum temperature range for the compositions is from 10° C. to 20° C., from 15° C. to 25° C., from 15° C. to 30° C., from 20° C. to 30° C., from 25° C. to 35° C., from 30° C. to 40° C., from 35° C. to 45° C., or from 40° C. to 50° C.

Form of the Composition

The compositions described herein are advantageously employed for example, in laundry applications, hard surface cleaning, dishwashing applications, as well as cosmetic applications such as dentures, teeth, hair and skin. The compositions of the invention are in particular solid or liquid cleaning and/or treatment compositions. In one aspect, the invention relates to a composition, wherein the form of the composition is selected from the group consisting of a regular, compact or concentrated liquid; a gel; a paste; a soap bar; a regular or a compacted powder; a granulated solid; a homogenous or a multilayer tablet with two or more layers (same or different phases); a pouch having one or more compartments; a single or a multi-compartment unit dose form; or any combination thereof.

The form of the composition may separate the components physically from each other in compartments such as, e.g., water dissolvable pouches or in different layers of tablets. Thereby negative storage interaction between components can be avoided. Different dissolution profiles of each of the compartments can also give rise to delayed dissolution of selected components in the wash solution.

Pouches can be configured as single or multicompartments. It can be of any form, shape and material which is suitable for hold the composition, e.g., without allowing the release of the composition to release of the composition from the pouch prior to water contact. The pouch is made from water soluble film which encloses an inner volume. Said inner volume can be divided into compartments of the pouch. Preferred films are polymeric materials preferably polymers which are formed into a film or sheet. Preferred polymers, copolymers or derivates thereof are selected polyacrylates, and water soluble acrylate copolymers, methyl cellulose, carboxy methyl cellulose, sodium dextrin, ethyl cellulose, hydroxyethyl cellulose, hydroxypropyl methyl cellulose, malto dextrin, poly methacrylates, most preferably polyvinyl alcohol copolymers and, hydroxypropyl methyl cellulose (HPMC). Preferably the level of polymer in the film for example PVA is at least about 60%. Preferred average molecular weight will typically be about 20,000 to about 150,000. Films can also be of blended compositions comprising hydrolytically degradable and water soluble polymer blends such as polylactide and polyvinyl alcohol (known under the Trade reference M8630 as sold by MonoSol LLC, Indiana, USA) plus plasticisers like glycerol, ethylene glycerol, propylene glycol, sorbitol and mixtures thereof. The pouches can comprise a solid laundry cleaning composition or part components and/or a liquid cleaning composition or part components separated by the water soluble film. The compartment for liquid components can be different in composition than compartments containing solids (US 2009/0011970).

Lipase Particles

The lipase variants comprised in the water-soluble film of the invention may be present as lipase particles. The lipase particles may even contain one or more Additional Enzymes, as described below.

Lipase particles are any form of lipase variant in a solid particulate form. That can be as lipase crystals, lipase precipitate, spray or freeze-dried lipase or any form of granulated lipase, either as a powder or a suspension in liquid. Typically the particle size, measured as equivalent spherical diameter (volume based average particle size), of the lipase particles is below 2 mm, preferably below 1 mm, below 0.5 mm, below 0.25 mm, or below 0.1 mm; and above 0.05 μm, preferably above 0.1 μm, above 0.5 μm, above 1 μm, above 5 μm or above 10 μm.

In a preferred embodiment, the particle size of the lipase particles is from 0.5 μm to 100 μm.

The lipase particles contain at least 1% w/w lipase protein, preferably at least 5% w/w lipase protein, at least 10% w/w lipase protein, at least 20% w/w lipase protein, at least 30% w/w lipase protein, at least 40% w/w lipase protein, at least 50% w/w lipase protein, at least 60% w/w lipase protein, at least 70% w/w lipase protein, at least 80% w/w lipase protein, or at least 90% w/w lipase protein.

In a preferred embodiment, the lipase particles are lipase crystals, or the lipase protein is on a crystalline form.

Enzyme crystallization may be carried out in a number of ways, as known in the art (e.g., as described in WO 91/09943 or WO 94/22903).

The lipase may be formulated in the lipase particle as known in the art for solid enzyme formulations, such as formulations for reducing dust, improving stability and/or modifying release rate of the enzyme. The lipase particle may also be formulated in a matrix or coated with agents suppressing dissolution of the enzyme particle in the PVOH/film solution used for preparing the water-soluble film.

The lipase molecules on the surface of the lipase particles may also be cross-linked, like CLECs (Cross-Linked Enzyme Crystals) or CLEA (Cross-Linked Enzyme Aggregate).

Water-Soluble Film

Water-soluble films, optional ingredients for use therein, and methods of making the same are well known in the art. In one class of embodiments, the water-soluble film includes PVOH. PVOH is a synthetic resin generally prepared by the alcoholysis, usually termed hydrolysis or saponification, of polyvinyl acetate. Fully hydrolyzed PVOH, wherein virtually all the acetate groups have been converted to alcohol groups, is a strongly hydrogen-bonded, highly crystalline polymer which dissolves only in hot water—greater than about 140° F. (60° C.). If a sufficient number of acetate groups are allowed to remain after the hydrolysis of polyvinyl acetate, the PVOH polymer then being known as partially hydrolyzed, it is more weakly hydrogen-bonded and less crystalline and is soluble in cold water—less than about 50° F. (10° C.). An intermediate cold/hot water-soluble film can include, for example, intermediate partially-hydrolyzed PVOH (e.g., with degrees of hydrolysis of about 94% to about 98%), and is readily soluble only in warm water—e.g., rapid dissolution at temperatures of about 40° C. and greater. Both fully and partially hydrolyzed PVOH types are commonly referred to as PVOH homopolymers although the partially hydrolyzed type is technically a vinyl alcohol-vinyl acetate copolymer.

The degree of hydrolysis of the PVOH included in the water-soluble films of the present disclosure can be about 75% to about 99%. As the degree of hydrolysis is reduced, a film made from the resin will have reduced mechanical strength but faster solubility at temperatures below about 20° C. As the degree of hydrolysis increases, a film made from the resin will tend to be mechanically stronger and the thermoformability will tend to decrease. The degree of hydrolysis of the PVOH can be chosen such that the water-solubility of the resin is temperature dependent, and thus the solubility of a film made from the resin, compatibilizing agent, and additional ingredients is also influenced. In one class of embodiments the film is cold water-soluble. A cold water-soluble film, soluble in water at a temperature of less than 10° C., can include PVOH with a degree of hydrolysis in a range of about 75% to about 90%, or in a range of about 80% to about 90%, or in a range of about 85% to about 90%. In another class of embodiments the film is hot water-soluble. A hot water-soluble film, soluble in water at a temperature of at least about 60° C., can include PVOH with a degree of hydrolysis of at least about 98%.

Other film-forming resins for use in addition to or in an alternative to PVOH can include, but are not limited to, modified polyvinyl alcohols, polyacrylates, water-soluble acrylate copolymers, polyacrylates, polyacryamides, polyvinyl pyrrolidone, pullulan, water-soluble natural polymers including, but not limited to, guar gum, xanthan gum, carrageenan, and starch, water-soluble polymer derivatives including, but not limited to, ethoxylated starch and hydroxypropylated starch, poly(sodium acrylamido-2-methylpropane sulfonate), polymonomethylmaleate, copolymers thereof, and combinations of any of the foregoing. In one class of embodiments, the film-forming resin is a terpolymer consisting of vinyl alcohol, vinyl acetate, and sodium acrylamido-2-methylpropanesulfonate. Unexpectedly, water-soluble films based on a vinyl alcohol, vinyl acetate, and sodium acrylamido-2-methylpropanesulfonate terpolymer, have demonstrated a high percent recovery of enzyme.

The water-soluble resin can be included in the water-soluble film in any suitable amount, for example an amount in a range of about 35 wt. % to about 90 wt. %. The preferred weight ratio of the amount of the water-soluble resin as compared to the combined amount of all enzymes, enzyme stabilizers, and secondary additives can be any suitable ratio, for example a ratio in a range of about 0.5 to about 5, or about 1 to 3, or about 1 to 2.

Water-soluble resins for use in the films described herein (including, but not limited to PVOH resins) can be characterized by any suitable viscosity for the desired film properties, optionally a viscosity in a range of about 5.0 to about 30.0 cP, or about 10.0 cP to about 25 cP. The viscosity of a PVOH resin is determined by measuring a freshly made solution using a Brookfield LV type viscometer with UL adapter as described in British Standard EN ISO 15023-2:2006 Annex E Brookfield Test method. It is international practice to state the viscosity of 4% aqueous polyvinyl alcohol solutions at 20° C. All PVOH viscosities specified herein in cP should be understood to refer to the viscosity of 4% aqueous polyvinyl alcohol solution at 20° C., unless specified otherwise.

It is well known in the art that the viscosity of a PVOH resin is correlated with the weight average molecular weight of the same PVOH resin, and often the viscosity is used as a proxy for the average molecular weight. Thus, the average molecular weight of the water-soluble resin optionally can be in a range of about 35,000 to about 190,000, or about 80,000 to about 160,000. The molecular weight of the resin need only be sufficient to enable it to be molded by suitable techniques to form a thin plastic film.

The water-soluble films according to the present disclosure may include other optional additive ingredients including, but not limited to, plasticizers, surfactants, defoamers, film formers, antiblocking agents, internal release agents, anti-yellowing agents and other functional ingredients, for example in amounts suitable for their intended purpose.

Water is recognized as a very efficient plasticizer for PVOH and other polymers; however, the volatility of water makes its utility limited since polymer films need to have at least some resistance (robustness) to a variety of ambient conditions including low and high relative humidity. Glycerin is much less volatile than water and has been well established as an effective plasticizer for PVOH and other polymers. Glycerin or other such liquid plasticizers by themselves can cause surface “sweating” and greasiness if the level used in the film formulation is too high. This can lead to problems in a film such as unacceptable feel to the hand of the consumer and even blocking of the film on the roll or in stacks of sheets if the sweating is not mitigated in some manner, such as powdering of the surface. This could be characterized as over plasticization. However, if too little plasticizer is added to the film the film may lack sufficient ductility and flexibility for many end uses, for example to be converted into a final use format such as pouches.

Plasticizers for use in water-soluble films of the present disclosure include, but are not limited to, sorbitol, glycerol, diglycerol, propylene glycol, ethylene glycol, diethyleneglycol, triethylene glycol, tetraethyleneglycol, polyethylene glycols up to MW 400, 2-methyl-1,3-propane diol, lactic acid, monoacetin, triacetin, triethyl citrate, 1,3-butane diol, trimethylolpropane (TMP), polyether triol, and combinations thereof. Polyols, as described above, are generally useful as plasticizers. As less plasticizer is used, the film can become more brittle, whereas as more plasticizer is used the film can lose tensile strength. Plasticizers can be included in the water-soluble films in an amount in a range of about 25 phr (parts per hundred parts of resin) to about 50 phr, or from about 30 phr to about 45 phr, or from about 32 phr to about 42 phr, for example.

Surfactants for use in water-soluble films are well known in the art. Optionally, surfactants are included to aid in the dispersion of the resin solution upon casting. Suitable surfactants for water-soluble films of the present disclosure include, but are not limited to, dialkyl sulfosuccinates, lactylated fatty acid esters of glycerol and propylene glycol, lactylic esters of fatty acids, sodium alkyl sulfates, polysorbate 20, polysorbate 60, polysorbate 65, polysorbate 80, alkyl polyethylene glycol ethers, lecithin, acetylated fatty acid esters of glycerol and propylene glycol, sodium lauryl sulfate, acetylated esters of fatty acids, myristyl dimethylamine oxide, trimethyl tallow alkyl ammonium chloride, quaternary ammonium compounds, salts thereof and combinations of any of the forgoing. Thus, surfactants can be included in the water-soluble films in an amount of less than about 2 phr, for example less than about 1 phr, or less than about 0.5 phr, for example.

One type of secondary component contemplated for use is a defoamer. Defoamers can aid in coalescing of foam bubbles. Suitable defoamers for use in water-soluble films according to the present disclosure include, but are not limited to, hydrophobic silicas, for example silicon dioxide or fumed silica in fine particle sizes, including Foam Blast® defoamers available from Emerald Performance Materials, including Foam Blast® 327, Foam Blast® UVD, Foam Blast® 163, Foam Blast® 269, Foam Blast® 338, Foam Blast® 290, Foam Blast® 332, Foam Blast® 349, Foam Blast® 550 and Foam Blast® 339, which are proprietary, non-mineral oil defoamers. In embodiments, defoamers can be used in an amount of 0.5 phr, or less, for example, 0.05 phr, 0.04 phr, 0.03 phr, 0.02 phr, or 0.01 phr. Preferably, significant amounts of silicon dioxide will be avoided, in order to avoid stress whitening.

Processes for making water-soluble articles, including films, include casting, blow-molding, extrusion and blown extrusion, as known in the art. One contemplated class of embodiments is characterized by the water-soluble film described herein being formed by casting, for example, by admixing the ingredients described herein with water to create an aqueous mixture, for example a solution with optionally dispersed solids, applying the mixture to a surface, and drying off water to create a film. Similarly, other compositions can be formed by drying the mixture while it is confined in a desired shape.

In one contemplated class of embodiments, the water-soluble film is formed by casting a water-soluble mixture wherein the water-soluble mixture is prepared according to the steps of:

(a) providing a mixture of water-soluble resin, water, and any optional additives excluding plasticizers;

(b) boiling the mixture for 30 minutes;

(c) degassing the mixture in an oven at a temperature of at least 40° C.; optionally in a range of 40° C. to 70° C., e.g., about 65° C.;

(d) adding one or more enzymes, plasticizer, and additional water to the mixture at a temperature of 65° C. or less; and

(e) stirring the mixture without vortex until the mixture appears substantially uniform in color and consistency; optionally for a time period in a range of 30 minutes to 90 minutes, optionally at least 1 hour; and

(f) casting the mixture promptly after the time period of stirring (e.g., within 4 hours, or 2 hours, or 1 hour).

If the enzyme is added to the mixture too early, e.g., with the secondary additives or resin, the activity of the enzyme may decrease. Without intending to be bound by any particular theory, it is believed that boiling of the mixture with the enzyme leads to the enzyme denaturing and storing in solution for extended periods of time also leads to a reduction in enzyme activity.

In one class of embodiments, high enzyme activity is maintained in the water-soluble films according to the present disclosure by drying the films quickly under moderate to mild conditions. As used herein, drying quickly refers to a drying time of less than 24 hours, optionally less than 12 hours, optionally less than 8 hours, optionally less than 2 hours, optionally less than 1 hour, optionally less than 45 minutes, optionally less than 30 minutes, optionally less than 20 minutes, optionally less than 10 minutes, for example in a range of about 6 minutes to about 10 minutes, or 8 minutes. As used herein, moderate to mild conditions refer to drying temperatures of less than 170° F. (77° C.), optionally in a range of about 150° F. to about 170° F. (about 66° C. to about 77° C.), e.g., 165° F. (74° C.). As the drying temperature increases, the enzymes tend to denature faster, whereas as the drying temperature decreases, the drying time increases, thus exposing the enzymes to solution for an extended period of time.

The film is useful for creating a packet to contain a composition, for example laundry or dishwashing compositions, thereby forming a pouch. The film described herein can also be used to make a packet with two or more compartments made of the same film or in combination with films of other polymeric materials. Additional films can, for example, be obtained by casting, blow-molding, extrusion or blown extrusion of the same or a different polymeric material, as known in the art. In one type of embodiment, the polymers, copolymers or derivatives thereof suitable for use as the additional film are selected from polyvinyl alcohols, polyvinyl pyrrolidone, polyalkylene oxides, polyacrylic acid, cellulose, cellulose ethers, cellulose esters, cellulose amides, polyvinyl acetates, polycarboxylic acids and salts, polyaminoacids or peptides, polyamides, polyacrylamide, copolymers of maleic/acrylic acids, polysaccharides including starch and gelatin, natural gums such as xanthan, and carrageenans. For example, polymers can be selected from polyacrylates and water-soluble acrylate copolymers, methylcellulose, carboxymethylcellulose sodium, dextrin, ethylcellulose, hydroxyethyl cellulose, hydroxypropyl methylcellulose, maltodextrin, polymethacrylates, and combinations thereof, or selected from polyvinyl alcohols, polyvinyl alcohol copolymers and hydroxypropyl methyl cellulose (HPMC), and combinations thereof.

The pouches and/or packets of the present disclosure comprise at least one sealed compartment. Thus the pouches may comprise a single compartment or multiple compartments. The pouches may have regions with and without enzymes. In embodiments including multiple compartments, each compartment may contain identical and/or different compositions. In turn, the compositions may take any suitable form including, but not limited to liquid, solid and combinations thereof (e.g., a solid suspended in a liquid). In some embodiments, the pouches comprises a first, second and third compartment, each of which respectively contains a different first, second and third composition. In some embodiments, the compositions may be visually distinct as described in EP 2258820.

The compartments of multi-compartment pouches and/or packets may be of the same or different size(s) and/or volume(s). The compartments of the present multi-compartment pouches can be separate or conjoined in any suitable manner. In some embodiments, the second and/or third and/or subsequent compartments are superimposed on the first compartment. In one aspect, the third compartment may be superimposed on the second compartment, which is in turn superimposed on the first compartment in a sandwich configuration. Alternatively the second and third compartments may be superimposed on the first compartment. However it is also equally envisaged that the first, second and optionally third and subsequent compartments may be attached to one another in a side by side relationship. The compartments may be packed in a string, each compartment being individually separable by a perforation line. Hence each compartment may be individually torn-off from the remainder of the string by the end-user.

In some embodiments, multi-compartment pouches and/or packets include three compartments consisting of a large first compartment and two smaller compartments. The second and third smaller compartments are superimposed on the first larger compartment. The size and geometry of the compartments are chosen such that this arrangement is achievable. The geometry of the compartments may be the same or different. In some embodiments the second and optionally third compartment each has a different geometry and shape as compared to the first compartment. In these embodiments, the second and optionally third compartments are arranged in a design on the first compartment. The design may be decorative, educative, or illustrative, for example to illustrate a concept or instruction, and/or used to indicate origin of the product. In some embodiments, the first compartment is the largest compartment having two large faces sealed around the perimeter, and the second compartment is smaller covering less than about 75%, or less than about 50% of the surface area of one face of the first compartment. In embodiments in which there is a third compartment, the aforementioned structure may be the same but the second and third compartments cover less than about 60%, or less than about 50%, or less than about 45% of the surface area of one face of the first compartment.

The pouches and/or packets of the present disclosure may comprise one or more different films. For example, in single compartment embodiments, the packet may be made from one wall that is folded onto itself and sealed at the edges, or alternatively, two walls that are sealed together at the edges. In multiple compartment embodiments, the packet may be made from one or more films such that any given packet compartment may comprise walls made from a single film or multiple films having differing compositions. In one aspect, a multi-compartment pouch comprises at least three walls: an outer upper wall; an outer lower wall; and a partitioning wall. The outer upper wall and the outer lower wall are generally opposing and form the exterior of the pouch. The partitioning wall is interior to the pouch and is secured to the generally opposing outer walls along a seal line. The partitioning wall separates the interior of the multi-compartment pouch into at least a first compartment and a second compartment. In one class of embodiments, the partitioning wall may be the only enzyme containing film thereby minimizing the exposure of the consumer to the enzymes.

Pouches and packets may be made using any suitable equipment and method. For example, single compartment pouches may be made using vertical form filling, horizontal form filling, or rotary drum filling techniques commonly known in the art. Such processes may be either continuous or intermittent. The film may be dampened, and/or heated to increase the malleability thereof. The method may also involve the use of a vacuum to draw the film into a suitable mold. The vacuum drawing the film into the mold can be applied for about 0.2 to about 5 seconds, or about 0.3 to about 3, or about 0.5 to about 1.5 seconds, once the film is on the horizontal portion of the surface. This vacuum can be such that it provides an under-pressure in a range of 10 mbar to 1000 mbar, or in a range of 100 mbar to 600 mbar, for example.

The molds, in which packets may be made, can have any shape, length, width and depth, depending on the required dimensions of the pouches. The molds may also vary in size and shape from one to another, if desirable. For example, the volume of the final pouches may be about 5 ml to about 300 ml, or about 10 to 150 ml, or about 20 to about 100 ml, and that the mold sizes are adjusted accordingly.

In one aspect, the packet includes a first and a second sealed compartment. The second compartment is in a generally superposed relationship with the first sealed compartment such that the second sealed compartment and the first sealed compartment share a partitioning wall interior to the pouch.

In one aspect, the packet including a first and a second compartment further includes a third sealed compartment. The third sealed compartment is in a generally superposed relationship with the first sealed compartment such that the third sealed compartment and the first sealed compartment share a partitioning wall interior to the pouch.

In various aspects, the first composition and the second composition are selected from one of the following combinations: liquid, liquid; liquid, powder; powder, powder; and powder, liquid.

In various aspects, the first, second and third compositions are selected from one of the following combinations: solid, liquid, liquid; and liquid, liquid, liquid.

In one aspect, the single compartment or plurality of sealed compartments contains a composition. The plurality of compartments may each contain the same or a different composition. The composition is selected from a liquid, solid or combination thereof.

Heat can be applied to the film in the process commonly known as thermoforming. The heat may be applied using any suitable means. For example, the film may be heated directly by passing it under a heating element or through hot air, prior to feeding it onto a surface or once on a surface. Alternatively, it may be heated indirectly, for example by heating the surface or applying a hot item onto the film. The film can be heated using an infrared light. The film may be heated to a temperature of at least 50° C., for example about 50 to about 150° C., about 50 to about 120° C., about 60 to about 130° C., about 70 to about 120° C., or about 60 to about 90° C.

Alternatively, the film can be wetted by any suitable means, for example directly by spraying a wetting agent (including water, a solution of the film composition, a plasticizer for the film composition, or any combination of the foregoing) onto the film, prior to feeding it onto the surface or once on the surface, or indirectly by wetting the surface or by applying a wet item onto the film.

Once a film has been heated and/or wetted, it may be drawn into an appropriate mold, preferably using a vacuum. The film can be thermoformed with a draw ratio of at least about 1.5, for example, and optionally up to a draw ratio of 2, for example. The filling of the molded film can be accomplished by utilizing any suitable means. In some embodiments, the most preferred method will depend on the product form and required speed of filling. In some embodiments, the molded film is filled by in-line filling techniques. The filled, open packets are then closed forming the pouches, using a second film, by any suitable method. This may be accomplished while in horizontal position and in continuous, constant motion. The closing may be accomplished by continuously feeding a second film, preferably water-soluble film, over and onto the open packets and then preferably sealing the first and second film together, typically in the area between the molds and thus between the packets.

Any suitable method of sealing the packet and/or the individual compartments thereof may be utilized. Non-limiting examples of such means include heat sealing, solvent welding, solvent or wet sealing, and combinations thereof. The water-soluble packet and/or the individual compartments thereof can be heat sealed at a temperature of at least 200° F. (93° C.), for example in a range of about 220° F. (about 105° C.) to about 290° F. (about 145° C.), or about 230° F. (about 110° C.) to about 280° F. (about 140° C.). Typically, only the area which is to form the seal is treated with heat or solvent. The heat or solvent can be applied by any method, typically on the closing material, and typically only on the areas which are to form the seal. If solvent or wet sealing or welding is used, it may be preferred that heat is also applied. Preferred wet or solvent sealing/welding methods include selectively applying solvent onto the area between the molds, or on the closing material, by for example, spraying or printing this onto these areas, and then applying pressure onto these areas, to form the seal. Sealing rolls and belts as described above (optionally also providing heat) can be used, for example.

The formed pouches may then be cut by a cutting device. Cutting can be accomplished using any known method. It may be preferred that the cutting is also done in continuous manner, and preferably with constant speed and preferably while in horizontal position. The cutting device can, for example, be a sharp item, or a hot item, or a laser, whereby in the latter cases, the hot item or laser ‘burns’ through the film/sealing area.

The different compartments of a multi-compartment pouches may be made together in a side-by-side style wherein the resulting, cojoined pouches may or may not be separated by cutting. Alternatively, the compartments can be made separately.

In some embodiments, pouches may be made according to a process including the steps of:

a) forming a first compartment (as described above);

b) forming a recess within some or all of the closed compartment formed in step (a), to generate a second molded compartment superposed above the first compartment;

c) filling and closing the second compartments by means of a third film;

d) sealing the first, second and third films; and

e) cutting the films to produce a multi-compartment pouch.

The recess formed in step (b) may be achieved by applying a vacuum to the compartment prepared in step (a).

In some embodiments, second, and/or third compartment(s) can be made in a separate step and then combined with the first compartment as described in EP 2088187 or WO 2009/152031.

In other embodiments, pouches may be made according to a process including the steps of:

a) forming a first compartment, optionally using heat and/or vacuum, using a first film on a first forming machine;

b) filling the first compartment with a first composition;

c) on a second forming machine, deforming a second film, optionally using heat and vacuum, to make a second and optionally third molded compartment;

d) filling the second and optionally third compartments;

e) sealing the second and optionally third compartment using a third film;

f) placing the sealed second and optionally third compartments onto the first compartment;

g) sealing the first, second and optionally third compartments; and

h) cutting the films to produce a multi-compartment pouch.

The first and second forming machines may be selected based on their suitability to perform the above process. In some embodiments, the first forming machine is preferably a horizontal forming machine, and the second forming machine is preferably a rotary drum forming machine, preferably located above the first forming machine.

It should be understood that by the use of appropriate feed stations, it may be possible to manufacture multi-compartment pouches incorporating a number of different or distinctive compositions and/or different or distinctive liquid, gel or paste compositions.

Processes of Making the Compositions

The compositions of the present invention can be formulated into any suitable form and prepared by any process chosen by the formulator, non-limiting examples of which are described in Applicants' examples and in U.S. Pat. No. 4,990,280; US 2003/0087791; US 2003/0087790; US 2005/0003983; US 2004/0048764; U.S. Pat. Nos. 4,762,636; 6,291,412; US 2005/0227891; EP 1070115; U.S. Pat. Nos. 5,879,584; 5,691,297; 5,574,005; 5,569,645; 5,565,422; 5,516,448; 5,489,392; 5,486,303 all of which are incorporated herein by reference. The compositions of the invention or prepared according to the invention comprise cleaning and/or treatment composition including, but not limited to, compositions for treating fabrics, hard surfaces and any other surfaces in the area of fabric and home care, including: air care including air fresheners and scent delivery systems, car care, dishwashing, fabric conditioning (including softening and/or freshening), laundry detergency, laundry and rinse additive and/or care, hard surface cleaning and/or treatment including floor and toilet bowl cleaners, granular or powder-form all-purpose or “heavy-duty” washing agents, especially cleaning detergents; liquid, gel or paste-form all-purpose washing agents, especially the so-called heavy-duty liquid types; liquid fine-fabric detergents; hand dishwashing agents or light duty dishwashing agents, especially those of the high-foaming type; machine dishwashing agents, including the various tablet, granular, liquid and rinse-aid types for household and institutional use: car or carpet shampoos, bathroom cleaners including toilet bowl cleaners; as well as cleaning auxiliaries such as bleach additives and “stain-stick” or pre-treat types, substrate-laden compositions such as dryer added sheets. Preferred are compositions and methods for cleaning and/or treating textiles and/or hard surfaces, most preferably textiles. The compositions are preferably compositions used in a pre-treatment step or main wash step of a washing process, most preferably for use in textile washing step.

As used herein, the term “fabric and/or hard surface cleaning and/or treatment composition” is a subset of cleaning and treatment compositions that includes, unless otherwise indicated, granular or powder-form all-purpose or “heavy-duty” washing agents, especially cleaning detergents; liquid, gel or paste-form all-purpose washing agents, especially the so-called heavy-duty liquid types; liquid fine-fabric detergents; hand dishwashing agents or light duty dishwashing agents, especially those of the high-foaming type; machine dishwashing agents, including the various tablet, granular, liquid and rinse-aid types for household and institutional use; liquid cleaning and disinfecting agents, car or carpet shampoos, bathroom cleaners including toilet bowl cleaners; fabric conditioning compositions including softening and/or freshening that may be in liquid, solid and/or dryer sheet form; as well as cleaning auxiliaries such as bleach additives and “stain-stick” or pre-treat types, substrate-laden compositions such as dryer added sheets. All of such compositions which are applicable may be in standard, concentrated or even highly concentrated form even to the extent that such compositions may in certain aspect be non-aqueous.

Methods of Use

The present invention includes a method for cleaning any surface including treating a textile or a hard surface or other surfaces in the field of fabric and/or home care. It is contemplated that cleaning as described may be both in small scale as in, e.g., family house hold as well as in large scale as in, e.g., industrial and professional settings. In one aspect of the invention, the method comprises the step of contacting the surface to be treated in a pre-treatment step or main wash step of a washing process, most preferably for use in a textile washing step or alternatively for use in dishwashing including both manual as well as automated/mechanical dishwashing. In one aspect of the invention the lipase variant and other components are added sequentially into the method for cleaning and/or treating the surface. Alternatively, the lipase variant and other components are added simultaneously.

As used herein, washing includes but is not limited to, scrubbing, and mechanical agitation. Washing may be conducted with a foam composition as described in WO 2008/101958 and/or by applying alternating pressure (pressure/vacuum) as an addition or as an alternative to scrubbing and mechanical agitation. Drying of such surfaces or fabrics may be accomplished by any one of the common means employed either in domestic or industrial settings. The cleaning compositions of the present invention are ideally suited for use in laundry as well as dishwashing applications. Accordingly, the present invention includes a method for cleaning an object including but not limiting to fabric, tableware, cutlery and kitchenware. The method comprises the steps of contacting the object to be cleaned with a said cleaning composition comprising at least one aspect of Applicants' cleaning composition, cleaning additive or mixture thereof. The fabric may comprise almost any fabric capable of being laundered in normal consumer or institutional use conditions. The solution may have a pH from 8 to 10.5. The compositions may be employed at concentrations from 500 to 15.000 ppm in solution. The water temperatures typically range from 5° C. to 90° C. The water to fabric ratio is typically from 1:1 to 30:1.

In one aspect, the invention relates to a method for cleaning a surface, comprising contacting a lipid stain present on the surface to be cleaned with the cleaning composition. In one aspect, the invention relates to a method for hydrolyzing a lipid present in a soil and/or a stain on a surface, comprising contacting the soil and/or the stain with the cleaning composition. In one aspect, the invention relates to use of the composition in the hydrolysis of a carboxylic acid ester. In one aspect, the invention relates to use of the composition in the hydrolysis, synthesis or interesterification of an ester. In one aspect, the invention relates to use of the composition for the manufacture of a stable formulation.

The Invention is Described by Below Numbered Paragraphs:

1. A lipase variant of a parent lipase, wherein said variant comprises a modification at one or more (e.g., several) positions corresponding to positions 1, 2, 3, 5, 8, 43, 45, 105, 167, 178, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236, 239 and 244 of SEQ ID NO: 1, wherein the lipase variant has at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99% sequence identity, but less than 100% sequence identity, to SEQ ID NO: 1; the lipase variant has lipase activity; and

-   -   a. the modification at the position corresponding to position 1         is a deletion, e.g., E1*, or an insertion of Arg, e.g., E1ER;     -   b. the modification at the position corresponding to position 2         is a deletion, e.g., V2*;     -   c. the modification at the position corresponding to position 3         is a deletion, e.g., S3*;     -   d. the modification at the position corresponding to position 5         is a deletion, e.g., D5*;     -   e. the modification at the position corresponding to position 8         is a substitution with Arg or Lys, e.g., N8R or N8K, in         particular with Arg;     -   f. the modification at the position corresponding to position 43         is a deletion, e.g., E43*;     -   g. the modification at the position corresponding to position 45         is a deletion, e.g., E45*;     -   h. the modification at the position corresponding to position         167 is a deletion, e.g., D167*;     -   i. the modification at the position corresponding to position         224 is a deletion, e.g., S224*;     -   j. the modification at the position corresponding to position         225 is a deletion, e.g., G225*;     -   k. the modification at the position corresponding to position         226 is a deletion, e.g., T226*;     -   l. the modification at the position corresponding to position         227 is a deletion, e.g., L227*;     -   m. the modification at the position corresponding to position         228 is a deletion, e.g., V228*;     -   n. the modification at the position corresponding to position         229 is a deletion, e.g., P229*;     -   o. the modification at the position corresponding to position         230 is a deletion, e.g., V230*, or a substitution with Arg or         Lys, e.g., V230K or V230R, in particular with Arg;     -   p. the modification at the position corresponding to position         231 is an insertion of Arg, e.g., T231TR;     -   q. the modification at the position corresponding to position         232 is an insertion of Arg, e.g., R232RR;     -   r. the modification at the position corresponding to position         234 is a deletion, e.g., D234*;     -   s. the modification at the position corresponding to position         236 is a substitution with Arg or Lys, e.g., V236K or V236R, in         particular with Arg;     -   t. the modification at the position corresponding to position         239 is a deletion, e.g., E239*;     -   u. the modification at the position corresponding to position         105 is a substitution, e.g., S105R; and     -   v. the modification at the position corresponding to position         178 is a substitution, e.g., N178R; and     -   x. the modification at the position corresponding to position         244 is an insertion of Arg, e.g., T244TR.         2. The variant of paragraph 1, which comprises a deletion at the         position corresponding to position 1 of SEQ ID NO: 1, e.g., E1*,         or an insertion of Arg at the position corresponding to position         1, e.g., E1ER.         3. The variant of paragraph 1 or 2, which comprises a deletion         at the position corresponding to position 2, e.g., V2*.         4. The variant of any of paragraphs 1-3, which comprises a         deletion at the position corresponding to position 3, e.g., S3*.         5. The variant of any of paragraphs 1-4, which comprises a         deletion at the position corresponding to position 5, e.g., D5*.         6. The variant of any of paragraphs 1-5, which comprises a         substitution at the position corresponding to position 8 with         Arg or Lys, e.g., N8K or N8R, in particular with Arg.         7. The variant of any of paragraphs 1-6, which comprises a         deletion at the position corresponding to position 43, e.g.,         E43*.         8. The variant of any of paragraphs 1-7, which comprises a         deletion at the position corresponding to position 45, e.g.,         E45*.         9. The variant of any of paragraphs 1-8, which comprises a         substitution at the position corresponding to position 105 with         Arg, e.g., S105R and/or an insertion of Arg, e.g., S105SR or         S105RR.         10. The variant of any of paragraphs 1-9, which comprises a         deletion at the position corresponding to position 167, e.g.,         D167*.         11. The variant of any of paragraphs 1-10, which comprises a         substitution at the position corresponding to position 178 with         Arg or Lys, e.g., N178R.         12. The variant of any of paragraphs 1-11, which comprises a         deletion at the position corresponding to position 224, e.g.,         S224*, or an insertion of Arg, e.g., S224SR.         13. The variant of any of paragraphs 1-12, which comprises a         deletion at the position corresponding to position 225, e.g.,         G225*, or an insertion of Arg, e.g., EG225GR.         14. The variant of any of paragraphs 1-13, which comprises a         deletion at the position corresponding to position 226, e.g.,         T226*, or an insertion of Arg, e.g., T226TR.         15. The variant of any of paragraphs 1-14, which comprises a         deletion at the position corresponding to position 227, e.g.,         L227*, or an insertion of Arg, e.g., L227LR.         16. The variant of any of paragraphs 1-15, which comprises a         deletion at the position corresponding to position 228, e.g.,         V228*, or an insertion of Arg, e.g., V228VR.         17. The variant of any of paragraphs 1-16, which comprises a         deletion at the position corresponding to position 229, e.g.,         P229*, or an insertion of Arg, e.g., E1ER.         18. The variant of any of paragraphs 1-17, which comprises a         deletion at the position corresponding to position 230, e.g.,         V230*, or an insertion of Arg, e.g., V230VR or a substitution at         the position corresponding to position 230 with Arg or Lys,         e.g., V230K or V230R, in particular with Arg.         19. The variant of any of paragraphs 1-18, which comprises one         or two insertions at the position corresponding to position 231         with Arg, e.g., T231TR or T231TRR.         20. The variant of any of paragraphs 1-19, which comprises an         insertion at the position corresponding to position 232 with         Arg, e.g., R232RR.         21. The variant of any of paragraphs 1-20, which comprises a         deletion at the position corresponding to position 234, e.g.,         D234*.         22. The variant of any of paragraphs 1-21, which comprises a         substitution at the position corresponding to position 236 with         Arg or Lys, e.g., V236K or V236R, in particular with Arg.         23. The variant of any of paragraphs 1-22, which comprises a         deletion at the position corresponding to position 239, e.g.,         E239*;         24. The variant of any of paragraphs 1-23, which comprises an         insertion at the position corresponding to position 244, e.g.,         T244TR.         25. A lipase variant, comprising a modification at two or more         positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9,         11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73,         91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199,         200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228,         229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248,         249, 250, 251, 252, 254 and 256 of SEQ ID NO: 1, wherein the         lipase variant has at least 60%, e.g., at least 65%, at least         70%, at least 75%, at least 80%, at least 85%, at least 90%, at         least 95%, at least 96%, at least 97%, at least 98%, or at least         99% sequence identity, but less than 100% sequence identity, to         SEQ ID NO: 1; the lipase variant has lipase activity; and     -   a. the modification at the position corresponding to position 1         is a deletion, e.g., E1*, an insertion of Arg, e.g., E1ER, or a         substitution with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg, Gln, Lys, or Pro, most particularly with Gln or Pro,         e.g., E1P or E1Q;     -   b. the modification at the position corresponding to position 2         is a deletion, e.g., V2*, or a substitution with Arg or Lys,         e.g., V2R or V2K;     -   c. the modification at the position corresponding to position 3         is a deletion, e.g., S3*, or a substitution with Arg or Lys,         e.g., S3R or S3K, in particular with Arg;     -   d. the modification at the position corresponding to position 4         is a substitution with Arg or Lys, e.g., Q4R or Q4K, in         particular with Arg;     -   e. the modification at the position corresponding to position 5         is a deletion, e.g., D5*, or a substitution with Ala, Arg, Asn,         Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp,         Tyr, or Val, in particular with Arg or Lys, e.g., D5K or D5R,         most particularly with Arg;     -   f. the modification at the position corresponding to position 6         is a substitution with Arg or Lys, e.g., L6R or L6K, in         particular with Arg;     -   g. the modification at the position corresponding to position 7         is a substitution with Arg or Lys, e.g., F7R or F7K, in         particular with Arg;     -   h. the modification at the position corresponding to position 8         is a substitution with Arg or Lys, e.g., N8R or N8K, in         particular with Arg;     -   i. the modification at the position corresponding to position 9         is a substitution with Arg or Lys, e.g., Q9R or Q9K, in         particular with Arg;     -   j. the modification at the position corresponding to position 11         is a substitution with Arg or Lys, e.g., N11R or N11K, in         particular with Arg;     -   k. the modification at the position corresponding to position 12         is a substitution with Arg or Lys, e.g., L12R or L12K, in         particular with Arg;     -   l. the modification at the position corresponding to position 15         is a substitution with Arg or Lys, e.g., Q15R or Q15K, in         particular with Arg;     -   m. the modification at the position corresponding to position 37         is a substitution with Arg or Lys, e.g., T37R or T37K, in         particular with Arg;     -   n. the modification at the position corresponding to position 38         is a substitution with Arg or Lys, e.g., Q38R or Q38K, in         particular with Arg;     -   o. the modification at the position corresponding to position 39         is a substitution with Arg or Lys, e.g., N39R or N39K, in         particular with Arg;     -   p. the modification at the position corresponding to position 40         is a substitution with Arg or Lys, e.g., A40R or A40K, in         particular with Arg;     -   q. the modification at the position corresponding to position 42         is a substitution with Arg or Lys, e.g., P42R or P42K, in         particular with Arg;     -   r. the modification at the position corresponding to position 43         is a deletion, e.g., E43*, or a substitution at the position         corresponding to position 43 with Ala, Arg, Asn, Cys, Gln, Gly,         His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val,         in particular with Arg or Lys, e.g., E43K, or E43R, most         particularly with Arg;     -   s. the modification at the position corresponding to position 45         is a deletion, e.g., E45*, or a substitution at the position         corresponding to position 45 with Ala, Arg, Asn, Cys, Gln, Gly,         His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val,         in particular with Arg or Lys, e.g., E45K or E45R, most         particularly with Arg;     -   t. the modification at the position corresponding to position 73         is a substitution with Arg or Lys, e.g., N73R or N73K, in         particular with Arg;     -   u. the modification at the position corresponding to position         167 is a deletion, e.g., D167*, or a substitution at the         position corresponding to position 167 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., D167K or D167R,         most particularly with Arg;     -   v. the modification at the position corresponding to position         192 is a substitution with Arg or Lys, e.g., T192R or T192K, in         particular with Arg;     -   w. the modification at the position corresponding to position         193 is a substitution with Arg or Lys, e.g., L193R or L193K, in         particular with Arg;     -   x. the modification at the position corresponding to position         194 is a substitution with Arg or Lys, e.g., Y194R or Y194K, in         particular with Arg;     -   y. the modification at the position corresponding to position         199 is a substitution with Arg or Lys, e.g., T199R or T199K, in         particular with Arg;     -   z. the modification at the position corresponding to position         200 is a substitution with Arg or Lys, e.g., N200R or N200K, in         particular with Arg;     -   aa. the modification at the position corresponding to position         202 is a substitution with Arg or Lys, e.g., I202R or I202K, in         particular with Arg;     -   ab. the modification at the position corresponding to position         217 is a substitution with Arg or Lys, e.g., S217R or S217K, in         particular with Arg;     -   ac. the modification at the position corresponding to position         218 is a substitution with Arg or Lys, e.g., P218R or P218K, in         particular with Arg;     -   ad. the modification at the position corresponding to position         220 is a substitution with Arg or Lys, e.g., Y220R or Y220K, in         particular with Arg;     -   ae. the modification at the position corresponding to position         221 is a substitution with Arg or Lys, e.g., W221R or W221K, in         particular with Arg;     -   af. the modification at the position corresponding to position         224 is a deletion, e.g., S224*, an insertion of Arg, e.g.,         S224SR, or a substitution with Arg or Lys, e.g., S224K or S224R,         in particular with Arg;     -   ag. the modification at the position corresponding to position         225 is a deletion, e.g., G225*, an insertion of Arg, e.g.,         G225GR, or a substitution with Arg or Lys, e.g., G225K or G225R,         in particular with Arg;     -   ah. the modification at the position corresponding to position         226 is a deletion, e.g., T226*, an insertion of Arg, e.g.,         T226TR or a substitution with Arg or Lys, e.g., T226K or T226R,         in particular with Arg;     -   ai. the modification at the position corresponding to position         227 is a deletion, e.g., L227*, an insertion of Arg, e.g.,         L227LR or a substitution with Arg or Lys, e.g., L227K or L227R,         in particular with Arg;     -   aj. the modification at the position corresponding to position         228 is a deletion, e.g., V228*, an insertion of Arg, e.g.,         V228VR or a substitution with Arg or Lys, e.g., V228K or V228R,         in particular with Arg;     -   ak. the modification at the position corresponding to position         229 is a deletion, e.g., P229*, an insertion of Arg, e.g.,         P229PR, or a substitution with Arg or Lys, e.g., P229K or P229R,         in particular with Arg;     -   al. the modification at the position corresponding to position         230 is a deletion, e.g., V230*, an insertion of Arg, e.g.,         V230VR or a substitution with Arg or Lys, e.g., V230K or V230R,         in particular with Arg;     -   am. the modification at the position corresponding to position         231 is one or two insertions of Arg, e.g., T231TR or T231TRR, or         a substitution with Arg or Lys, e.g., T231K or T231R, in         particular with Arg;     -   an. the modification at the position corresponding to position         232 is an insertion of Arg, e.g., R232RR;     -   ao. the modification at the position corresponding to position         233 is a substitution with Arg or Lys, e.g., N233K or D233R, in         particular with Arg;     -   ap. the modification at the position corresponding to position         234 is a deletion, e.g., D234*, or a substitution at the         position corresponding to position 234 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., D234K or D234R,         most particularly with Arg;     -   aq. the modification at the position corresponding to position         236 is a substitution with Arg or Lys, e.g., V236K or V236R, in         particular with Arg;     -   ar. the modification at the position corresponding to position         238 is a substitution with Arg or Lys, e.g., I238K or I238R, in         particular with Arg;     -   as. the modification at the position corresponding to position         239 is a deletion, e.g., E239*, or a substitution at the         position corresponding to position 239 with Ala, Arg, Asn, Cys,         Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr,         or Val, in particular with Arg or Lys, e.g., E239K or E239R,         most particularly with Arg;     -   at. the modification at the position corresponding to position         243 is an insertion of Arg, e.g., A243AR or a substitution with         Arg or Lys, e.g., A243K or A243R, in particular with Arg;     -   au. the modification at the position corresponding to position         244 is an insertion of Arg, e.g., T244TR or a substitution with         Arg or Lys, e.g., T244K or T244R, in particular with Arg;     -   av. the modification at the position corresponding to position         245 is a substitution with Arg or Lys, e.g., G245K or G245R, in         particular with Arg;     -   aw. the modification at the position corresponding to position         248 is a substitution with Arg or Lys, e.g., N248K or N248R, in         particular with Arg;     -   ax. the modification at the position corresponding to position         249 is a substitution with Arg or Lys, e.g., Q249K or Q249R, in         particular with Arg; and     -   ay. the modification at the position corresponding to position         251 is a substitution with Arg or Lys, e.g., N251K or N251R, in         particular with Arg     -   az. the modification at the position corresponding to position         28 is a substitution with Arg, e.g., A28R     -   ba. the modification at the position corresponding to position         29 is a substitution with Arg, e.g., P29R;     -   bb. the modification at the position corresponding to position         30 is a substitution with Arg, e.g., A30R;     -   bc. the modification at the position corresponding to position         31 is a substitution with Arg, e.g., G31R;     -   bd. the modification at the position corresponding to position         33 is a substitution with Arg, e.g., N33R;     -   be. the modification at the position corresponding to position         99 is a substitution with Arg, e.g., E99R;     -   bf. the modification at the position corresponding to position         101 is a substitution with Arg, e.g., N101R;     -   bg. the modification at the position corresponding to position         102 is a substitution with Arg, e.g., D102R;     -   bh. the modification at the position corresponding to position         105 is a substitution with Arg, e.g., S105R and/or an insertion         of Arg, e.g., S105SR or S105RR;     -   bi. the modification at the position corresponding to position         178 is a substitution with Arg, e.g., N178R     -   bj. the modification at the position corresponding to position         180 is a substitution with Arg, e.g., A180R;     -   bk. the modification at the position corresponding to position         211 is a substitution with Arg, e.g., F211R;     -   bl. the modification at the position corresponding to position         250 is a substitution with Arg, e.g., P250R;     -   bm. the modification at the position corresponding to position         252 is a substitution with Arg, e.g., I252R;     -   bn. the modification at the position corresponding to position         254 is a substitution with Arg, e.g., D254R;     -   bo. the modification at the position corresponding to position         256 is a substitution with Arg, e.g., P256R.         26. The variant of paragraph 25, which comprises a deletion at         the position corresponding to position 1 of SEQ ID NO: 1, e.g.,         E1*, an insertion of Arg at the position corresponding to         position 1, e.g., E1ER, or a substitution at the position         corresponding to position 1 with Ala, Arg, Asn, Cys, Gln, Gly,         His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val,         in particular with Arg, Gln, Lys, or Pro, most particularly, Gln         or Pro, e.g., E1P or E1Q.         27. The variant of paragraph 25 or 26, which comprises a         deletion at the position corresponding to position 2, e.g., V2*,         or a substitution at the position corresponding to position 2         with Arg or Lys, e.g., V2K or V2R.         28. The variant of any of paragraphs 25-27, which comprises a         deletion at the position corresponding to position 3, e.g., S3*,         or a substitution at the position corresponding to position 3         with Arg or Lys, e.g., S3K or S3R, in particular with Arg.         29. The variant of any of paragraphs 25-28, which comprises a         substitution at the position corresponding to position 4 with         Arg or Lys, e.g., Q4K or Q4R, in particular with Arg.         30. The variant of any of paragraphs 25-29, which comprises a         deletion at the position corresponding to position 5, e.g., D5*,         or a substitution at the position corresponding to position 5         with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe,         Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys,         e.g., D5K or D5R, most particularly with Arg.         31. The variant of any of paragraphs 25-30, which comprises a         substitution at the position corresponding to position 6 with         Arg or Lys, e.g., L6K or L6R, in particular with Arg.         32. The variant of any of paragraphs 25-31, which comprises a         substitution at the position corresponding to position 7 with         Arg or Lys, e.g., F7K or F7R, in particular with Arg.         33. The variant of any of paragraphs 25-32, which comprises a         substitution at the position corresponding to position 8 with         Arg or Lys, e.g., N8K or N8R, in particular with Arg.         34. The variant of any of paragraphs 25-33, which comprises a         substitution at the position corresponding to position 9 with         Arg or Lys, e.g., Q9K or Q9R, in particular with Arg.         35. The variant of any of paragraphs 25-34, which comprises a         substitution at the position corresponding to position 11 with         Arg or Lys, e.g., N11K or N11R, in particular with Arg.         36. The variant of any of paragraphs 25-35, which comprises a         substitution at the position corresponding to position 12 with         Arg or Lys, e.g., L12K or L12R, in particular with Arg.         37. The variant of any of paragraphs 25-36, which comprises a         substitution at the position corresponding to position 15 with         Arg or Lys, e.g., Q15K or Q15R, in particular with Arg.         38. The variant of any of paragraphs 25-37, which comprises a         substitution at the position corresponding to position 28 with         Arg or Lys, e.g., A28K or A28R, in particular with Arg.         39. The variant of any of paragraphs 25-38, which comprises a         substitution at the position corresponding to position 29 with         Arg or Lys, e.g., P29K or P29R, in particular with Arg.         40. The variant of any of paragraphs 25-39, which comprises a         substitution at the position corresponding to position 30 with         Arg or Lys, e.g., A30K or A30R, in particular with Arg.         41. The variant of any of paragraphs 25-40, which comprises a         substitution at the position corresponding to position 31 with         Arg or Lys, e.g., G31K or G31R, in particular with Arg.         42. The variant of any of paragraphs 25-41, which comprises a         substitution at the position corresponding to position 33 with         Arg or Lys, e.g., N33K or N33R, in particular with Arg.         43. The variant of any of paragraphs 25-42, which comprises a         substitution at the position corresponding to position 38 with         Arg or Lys, e.g., Q38K or Q38R, in particular with Arg.         44. The variant of any of paragraphs 25-43, which comprises a         substitution at the position corresponding to position 39 with         Arg or Lys, e.g., N39K or N39R, in particular with Arg.         45. The variant of any of paragraphs 25-44, which comprises a         substitution at the position corresponding to position 40 with         Arg or Lys, e.g., A40K or A40R, in particular with Arg.         46. The variant of any of paragraphs 25-45, which comprises a         substitution at the position corresponding to position 42 with         Arg or Lys, e.g., P42K or P42R, in particular with Arg.         47. The variant of any of paragraphs 25-46, which comprises a         deletion at the position corresponding to position 43, e.g.,         E43*, or a substitution at the position corresponding to         position 5 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg or Lys, most particularly with Arg.         48. The variant of any of paragraphs 25-47, which comprises a         deletion at the position corresponding to position 45, e.g.,         E45*, or a substitution at the position corresponding to         position 5 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg or Lys, most particularly with Arg.         49. The variant of any of paragraphs 25-48, which comprises a         substitution at the position corresponding to position 73 with         Arg or Lys, e.g., N73K or N73R, in particular with Arg.         50. The variant of any of paragraphs 25-49, which comprises a         substitution at the position corresponding to position 99 with         Arg or Lys, e.g., E99K or E99R, in particular with Arg.         51. The variant of any of paragraphs 25-50, which comprises a         substitution at the position corresponding to position 101 with         Arg or Lys, e.g., N101K or N101R, in particular with Arg.         52. The variant of any of paragraphs 25-51, which comprises a         substitution at the position corresponding to position 102 with         Arg or Lys, e.g., D102K or D102R, in particular with Arg.         53. The variant of any of paragraphs 25-52, which comprises a         substitution at the position corresponding to position 105 with         Arg or Lys, e.g., S105K or S105R, in particular Arg, and/or an         insertion of Arg, e.g., S105SR or S105RR.         54. The variant of any of paragraphs 25-53, which comprises a         deletion at the position corresponding to position 167, e.g.,         D167*, or a substitution at the position corresponding to         position 167 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg or Lys, D167K or D167R, most particularly with Arg.         55. The variant of any of paragraphs 25-54, which comprises a         substitution at the position corresponding to position 178 with         Arg, e.g., N178R.         56. The variant of any of paragraphs 25-55, which comprises a         substitution at the position corresponding to position 180 with         Arg or Lys, e.g., A180K or A180R, in particular with Arg.         57. The variant of any of paragraphs 25-56, which comprises a         substitution at the position corresponding to position 192 with         Arg or Lys, e.g., T192K or T192R, in particular with Arg.         58. The variant of any of paragraphs 25-57, which comprises a         substitution at the position corresponding to position 193 with         Arg or Lys, e.g., L193K or L193R, in particular with Arg.         59. The variant of any of paragraphs 25-58, which comprises a         substitution at the position corresponding to position 194 with         Arg or Lys, e.g., Y194K or Y194R, in particular with Arg.         60. The variant of any of paragraphs 25-59, which comprises a         substitution at the position corresponding to position 199 with         Arg or Lys, e.g., T199K or T199R, in particular with Arg.         61. The variant of any of paragraphs 25-60, which comprises a         substitution at the position corresponding to position 200 with         Arg or Lys, e.g., N200K or N200R, in particular with Arg.         62. The variant of any of paragraphs 25-61, which comprises a         substitution at the position corresponding to position 202 with         Arg or Lys, e.g., I202K or I202R, in particular with Arg.         63. The variant of any of paragraphs 25-62, which comprises a         substitution at the position corresponding to position 211 with         Arg or Lys, e.g., F211K or F211R, in particular with Arg.         64. The variant of any of paragraphs 25-63, which comprises a         substitution at the position corresponding to position 217 with         Arg or Lys, e.g., S217K or T217R, in particular with Arg.         65. The variant of any of paragraphs 25-64, which comprises a         substitution at the position corresponding to position 218 with         Arg or Lys, e.g., P218K or P218R, in particular with Arg.         66. The variant of any of paragraphs 25-65, which comprises a         substitution at the position corresponding to position 220 with         Arg or Lys, e.g., Y220K or Y220R, in particular with Arg.         67. The variant of any of paragraphs 25-66, which comprises a         substitution at the position corresponding to position 221 with         Arg or Lys, e.g., W221K or W221R, in particular with Arg.         68. The variant of any of paragraphs 25-67, which comprises a         deletion at the position corresponding to position 224, e.g.,         S224*, an insertion of Arg, e.g., S224SR, or a substitution at         the position corresponding to position 224 with Arg or Lys,         e.g., S224K or S224R, in particular with Arg.         69. The variant of any of paragraphs 25-68, which comprises a         deletion at the position corresponding to position 225, e.g.,         G225*, an insertion of Arg, e.g., G225GR, or a substitution at         the position corresponding to position 225 with Arg or Lys,         e.g., G225K or G225R, in particular with Arg.         70. The variant of any of paragraphs 25-69, which comprises a         deletion at the position corresponding to position 226, e.g.,         T226*, an insertion of Arg, e.g., T226TR, or a substitution at         the position corresponding to position 226 with Arg or Lys,         e.g., T226K or T226R, in particular with Arg.         71. The variant of any of paragraphs 25-70, which comprises a         deletion at the position corresponding to position 227, e.g.,         L227*, an insertion of Arg, e.g., L227LR, or a substitution at         the position corresponding to position 227 with Arg or Lys,         e.g., L227K or L227R, in particular with Arg.         72. The variant of any of paragraphs 25-71, which comprises a         deletion at the position corresponding to position 228, e.g.,         V228*, an insertion of Arg, e.g., V228VR, or a substitution at         the position corresponding to position 228 with Arg or Lys,         e.g., V228K or V228R, in particular with Arg.         73. The variant of any of paragraphs 25-72, which comprises a         deletion at the position corresponding to position 229, e.g.,         P229*, an insertion of Arg, e.g., P229PR, or a substitution at         the position corresponding to position 229 with Arg or Lys,         e.g., P229K or P229R, in particular with Arg.         74. The variant of any of paragraphs 26-73, which comprises a         deletion at the position corresponding to position 230, e.g.,         V230*, an insertion of Arg, e.g., V230VR, or a substitution at         the position corresponding to position 230 with Arg or Lys,         e.g., V230K or V230R, in particular with Arg.         75. The variant of any of paragraphs 25-74, which comprises one         or two insertions at the position corresponding to position 231         with Arg, e.g., T231TR or T231TRR, or a substitution at the         position corresponding to position 231 with Arg or Lys, e.g.,         T231K or T231,R, in particular with Arg.         76. The variant of any of paragraphs 25-75, which comprises an         insertion at the position corresponding to position 232 with         Arg, e.g., R232RR.         77. The variant of any of paragraphs 26-76, which comprises a         substitution at the position corresponding to position 233 with         Arg or Lys, e.g., N233K or N233R, in particular with Arg.         78. The variant of any of paragraphs 25-77, which comprises a         deletion at the position corresponding to position 234, e.g.,         D234*, or a substitution at the position corresponding to         position 234 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg or Lys, e.g., D234K or D234R, most particularly with         Arg.         79. The variant of any of paragraphs 25-78, which comprises a         substitution at the position corresponding to position 236 with         Arg or Lys, e.g., V236K or V236R, in particular with Arg.         80. The variant of any of paragraphs 25-79, which comprises a         substitution at the position corresponding to position 238 with         Arg or Lys, e.g., I236K or I236R, in particular with Arg.         81. The variant of any of paragraphs 25-80, which comprises a         deletion at the position corresponding to position 239, e.g.,         E239*, or a substitution at the position corresponding to         position 239 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu,         Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular         with Arg or Lys, most particularly with Arg.         82. The variant of any of paragraphs 25-81, which comprises a         substitution at the position corresponding to position 243 with         Arg or Lys, e.g., A243K or A243R, in particular with Arg.         83. The variant of any of paragraphs 25-82, which comprises a         substitution at the position corresponding to position 244 with         Arg or Lys, e.g., T244K or T244R, in particular with Arg.         84. The variant of any of paragraphs 25-83, which comprises a         substitution at the position corresponding to position 245 with         Arg or Lys, e.g., G245K or G245R, in particular with Arg.         85. The variant of any of paragraphs 25-84, which comprises a         substitution at the position corresponding to position 248 with         Arg or Lys, e.g., N248K or N248R, in particular with Arg.         86. The variant of any of paragraphs 25-85, which comprises a         substitution at the position corresponding to position 249 with         Arg or Lys, e.g., Q249K or Q249R, in particular with Arg.         87. The variant of any of paragraphs 25-86, which comprises a         substitution at the position corresponding to position 250 with         Arg or Lys, e.g., P250K or P250R, in particular with Arg.         88. The variant of any of paragraphs 25-87, which comprises a         substitution at the position corresponding to position 251 with         Arg or Lys, e.g., N251K or N251R, in particular with Arg.         89. The variant of any of paragraphs 25-88, which comprises a         substitution at the position corresponding to position 252 with         Arg or Lys, e.g., I252K or I252R, in particular with Arg.         90. The variant of any of paragraphs 25-89, which comprises a         substitution at the position corresponding to position 254 with         Arg, e.g., D254R.         91. The variant of any of paragraphs 25-90, which comprises a         substitution at the position corresponding to position 256 with         Arg, e.g., P256R.         92. The variant of any of paragraphs 25-91, which comprises a         modification at three or more positions corresponding to         positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31,         33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106,         167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218,         220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234,         236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and         256.         93. The variant of any of paragraphs 25-92, which comprises a         modification at four or more positions corresponding to         positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31,         33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106,         167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218,         220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234,         236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and         256.         94. The variant of any of paragraphs 25-92, which comprises a         modification at five or more positions corresponding to         positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31,         33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106,         167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218,         220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234,         236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and         256.         95. The variant of any of paragraphs 25-94, which comprises a         modification at six or more positions corresponding to positions         1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37,         38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167,         178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220,         221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236,         238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and 256.         96. A lipase variant of any one of paragraphs 1-95, comprising a         modifications at two or more positions corresponding to         positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31,         33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106,         167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218,         220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234,         236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and         256 of SEQ ID NO: 1 with Arg, wherein the lipase variant has at         least 60%, e.g., at least 65%, at least 70%, at least 75%, at         least 80%, at least 85%, at least 90%, at least 95%, at least         96%, at least 97%, at least 98%, or at least 99% sequence         identity, but less than 100% sequence identity, to SEQ ID NO: 1;         the lipase variant has lipase activity.         97. The variant of any of paragraphs 1-96, which further         comprises one or more substitutions from the group 81, 83, 84,         85, 86, 87, 88, 90, 91, 92, 93, 94, 95, 96, 97, and 98.         98. The variant of any of paragraphs 1-97, which further one or         more substitutions in the lid region corresponding to 81-99 of         SEQ ID NO: 1, preferably R81Q; S83T; R84H; S85T; I86L, I86P,         I86V, I86W; E87A, E87I, E87K, E87T, E87V; N88Q; I90L, I90M;         G91A, G91L, G91N, G91Q, G91T; N92D, N92K; L93F; N94D, N94K,         N94R; F95A, F95L, F95Y; D96E, D961, D96L, D96T: L97F, L97M,         L97P; K98D, K98E, K98I, and K98Q and E99K.         99. The variant of any of paragraphs 1-98, which further one or         more substitutions corresponding to any of positions selected         from: 27, 33, 38, 51, 56, 57, 58, 60, 69, 101, 106, 111, 150,         163, 198, 210, 211, 216, 220, 254, 255, 256, 263, 264, 265, 266,         267, and 269 of SEQ ID NO: 1.         100. The variant of any of paragraphs 1-99, wherein said one or         more substitutions are selected from the group consisting of:         27N, 27R; 33K, 33Q; 38A; 51I, 51L, 51V; 56K, 56Q, 56R, 56S; 57G,         57N; 58A; 60S; 69R; 101R; 106K, 106R; 111A; 131T; 149G; 150G;         163K, 163S; 198S; 210K, 210Q; 211L; 216P; 220F; 254S; 255A,         255I, 255T; 256K, 256T, 256V; 263Q; 264A, 264F, 264W; 265T;         266D; 267A; and 269N.         101. The variant of any of paragraphs 1-100, which is a variant         of a parent lipase having at least 60% sequence identity to SEQ         ID NO: 1, e.g., at least 65%, at least 70%, at least 75%, at         least 80%, at least 85%, at least 90%, at least 95%, at least         96%, at least 97%, at least 98%, at least 99% or 100% sequence         identity to SEQ ID NO: 1.         102. The variant of any of paragraphs 1-101, wherein the parent         lipase comprises or consists of the amino acid sequence of SEQ         ID NO: 1.         103. The variant of any of paragraphs 1-102, wherein the parent         lipase is a fragment of SEQ ID NO: 1, wherein the fragment has         lipase activity.         104. The variant of any of paragraphs 1-103, which has 1-20         modifications, e.g., 1-10 and 1-5, such as 1, 2, 3, 4, 5, 6, 7,         8, 9 or 10 modifications.         105. The variant of any of paragraphs 1-104, which has an         improved wash performance.         106. The variant of any of paragraphs 1-105, wherein the variant         has one of the following set of modifications:

R232RR V236R + E239R S224* + G225* + T226* + L227R + V228R + V230* G225R + T231R T231R + E239R + Q249R G225R + L227R T199R + N200R Q4R + N8R E1Q + V2K G91T + N101R + G106R G225R + V228R E1ER T231TR E1* + V2R + S3R E1* + V2* + S3R E1* + V2* + S3* E1* + V2R E1* N233R + V236R T231R + V236R N200R + T231R N233R + Q249R G225R + N233R L227R + V236R N200R + L227R T226R + Q249R N200R + G225R G225R + T226R V236R + E239R S224R + G225R N8R + N11R G38R + N39R S224R + P229R T37R + G38R + N39R E1Q + V2K + Q4R T37R + N39R T37R + G38R S224R + L227R L227R + P229R E1P + V2* D5R + N8R N8R + E43R 107. The variant of any of paragraphs 1-106, wherein the variant has one of the following set of modifications:

D234R V236R G225R P229R N33R T37R N39R A131T G245R Q249R G225* T226* L227R V228R E1* V2* E1* V2K V2* E1Q V2* E1ER V2R S224* G225* T226R L227R V228* S224* G225* T226* L227R P229R S224R G225R L227R V228* T231RR S224K G225K A30R N33R S224K P229K S224K G225K L227K V236K E239K N39K P229R G38R P229R A30R G31R S105R G106R G106R N178R E210Q F211R P250R I252R Q249R P250R A243R G245R N233R A243AR T244TRR S105RR S105RR G106R T199KN200K P229R T231TR P229R V230VR P229PR T231TR T226R V228R E1P V2* Q4R N8R E1P D5R N8R D5R N11R Q4R N11R A28R P29R N178R A180R T37K G38K N39K G225GR G91T N101R S105R G91T D102R S105R S224R V*228VR S224SR V228VaR S224SR T226TR V228VR P229PR G91T E99R N101R S105R G91TG106R N178R T244TR E99R N101R G91T N101R D102R N101R D102R D102R S105R G91TG106R A180R D254R P256R L227LR 108. The variant of any of paragraphs 1-107, wherein the variant has a relative wash performance (RP(Wash)) higher than 1.00 when compared to the lipase shown as SEQ ID NO: 1, such as higher than 2.00, such as higher than 3.00, such as higher than 4.00, such as higher than 5.00, such as higher than 6.00, such as higher than 7.00, such as higher than 8.00, such as higher than 9.00, such as higher than 10.00, such as higher than 11.00, such as higher than 12.00, such as higher than 13.00, such as higher than 14.00, such as higher than 15.00. 109. The variant of any of paragraphs 1-108, wherein the relative wash performance (RP(Wash)) is determined as AMSA Model J RP (6° dH, 0.8 g/L) or AMSA Model B RP (6° dH, 3.3 g/L) or AMSA Model B RP (15° dH, 3.3 g/L) as described in the Example 3. 110. The variant of any of paragraphs 1-109, wherein the variant has relative odor release (RP(odor)) is lower than 15.00 when compared to the lipase shown as SEQ ID NO: 1, such as lower than 14.00, such as lower than 13.00, such as lower than 12.00, such as lower than 11.00, such as lower than 10.00, such as lower than 9.00, such as lower than 8.00, such as lower than 7.00, such as lower than 6.00, such as lower than 5.00, such as lower than 4.00, such as lower than 3.00, such as lower than 2.00, such as lower than 1.00. 111. The variant of any one of paragraphs 1-110, wherein the relative odor release (RP(odor)) lower is determined as AMSA Model J, RP (6° dH, 0.8 g/L)(odor) as described in Example 3. 112. The variant of any of paragraphs 1-111, wherein the variant has a BRF (Benefit Risk Factor) higher than 1 when compared to the lipase shown as SEQ ID NO: 1, such as higher than 2, such as higher than 3, such as higher than 4, such as higher than 5. 113. The variant of any one of paragraphs 1-112, wherein the variant has a BRF (Benefit Risk Factor) AMSA Model J as described in Example 3 114. The variant of any one of paragraphs 1-113, wherein BRF is determined in a detergent comprising an anionic surfactant, in particular linear alkylbenzene sulfonate (LAS) and/or alcohol ethoxysulfate (AEOS). 115. The variant of any of paragraphs 112-114, wherein BRF is determined in a detergent composition comprising nonionic surfactant, such as alcohol ethoxylate (AEO). 116. The variant of any of paragraphs 112-115, wherein BRF is determined using AMSA in Model Detergent J (6° dH, 0.8 g/L) and/or Model Detergent B (6° dH, 3.3 g/L). 117. The variant of any one of paragraphs 1-116, wherein the variant has one of the following set of modifications:

N200R + G225R G225R + N233R N200R + T231R T231R + E239R + Q249R G225R + T231R T37R + N39R T37R + G38R + N39R G38R + N39R G91T + N101R + G106R 118. The variant of any of paragraphs 108-117, where in relative wash performance ((RP(wash)) is determined in a detergent comprising an anionic surfactant, in particular linear alkylbenzene sulfonate (LAS) and/or alcohol ethoxysulfate (AEOS). 119. The variant of any of paragraphs 108-118, wherein the relative wash performance ((RP(wash)) is determined in a detergent composition comprising nonionic surfactant, such as alcohol ethoxylate (AEO). 120. The variant of any of paragraphs 108-119, wherein the relative wash performance ((RP(wash)) is determined using AMSA in Model Detergent B, Detergent Diao, Model Detergent V, Model Detergent T, Model Detergent Y, or Model Detergent X. 121. A composition comprising the variant of any of paragraphs 1-120. 122. The composition of paragraph 121, which is a detergent composition, such as a liquid or powder laundry detergent composition. 123. The composition of paragraph 121 or 122, further comprising a surfactant. 124. Use of the variant of any of paragraphs 1-120 for hydrolyzing a lipase substrate. 125. A method for cleaning a surface comprising contacting the surface with the variant of any of paragraphs 1-120. 126. A method of hydrolyzing a lipase substrate, comprising treating the lipase substrate with a lipase variant of any of paragraphs 1-120. 127. A polynucleotide encoding the variant of any of paragraphs 1-120, wherein the polynucleotide is operably linked to one or more control sequences that direct the production of the xylanase variant in a recombinant host cell. 128. A nucleic acid construct comprising the polynucleotide of paragraph 127. 129. An expression vector comprising the polynucleotide of paragraph 127. 130. A host cell comprising a nucleic acid construct of paragraph 128 or expression vector of paragraph 129. 131. A method of producing a lipase variant, comprising:

-   -   a. cultivating the host cell of paragraph 130 under conditions         suitable for expression of the variant; and     -   b. recovering the variant.         132. A method of producing the variant of any of paragraphs         1-120, comprising:     -   a. cultivating a transgenic plant or a plant cell comprising a         polynucleotide encoding the variant under conditions conducive         for production of the variant; and     -   b. recovering the variant.         133. A whole broth formulation or cell culture composition         comprising the variant of any of paragraphs 1-120.

The present invention is further described by the following examples that should not be construed as limiting the scope of the invention.

EXAMPLES Example 1: p-Nitrophenyl (pNP) Assay

The hydrolytic activity of a lipase may be determined by a kinetic assay using p-nitrophenyl acyl esters as substrate.

A 100 mM stock solution in DMSO for each of the substrates p-nitrophenyl butyrate (C4), p-nitrophenyl caproate (C6), p-nitrophenyl caprate (C10), p-nitrophenyl laurate (C12) and p-nitrophenyl palmitate (C16) (all from Sigma-Aldrich Danmark A/S, Kirkebjerg Allé 84, 2605 Brøndby; Cat. no.: C3:N-9876, C6: N-0502, C10: N-0252, C12: N-2002, C16: N-2752) is diluted to a final concentration of 1 mM 25 mM in the assay buffer (50 mM Tris; pH 7.7; 0.4% Triton X-100).

The lipase variants of the invention, the parent lipase and appropriate controls, e.g., Lipolase™ (SEQ ID NO: 1) in 50 mM Hepes; pH 8.0; 10 ppm Triton X-100; +/−20 mM CaCl₂ are added to the substrate solution in the following final protein concentrations: 0.01 mg/ml; 5×10⁻³ mg/ml; 2.5×10⁻⁴ mg/ml; and 1.25×10⁻⁴ mg/ml in 96-well NUNC plates (Cat. No. 260836, Kamstrupvej 90, DK-4000, Roskilde). The buffer is also run as a negative control. Release of p-nitrophenol by hydrolysis of a p-nitrophenyl acyl may be monitored at 405 nm for 5 minutes in 10 second intervals on a Spectra max 190 (Molecular Devices GmbH, Bismarckring 39, 88400 Biberach an der Riss, GERMANY). The hydrolytic activity towards one or more substrates of a variant may be compared to that of the parent lipase.

Example 2: Construction of Variants by Site-Directed Mutagenesis

Site-directed variants of the Thermomyces lanuginosus lipase (TLL) of SEQ ID NO 1 were constructed comprising specific substitutions according to the invention. The variants were made by traditional cloning of DNA fragments (Sambrook et al., Molecular Cloning: A Laboratory Manual, 2nd Ed., Cold Spring Harbor, 1989) using PCR together with properly designed mutagenic oligonucleotides that introduced the desired mutations/modifications in the resulting sequence.

Mutagenic oligos were designed corresponding to the DNA sequence flanking the desired site(s) of mutation, separated by the DNA base pairs defining the insertions/deletions/substitutions, and purchased from an oligo vendor such as Life Technologies. In order to test the TLL variants, the mutated DNA comprising a variant was integrated into a competent A. oryzae strain by homologous recombination, fermented using standard protocols (yeast extract based media, 3-4 days, 30° C.), and purified by chromatography. In this manner, the variants listed in Table 1 below were constructed and produced.

TABLE 1 Variants of SEQ ID NO 1 E1ER E1P + V2* E1Q + V2K E1Q + V2K + Q4R E1* E1* + V2R E1* + V2R + S3R E1* + V2* + S3R E1* + V2* + S3* Q4R + N8R D5R + N8R N8R + N11R N8R + E43R T37R + G38R T37R + G38R + N39R T37R + N39R G38R + N39R G91T + N101R + G106R T199R + N200R N200R + G225R N200R + L227R N200R + T231R S224R + G225R S224R + L227R S224R + P229R S224* + G225* + T226* + L227R + V228R + V230* G225R + T226R G225R + L227R G225R + V228R G225R + T231R G225R + N233R T226R + Q249R L227R + P229R L227R + V236R T231R + V236R T231R + E239R + Q249R T231TR R232RR N233R + V236R N233R + Q249R V236R + E239R

Example 3: Wash Performance of Lipase Variants

Washing experiments were performed using the Automatic Mechanical Stress Assay (AMSA) described in WO 02/42740 (hereby incorporated by reference) in order to assess the wash performance in laundry. The AMSA plate has a number of slots for test solutions and a lid firmly squeezing the laundry sample, the textile to be washed against all the slot openings. During the washing time, the plate, test solutions, textile and lid are vigorously shaken to bring the test solution in contact with the textile and apply mechanical stress in a regular, periodic oscillating manner. For further description see WO 02/42740 especially the paragraph “Special method embodiments” at page 23-24 hereby incorporated by reference.

The laundry experiments were conducted according to the experimental conditions (Table 2) specified below:

TABLE 2 Experimental Conditions Detergent: 3.3 g/L Model Detergent B (Model B) or 0.8 g/L Model Detergent J (Model J) Test solution 160 μL volume: Wash time: 20 minutes Temperature: 30° C. Lipase dosage: 0 ppm or 0.35 ppm Test material: Cream Annatto stained EMPA221 cotton textile prepared as described in WO 2006/125437 except turmeric was exchanged with annatto (Annatto: A-320-WS, Chr. Hansen A/S, Boege Alle′ 10-12, DK-2970, Hoersholm, Denmark & EMPA221: EMPA, Lerchenfeldstrasse 5, CH-9014, St. Gallen, Switzerland)

Water hardness was adjusted to 15° dH or 6° dH by addition of CaCl₂, MgCl₂ and NaHCO₃ (Ca²⁺:Mg²⁺:HCO₃ ⁻=4:1:7.5 or 2:1:4.5).

TABLE 3 Model Detergent B (wt. %) NaOH, pellets (>99%) 1.05 Linear alkylbenzenesulfonic acid (LAS) (97%) 7.20 Sodium laureth sulfate (SLES) (28%) 10.58 Soy fatty acid (>90%) 2.75 Coco fatty acid (>99%) 2.75 Alcohol ethoxylate (AEO) with 8 mol EO; 6.60 Lutensol TO 8 (~100%) Triethanol amine (100%) 3.33 Na-citrate, dihydrate (100%) 2.00 DTMPA; diethylenetriaminepentakis 0.48 (methylene)pentakis(phosphonic acid), heptasodium salt (Dequest 2066 C) (~42% as Na7 salt) MPG (>98%) 6.00 EtOH, propan-2-ol (90/10%) 3.00 Glycerol (>99.5%) 1.71 Sodium formate (>95%) 1.00 PCA (40% as sodium salt) 0.46 Water up to 100.00

TABLE 4 Model Detergent J (wt. %) sodium hydroxide (>99%) 0.50 Linear alkylbenzenesulfonic acid (LAS) (97%) 5.00 sodium alkyl sulfate (90%) 5.00 AEOS, sodium (C12) alkyl ether sulfate (70.5%) 10.00 Coco fatty acid (>99%) 1.00 Alcohol ethoxylate (AEO) with 7 mol EO (99.5%) 5.00 MEA, monoethanolamine (99.5%) 0.20 MPG (>98%) 3.00 EtOH, propan-2-ol (90/10%) 1.50 DTPA, diethylenetriaminepentaacetic acid, 0.10 pentasodium salt, (~40% as Na5 salt) sodium citrate (>99%) 4.00 sodium formate (>99%) 1.00 Water up to 100

After washing the textiles were flushed in tap water and excess water was removed from the textiles using filter paper and immediately thereafter the textiles were dried at 100° C. for 15 minutes.

The wash performance was measured as the color change of the washed soiled textile. The soil was cream mixed with annatto. Annatto contains the colorant norbixin, which functions as a pH indicator with a pH dependent color change. Lipase activity causes release of free fatty acids from the cream acylglycerols which leads to a pH decrease and thereby color change of the norbixin pH indicator. Lipase wash performance can therefore be expressed as the extent of color change of light reflected-emitted from the washed soiled textile when illuminated with white light.

Color measurements were made with a professional flatbed scanner (EPSON EXPRESSION 11000XL, Atea A/S, Lautrupvang 6, 2750 Ballerup, Denmark), which was used to capture an image of the washed soiled textile. To extract a value for the light intensity from the scanned images, 24-bit pixel values from the image were converted into values for red, green and blue (RGB).

Color change due to lipase activity was measured as the change in the reflection-emitting of green light (G) relative to the light intensity value (Int) calculated as:

Int=√{square root over (R ² +G ² +B ²)}

The relative wash performance (RP(Wash)) of a lipase variant relative to a reference lipase was calculated as:

RP(Wash)=(G/Int(tested lipase)−G/Int(no enzyme))/(G/Int(lipase ref.)−G/Int(no enzyme)).

A lipase variant is considered to exhibit improved wash performance, if it performs better than the reference lipase, i.e., the lipase of SEQ ID NO: 1 (RP(Wash)>1).

Odor Detection by Solid Phase Micro Extraction Gas Chromatograph Measurements.

The butyric acid release (odor) from the lipase washed swatches was measured by Solid Phase Micro Extraction Gas Chromatography (SPME-GC) using the following method.

Cream Annatto stained EMPA221 cotton textile was washed as specified above and after washing, excess water was removed from the textile using filter paper and the textile was thereafter dried at 25° C. for 2 hours. Each SPME-GC measurement was performed with four pieces of the washed and dried textile (5 mm in diameter), which were transferred to a Gas Chromatograph (GC) vial and the vial was closed. The samples were incubated at 30° C. for 24 hours and subsequently heated to 140° C. for 30 minutes and stored at 20° C.-25° C. for at least 4 hours before analysis. The analyses were performed on a Varian 3800 GC equipped with a Stabilwax-DA w/Integra-Guard column (30 m, 0.32 mm ID and 0.25 μm df) and a Carboxen PDMS SPME fiber (85 μm). Sampling from each GC vial was done at 50° C. for 8 minutes with the SPME fiber in the head-space over the textile pieces and the sampled compounds were subsequently injected onto the column (injector temperature=250° C.). Column flow=2 ml helium/minute. Column oven temperature gradient: 0 minute=50° C., 2 minutes=50° C., 6 minutes 45 seconds=240° C., 11 minutes 45 seconds=240° C. Detection was done using a Flame Ionization Detector (FID) and the retention time for butyric acid was identified using an authentic standard.

The relative odor release (RP(Odor)) of a lipase is the ratio between the amount of butyric acid released (peak area) from a lipase washed swatch and the amount of butyric acid released (peak area) from a reference lipase washed swatch, after both values have been corrected for the amount of butyric acid released (peak area) from a non-lipase washed swatch (blank). The reference lipase is a polypeptide having a single amino acid substitution relative to the tested lipase. The relative odor performance (RP(Odor)) of the polypeptide is calculated according to the following formula:

RP(Odor)=(odor(tested lipase variant)−odor(no enzyme))/(odor(lipase ref.)−odor(no enzyme))

where odor is the measured butyric acid (peak area) released from the textile surface.

Benefit Risk Factor (BRF).

The Benefit Risk Factor (BRF) describing the wash performance (Benefit) compared to the odor release (Risk) can be defined as RP(Wash)/RP(Odor). If the BRF of a lipase variant is higher than 1, the lipase variant has better wash performance relative to the released odor compared to the reference lipase.

The results are provided in Table 5.

TABLE 5 Wash performance and odor generation in Model J and Model B AMSA AMSA AMSA AMSA Model J Construct Model J Model B Model B RP Protein RP RP RP (6° dH, AMSA Mutations/ (6° dH, (6° dH, (15° dH, 0.8 g/L) Model J Modifications 0.8 g/L) 3.3 g/L) 3.3 g/L) (odor) BRF SEQ ID NO 1 1.00 1.00 1.00 1.00 1.00 R232RR 1.44 2.27 1.51 1.60 0.90 V236R + E239R 2.07 2.72 1.30 3.55 0.58 S224* + G225* + 3.50 2.96 1.78 1.75 2.00 T226* + L227R + V228R + V230* G225R + T231R 3.18 3.09 1.79 2.47 1.28 T231R + E239R + 3.64 1.90 1.16 1.89 1.92 Q249R G225R + L227R 1.25 1.98 1.44 2.50 0.50 T199R + N200R 4.48 4.22 2.07 4.04 1.10 Q4R + N8R 2.22 2.64 1.56 2.27 0.97 E1Q + V2K 1.62 1.99 1.54 1.85 0.87 G91T + N101R + 3.24 3.42 1.96 3.01 1.07 G106R G225R + V228R 4.74 4.41 2.11 3.24 1.46 E1ER 4.38 2.45 1.75 6.20 0.71 T231TR 3.14 2.16 1.68 4.38 0.71 E1* + V2R + S3R 5.60 2.49 1.66 9.48 0.59 E1* + V2* + S3R 2.78 2.34 1.69 5.01 0.55 E1* + V2* + S3* 4.65 2.81 1.96 7.23 0.64 E1* + V2R 2.35 2.14 1.76 2.51 0.93 E1* 5.24 3.27 1.79 11.01 0.47 N233R + V236R 8.65 3.95 2.08 8.74 0.98 T231R + V236R 10.11 3.56 1.90 8.80 1.14 N200R + T231R 13.34 6.18 2.33 15.63 0.85 N233R + Q249R 9.09 3.48 1.95 10.03 0.90 G225R + N233R 9.87 4.57 2.22 9.81 1.00 L227R + V236R 5.32 2.82 1.85 1.39 3.83 N200R + L227R 8.75 5.05 2.56 9.39 0.93 T226R + Q249R 8.41 4.41 2.13 4.54 1.85 N200R + G225R 13.68 5.25 2.43 15.95 0.85 G225R + T226R 8.47 4.50 2.31 8.19 1.03 V236R + E239R 6.27 2.82 1.71 9.80 0.63 S224R + G225R 6.07 4.06 2.41 1.08 5.62 N8R + N11R 2.62 2.74 2.42 0.76 3.44 G38R + N39R 2.75 2.89 2.03 0.79 3.48 S224R + P229R 5.85 4.37 2.66 1.05 5.57 T37R + G38R + 4.40 3.17 2.27 0.89 4.94 N39R E1Q + V2K + 2.15 2.48 2.25 0.77 2.79 Q4R T37R + N39R 3.66 3.02 2.59 1.19 3.07 T37R + G38R 3.01 2.53 1.99 0.81 3.72 S224R + L227R 1.37 2.28 2.10 0.57 2.40 L227R + P229R 1.90 2.24 2.06 0.58 3.27 E1P + V2* 3.23 3.33 2.30 1.63 1.98 D5R + N8R 2.48 2.71 2.03 1.08 2.29 N8R + E43R 3.56 2.87 2.16 0.92 3.87

The results demonstrate that the lipase variants have improved wash performance relative to the reference (SEQ ID NO: 1) under the conditions tested (Model B and Model J) and several variants also have improved BRF values relative to the reference.

Example 4: Wash Performance of Lipase Variants

In order to assess the wash performance on laundry, washing experiments were performed using the Automatic Mechanical Stress Assay (AMSA). The AMSA plate has a number of slots for test solutions and a lid firmly squeezing the laundry sample, the textile to be washed against all the slot openings. During the washing time, the plate, test solutions, textile and lid were vigorously shaken to bring the test solution in contact with the textile and apply mechanical stress in a regular, periodic oscillating manner. For further description see WO 02/42740 especially the paragraph “Special method embodiments” at pages 23-24.

The laundry experiments were conducted in Model Detergents with different surfactant compositions and pH and commercial Diao (Table 7), under the experimental conditions (Table 6) specified below:

TABLE 6 Experimental Conditions Detergents 1. 3.3 g/L liquid Model detergent B adjusted to pH 8 by 4N NaOH 2. 3.3 g/L liquid Model detergent B adjusted to pH 9 by 4N NaOH 3. 3.3 g/L liquid Model detergent B adjusted to pH 10 by 4N NaOH 4. 2.0 g/L powder DiaoChao Xiao Jia Mei 5. 5 g/L powder Model V with AEO Detergent 6. 5 g/L powder Model T with AEO Detergent 7. 1.75 g/L powder Model Y 8. 1.75 g/L powder Model X Test solution 160 μl volume Wash time 15 minutes for Model B; 20 min for Diao, Model V, Model T, Model Y and Model X Temperature 25° C. for Model B and Diao; 30° C. for Model V, Model T, Model Y and Model X Water 15° dH for Model B, Model V and T; 14° dH Hardness for Diao; 12° dH for Model Y and Model X Lipase 0 ppm & 1 ppm dosage Test material Cream turmeric stain according to WO 2006/125437

TABLE 7 Detergent composition (wt. %) Total surfactant comprised in Model detergents B V T Y X linear alkylbenzenesulfonic acid (LAS) 7 6 10 9 15 sodium lauryl ether sulfate (SLES) (STEOL CS-370 E) 3 0 0 0 0 Surfactant SLS/BP 0 0 1.8 0 0 alcohol ethoxylate (AEO) (Bio-Soft N25-7) 6.6 1.8 3 2 2 coco soap 2.75 0.6 1 0 0 soy soap 2.75 0.6 1 0 0 sodium hydroxide 1.1 0 0 0 0 Ethanol 2.7 0 0 0 0 propane-1,2-diol (MPG) 6 0 0 0 0 Glycerol 1.7 0 0 0 0 triethanolamine (TEA) 3.3 0 0 0 0 sodium formate 1 0 0 0 0 sodium citrate 2 2 2 0 0 Diethylenetriaminepentakis 0.2 0 0 0 0 (methylenephosphonic acid) (DTMPA) PCA (polycarboxylate polymer) (Sokalan CP-5) 0.18 1.5 1.5 1.3 1 Sodium carbonate 0 14.9 14.9 20.1 0 CMC Sodium (carboxymethyl)cellulose 0 1.6 0 0 0 SRP copolymer polyether/polyester 0 0.5 0.5 0 0 SPC sodium percarbonate 0 20 0 0 0 TAED tetraacetylethylenediamine 0 3 0 0 0 Sodium sulfate 0 17.9 38.6 38.5 38.9 HEDP-Na₄ 1-hydroxyethane-1.1-diylbis(phosphonic 0 0 0.13 0 0 acid), tetrasodiumsalt; tetrasodium etidronate Foam controller Dow Corning 1-4248S 0 2 1 0 0 Hydrous sodium (di)silicate 0 0 0 9.9 9.9 Zeolite A ZP-4AM 0 0 0 12.1 12 Water up to 100 0 0 0 0

Water hardness was adjusted to Model B 15° dH by addition of CaCl₂, MgCl₂ and CO₃ ²⁻ (Ca²⁺:Mg²⁺⁺:CO₃ ²⁻=4:1:7.5) to the test system; to Diao 14° dH by addition of CaCl₂ and MgCl₂ (Ca²⁺:Mg²⁺=3:2) to the test system; to Model V and Model T 15° dH by addition of CaCl₂, MgCl₂ and CO₃ ²⁻ (Ca²⁺:Mg²⁺:CO₃ ²⁻=4:1:7.5); to Model Y and Model X 12° dH by addition of CaCl₂, MgCl₂ and CO₃ ²⁻ (Ca²⁺:Mg²⁺:CO₃ ²⁻=2:1:4.5).

After washing the textiles were rinsed in tap water and excess water was removed from the textiles using filter paper and immediately thereafter the textiles were dried at 85° C. for 5 minutes.

The wash performance was measured as the color change of the washed soiled textile. The soil was cream mixed with turmeric. Turmeric contains the colorant curcumin, which functions as a pH indicator with a pH dependent color change. Lipase activity causes release of free fatty acids from the cream acylglycerides which leads to a pH decrease and thereby color change of the curcumin pH indicator. Lipase wash performance can therefore be expressed as the extent of color change of light reflected from the washed soiled textile when illuminated with white light.

Color measurements were made with a professional flatbed scanner (Kodak iQsmart, Kodak, Midtager 29, DK-2605 Brøndby, Denmark), which was used to capture an image of the washed soiled textile. To extract a value for the light intensity from the scanned images, 24-bit pixel values from the image were converted into values for red, green and blue (RGB). The intensity value (Int) was calculated by adding the RGB values together as vectors and then taking the length of the resulting vector:

Int=√{square root over (r ² +g ² +b ²)}

Color change due to lipase activity was measured as the increase in the reflection of green light (G) relative to the intensity (Int) of the total reflected light. The wash performance (RP(Wash)) of a lipase variant relative to a reference lipase (Lipolase®, Novozymes A/S) was calculated as:

Relative wash performance(RP(Wash))=(G/Int(tested lipase variant)−G/Int(no enzyme))/(G/Int(lipase reference)−G/Int(no enzyme))

The results are provided in Table 8.

TABLE 8 Relative wash performance (RP) of the tested variants Model B Diao Model V Model T Model Y Model RP(wash) (wash) (wash) (wash) (wash) (wash) pH 8 pH 9 pH 10 RP RP RP RP X RP SEQ ID NO 1 1.00 1.00 1.00 1.00 1.00 1.00 1.00 1.00 N200R + G225R 1.60 2.81 5.52 7.05 4.41 3.99 12.21 6.84 G225R + N233R 1.54 2.69 4.19 6.31 2.53 2.53 6.20 5.05 N200R + T231R 1.66 2.78 5.09 6.94 3.32 3.22 9.45 6.27 T231R + E239R + 1.23 2.30 5.56 6.17 2.29 0.80 8.69 4.89 Q249R G225R + T231R 1.53 2.67 4.63 6.72 3.01 2.84 7.82 5.66 T37R + N39R 1.49 2.65 4.54 6.23 3.04 2.99 8.02 5.47 T37R + G38R + 1.49 2.58 5.44 6.20 4.42 3.63 11.17 6.04 N39R G38R + N39R 1.39 2.39 4.34 5.99 2.96 2.72 8.22 5.11 G91T + N101R + 1.40 2.50 4.69 6.13 3.23 2.91 8.98 5.71 G106R

The results demonstrate that the lipase variants have an improved wash performance relative to the reference (SEQ ID NO: 1), in the detergents and conditions tested.

Example 5: Construction of Variants by Site-Directed Mutagenesis

Site-directed variants were constructed of the Thermomyces lanuginosus lipase (TLL) (SEQ ID NO: 1), comprising specific substitutions according to the invention. The variants were made by traditional cloning of DNA fragments (Sambrook et al., Molecular Cloning: A Laboratory Manual, 2nd Ed., Cold Spring Harbor, 1989) using PCR together with properly designed mutagenic oligonucleotides that introduced the desired mutations/modification in the resulting sequence. Mutagenic oligos were designed corresponding to the DNA sequence flanking the desired site(s) of mutation, separated by the DNA base pairs defining the insertions/deletions/substitutions, and purchased from an oligo vendor such as Life Technologies. In order to test the TLL variants of the invention, the mutated DNA comprising a variant of the invention are integrated into a competent A. oryzae strain by homologous recombination, fermented using standard protocols (yeast extract based media, 3-4 days, 30° C.), and purified by chromatography. In this manner, the variants listed in Table 1 below were constructed and produced.

TABLE 9 Variants of SEQ ID NO: 1 D234R V236R G225R P229R N33R T37R N39R A131T G245R Q249R G225* T226* L227R V228R E1* V2* E1* V2K V2* E1Q V2* E1ER V2R S224* G225* T226R L227R V228* S224* G225* T226* L227R P229R S224R G225R L227R V228* T231TRR S224K G225K A30R N33R S224K P229K S224K G225K L227K V236K E239K N39K P229R G38R P229R A30R G31R S105R G106R G106R N178R E210Q F211R P250R I252R Q249R P250R A243R G245R N233R A243AR T244TRR S105RR S105RR G106R T199KN200K P229R T231TR P229R V230VR P229PR T231TR T226R V228R E1P V2* Q4R N8R E1P D5R N8R D5R N11R Q4R N11R A28R P29R N178R A180R T37K G38K N39K G225GR G91T N101R S105R G91T D102R S105R S224R V228VR S224SR V228VR S224SR T226TR V228VR P229PR G91T E99R N101R S105R G91TG106R N178R T244TR E99R N101R G91T N101R D102R N101R D102R D102R S105R G91TG106R A180R D254R P256R L227LR

Example 6: Wash Performance of Lipase Variants

Washing experiments were performed using Automatic Mechanical Stress Assay (AMSA) in order to assess the wash performance in laundry. The AMSA plate has a number of slots for test solutions and a lid firmly squeezing the laundry sample, the textile to be washed against all the slot openings. During the washing time, the plate, test solutions, textile and lid are vigorously shaken to bring the test solution in contact with the textile and apply mechanical stress in a regular, periodic oscillating manner. For further description see WO02/42740 especially the paragraph “Special method embodiments” at page 23-24.

The laundry experiments were conducted under the experimental conditions specified below:

Table 10

-   -   Detergent: 3.3 g/L Detergent B or 0.8 g/L Detergent J     -   Test solution volume: 160 μL     -   Wash time: 20 minutes     -   Temperature: 30° C.     -   Lipase dosage: 0 ppm or 0.35 ppm     -   Test material: Cream Annatto stained EMPA221 cotton textile         prepared as described in WO06/125437 except to exchanging         turmeric with annatto (Annatto: A-320-WS, Chr. Hansen A/S, Boege         Allé 10-12, DK-2970, Hoersholm, Denmark & EMPA221: EMPA,         Lerchenfeldstrasse 5, CH-9014, St. Gallen, Switzerland)         Water hardness was adjusted to 15° dH or 6° dH by addition of         CaCl₂, MgCl₂ and NaHCO₃ (Ca²⁺:Mg²⁺:HCO₃ ⁻=4:1:7.5 or 2:1:4.5).

TABLE 11 Composition Detergent B (wt %) NaOH, pellets (>99%) 1.05 Linear alkylbenzenesulfonic acid (LAS) (97%) 7.20 Sodium laureth sulfate (SLES) (28%) 10.58 Soy fatty acid (>90%) 2.75 Coco fatty acid (>99%) 2.75 Alcohol ethoxylate (AEO) with 8 mol EO; 6.60 Lutensol TO 8 (~100%) Triethanol amine (100%) 3.33 Na-citrate, dihydrate (100%) 2.00 DTMPA; diethylenetriaminepentakis 0.48 (methylene)pentakis(phosphonic acid), heptasodium salt (Dequest 2066 C) (~42% as Na7 salt) MPG (>98%) 6.00 EtOH, propan-2-ol (90/10%) 3.00 Glycerol (>99.5%) 1.71 Sodium formate (>95%) 1.00 PCA (40% as sodium salt) 0.46 Water up to 100

TABLE 12 Composition Detergent J (wt %) sodium hydroxide (>99%) 0.50 Linear alkylbenzenesulfonic acid (LAS) (97%) 5.00 sodium alkyl sulfate (90%) 5.00 AEOS, sodium (C12) alkyl ether sulfate (70.5%) 10.00 Coco fatty acid (>99%) 1.00 Alcohol ethoxylate (AEO) with 7 mol EO (99.5%) 5.00 MEA, monoethanolamine (99.5%) 0.20 MPG (>98%) 3.00 EtOH, propan-2-ol (90/10%) 1.50 DTPA, diethylenetriaminepentaacetic acid, 0.10 pentasodium salt, (~40% as Na5 salt) sodium citrate (>99%) 4.00 sodium formate (>99%) 1.00 Water up to 100

After washing the textiles were flushed in tap water and excess water was removed from the textiles using filter paper and immediately thereafter the textiles were dried at 100° C. for 15 minutes.

The wash performance was measured as the color change of the washed soiled textile. The soil was cream mixed with annatto. Annatto contains the colorant norbixin, which functions as a pH indicator with a pH dependent color change. Lipase activity leads to release of free fatty acids from the cream acylglycerols and this leads to pH decrease and thereby color change of the norbixin pH indicator. Lipase wash performance can therefore be expressed as the extent of color change of light reflected-emitted from the washed soiled textile when illuminated with white light.

Color measurements were made with a professional flatbed scanner (EPSON EXPRESSION 11000XL, Atea A/S, Lautrupvang 6, 2750 Ballerup, Denmark), which was used to capture an image of the washed soiled textile. To extract a value for the light intensity from the scanned images, 24-bit pixel values from the image were converted into values for red, green and blue (RGB).

Color change due to lipase activity was measured as the change in the reflection-emitting of green light (G) relative to the light intensity value (Int) calculated as:

Int=√{square root over (R ² +G ² =B ²)}

The relative wash performance (RP(Wash)) of a lipase relative to a reference lipase was calculated as:

RP(Wash)=(G/Int(tested lipase)−G/Int(no enzyme))/(G/Int(lipase ref.)−G/Int(no enzyme)).

A lipase is considered to exhibit improved wash performance, if it performs better than the reference (RP(Wash)>1). In the context of the present invention the reference enzyme is a lipase having a single amino acid substitution relative to the tested lipase.

Odor Detection by Solid Phase Micro Extraction Gas Chromatograph Measurements.

The butyric acid release (odor) from the lipase washed swatches were measured by Solid Phase Micro Extraction Gas Chromatography (SPME-GC) using the following method.

Cream Annatto stained EMPA221 cotton textile was washed as specified above and after wash, excess water was removed from the textile using filter paper and the textile was thereafter dried at 25° C. for 2 h. Each SPME-GC measurement was performed with four pieces of the washed and dried textile (5 mm in diameter), which were transferred to a Gas Chromatograph (GC) vial and the vial was closed. The samples were incubated at 30° C. for 24 hours and subsequently heated to 140° C. for 30 minutes and stored at 20° C.-25° C. for at least 4 hours before analysis. The analyses were performed on a Varian 3800 GC equipped with a Stabilwax-DA w/Integra-Guard column (30m, 0.32 mm ID and 0.25 micro-m df) and a Carboxen PDMS SPME fiber (85 micro-m). Sampling from each GC vial was done at 50° C. for 8 minutes with the SPME fiber in the head-space over the textile pieces and the sampled compounds were subsequently injected onto the column (injector temperature=250° C.). Column flow=2 ml helium/minute. Column oven temperature gradient: 0 minute=50° C., 2 minutes=50° C., 6 minutes 45 seconds=240° C., 11 minutes 45 seconds=240° C. Detection was done using a Flame Ionization Detector (FID) and the retention time for butyric acid was identified using an authentic standard.

The relative odor release (RP(Odor)) of a lipase is the ratio between the amount butyric acid released (peak area) from a lipase washed swatch and the amount butyric acid released (peak area) from a reference lipase washed swatch, after both values have been corrected for the amount of butyric acid released (peak area) from a non-lipase washed swatch (blank). The reference lipase is a polypeptide having a single amino acid substitution relative to the tested lipase. The relative odor performance (RP(Odor)) of the polypeptide is calculated in accordance with the below formula:

RP(Odor)=(odor(tested lipase)−odor(no enzyme))/(odor(lipase ref.)−odor(no enzyme))

Where odor is the measured butyric acid (peak area) released from the textile surface.

Benefit Risk Factor (RP(Wash)/RP(Odor)).

The Benefit Risk factor describing the wash performance (Benefit) compared to the odor release (Risk) can be defined as RP(Wash)/RP(Odor). If the Benefit Risk factor of a lipase is higher than 1, the lipase has better wash performance relative to the released odor compared to the reference lipase.

TABLE 13 AMSA Model J Construct AMSA AMSA AMSA RP(6° dH, Protein Model J Model B Model B 0.8 AMSA Mutations/ RP(6° dH,  RP(6° dH, RP(15° dH, g/L) Model J Modifications 0.8 g/L) 3.3 g/L)  3.3 g/L) (odor) BRF SEQ ID NO 1 1.00 1.00 1.00 1.00 1 D234R V236R 11.61 3.07 1.64 14.13 0.82 G225R P229R 10.07 4.05 2.19 9.21 1.09 N33R T37R 7.98 4.05 2.10 6.43 1.24 N39R A131T G245R Q249R 9.46 3.14 1.87 9.99 0.95 G225* T226* L227R 4.15 2.94 1.77 2.27 1.83 V228R E1* V2* 1.07 1.34 1.31 1.49 0.72 E1* V2K 2.26 1.67 1.62 2.39 0.95 V2* 0.14 0.86 1.39 1.43 0.10 E1Q V2* −1.06 0.88 1.20 1.53 −0.69 E1ER V2R 0.91 0.85 1.15 1.54 0.59 S224* G225* T226R 2.51 2.17 1.60 1.50 1.68 L227R V228* S224* G225* 8.00 2.91 1.97 5.37 1.49 T226* L227R P229R S224R G225R L227R 6.79 3.17 2.06 4.94 1.38 V228* T231TRR 6.46 2.42 1.71 6.99 0.92 S224K G225K 9.13 3.22 2.15 8.54 1.07 A30R N33R 0.32 0.90 1.21 1.55 0.21 S224K P229K 9.72 4.33 2.13 9.41 1.03 S224K G225K L227K 7.45 3.28 2.00 4.66 1.60 V236K E239K 6.97 2.97 2.02 7.23 0.96 N39K P229R 3.75 4.23 2.06 3.44 1.09 G38R P229R 3.43 3.62 1.76 2.53 1.36 A30R G31R 1.13 0.90 0.80 0.78 1.44 S105R G106R 2.79 3.15 1.50 2.05 1.36 G106R N178R 2.82 0.55 0.78 4.00 0.71 E210Q F211R 0.63 1.63 1.26 2.72 0.23 P250R I252R 1.83 1.38 1.31 2.54 0.72 Q249R P250R 6.87 4.66 1.93 6.29 1.09 A243R G245R 0.84 0.38 0.74 1.11 0.76 N233R *243aR 1.28 1.12 1.06 1.74 0.73 T244TRR 1.38 0.81 0.88 1.24 1.12 S105RR 2.65 3.24 1.51 2.01 1.32 S105RR G106R 2.01 2.35 1.06 2.75 0.73 T199KN200K 7.64 4.32 1.93 8.01 0.95 P229R *231 aR 5.59 3.64 1.72 3.58 1.56 P229R *230aR 4.99 3.13 1.75 2.80 1.78 P229PRT231TR 4.00 3.38 1.63 3.23 1.24 T226R V228R 9.57 2.71 1.67 3.24 2.96 E1P V2* Q4R N8R 11.12 2.90 1.53 6.07 1.83 E1P D5R N8R 11.73 2.85 1.55 6.41 1.83 D5R N11R 7.64 2.34 1.64 3.45 2.21 Q4R N11R 10.40 2.85 1.71 3.28 3.17 A28R P29R 0.95 0.37 0.49 0.35 2.68 N178R A180R 13.00 2.11 1.55 7.91 1.64 T37K G38K N39K 7.60 2.38 1.64 3.73 2.04 G225GR 3.91 1.60 1.40 2.03 1.92 G91T N101R S105R −0.06 1.36 1.08 1.94 −0.03 G91T D102R S105R −0.65 0.85 1.19 2.20 −0.30 S224R V228VR 14.08 3.39 1.90 4.86 2.89 S224SR V228VR 8.93 3.60 1.96 2.02 4.42 S224SR 2.58 1.20 1.24 0.56 4.64 T226TR −0.10 1.08 1.15 0.87 −0.12 V228VR 3.77 1.33 1.61 2.21 1.70 P229PR 2.96 1.97 1.53 1.35 2.19 G91T E99R N101R 1.93 2.10 1.15 1.28 1.51 S105R 5.00 1.78 1.56 1.53 3.27 G91TG106R −2.23 1.26 1.00 1.76 −1.27 N178R 6.58 2.11 1.37 4.53 1.45 T244TR −2.90 0.61 0.68 1.29 −2.25 E99R N101R 3.80 2.31 1.60 4.91 0.77 G91T N101R D102R −0.62 1.35 1.05 3.44 −0.18 N101R D102R 1.80 2.18 1.54 2.48 0.73 D102R S105R 4.35 2.54 1.57 2.01 2.16 G91TG106R A180R 2.27 2.41 1.23 2.12 1.07 D254R P256R 5.99 1.79 1.18 6.11 0.98 L227LR 0.90 2.28 1.36 1.80 0.50

The invention described and claimed herein is not to be limited in scope by the specific aspects herein disclosed, since these aspects are intended as illustrations of several aspects of the invention. Any equivalent aspects are intended to be within the scope of this invention. Indeed, various modifications of the invention in addition to those shown and described herein will become apparent to those skilled in the art from the foregoing description. Such modifications are also intended to fall within the scope of the appended claims. In the case of conflict, the present disclosure including definitions will control. 

1. A lipase variant of a parent lipase, wherein said variant comprises a modification at one or more (e.g., several) positions corresponding to positions 1, 2, 3, 5, 8, 43, 45, 105, 167, 178, 224, 225, 226, 227, 228, 229, 230, 231, 232, 234, 236 239 and 244 of SEQ ID NO: 1, wherein the lipase variant has at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99% sequence identity, but less than 100% sequence identity, to SEQ ID NO: 1; the lipase variant has lipase activity; and a. the modification at the position corresponding to position 1 is a deletion, e.g., E1*, or an insertion of Arg, e.g., E1ER; b. the modification at the position corresponding to position 2 is a deletion, e.g., V2*; c. the modification at the position corresponding to position 3 is a deletion, e.g., S3*; d. the modification at the position corresponding to position 5 is a deletion, e.g., D5*; e. the modification at the position corresponding to position 8 is a substitution with Arg or Lys, e.g., N8R or N8K, in particular with Arg; f. the modification at the position corresponding to position 43 is a deletion, e.g., E43*; g. the modification at the position corresponding to position 45 is a deletion, e.g., E45*; h. the modification at the position corresponding to position 167 is a deletion, e.g., D167*; i. the modification at the position corresponding to position 224 is a deletion, e.g., S224* or an insertion of Arg, e.g., S224SR; j. the modification at the position corresponding to position 225 is a deletion, e.g., G225*; k. the modification at the position corresponding to position 226 is a deletion, e.g., T226* or an insertion of Arg, e.g., T226TR; l. the modification at the position corresponding to position 227 is a deletion, e.g., L227* or an insertion of Arg, e.g., L227LR; m. the modification at the position corresponding to position 228 is a deletion, e.g., V228* or an insertion of Arg, e.g., V228VR; n. the modification at the position corresponding to position 229 is a deletion, e.g., P229* or an insertion of Arg, e.g., P229PR; o. the modification at the position corresponding to position 230 is a deletion, e.g., V230*, or an insertion of Arg, e.g., V230VR, or a substitution with Arg or Lys, e.g., V230K or V230R, in particular with Arg; p. the modification at the position corresponding to position 231 is one or two insertions of Arg, e.g., T231TR or T231TRR; q. the modification at the position corresponding to position 232 is an insertion of Arg, e.g., R232RR; r. the modification at the position corresponding to position 234 is a deletion, e.g., D234*; s. the modification at the position corresponding to position 236 is a substitution with Arg or Lys, e.g., V236K or V236R, in particular with Arg; t. the modification at the position corresponding to position 239 is a deletion, e.g., E239*; u. the modification at the position corresponding to position 105 is a substitution with Arg, e.g., S105R, and/or an insertion of Arg, e.g., S105SR or S105RR; v. the modification at the position corresponding to position 178 is a substitution with Arg, e.g., N178R; and the modification at the position corresponding to position 244 is an insertion of Arg, e.g., T244TR.
 2. A lipase variant, comprising a modification at two or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254, and 256 of SEQ ID NO: 1, wherein the lipase variant has at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99% sequence identity, but less than 100% sequence identity, to SEQ ID NO: 1; the lipase variant has lipase activity; and a. the modification at the position corresponding to position 1 is a deletion, e.g., E1*, an insertion of Arg, e.g., E1ER, or a substitution with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg, Gln, Lys, or Pro, most particularly with Gln or Pro, e.g., E1P or E1Q; b. the modification at the position corresponding to position 2 is a deletion, e.g., V2*, or a substitution with Arg or Lys, e.g., V2R or V2K; c. the modification at the position corresponding to position 3 is a deletion, e.g., S3*, or a substitution with Arg or Lys, e.g., S3R or S3K, in particular with Arg; d. the modification at the position corresponding to position 4 is a substitution with Arg or Lys, e.g., Q4R or Q4K, in particular with Arg; e. the modification at the position corresponding to position 5 is a deletion, e.g., D5*, or a substitution with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., D5K or D5R, most particularly with Arg; f. the modification at the position corresponding to position 6 is a substitution with Arg or Lys, e.g., L6R or L6K, in particular with Arg; g. the modification at the position corresponding to position 7 is a substitution with Arg or Lys, e.g., F7R or F7K, in particular with Arg; h. the modification at the position corresponding to position 8 is a substitution with Arg or Lys, e.g., N8R or N8K, in particular with Arg; i. the modification at the position corresponding to position 9 is a substitution with Arg or Lys, e.g., Q9R or Q9K, in particular with Arg; j. the modification at the position corresponding to position 11 is a substitution with Arg or Lys, e.g., N11R or N11K, in particular with Arg; k. the modification at the position corresponding to position 12 is a substitution with Arg or Lys, e.g., L12R or L12K, in particular with Arg; l. the modification at the position corresponding to position 15 is a substitution with Arg or Lys, e.g., Q15R or Q15K, in particular with Arg; m. the modification at the position corresponding to position 37 is a substitution with Arg or Lys, e.g., T37R or T37K, in particular with Arg; n. the modification at the position corresponding to position 38 is a substitution with Arg or Lys, e.g., Q38R or Q38K, in particular with Arg; o. the modification at the position corresponding to position 39 is a substitution with Arg or Lys, e.g., N39R or N39K, in particular with Arg; p. the modification at the position corresponding to position 40 is a substitution with Arg or Lys, e.g., A40R or A40K, in particular with Arg; q. the modification at the position corresponding to position 42 is a substitution with Arg or Lys, e.g., P42R or P42K, in particular with Arg; r. the modification at the position corresponding to position 43 is a deletion, e.g., E43*, or a substitution at the position corresponding to position 43 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., E43K, or E43R, most particularly with Arg; s. the modification at the position corresponding to position 45 is a deletion, e.g., E45*, or a substitution at the position corresponding to position 45 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., E45K or E45R, most particularly with Arg; t. the modification at the position corresponding to position 73 is a substitution with Arg or Lys, e.g., N73R or N73K, in particular with Arg; u. the modification at the position corresponding to position 167 is a deletion, e.g., D167*, or a substitution at the position corresponding to position 167 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., D167K or D167R, most particularly with Arg; v. the modification at the position corresponding to position 192 is a substitution with Arg or Lys, e.g., T192R or T192K, in particular with Arg; w. the modification at the position corresponding to position 193 is a substitution with Arg or Lys, e.g., L193R or L193K, in particular with Arg; x. the modification at the position corresponding to position 194 is a substitution with Arg or Lys, e.g., Y194R or Y194K, in particular with Arg; y. the modification at the position corresponding to position 199 is a substitution with Arg or Lys, e.g., T199R or T199K, in particular with Arg; z. the modification at the position corresponding to position 200 is a substitution with Arg or Lys, e.g., N200R or N200K, in particular with Arg; aa. the modification at the position corresponding to position 202 is a substitution with Arg or Lys, e.g., I202R or I202K, in particular with Arg; ab. the modification at the position corresponding to position 217 is a substitution with Arg or Lys, e.g., S217R or S217K, in particular with Arg; ac. the modification at the position corresponding to position 218 is a substitution with Arg or Lys, e.g., P218R or P218K, in particular with Arg; ad. the modification at the position corresponding to position 220 is a substitution with Arg or Lys, e.g., Y220R or Y220K, in particular with Arg; ae. the modification at the position corresponding to position 221 is a substitution with Arg or Lys, e.g., W221R or W221K, in particular with Arg; af. the modification at the position corresponding to position 224 is a deletion, e.g., S224*, an insertion of Arg, e.g., S224SR, or a substitution with Arg or Lys, e.g., S224K or S224R, in particular with Arg; ag. the modification at the position corresponding to position 225 is a deletion, e.g., G225*, an insertion of Arg, e.g., G225GR, or a substitution with Arg or Lys, e.g., G225K or G225R, in particular with Arg; ah. the modification at the position corresponding to position 226 is a deletion, e.g., T226*, an insertion of Arg, e.g., T226TR or a substitution with Arg or Lys, e.g., T226K or T226R, in particular with Arg; ai. the modification at the position corresponding to position 227 is a deletion, e.g., L227*, an insertion of Arg, e.g., L227LR or a substitution with Arg or Lys, e.g., L227K or L227R, in particular with Arg; aj. the modification at the position corresponding to position 228 is a deletion, e.g., V228*, an insertion of Arg, e.g., V228VR or a substitution with Arg or Lys, e.g., V228K or V228R, in particular with Arg; ak. the modification at the position corresponding to position 229 is a deletion, e.g., P229*, an insertion of Arg, e.g., P229PR, or a substitution with Arg or Lys, e.g., P229K or P229R, in particular with Arg; al. the modification at the position corresponding to position 230 is a deletion, e.g., V230*, an insertion of Arg, e.g., V230VR or a substitution with Arg or Lys, e.g., V230K or V230R, in particular with Arg; am. the modification at the position corresponding to position 231 is one or two insertions of Arg, e.g., T231TR or T231TRR, or a substitution with Arg or Lys, e.g., T231K or T231R, in particular with Arg; an. the modification at the position corresponding to position 232 is an insertion of Arg, e.g., R232RR; ao. the modification at the position corresponding to position 233 is a substitution with Arg or Lys, e.g., N233K or D233R, in particular with Arg; ap. the modification at the position corresponding to position 234 is a deletion, e.g., D234*, or a substitution at the position corresponding to position 234 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., D234K or D234R, most particularly with Arg; aq. the modification at the position corresponding to position 236 is a substitution with Arg or Lys, e.g., V236K or V236R, in particular with Arg; ar. the modification at the position corresponding to position 238 is a substitution with Arg or Lys, e.g., I238K or I238R, in particular with Arg; as. the modification at the position corresponding to position 239 is a deletion, e.g., E239*, or a substitution at the position corresponding to position 239 with Ala, Arg, Asn, Cys, Gln, Gly, His, Ile, Leu, Lys, Met, Phe, Pro, Ser, Thr, Trp, Tyr, or Val, in particular with Arg or Lys, e.g., E239K or E239R, most particularly with Arg; at. the modification at the position corresponding to position 243 is an insertion of Arg, e.g., A243AR or a substitution with Arg or Lys, e.g., A243K or A243R, in particular with Arg; au. the modification at the position corresponding to position 244 is an insertion of Arg, e.g., T244TR or a substitution with Arg or Lys, e.g., T244K or T244R, in particular with Arg; av. the modification at the position corresponding to position 245 is a substitution with Arg or Lys, e.g., G245K or G245R, in particular with Arg; aw. the modification at the position corresponding to position 248 is a substitution with Arg or Lys, e.g., N248K or N248R, in particular with Arg; ax. the modification at the position corresponding to position 249 is a substitution with Arg or Lys, e.g., Q249K or Q249R, in particular with Arg; and ay. the modification at the position corresponding to position 251 is a substitution with Arg or Lys, e.g., N251K or N251R, in particular with Arg az. the modification at the position corresponding to position 28 is a substitution with Arg, e.g., A28R ba. the modification at the position corresponding to position 29 is a substitution with Arg, e.g., P29R; bb. the modification at the position corresponding to position 30 is a substitution with Arg, e.g., A30R; bc. the modification at the position corresponding to position 31 is a substitution with Arg, e.g., G31R; bd. the modification at the position corresponding to position 33 is a substitution with Arg, e.g., N33R; be. the modification at the position corresponding to position 99 is a substitution with Arg, e.g., E99R; bf. the modification at the position corresponding to position 101 is a substitution with Arg, e.g., N101R; bg. the modification at the position corresponding to position 102 is a substitution with Arg, e.g., D102R; bh. the modification at the position corresponding to position 105 is a substitution with Arg, e.g., S105R and/or an insertion of Arg, e.g., S105SR or S105RR; bi. the modification at the position corresponding to position 178 is a substitution with Arg, e.g., N178R bj. the modification at the position corresponding to position 180 is a substitution with Arg, e.g., A180R; bk. the modification at the position corresponding to position 211 is a substitution with Arg, e.g., F211R; bl. the modification at the position corresponding to position 250 is a substitution with Arg, e.g., P250R; bm. the modification at the position corresponding to position 252 is a substitution with Arg, e.g., I252R; bn. the modification at the position corresponding to position 254 is a substitution with Arg, e.g., D254R; bo. the modification at the position corresponding to position 256 is a substitution with Arg, e.g., P256R.
 3. The variant of claim 1 or 2, which comprises a modification at three or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254 and
 256. 4. A lipase variant of any of claims 1-3, comprising a modification at two or more positions corresponding to positions 1, 2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 15, 28, 29, 30, 31, 33, 37, 38, 39, 40, 42, 43, 45, 73, 91, 99, 101, 102, 105, 106, 167, 178, 180, 192, 193, 194, 199, 200, 202, 210, 211, 217, 218, 220, 221, 224, 225, 226, 227, 228, 229, 230, 231, 232, 233, 234, 236, 238, 239, 243, 244, 245, 248, 249, 250, 251, 252, 254, and 256 of SEQ ID NO: 1 with Arg, wherein the lipase variant has at least 60%, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, or at least 99% sequence identity, but less than 100% sequence identity, to SEQ ID NO: 1; the lipase variant has lipase activity.
 5. The variant of any of claims 1-4, which further comprises one or more substitutions in the lid region corresponding to 81-99 of SEQ ID NO: 1, preferably R81Q; S83T; R84H; S85T; I86L, I86P, I86V, I86W; E87A, E87I, E87K, E87T, E87V; N88Q; I90L, I90M; G91A, G91L, G91N, G91Q, G91T; N92D, N92K; L93F; N94D, N94K, N94R; F95A, F95L, F95Y; D96E, D961, D96L, D96T: L97F, L97M, L97P; K98D, K98E, K98I, K98Q; and E99K.
 6. The variant of any of claims 1-5, which further comprises one or more substitutions corresponding to any of positions selected from: 27, 33, 38, 51, 56, 57, 58, 60, 69, 101, 106, 111, 150, 163, 198, 210, 211, 216, 220, 254, 255, 256, 263, 264, 265, 266, 267, and 269 of SEQ ID NO:
 1. 7. The variant of claim 6, wherein said one or more further substitutions are selected from the group consisting of: 27N, 27R; 33K, 33Q; 38A; 51I, 51L, 51V; 56K, 56Q, 56R, 56S; 57G, 57N; 58A; 60S; 69R; 101R; 106K, 106R; 111A; 131T; 149D; 150G; 163K, 163S; 198S; 210K, 210Q; 211L; 216P; 220F; 254S; 255A, 255I, 255T; 256K, 256T, 256V; 263Q; 264A, 264F, 264W; 265T; 266D; 267A; and 269N.
 8. The variant of any of claims 1-7, which is a variant of a parent lipase having at least 60% sequence identity to SEQ ID NO: 1, e.g., at least 65%, at least 70%, at least 75%, at least 80%, at least 85%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, at least 99% or 100% sequence identity to SEQ ID NO:
 1. 9. The variant of any of claims 1-8, wherein the variant has one of the following set of modifications: R232RR V236R + E239R S224* + G225* + T226* + L227R + V228R + V230* G225R + T231R T231R + E239R + Q249R G225R + L227R T199R + N200R Q4R + N8R E1Q + V2K G91T + N101R + G106R G225R + V228R E1ER T231TR E1* + V2R + S3R E1* + V2* + S3R E1* + V2* + S3* E1* + V2R E1* N233R + V236R T231R + V236R N200R + T231R N233R + Q249R G225R + N233R L227R + V236R N200R + L227R T226R + Q249R N200R + G225R G225R + T226R V236R + E239R S224R + G225R N8R + N11R G38R + N39R S224R + P229R T37R + G38R + N39R E1Q + V2K + Q4R T37R + N39R T37R + G38R S224R + L227R L227R + P229R E1P + V2* D5R + N8R N8R + E43R N200R + G225R G225R + N233R N200R + T231R T231R + E239R + Q249R G225R + T231R T37R + N39R T37R + G38R + N39R G38R + N39R G91T + N101R + G106R D234R V236R G225R P229R N33R T37R N39R A131T G245R Q249R G225* T226* L227R V228R E1* V2* E1* V2K V2* E1Q V2* E1ER V2R S224* G225* T226R L227R V228* S224* G225* T226* L227R P229R S224R G225R L227R V228* T231TRR S224K G225K A30R N33R S224K P229K S224K G225K L227K V236K E239K N39K P229R G38R P229R A30R G31R S105R G106R G106R N178R E210Q F211R P250R I252R Q249R P250R A243R G245R N233R A243AR T244TRR S105RR S105RR G106R T199KN200K P229R T231TR P229R V230VR P229PR T231TR T226R V228R E1P V2* Q4R N8R E1P D5R N8R D5R N11R Q4R N11R A28R P29R N178R A180R T37K G38K N39K G225GR G91T N101R S105R G91T D102R S105R S224R V228VR S224SR V228VR S224SR T226TR V228VR P229PR G91T E99R N101R S105R G91TG106R N178R T244TR E99R N101R G91T N101R D102R N101R D102R D102R S105R G91TG106R A180R D254R P256R L227LR


10. The variant of any of claims 1-9, which has an improved wash performance, in particular higher Benefit Risk Factor (BRF), higher relative wash performance (RP(Wash) and/or lower relative odor (RP(Odor) than the lipase shown as SEQ ID NO:
 1. 11. A composition comprising the variant of any of claims 1-10.
 12. The composition of claim 11, further comprising a surfactant.
 13. Use of the variant of any of claims 1-10 for hydrolyzing a lipase substrate.
 14. A method for cleaning a surface comprising contacting the surface with the variant of any of claims 1-10.
 15. A method of hydrolyzing a lipase substrate, comprising treating the lipase substrate with a lipase variant of any of claims 1-10.
 16. A polynucleotide encoding the variant of any of claims 1-10, wherein the polynucleotide is operably linked to one or more control sequences that direct the production of the xylanase variant in a recombinant host cell.
 17. A nucleic acid construct comprising the polynucleotide of claim
 16. 18. An expression vector comprising the polynucleotide of claim
 16. 19. A host cell comprising a nucleic acid construct of claim 17 or expression vector of claim
 18. 20. A method of producing a lipase variant, comprising: a. cultivating the host cell of claim 19 under conditions suitable for expression of the variant; and b. recovering the variant.
 21. A method of producing the variant of any of claims 1-10, comprising: c. cultivating a transgenic plant or a plant cell comprising a polynucleotide encoding the variant under conditions conducive for production of the variant; and d. recovering the variant.
 22. A whole broth formulation or cell culture composition comprising the variant of any of claims 1-10. 